Development of HW-CVD technique with a radical source and application to preparation of doped nanocrystalline thin films

• Project/Area Number: 19560314
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Electronic materials/Electric materials
• Research Institution: Nagoya University
• Principal Investigator: TABATA Akimori Nagoya University, 大学院・工学研究科, 准教授 (20227250)
• Project Period (FY): 2007 – 2008
• Project Status: Completed (Fiscal Year 2008)
• Budget Amount: ¥4,160,000 (Direct Cost: ¥3,200,000、Indirect Cost: ¥960,000); Fiscal Year 2008: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000); Fiscal Year 2007: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
• Keywords: ホットワイヤー化学気相成長法 / ラジカル源 / ナノ結晶 / 炭化シリコン / ドーピング / N_2分解

Research Abstract

シラン・メタンを原料としたホットワイヤー化学気相成長(HW-CVD)法によるn型およびp型ナノ結晶SiC薄膜の作製に関する研究を行った。(1)予備実験として、N2のHW上での分解を調べ、N_2がHW-CVD法においても有用なN源であることを明らかにした。(2)N_2およびH_2ガス流量を制御して膜の結晶性およびN混入量の制御を図ることにより、高い電気伝導度を有するNドープn型膜の作製に成功した。(3)ラジカル源を併用することにより、固体源をドーパントとしても不純物添加ができ、p型膜の作製の可能性を示した

Research Products

• [Journal Article] Preparation of N-type nanocrystalline 3C-SiC films by hot-wire CVD using N2 as doping gas (2009)
  • Author(s): Y. Hoshide, A. Tabata, A. Kitagawa, A. Kondo
  • Journal Title: Thin Solid Films 517 Pages: 3524-3524
  • Peer Reviewed
• [Journal Article] H_2 decomposition by hot wire and N_2 post-deposition treatment on hydrogenated microcrystalline silicon thin films (2009)
  • Author(s): M. Koji, A. Tabata, A. Kitagawa, A. Kondo
  • Journal Title: Thin Solid Films 517 Pages: 3452-3452
  • Peer Reviewed
• [Journal Article] Preparation of n-type nanocrystalline 3C-SiC films by hot-wire CVD using N_2 as doping gas (2009)
  • Author(s): Y. Hoshide, A. Tabata, A. Kitagawa A. Kondo
  • Journal Title: Thin Solid Films (未定印刷中)
  • Peer Reviewed
• [Journal Article] N_2 decomposition by hot wire and N_2 post-deposition treatment on hydrogenated microcrystalline silicon thin films. (2009)
  • Author(s): K. Mazaki A. Tabata, A. Kitagawa A. Kondo
  • Journal Title: Thin Solid Films (未定印刷中)
  • Peer Reviewed
• [Presentation] ガラス基板上へのn型ナノ結晶3C-SiC薄膜の低温堆積とその高品質化 (2008)
  • Author(s): 星出純希, 田畑彰守, 北川明彦, 近藤明弘
  • Organizer: SiC及び関連ワイドギャップ半導体研究会第17回講演会予稿集
  • Place of Presentation: 大田区産業プラザ(35-36)
  • Year and Date: 2008-12-08
• [Presentation] Improvement of electrical properties of n-type nano- crystalline 3C-SiC thin films prepared by hot-wire CVD at high H2-dilution (2008)
  • Author(s): Y. Hoshide, A. Tabata
  • Organizer: 30th International Symposium on Dry Process
  • Place of Presentation: Tokyo (Japan)
  • Year and Date: 2008-11-26
• [Presentation] Preparation of n-type nano- crystalline 3C-SiC films by hot-wire CVD using N2 as doping gas (2008)
  • Author(s): Y. Hoshide, A. Tabata, A. Kitagawa, A. Kondo
  • Organizer: 5th International Conference on Hot-Wire CVD (Cat-CVD) process
  • Place of Presentation: Massachusetts (USA)
  • Year and Date: 2008-08-23
• [Presentation] H_2 decomposition by hot wire and N2 post-deposition treatment on hydrogenated microcrystalline silicon thin films (2008)
  • Author(s): M. Koji, A. Tabata, A. Kitagawa, A. Kondo
  • Organizer: 5th International Conference on Hot-Wire CVD (Cat-CVD) process
  • Place of Presentation: Massachusetts (USA)
  • Year and Date: 2008-08-23
• [Presentation] N2ガスをドーピング原料としたn型ナノ結晶3C-SiC薄膜の開発 (2008)
  • Author(s): 星出純希, 田畑彰守, 北川明彦, 近藤明弘
  • Organizer: 第5回Cat-CVD研究会講演予稿集
  • Place of Presentation: 神奈川工科大学メディアホール(33-36)
  • Year and Date: 2008-06-20
• [Presentation] ホットワイヤーによるN2ガス分解 (2008)
  • Author(s): 間崎耕司, 田畑彰守, 北川明彦, 近藤明弘
  • Organizer: 第5回Cat-CVD研究会講演予稿集
  • Place of Presentation: 神奈川工科大学メディアホール(33-36)
  • Year and Date: 2008-06-20
• [Presentation] N_2ガスをドーピング原料としたn型ナノ結晶3 C-SiC薄膜の開発 (2008)
  • Author(s): 星出純希, 田畑彰守, 北川明彦, 近藤明弘
  • Organizer: 第5回Cat-CVD研究会講演予稿集、
  • Place of Presentation: 神奈川工科大学、神奈川
• [Presentation] ホットワイヤーによるN_2ガス分解 (2008)
  • Author(s): 間崎耕司, 田畑彰守, 北川明彦, 近藤明弘
  • Organizer: 第5回Cat-CVD研究会講演予稿集、
  • Place of Presentation: 神奈川工科大学、神奈川
• [Presentation] Preparation of n-type nanocrystalline 3C-SiC films by hot-wire CVD usine N_2 as doping gas (2008)
  • Author(s): Y. Hoshide, A. Tabata A. Kitagawa, A. Kondo
  • Organizer: 5th International Conference on Hot-wire CVD (Cat-CVD) process
  • Place of Presentation: Massachusetts, USA
• [Presentation] N_2 decomposition by hot wire and N_2 post-deposition treatment on hydrogenated microcrystalline silicon thin films. (2008)
  • Author(s): M. Mazaki, A. Tabata. Kitagawa, A. Kondo
  • Organizer: 5th International Conference on Hot-Wire CVD (Cat-CVD) process
  • Place of Presentation: Massachusetts, USA
• [Presentation] Improvement of electrical properties of n-type nanocrystalline 3C-SiC thin films prepared by hot-wire CVD at high H_2-dilution (2008)
  • Author(s): Y. Hoshide A. Tabata
  • Organizer: 30th International Symposium on Dry Process
  • Place of Presentation: Tokyo, Japan
• [Presentation] ガラス基板上へのn型ナノ結晶3C-SiC薄膜の低温堆積とその高品質化 (2008)
  • Author(s): 星出純希, 由畑彰守 北川明彦, 近藤明弘
  • Organizer: 第17回Sic及び関連ワイドギャップ半導体研究会
  • Place of Presentation: 大田区産業プラザ、東京