A novel technique to make nanogap with atomically flat electrodes
Project/Area Number |
19760023
|
Research Category |
Grant-in-Aid for Young Scientists (B)
|
Allocation Type | Single-year Grants |
Research Field |
Thin film/Surface and interfacial physical properties
|
Research Institution | Kyoto University |
Principal Investigator |
KUROKAWA Shu Kyoto University, 大学院・工学研究科, 准教授 (90303859)
|
Project Period (FY) |
2007 – 2008
|
Project Status |
Completed (Fiscal Year 2008)
|
Budget Amount *help |
¥3,510,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥210,000)
Fiscal Year 2008: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000)
Fiscal Year 2007: ¥2,600,000 (Direct Cost: ¥2,600,000)
|
Keywords | 走査プローブ顕微鏡 / 表面・界面 / ナノギャップ |
Research Abstract |
Silicon on insulator基板を使用することで,比較的簡便な方法でSPM(走査プローブ顕微鏡)観察に適したナノギャップを作成した.実際にギャップ部で電圧降下が起っていること,電極表面が1nm以下の平坦差に保たれていることを確かめた.
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Report
(3 results)
Research Products
(7 results)