Development of biomaterials using plasma and ion processes
| Project/Area Number |
19760498
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Single-year Grants |
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| Research Field |
Structural/Functional materials
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| Research Institution | The Institute of Physical and Chemical Research |
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Principal Investigator |
KOBAYASHI Tomohiro The Institute of Physical and Chemical Research, 山崎原子物理研究室, 専任研究員 (40282496)
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| Project Period (FY) |
2007 – 2009
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| Project Status |
Completed (Fiscal Year 2009)
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| Budget Amount *help |
¥3,350,000 (Direct Cost: ¥2,900,000、Indirect Cost: ¥450,000)
Fiscal Year 2009: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2008: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000)
Fiscal Year 2007: ¥1,400,000 (Direct Cost: ¥1,400,000)
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| Keywords | プラズマイオン注入 / 細胞接着 / 生体適合性 / シリコーン / 炭素化 / PBII / PTFE / ダイヤモンドライクカーボン / フッ素化ダイヤモンドライクカーボン |
|---|
| Research Abstract |
In this study the surfaces of Silicones (polydimethylsiloxane) were irradiated with ions by a plasma based ion implantation (PBII) method and changes in their composition, structure, morphology and biocompatibility were investigated. Due to the morphological and the structural changes, the cell attachment percentage and growth rate were improved. The optimal irradiation voltage was between 2.5 and 5 kV. The Raman spectra showed a destruction of siloxane bonds and formation of amorphous carbon structures.
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Report
(4 results)
Research Products
(27 results)
