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Research on Polarization-Controlled Ultra-Wide Bandgap Semiconductor Devices

Research Project

Project/Area Number 19H02170
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Review Section Basic Section 21050:Electric and electronic materials-related
Research InstitutionKyoto Institute of Technology

Principal Investigator

Nishinaka Hiroyuki  京都工芸繊維大学, 電気電子工学系, 准教授 (70754399)

Co-Investigator(Kenkyū-buntansha) 上田 修  明治大学, 研究・知財戦略機構(生田), 研究推進員(客員研究員) (50418076)
池永 訓昭  金沢工業大学, 工学部, 准教授 (30512371)
蓮池 紀幸  京都工芸繊維大学, 電気電子工学系, 助教 (40452370)
Project Period (FY) 2019-04-01 – 2022-03-31
Project Status Completed (Fiscal Year 2021)
Budget Amount *help
¥17,550,000 (Direct Cost: ¥13,500,000、Indirect Cost: ¥4,050,000)
Fiscal Year 2021: ¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000)
Fiscal Year 2020: ¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000)
Fiscal Year 2019: ¥8,970,000 (Direct Cost: ¥6,900,000、Indirect Cost: ¥2,070,000)
Keywords酸化ガリウム / 強誘電体 / 単一ドメイン / ε相酸化ガリウム / ミストCVD / 混晶 / 結晶成長 / 高電子移動度トランジスタ / 単結晶 / ミストCVD法 / 高移動度トランジスタ
Outline of Research at the Start

本研究は、次世代パワー半導体として期待されている酸化ガリウムの一つの結晶多形であるε型の結晶構造に注目し、従来のパワー半導体が成しえなかった超省エネのパワーデバイスを実現することを目的としている。このε型酸化ガリウムは大きなバンドギャップ、大きな分極、強誘電体特性など、すでに検討されている窒化ガリウムが持ちえない魅力的な物性を持っている。本研究では、このε型酸化ガリウムの材料の開拓を行う。

Outline of Final Research Achievements

In this study, we investigated ferroelectric κ-Ga2O3 thin films for high-electron-mobility transistors. It shows a large polarization and hence high two-dimensional electron gas density, which makes it a highly promising candidate for low resistance power-switching applications. It is challenging to grow single-domain κ-Ga2O3 thin films using the conventional substrates. We proposed a novel substrate for obtaining single-domain κ-Ga2O3. The substrates allowed the growth of single-domain κ-Ga2O3 thin films. Furthermore, the lattice-mismatch exhibits as small as approximately 1 %. This small lattice-mismatch also allowed the growth of high-quality κ-Ga2O3 thin films. We believe that these results pave the way for the high-electron-mobility transistors with low on-resistance.

Academic Significance and Societal Importance of the Research Achievements

本研究は新しい強誘電体かつ半導体であるκ-Ga2O3の結晶成長技術や基礎物性を明らかにする研究である。従来のGaNを大きく上回る分極の大きさや分極スイッチングは新しいパワースイッチングデバイスが実現できる可能性を有しており、その学術的意義は大きい。また、この大きな分極はより小さなオン抵抗が実現できるため、より低消費なスイッチング素子が実現できる。このより低消費なスイッチング素子は、超低消費電力社会に向けて大きな社会的意義があると考えている。

Report

(4 results)
  • 2021 Annual Research Report   Final Research Report ( PDF )
  • 2020 Annual Research Report
  • 2019 Annual Research Report
  • Research Products

    (66 results)

All 2022 2021 2020 2019 Other

All Journal Article (14 results) (of which Peer Reviewed: 14 results,  Open Access: 3 results) Presentation (48 results) (of which Int'l Joint Research: 10 results,  Invited: 7 results) Book (2 results) Remarks (2 results)

  • [Journal Article] Alloying In2O3 and Ga2O3 on AlN templates for deep-ultraviolet transparent conductive films by mist chemical vapor deposition2022

    • Author(s)
      Ogura Yuri、Arata Yuta、Nishinaka Hiroyuki、Yoshimoto Masahiro
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 61 Issue: SC Pages: SC1037-SC1037

    • DOI

      10.35848/1347-4065/ac4688

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Observing the microstructure of a (001) κ-Ga2O3 thin film grown on a (-201) β-Ga2O3 substrate using automated crystal orientation mapping transmission electron microscopy2022

    • Author(s)
      Kajita Yuki、Nishinaka Hiroyuki、Yoshimoto Masahiro
    • Journal Title

      CrystEngComm

      Volume: 24 Issue: 17 Pages: 3239-3245

    • DOI

      10.1039/d2ce00042c

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Epitaxial growth of metastable c-plane rhombohedral indium tin oxide using mist chemical vapor deposition2022

    • Author(s)
      Shimazoe Kazuki、Nishinaka Hiroyuki、Watanabe Keisuke、Yoshimoto Masahiro
    • Journal Title

      Materials Science in Semiconductor Processing

      Volume: 147 Pages: 106689-106689

    • DOI

      10.1016/j.mssp.2022.106689

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Growth of Metastable α-Ga<sub>2</sub>O<sub>3</sub> Epitaxial Thin Film on Flexible Synthetic Mica by Insertion α-Fe<sub>2</sub>O<sub>3</sub> Buffer Layer2021

    • Author(s)
      ARATA Yuta、NISHINAKA Hiroyuki、SHIMAZOE Kazuki、YOSHIMOTO Masahiro
    • Journal Title

      Journal of the Society of Materials Science, Japan

      Volume: 70 Issue: 10 Pages: 738-744

    • DOI

      10.2472/jsms.70.738

    • NAID

      130008105966

    • ISSN
      0514-5163, 1880-7488
    • Year and Date
      2021-10-15
    • Related Report
      2021 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Epitaxial growth of <i>κ</i>- and <i>γ</i>-Ga<sub>2</sub>O<sub>3</sub> thin films with alloying and lattice matching2021

    • Author(s)
      西中 浩之
    • Journal Title

      Oyo Buturi

      Volume: 90 Issue: 6 Pages: 360-364

    • DOI

      10.11470/oubutsu.90.6_360

    • NAID

      130008049183

    • ISSN
      0369-8009, 2188-2290
    • Year and Date
      2021-06-05
    • Related Report
      2021 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Epitaxial growth of γ-(AlxGa1-x)2O3 alloy thin films on spinel substrates via mist chemical vapor deposition2021

    • Author(s)
      Horie Ryuto、Nishinaka Hiroyuki、Tahara Daisuke、Yoshimoto Masahiro
    • Journal Title

      Journal of Alloys and Compounds

      Volume: 851 Pages: 156927-156927

    • DOI

      10.1016/j.jallcom.2020.156927

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Rapid homoepitaxial growth of (010) β-Ga2O3 thin films via mist chemical vapor deposition2021

    • Author(s)
      Nishinaka Hiroyuki、Nagaoka Tatsuji、Kajita Yuki、Yoshimoto Masahiro
    • Journal Title

      Materials Science in Semiconductor Processing

      Volume: 128 Pages: 105732-105732

    • DOI

      10.1016/j.mssp.2021.105732

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Plan-view TEM observation of a single-domain κ-Ga2O3 thin film grown on ε-GaFeO3 substrate using GaCl3 precursor by mist chemical vapor deposition2021

    • Author(s)
      Nishinaka Hiroyuki、Ueda Osamu、Ito Yusuke、Ikenaga Noriaki、Hasuike Noriyuki、Yoshimoto Masahiro
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 61 Issue: 1 Pages: 018002-018002

    • DOI

      10.35848/1347-4065/ac3e17

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Single-Domain and Atomically Flat Surface of κ-Ga<sub>2</sub>O<sub>3</sub> Thin Films on FZ-Grown ε-GaFeO<sub>3</sub> Substrates via Step-Flow Growth Mode2020

    • Author(s)
      Nishinaka Hiroyuki、Ueda Osamu、Tahara Daisuke、Ito Yusuke、Ikenaga Noriaki、Hasuike Noriyuki、Yoshimoto Masahiro
    • Journal Title

      ACS Omega

      Volume: 5 Issue: 45 Pages: 29585-29592

    • DOI

      10.1021/acsomega.0c04634

    • Related Report
      2020 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Phase control of α- and κ-Ga2O3 epitaxial growth on LiNbO3 and LiTaO3 substrates using α-Fe2O3 buffer layers2020

    • Author(s)
      Shimazoe Kazuki、Nishinaka Hiroyuki、Arata Yuta、Tahara Daisuke、Yoshimoto Masahiro
    • Journal Title

      AIP Advances

      Volume: 10 Issue: 5 Pages: 055310-055310

    • DOI

      10.1063/5.0006137

    • Related Report
      2019 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Epitaxial Growth of Bendable Cubic NiO and In2O3 Thin Films on Synthetic Mica for p- and n-type Wide-Bandgap Semiconductor Oxides2020

    • Author(s)
      Arata Yuta、Nishinaka Hiroyuki、Shimazoe Kazuki、Yoshimoto Masahiro
    • Journal Title

      MRS Advances

      Volume: - Issue: 31-32 Pages: 1-9

    • DOI

      10.1557/adv.2020.85

    • Related Report
      2019 Annual Research Report
    • Peer Reviewed
  • [Journal Article] van der Waals epitaxy of ferroelectric ε-gallium oxide thin film on flexible synthetic mica2020

    • Author(s)
      Arata Yuta、Nishinaka Hiroyuki、Tahara Daisuke、Yoshimoto Masahiro
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 59 Issue: 2 Pages: 025503-025503

    • DOI

      10.35848/1347-4065/ab6b70

    • Related Report
      2019 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Microstructures of ε-Ga2O3 thin film on (100) TiO2 substrate by mist chemical vapor deposition2019

    • Author(s)
      Tahara Daisuke、Nishinaka Hiroyuki、Arata Yuta、Shimazoe Kazuki、Yoshimoto Masahiro
    • Journal Title

      IEEE Xplore (IMFEDK)

      Volume: - Pages: 79-80

    • DOI

      10.1109/imfedk48381.2019.8950694

    • Related Report
      2019 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Growth and characterization of F-doped α-Ga2O3 thin films with low electrical resistivity2019

    • Author(s)
      Shota Morimoto, Hiroyuki Nishinaka, Masahiro Yoshimoto
    • Journal Title

      Thin Solid Films

      Volume: 682 Pages: 16-23

    • DOI

      10.1016/j.tsf.2019.04.051

    • Related Report
      2019 Annual Research Report
    • Peer Reviewed
  • [Presentation] ミストCVD法によるパワー半導体応用に向けたGa2O3の形成技術2022

    • Author(s)
      西中浩之
    • Organizer
      FIoTコンソーシアム令和3年度第3回機能性フレキシブルとインクジェット技術分科会
    • Related Report
      2021 Annual Research Report
    • Invited
  • [Presentation] Growth of corundum structured oxides and their alloy for lattice matched applications2021

    • Author(s)
      K. Shimazoe, H. Nishinaka, and M. Yoshimoto
    • Organizer
      The 2021 International Meeting for Future of Electron Devices, Kansai
    • Related Report
      2021 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Epitaxial Growth of Indium-Gallium-Oxide-Alloy Thin Films on AlN Templates by Mist Chemical Vapor Deposition2021

    • Author(s)
      Y. Ogura, Y. Arata, H. Nishinaka, and M. Yoshimoto
    • Organizer
      2021 International Conference on Solid State Devices and Materials,
    • Related Report
      2021 Annual Research Report
  • [Presentation] Bi添加In2O3の光学的特性評価2021

    • Author(s)
      谷口 陽子,島添 和樹,西中 浩之,吉本 昌広
    • Organizer
      第31回日本MRS年次大会
    • Related Report
      2021 Annual Research Report
  • [Presentation] ミストCVD法によるスズ添加酸化インジウム及びフッ素添加酸化スズ薄膜のエピタキシャル成長2021

    • Author(s)
      島添 和樹,西中 浩之,石野 貴之,渡邉 啓佑,吉本 昌広
    • Organizer
      第31回日本MRS年次大会
    • Related Report
      2021 Annual Research Report
  • [Presentation] ミストCVD法によるα-Al2O3基板上のrh-IMO薄膜のエピタキシャル成長とその評価2021

    • Author(s)
      石野 貴之,島添 和樹,西中 浩之,吉本 昌広
    • Organizer
      第31回日本MRS年次大会
    • Related Report
      2021 Annual Research Report
  • [Presentation] ミストCVD法でのκ相およびγ相Ga2O3結晶の成長と評価2021

    • Author(s)
      西中浩之
    • Organizer
      (独)日本学術振興会「結晶加工と評価技術」第145 委員会 第173 回研究会
    • Related Report
      2021 Annual Research Report
    • Invited
  • [Presentation] ミストCVD法による省エネパワーデバイスGa2O3の形成技術2021

    • Author(s)
      西中浩之
    • Organizer
      関西広域連合グリーン・イノベーション研究成果企業化フォーラム
    • Related Report
      2021 Annual Research Report
    • Invited
  • [Presentation] ミストCVD法による深紫外透明導電膜への応用に向けた(InxGa1-x)2O3混晶薄膜の成長2021

    • Author(s)
      小倉有莉,池之上卓己,新田悠汰,西中浩之,吉本昌広
    • Organizer
      材料学会半導体エレクロトニクス部門委員会第2回研究会
    • Related Report
      2021 Annual Research Report
  • [Presentation] ミストCVD法を用いたYSZ(111)面基板上のIMO薄膜のエピタキシャル成長とその評価2021

    • Author(s)
      石野 貴之, 島添 和樹, 西中 浩之, 吉本 昌広
    • Organizer
      第82回応用物理学会秋季学術講演会
    • Related Report
      2021 Annual Research Report
  • [Presentation] ミスト CVD 法によるβ-(AlxGa1-x)2O3混晶薄膜成長2021

    • Author(s)
      金子 真大, 堀江 竜斗, 梶田 優気, 西中 浩之, 吉本 昌広
    • Organizer
      第82回応用物理学会秋季学術講演会
    • Related Report
      2021 Annual Research Report
  • [Presentation] ミストCVD法を用いたrh-ITOエピタキシャル薄膜上へのHfxZr1-xO2薄膜成長2021

    • Author(s)
      島添 和樹, 藤原 悠希, 新田 悠汰, 西中 浩之, 吉本 昌広, 野田 実
    • Organizer
      第82回応用物理学会秋季学術講演会
    • Related Report
      2021 Annual Research Report
  • [Presentation] 深紫外透明導電膜への応用に向けた(InxGa1-x)2O3混晶薄膜の成長とその評価2021

    • Author(s)
      小倉 有莉, 新田 悠汰, 池之上 卓己, 西中 浩之, 吉本 昌広
    • Organizer
      第82回応用物理学会秋季学術講演会
    • Related Report
      2021 Annual Research Report
  • [Presentation] ミストCVD法を用いたβ-(InxGa1-x)2O3薄膜のエピタキシャル成長2021

    • Author(s)
      梶田 優気, 西中 浩之, 吉本 昌広
    • Organizer
      第82回応用物理学会秋季学術講演会
    • Related Report
      2021 Annual Research Report
  • [Presentation] Growth of Rhombohedral Indium Oxide Thin Films on LiTaO3 Substrate for Fabrication of Lattice Matched Indium Gallium Oxide Power Devices2020

    • Author(s)
      K. Shimazoe, H. Nishinaka, Y. Arata, Y. Ito, and M. Yoshimoto
    • Organizer
      The 2021 International Meeting for Future of Electron Devices, Kansai Satellite event
    • Related Report
      2020 Annual Research Report
  • [Presentation] Epitaxial Growth of ZnO Thin Films on Flexible Substrates and Characteristics of Optical Properties by Bending2020

    • Author(s)
      Y. Arata, H. Nishinaka, and M. Yoshimoto
    • Organizer
      The 2021 International Meeting for Future of Electron Devices, Kansai Satellite event
    • Related Report
      2020 Annual Research Report
  • [Presentation] ミストCVD法によるGa2O3のエピタキシャル成長技術2020

    • Author(s)
      西中浩之
    • Organizer
      日本板硝子材料工学助成会 第38回無機材料に関する最近の研究成果発表会
    • Related Report
      2020 Annual Research Report
    • Invited
  • [Presentation] Ga2O3 の中間準位を利用した p 型伝導に向けた検討2020

    • Author(s)
      西中浩之
    • Organizer
      日本学術振興会 結晶加工と評価技術 第145委員会 第169回研究会
    • Related Report
      2020 Annual Research Report
    • Invited
  • [Presentation] HEMT応用に向けたκ-Ga2O3の結晶成長技術2020

    • Author(s)
      西中浩之
    • Organizer
      電子情報通信学会 SDM/EID/ITE-IDY 研究会
    • Related Report
      2020 Annual Research Report
    • Invited
  • [Presentation] ミストCVDによるκ-酸化ガリウムのエピタキシャル成長2020

    • Author(s)
      西中浩之
    • Organizer
      第71回CVD研究会
    • Related Report
      2020 Annual Research Report
    • Invited
  • [Presentation] Epitaxial growth of various p- and n-type oxide thin films on flexible synthetic mica using mist chemical vapor depositio2020

    • Author(s)
      Y. Arata, H. Nishinaka, K. Shimazoe, Y. Ito, and M. Yoshimoto
    • Organizer
      The 39th Electronic Materials Symposium
    • Related Report
      2020 Annual Research Report
  • [Presentation] Growth of Metastable Rhombohedral Structured Oxides Using Alpha-Fe2O3 Buffer Layers via Mist CVD Method2020

    • Author(s)
      K. Shimazoe, H. Nishinaka, Y. Arata, Y. Ito, and M. Yoshimoto
    • Organizer
      The 39th Electronic Materials Symposium
    • Related Report
      2020 Annual Research Report
  • [Presentation] ミストCVD法を用いたフレキシブルなZnO薄膜のエピタキシャル成長および光学的特性の評価2020

    • Author(s)
      新田悠汰, 西中浩之, 吉本昌広
    • Organizer
      第81回応用物理学会秋季学術講演会
    • Related Report
      2020 Annual Research Report
  • [Presentation] ミストCVD法を用いて(-201) β-Ga2O3基板上に成長したκ-Ga2O3薄膜の構造解析2020

    • Author(s)
      梶田優気, 西中浩之, 新田 悠汰, 吉本昌広
    • Organizer
      第81回応用物理学会秋季学術講演会
    • Related Report
      2020 Annual Research Report
  • [Presentation] ミストCVD法によるLiTaO3基板上へのバッファ層を用いないrh-ITOエピタキシャル薄膜の成長とその評価2020

    • Author(s)
      島添 和樹, 西中浩之, 新田 悠汰, 伊藤 雄祐, 吉本昌広
    • Organizer
      第81回応用物理学会秋季学術講演会
    • Related Report
      2020 Annual Research Report
  • [Presentation] スピネル基板上に格子整合して成長したγ-(AlxGa1-x)2O3混晶薄膜の界面の結晶構造解析2020

    • Author(s)
      堀江 竜斗, 田原大祐, 西中浩之, 吉本昌広
    • Organizer
      第81回応用物理学会秋季学術講演会
    • Related Report
      2020 Annual Research Report
  • [Presentation] 酸化鉄を用いた準安定酸化物半導体の結晶相制御2020

    • Author(s)
      島添 和樹, 西中浩之, 新田 悠汰, 伊藤 雄祐, 吉本昌広
    • Organizer
      日本材料学会半導体エレクトロニクス部門委員会令和2年度第1回研究会
    • Related Report
      2020 Annual Research Report
  • [Presentation] ミストCVD法によるγ-(AlxGa1-x)2O3混晶薄膜成長2020

    • Author(s)
      堀江竜斗、田原大祐、西中浩之、吉本昌広
    • Organizer
      第67回応用物理学会春季学術講演会
    • Related Report
      2019 Annual Research Report
  • [Presentation] ミストCVD法による準安定相rh-ITO薄膜のエピタキシャル成長と評価2020

    • Author(s)
      島添和樹、西中浩之、田原大祐、新田悠汰、吉本昌広
    • Organizer
      第67回応用物理学会春季学術講演会
    • Related Report
      2019 Annual Research Report
  • [Presentation] ミストCVD法によるβ-Ga2O3(-201)基板上へのε-Ga2O3薄膜のエピタキシャル成長2020

    • Author(s)
      梶田優気、西中浩之、田原大祐、新田悠汰、吉本昌広
    • Organizer
      第67回応用物理学会春季学術講演会
    • Related Report
      2019 Annual Research Report
  • [Presentation] ミストCVD法を用いたフレキシブルなワイドギャップ酸化物半導体のエピタキシャル成長2020

    • Author(s)
      新田悠汰、西中浩之、島添和樹、田原大祐、吉本昌広
    • Organizer
      第67回応用物理学会春季学術講演会
    • Related Report
      2019 Annual Research Report
  • [Presentation] ミストCVD法によるrh-ITO上のε-Ga2O3薄膜成長と電気的特性評価2020

    • Author(s)
      伊藤雄祐、藤原悠希、西中浩之、田原大祐、島添和樹、新田悠汰、野田実、吉本昌広
    • Organizer
      第67回応用物理学会春季学術講演会
    • Related Report
      2019 Annual Research Report
  • [Presentation] 新しい強誘電体ε-Ga2O3のエピタキシャル成長技術2019

    • Author(s)
      西中浩之、田原大祐、新田悠汰、島添和樹、野田実、吉本昌広
    • Organizer
      第36回強誘電体応用会議
    • Related Report
      2019 Annual Research Report
  • [Presentation] Effect of plasma treatment of GaN templates on ε-Ga2O3 epitaxial growth by mist chemical vapor deposition2019

    • Author(s)
      Y. Ito、D. Tahara、Y. Arata、H. Nishinaka、M. Yoshimoto
    • Organizer
      3rd International Workshop on Ga2O3 and Related Materials
    • Related Report
      2019 Annual Research Report
    • Int'l Joint Research
  • [Presentation] 合成雲母上へのバッファ層の挿入による曲げられるα-Ga2O3薄膜のエピタキシャル成長2019

    • Author(s)
      新田悠汰、西中浩之、田原大祐、島添和樹、伊藤雄祐、吉本昌広
    • Organizer
      第80回応用物理学会秋季学術講演会
    • Related Report
      2019 Annual Research Report
  • [Presentation] GaNテンプレート基板上の自然酸化膜処理が及ぼすミストCVD法によるε-Ga2O3薄膜成長への影響2019

    • Author(s)
      伊藤雄祐、田原大祐、新田悠汰、西中浩之、吉本昌広
    • Organizer
      第80回応用物理学会秋季学術講演会
    • Related Report
      2019 Annual Research Report
  • [Presentation] ミストCVD法によるGa2O3薄膜成長におけるビスマス添加の効果2019

    • Author(s)
      田原大祐、西中浩之、新田悠汰、長谷川将、吉本昌広
    • Organizer
      第80回応用物理学会秋季学術講演会
    • Related Report
      2019 Annual Research Report
  • [Presentation] LiNbO3,LiTaO3基板上のα, ε-Ga2O3薄膜のエピタキシャル成長2019

    • Author(s)
      島添和樹、西中浩之、田原大祐、新田悠汰、吉本昌広
    • Organizer
      第80回応用物理学会秋季学術講演会
    • Related Report
      2019 Annual Research Report
  • [Presentation] Bismuth-assisted effect for the growth of ε-Ga2O3 films grown on c-plane sapphire substrates by mist chemical vapor deposition2019

    • Author(s)
      D. Tahara、H. Nishinaka、Y. Arata、S. Hasegawa、M Yoshimoto
    • Organizer
      The 38th Electronic Materials Symposium
    • Related Report
      2019 Annual Research Report
  • [Presentation] Van der Waals epitaxy of flexible ε- and α-Ga2O3 filmson cleaved mica by mist chemical vapor deposition2019

    • Author(s)
      Y. Arata、H. Nishinaka、D. Tahara、K. Shimazoe、Y. Ito、M. Yoshimoto
    • Organizer
      11th International Symoposium on Transparent Oxide and Related Materials for Electronics and Optics
    • Related Report
      2019 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Growth And Characterization of Single-Phase Metastable Rhombohedral Indium Tin Oxide Epitaxial Films on Various Plane α-Al2O3 Substrates with α-Fe2O3 Buffer Layers2019

    • Author(s)
      K. Shimazoe、H. Nishinaka、M. Yoshimoto
    • Organizer
      11th International Symoposium on Transparent Oxide and Related Materials for Electronics and Optics
    • Related Report
      2019 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Microstructures of ε-Ga2O3 Thin Film on (100)TiO2 Substrate by Mist Chemical Vapor Deposition2019

    • Author(s)
      D. Tahara、H. Nishinaka、Y. Arata、K. Shimazoe、M Yoshimoto
    • Organizer
      The 2019 International Meeting for Future of Electron Decives, Kansai
    • Related Report
      2019 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Growth of α-and ε-Ga2O3Epitaxial Thin Films on LiTaO3 Substrate2019

    • Author(s)
      K. Shimazoe、H. Nishinaka、D. Tahara、Y. Arata、M. Yoshimoto
    • Organizer
      The 2019 International Meeting for Future of Electron Decives, Kansai
    • Related Report
      2019 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Fabrication of Flexible and Epitaxial Metastable Ga2O3 Thin Films on Synthetic Mica Using OxideBuffer Layer2019

    • Author(s)
      Y. Arata、H. Nishinaka、D. Tahara、K. Shimazoe、Y. Ito、M. Yoshimoto
    • Organizer
      The 2019 International Meeting for Future of Electron Decives, Kansai
    • Related Report
      2019 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Growth and Characterization of Orthorhombic ε-Ga2O3 Thin Films Fabricated via Mist Chemical Vapor Deposition Technique2019

    • Author(s)
      D. Tahara、H. Nishinaka、Y. Arata、K. Shimazoe、Y. Ito、M. Noda、M. Toshimoto
    • Organizer
      2019 Materials Research Soceity Fall meeting
    • Related Report
      2019 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Growth and Characterization of Corundum Structure Oxide Semiconductor on α-Fe2O3 Buffer Layers by The Mist CVD Method2019

    • Author(s)
      K. Shimazoe、H. Nishinaka、D. Tahara、Y. Arata、M. Yoshimoto
    • Organizer
      2019 Materials Research Soceity Fall meeting
    • Related Report
      2019 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Fabrication of Flexible and Epitaxial Oxide Thin Films on Cleaved Synthetic Mica Using Mist Chemical Vapor Deposition2019

    • Author(s)
      Y. Arata、H. Nishinaka、D. Tahara、K. Shimazoe、Y. Ito、M. Yoshimoto
    • Organizer
      2019 Materials Research Soceity Fall meeting
    • Related Report
      2019 Annual Research Report
    • Int'l Joint Research
  • [Presentation] 曲げられる準安定Ga2O3薄膜のエピタキシャル成長2019

    • Author(s)
      新田悠汰、西中浩之、田原大祐、吉本昌広
    • Organizer
      応用物理学会関西支部 2019年度 第2回講演会
    • Related Report
      2019 Annual Research Report
  • [Book] 次世代パワー半導体の開発・評価と実用化 第4章第5節 ミストを用いた半導体製造装置2022

    • Author(s)
      岩室 憲幸 監修 西中浩之 分担執筆
    • Total Pages
      414
    • Publisher
      エヌ・ティー・エス
    • ISBN
      9784860437671
    • Related Report
      2021 Annual Research Report
  • [Book] Gallium Oxide (Chapter: Mist Chemical Vapor Deposition 2 Heteroepitaxial Growth of ε-Ga2O3 on Various Substrates)2020

    • Author(s)
      Hiroyuki Nishinaka(分担)
    • Total Pages
      13
    • Publisher
      Springer, Cham
    • ISBN
      9783030371531
    • Related Report
      2019 Annual Research Report
  • [Remarks] 注目の研究 ミストCVD法による半導体形成技術 ~パワーデバイス応用からナノ構造形成まで~

    • URL

      https://www.kit.ac.jp/chuumokukenkyu/chuumokukenkyu202004/

    • Related Report
      2021 Annual Research Report
  • [Remarks] 【京都工芸繊維大学】(研究紹介)電気電子工学系 西中浩之准教授

    • URL

      https://www.youtube.com/watch?v=6C3l-p9xyT8

    • Related Report
      2021 Annual Research Report

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Published: 2019-04-18   Modified: 2023-01-30  

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