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High-rate sputter deposition technique by controlling surface states of substrate and target independently

Research Project

Project/Area Number 19K05090
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeMulti-year Fund
Section一般
Review Section Basic Section 26050:Material processing and microstructure control-related
Research InstitutionKitami Institute of Technology

Principal Investigator

ABE Yoshio  北見工業大学, 工学部, 教授 (20261399)

Co-Investigator(Kenkyū-buntansha) 川村 みどり  北見工業大学, 工学部, 教授 (70261401)
金 敬鎬  北見工業大学, 工学部, 教授 (70608471)
Project Period (FY) 2019-04-01 – 2023-03-31
Project Status Completed (Fiscal Year 2022)
Budget Amount *help
¥4,420,000 (Direct Cost: ¥3,400,000、Indirect Cost: ¥1,020,000)
Fiscal Year 2022: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000)
Fiscal Year 2021: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000)
Fiscal Year 2020: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2019: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
Keywords水蒸気スパッタ法 / 基板冷却 / 高速成膜 / 酸化物薄膜 / 水酸化物薄膜 / 金属ターゲットモード / 水酸化物 / Ni(OH)2 / エージング処理 / 熱処理 / 熱分解 / β-Ni(OH)2 / プロトン伝道性 / プロトン伝導性 / スパッタ / 薄膜
Outline of Research at the Start

本研究では、水蒸気を反応ガスに用いた新規な反応性スパッタ成膜技術を開発する。本手法では、基板表面とターゲット表面の状態をそれぞれ独立に最適制御することが可能となり、従来のスパッタ法では困難であった幅広い組成領域で高速成膜を実現する。また、本手法を用いて各種酸化物薄膜を作製し、その適用性を明らかにする。

Outline of Final Research Achievements

We have fabricated a new sputtering system that used water vapor as a reactive gas and excess water vapor in a chamber was removed by a liquid nitrogen cold trap. The water vapor was injected toward substrate or target surfaces, and surface states of the substrate and target were controlled independently. We succeeded to deposit chromium oxide, nickel hydroxide, and hydrated tantalum oxide thin films with high deposition rates. The high deposition rates were realized by depositing the oxide films under metallic target mode.
Formation of Ni(OH)2 thin films and improvement of the ion-conductivity of Ta2O5・nH2O thin films were confirmed by cooling substrate below room temperature.

Academic Significance and Societal Importance of the Research Achievements

スパッタ法は、高品質な薄膜作製技術として、電気電子、光学、機械など広い分野で利用されているが、真空装置を必要とするため製造コストが高いという課題がある。そこで、本研究では、水蒸気を反応ガスに用いた新規なスパッタ装置を作製し、酸化物薄膜の高速成膜を実現した。また、スパッタ法では作製が難しかった水酸化物薄膜の作製と高プロトン伝導性の水和酸化物薄膜の作製にも成功した。これらの結果は、製造コストの低減という実用的成果とともに、熱分解しやすく不安定な材料にもスパッタ成膜技術を適用するための学術的な意義も大きい。

Report

(5 results)
  • 2022 Annual Research Report   Final Research Report ( PDF )
  • 2021 Research-status Report
  • 2020 Research-status Report
  • 2019 Research-status Report
  • Research Products

    (14 results)

All 2023 2022 2021 2020 2019

All Journal Article (5 results) (of which Peer Reviewed: 3 results) Presentation (9 results) (of which Int'l Joint Research: 4 results)

  • [Journal Article] Reactive sputter deposition of β-Ni(OH)2 thin films in Ar + H2O mixed gas atmosphere at a substrate temperature of -80 °C2023

    • Author(s)
      Yoshio Abe, Masaki Kataoka, Yuki Yokoiwa, Midori Kawamura, Kyung Ho Kim, Takayuki Kiba
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 62 Issue: 4 Pages: 0455021-6

    • DOI

      10.35848/1347-4065/acc999

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed
  • [Journal Article] 遷移金属酸化物系エレクトロクロミック薄膜のスパッタ成膜プロセス2022

    • Author(s)
      阿部良夫
    • Journal Title

      機能材料

      Volume: 42 (2) Pages: 36-42

    • Related Report
      2021 Research-status Report
  • [Journal Article] 水蒸気を利用した水酸化物系エレクトロクロミック薄膜の高速スパッタ成膜技術2021

    • Author(s)
      阿部良夫
    • Journal Title

      真空ジャーナル

      Volume: 176 Pages: 11-14

    • Related Report
      2021 Research-status Report
  • [Journal Article] Influence of substrate cooling on ion conductivity of tantalum oxide thin films prepared by reactive sputtering using water vapor injection2020

    • Author(s)
      Yusuke Ito, Yoshio Abe, Midori Kawamura, Kyung Ho Kim, Takayuki Kiba
    • Journal Title

      Thin Solid Films

      Volume: 710 Pages: 138276-138276

    • DOI

      10.1016/j.tsf.2020.138276

    • Related Report
      2020 Research-status Report
    • Peer Reviewed
  • [Journal Article] High-rate sputter deposition of chromium oxide thin films using water vapor as a reactive gas2020

    • Author(s)
      Fan Wang, Yoshio Abe, Midori Kawamura, Kyung Ho Kim, Takayuki Kiba
    • Journal Title

      Surface & Coatings Technology

      Volume: 387 Pages: 125509-125509

    • DOI

      10.1016/j.surfcoat.2020.125509

    • Related Report
      2019 Research-status Report
    • Peer Reviewed
  • [Presentation] Ni(OH)2薄膜の光学特性に対する熱処理温度の影響2023

    • Author(s)
      阿部良夫、川村みどり、金敬鎬、木場隆之
    • Organizer
      第70回応用物理学会春季学術講演会
    • Related Report
      2022 Annual Research Report
  • [Presentation] Reactive sputter deposition of β-Ni(OH)2 thin films using H2O as a reactive gas and substrate cooling to -80 ℃2022

    • Author(s)
      Yoshio Abe, Masaki Kataoka, Yuki Yokoiwa, Midori Kawamura, Kyung Ho Kim, Takayuki Kiba
    • Organizer
      The 22nd International Vacuum Congress (IVC-22)
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] 遷移金属酸化物のエレクトロクロミック特性とそのデバイスへの応用2021

    • Author(s)
      阿部良夫
    • Organizer
      電気化学会第88回大会
    • Related Report
      2020 Research-status Report
  • [Presentation] Deposition rate and electrochromic properties of Ni oxide thin films deposited by sputtering using water vapor as a reactive gas2020

    • Author(s)
      Masaki Kataoka, Yoshio Abe, Midori Kawamura, Kyung Ho Kim, Takayuki Kiba
    • Organizer
      Pacific Rim Meeting on Electrochemical and Solid State Science 2020 (PRiME 2020)
    • Related Report
      2020 Research-status Report
    • Int'l Joint Research
  • [Presentation] 基板及びターゲット表面に水蒸気吹き付けした低温スパッタ成膜による酸化ニッケル薄膜の評価2020

    • Author(s)
      片岡政貴、阿部良夫、川村みどり、金敬鎬、木場隆之
    • Organizer
      第81回応用物理学会秋季学術講演会
    • Related Report
      2020 Research-status Report
  • [Presentation] High-rate sputter deposition of chromium oxide thin films under metallic target mode using water vapor as a reactive gas2019

    • Author(s)
      Fan Wang, Yoshio Abe, Midori Kawamura, Kyung Ho Kim, Takayuki Kiba
    • Organizer
      TACT2019 International Thin Films Conference
    • Related Report
      2019 Research-status Report
    • Int'l Joint Research
  • [Presentation] Reactive sputtering of tantalum oxide solid-electrolyte thin films under metallic-target mode by water vapor injection2019

    • Author(s)
      Yusuke Ito, Yoshio Abe, Midori Kawamura, Kyung Ho Kim, Takayuki Kiba
    • Organizer
      TACT2019 International Thin Films Conference
    • Related Report
      2019 Research-status Report
    • Int'l Joint Research
  • [Presentation] 水蒸気を基板表面に吹き付けてスパッタ成膜したクロム酸化物薄膜2019

    • Author(s)
      王ハン;、阿部良夫、川村みどり、金 敬鎬、木場隆之
    • Organizer
      第80回応用物理学会秋季学術講演会
    • Related Report
      2019 Research-status Report
  • [Presentation] 水蒸気スパッタ法におけるターゲット状態の制御と酸化タンタル薄膜の作製2019

    • Author(s)
      伊藤勇佑、阿部良夫、川村みどり、金 敬鎬、木場隆之
    • Organizer
      第80回応用物理学会秋季学術講演会
    • Related Report
      2019 Research-status Report

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Published: 2019-04-18   Modified: 2024-01-30  

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