| Budget Amount *help |
¥46,410,000 (Direct Cost: ¥35,700,000、Indirect Cost: ¥10,710,000)
Fiscal Year 2011: ¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000)
Fiscal Year 2010: ¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000)
Fiscal Year 2009: ¥7,540,000 (Direct Cost: ¥5,800,000、Indirect Cost: ¥1,740,000)
Fiscal Year 2008: ¥30,290,000 (Direct Cost: ¥23,300,000、Indirect Cost: ¥6,990,000)
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| Research Abstract |
We developed novel fabrication techniques, which are not achievable by conventional lithography techniques based on the dry process, for semiconductors(Si, GaAs, and InP) and light metals(Al and Ti) to form ordered nano-and microstructures by wet process using the structural feature of spontaneously generated patterns.
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