Fabrication of ultra high density nanohole array using combination of top-down and bottom-up approaches and its application for a high density magnetic storage media
Project/Area Number |
20241027
|
Research Category |
Grant-in-Aid for Scientific Research (A)
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Allocation Type | Single-year Grants |
Section | 一般 |
Research Field |
Nanomaterials/Nanobioscience
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Research Institution | Kansai University |
Principal Investigator |
SINGUBARA Shoso Kansai University, システム理工学部, 教授 (10231367)
|
Co-Investigator(Kenkyū-buntansha) |
TANAKA Syukichi 情報通信研究機構(独), 主任研究員 (40284608)
|
Co-Investigator(Renkei-kenkyūsha) |
SHIMIZU Tomohiro 関西大学, システム理工学部, 助教 (80581165)
|
Project Period (FY) |
2008 – 2010
|
Project Status |
Completed (Fiscal Year 2010)
|
Budget Amount *help |
¥26,780,000 (Direct Cost: ¥20,600,000、Indirect Cost: ¥6,180,000)
Fiscal Year 2010: ¥5,460,000 (Direct Cost: ¥4,200,000、Indirect Cost: ¥1,260,000)
Fiscal Year 2009: ¥21,320,000 (Direct Cost: ¥16,400,000、Indirect Cost: ¥4,920,000)
|
Keywords | 磁性体 / 磁気記録媒体 / ナノワイヤ / ナノホール / 自己組織化 / トップダウン / ボトムアップ / ナノインプリント / 垂直磁気記録 / 保磁力 / 陽極酸化アルミナ / コバルト / 磁気抵抗 / 電解めっき / FePt / 合金めっき |
Research Abstract |
We succeeded in the fabrication of ultra high density ferromagnetic nanorod array which density was ranged from 200 Giga to 2.5 Tera per square inch, using porous alumina nanohole array formed on Si substrate. The smallest diameter of nanorod is 10 nm, and the coercivity at room temperature is 2.0 kOe. Furthermore, we succeeded in shrinkage of the ordered nanohole array using a combination of top-down and bottom-up technology, namely, ion beam etching with electron beam lithography and anodic oxidation of aluminum.
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Report
(4 results)
Research Products
(54 results)