| Project/Area Number |
20246139
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| Research Category |
Grant-in-Aid for Scientific Research (A)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Nuclear engineering
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| Research Institution | Japan Atomic Energy Agency |
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Principal Investigator |
SEKIGUCHI Tetsuhiro 独立行政法人日本原子力研究開発機構, 量子ビーム応用研究部門, 研究主幹 (20373235)
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| Co-Investigator(Kenkyū-buntansha) |
BABA Yuji 独立行政法人日本原子力研究開発機構, 量子ビーム応用研究部門, 研究主幹 (90360403)
SHIMOYAMA Iwao 独立行政法人日本原子力研究開発機構, 量子ビーム応用研究部門, 研究副主幹 (10425572)
HONDA Mitsunori 独立行政法人日本原子力研究開発機構, 量子ビーム応用研究部門, 博士研究員 (10435597)
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| Research Collaborator |
HIRAO Norie 独立行政法人日本原子力研究開発機構, 量子ビーム応用研究部門, 技術開発協力員 (30600027)
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| Project Period (FY) |
2008 – 2011
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| Project Status |
Completed (Fiscal Year 2011)
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| Budget Amount *help |
¥48,360,000 (Direct Cost: ¥37,200,000、Indirect Cost: ¥11,160,000)
Fiscal Year 2011: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
Fiscal Year 2010: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
Fiscal Year 2009: ¥4,420,000 (Direct Cost: ¥3,400,000、Indirect Cost: ¥1,020,000)
Fiscal Year 2008: ¥40,560,000 (Direct Cost: ¥31,200,000、Indirect Cost: ¥9,360,000)
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| Keywords | 光電子顕微鏡 / 放射光 / 有機半導体 / 有機薄膜 / 直線偏光 / ナノ材料 / X線吸収分光 / X線吸収測定 / 電気化学反応 |
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| Research Abstract |
We have developed the instrument which allows to measure angle-resolved X-ray absorption spectra of organic-semiconductor thin films in nano-meter scales by means of a combination of a rotatable Photo-Electron Emission Microscope(PEEM) and linearly polarized X-ray synchrotron radiation as an excitation source, working under ultra vacuum condition. Also development is the vacuum ultra violet light source with linear polarizer.
The thin films of various Silicon phthalocyanine molecules, which are semi-conductors, were prepared by the vacuum deposition, the cast, and the spin-coating methods. We have investigated orientation effect and molecular diffusion upon annealing by angle-resolved X-ray absorption spectroscopy and PEEM. We found there is an effect of molecular orientation on substrate and film thickness.
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