Study of polymer thin films for processing of metal thin films in thermal nanoimprint lithography
| Project/Area Number |
20350103
|
|---|
| Research Category |
Grant-in-Aid for Scientific Research (B)
|
| Allocation Type | Single-year Grants |
|---|
| Section | 一般 |
|---|
| Research Field |
Polymer/Textile materials
|
|---|
| Research Institution | Tohoku University |
|---|
Principal Investigator |
NAKAGAWA Masaru 東北大学, 多元物質科学研究所, 教授 (10293052)
|
|---|
| Co-Investigator(Renkei-kenkyūsha) |
MATSUI Shinji 兵庫県立大学, 高度産業科学技術研究所, 教授 (00312306)
|
|---|
| Research Collaborator |
KUBO Shoichi 東北大学, 多元物質科学研究所, 助教 (20514863)
|
|---|
| Project Period (FY) |
2008 – 2010
|
| Project Status |
Completed (Fiscal Year 2010)
|
| Budget Amount *help |
¥18,070,000 (Direct Cost: ¥13,900,000、Indirect Cost: ¥4,170,000)
Fiscal Year 2010: ¥3,120,000 (Direct Cost: ¥2,400,000、Indirect Cost: ¥720,000)
Fiscal Year 2009: ¥4,940,000 (Direct Cost: ¥3,800,000、Indirect Cost: ¥1,140,000)
Fiscal Year 2008: ¥10,010,000 (Direct Cost: ¥7,700,000、Indirect Cost: ¥2,310,000)
|
|---|
| Keywords | 高分子構造・物性 / 微細加工 / ナノ材料 |
|---|
| Research Abstract |
Thermoplastic polymer thin films showing resist property suitable for wet processing of metal thin films on substrates were studied for scientific understanding of reactive-monolayer-assisted thermal nanoimprint lithography using photoreactive adsorbed monolayers which form chemical covalent bonds at resist polymer and metal interface. We demonstrated the kind of thermoplastic polymers effectively grafted to photoreactive groups, the kind of thermoplastic polymer and its optimum molecular weight suitable for metal wet etching and electrodeposition, molecular-weight-dependent permeation behavior of etching aqueous solution through resist polymer thin film, and usefulness of fluorescent resist to visualize patterned shapes of resist thin films by thermal nanoimprinting.
|
Report
(4 results)
Research Products
(63 results)
