| Budget Amount *help |
¥18,070,000 (Direct Cost: ¥13,900,000、Indirect Cost: ¥4,170,000)
Fiscal Year 2010: ¥3,120,000 (Direct Cost: ¥2,400,000、Indirect Cost: ¥720,000)
Fiscal Year 2009: ¥4,940,000 (Direct Cost: ¥3,800,000、Indirect Cost: ¥1,140,000)
Fiscal Year 2008: ¥10,010,000 (Direct Cost: ¥7,700,000、Indirect Cost: ¥2,310,000)
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| Research Abstract |
Thermoplastic polymer thin films showing resist property suitable for wet processing of metal thin films on substrates were studied for scientific understanding of reactive-monolayer-assisted thermal nanoimprint lithography using photoreactive adsorbed monolayers which form chemical covalent bonds at resist polymer and metal interface. We demonstrated the kind of thermoplastic polymers effectively grafted to photoreactive groups, the kind of thermoplastic polymer and its optimum molecular weight suitable for metal wet etching and electrodeposition, molecular-weight-dependent permeation behavior of etching aqueous solution through resist polymer thin film, and usefulness of fluorescent resist to visualize patterned shapes of resist thin films by thermal nanoimprinting.
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