Steric control of molecular beam induced surface reactions and its ultra-high speed and high energy resolution photoemission spectroscopic analysis

• Project/Area Number: 20360024
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Thin film/Surface and interfacial physical properties
• Research Institution: Japan Atomic Energy Agency
• Principal Investigator: TERAOKA Yuden Japan Atomic Energy Agency, 量子ビーム応用研究部門, 研究主幹 (10343922)
• Co-Investigator(Kenkyū-buntansha): YOSHIGOE Akitaka 独立行政法人日本原子力研究開発機構, 究副主幹 (00283490)
• Project Period (FY): 2008 – 2010
• Project Status: Completed (Fiscal Year 2010)
• Budget Amount: ¥18,590,000 (Direct Cost: ¥14,300,000、Indirect Cost: ¥4,290,000); Fiscal Year 2010: ¥3,770,000 (Direct Cost: ¥2,900,000、Indirect Cost: ¥870,000); Fiscal Year 2009: ¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000); Fiscal Year 2008: ¥10,530,000 (Direct Cost: ¥8,100,000、Indirect Cost: ¥2,430,000)
• Keywords: 放射光 / 表面反応 / 分子ビーム / 光電子分光 / 軟X線放射光 / 放射光光電子分光 / 超音速分子ビーム / 高速原子分子ビーム / アルミニウム / シリコン / 窒化 / 酸化

Research Abstract

A continuous expansion type supersonic molecular beam source and related devices were fabricated to overwhelm insufficient beam flux density. Ion current of a high speed atomic and molecular (ion) beam apparatus was enhanced by reconstruction of the plasma ion source. High speed measurements of photoemission spectra were improved by replacing a measurement system to new one which is corresponding to a 5 channels detector. Various kinds of surface reaction mechanisms of many molecular beam induced surface reactions were clarified by high speed photoemission spectroscopy using newly developed experimental devices.

Research Products

• [Journal Article] Oxidation of TiNi surface with hyperthermal oxygen molecular beams (2011)
  • Author(s): M.Okada, M.Souwa, T.Kasai, Y.Teraoka
  • Journal Title: Applied Surface Science 257 Pages: 4257-4263
  • Peer Reviewed
• [Journal Article] Oxidation of TiNi surface with hyperthermal oxygen molecular beams (2011)
  • Author(s): M.Okada
  • Journal Title: Applied Surface Science Volume: 257 Pages: 4257-4263
  • Peer Reviewed
• [Journal Article] Immediate product after exposing Si(111)-7×7 surface to O_2 at 300 K (2010)
  • Author(s): 吉越章隆, 寺岡有殿
  • Journal Title: Japanese Journal of Applied Physics 49
  • Peer Reviewed
• [Journal Article] Adsorption dynamics on Si(111)-7×7 surface induced by supersonic O_2 beam studied using real-time photoelectron spectroscopy (2010)
  • Author(s): 吉越章隆, 寺岡有殿
  • Journal Title: Journal of Physical Chemistry C 114 Pages: 22539-22545
  • Peer Reviewed
• [Journal Article] Synchrotron radiation photoelectron spectroscopy and near-edge X-ray absorption fine structure study on oxidative etching of diamond-like carbon films by hyperthermal atomic oxygen (2010)
  • Author(s): M.Tagawa, K.Yokota, A.Kitamura, K.Matsumoto, A.Yoshigoe, Y.Teraoka, K.Kanda, M.Niibe
  • Journal Title: Applied Surface Science 256 Pages: 7678-7683
  • Peer Reviewed
• [Journal Article] Active oxidation of Cu3Au(110) using hyperthermal O_2 molecular beam (2010)
  • Author(s): M.Okada, Y.Teraoka
  • Journal Title: Applied Surface Science 256 Pages: 5676-5680
  • Peer Reviewed
• [Journal Article] 放射光光電子分光によるSiO_2薄膜の有効減衰長の実験的決定 (2010)
  • Author(s): 井上敬介、寺岡有殿
  • Journal Title: 電気学会論文誌C 130 Pages: 1817-1818
  • Peer Reviewed
• [Journal Article] TiA1表面酸化のシンクロトロン放射光を用いた光電子分光研究 (2010)
  • Author(s): 橋之口道宏、角本雄一、戸出真由美、James Harries、岡田美智雄、寺岡有殿、笠井俊夫
  • Journal Title: 電気学会論文誌C 130 Pages: 723-1729
  • Peer Reviewed
• [Journal Article] 放射光光電子分光による重水素イオン注入V_<25>Cr_<40>Ti_<35>表面の熱変性分析 (2010)
  • Author(s): 戸出真由美、James Harries、寺岡有殿、角本雄一、井上敬介、吉越章隆
  • Journal Title: 電気学会論文誌C 130 Pages: 1819-1820
  • NAID: 10026694247
  • Peer Reviewed
• [Journal Article] Immediate product after exposing Si(111)-7×7 surface to O_2 at 300 K (2010)
  • Author(s): A.Yoshigoe
  • Journal Title: Japanese Journal of Applied Physics Volume: 49
  • Peer Reviewed
• [Journal Article] Adsorption dynamics on Si(111)-7×7 surface induced by supersonic O_2 beam studied using real-time photoelectron spectroscopy (2010)
  • Author(s): A.Yoshigoe
  • Journal Title: Journal of Physical Chemistry C Volume: 114 Pages: 22539-22545
  • Peer Reviewed
• [Journal Article] Synchrotron radiation photoelectron spectroscopy and near-edge X-ray absorption fine structure study on oxidative etching of diamond-like carbon films by hyperthermal atomic oxygen (2010)
  • Author(s): M.Tagawa
  • Journal Title: Applied Surface Science Volume: 256 Pages: 7678-7683
  • Peer Reviewed
• [Journal Article] 放射光光電子分光によるSiO_2薄膜の有効減衰長の実験的決定 (2010)
  • Author(s): 井上敬介
  • Journal Title: 電気学会論文誌C Volume: 130 Pages: 1817-1818
  • Peer Reviewed
• [Journal Article] TiAl表面酸化のシンクロトロン放射光を用いた光電子分光研究 (2010)
  • Author(s): 橋之口道宏
  • Journal Title: 電気学会論文誌C Volume: 130 Pages: 1723-1729
  • Peer Reviewed
• [Journal Article] 放射光光電子分光による重水素イオン注入V_<25>Cr_<40>Ti_<35>表面の熱変性分析 (2010)
  • Author(s): 戸出真由美
  • Journal Title: 電気学会論文誌C Volume: 130 Pages: 1819-1820
  • Peer Reviewed
• [Journal Article] Active oxidation of Cu_3Au(110) using hyperthermal O_2 molecular beam (2010)
  • Author(s): M.Okada
  • Journal Title: Applied Surface Science Volume: 256 Pages: 5676-5680
  • Peer Reviewed
• [Journal Article] Kinetics of oxygen adsorption and initial oxidation on Cu(110) by hyperthermal oxygen molecular beams (2009)
  • Author(s): K.Moritani, M.Okada, Y.Teraoka, A.Yoshigoe, T.Kasai
  • Journal Title: J.Phys.Chem.A 113 Pages: 15217-15222
  • Peer Reviewed
• [Journal Article] Atomic layer fluorination of highly oriented pyrolytic graphite using hyperthermal atomic fluorine beam (2009)
  • Author(s): M.Tagawa, K.Yokota, K.Maeda, A.Yoshigoe, Y.Teraoka
  • Journal Title: Applied Physics Express 2
  • NAID: 10025086893
  • Peer Reviewed
• [Journal Article] Hydrogen desorption from a diamond-like carbon film by hyperthermal atomic oxygen exposures (2009)
  • Author(s): K.Yokota, M.Tagawa, A.Kitamura, K.Matsumoto, A.Yoshigoe, Y.Teraoka
  • Journal Title: Applied Surface Science 255 Pages: 6710-6714
  • Peer Reviewed
• [Journal Article] Synchrotron Radiation Photoemission Spectroscopy for Native Oxide Layer on Vanadium and VCrTa (2009)
  • Author(s): Y.Teraoka, A.Yoshigoe, J.Harries
  • Journal Title: Journal of Surface Analysis 15 Pages: 303-306
  • NAID: 130007686544
  • Peer Reviewed
• [Journal Article] Si-doping for the protection of hydrogenated diamond-like carbon films in a simulated atomic oxygen environment in low earth orbit, Transactions of the Japan Society for Aeronautical and Space Sciences (2009)
  • Author(s): K.Yokota, M.Tagawa, A.Kitamura, K.Matsumoto, A.Yoshigoe, Y.Teraoka, J.Fontaine, M.Belin
  • Journal Title: Space Technology Japan 7(ists26)
  • Peer Reviewed
• [Journal Article] Initial oxidation of Si(110) as studied by real-time synchrotron-radiation x-ray photoemission spectroscopy (2009)
  • Author(s): M.Suemitsu, Y.Yamamoto, H.Togashi, Y.Enta, A.Yoshigoe, Y.Teraoka
  • Journal Title: J.Vac. Sci.and Technol.B 27 Pages: 547-550
  • Peer Reviewed
• [Journal Article] 超熱酸素分子線による銅ならびに銅合金表面の酸化反応研究(解説) (2009)
  • Author(s): 岡田美智雄,寺岡有殿
  • Journal Title: Journal of the Vacuum Society of Japan 52 Pages: 80-84
  • Peer Reviewed
• [Journal Article] Cu_3Au表面自然酸化のシンクロトロン放射光を用いた光電子分光研究 (2009)
  • Author(s): 宗和誠、山崎大地、岡田美智雄、吉越章隆、寺岡有殿、笠井俊夫
  • Journal Title: 電気学会論文誌C 129 Pages: 229-232
  • NAID: 10023999625
  • Peer Reviewed
• [Journal Article] Kinetics of oxygen adsorption and initial oxidation on Cu(110)by hyperthermal oxygen molecular beams (2009)
  • Author(s): K.Moritani
  • Journal Title: J.Phys.Chem.A 113 Pages: 15217-15222
  • Peer Reviewed
• [Journal Article] Si-doping for the protection of hydrogenated diamond-like carbon films in a simulated atomic oxygen environment in low earth orbit (2009)
  • Author(s): K.Yokota
  • Journal Title: Transactions of the Japan Society for Aeronautical and Space Sciences, Space Technology Japan 7 (ists26)
  • Peer Reviewed
• [Journal Article] Atomic layer fluorination of highly oriented pyrolytic graphite using hyperthermal atomic fluorine beam (2009)
  • Author(s): M.Tagawa
  • Journal Title: Appl.Phys.Express 2
  • Peer Reviewed
• [Journal Article] Hydrogen desorption from a diamond-like carbon film by hyperthermal atomic oxygen exposures (2009)
  • Author(s): K.Yokota
  • Journal Title: Appl.Surf.Sci. 255 Pages: 6710-6714
  • Peer Reviewed
• [Journal Article] 放射光リアルタイム光電子分光で観たSi(111)表面の酸化過程 (2009)
  • Author(s): 吉越章隆
  • Journal Title: 電気学会光・量子デバイス研究会資料 OQD-09-56 Pages: 67-70
  • NAID: 10026077527
• [Journal Article] Synchrotron Radiation Photoemission Spectroscopy for Native Oxide Layer on Vanadium and VCrTa (2009)
  • Author(s): Y. Teraoka
  • Journal Title: Journal of Surface Analysis 15 Pages: 303-306
  • NAID: 130007686544
  • Peer Reviewed
• [Journal Article] Initial oxidation of Si(110) as studied by real-time synchrotron-radiation x-ray photoemission spectroscopy (2009)
  • Author(s): M. Suemitsu
  • Journal Title: J. Vac. Sci. and Technol. B 27 Pages: 547-550
  • Peer Reviewed
• [Journal Article] Cu_3Au表面自然酸化のシンクロトロン放射光を用いた光電子分光研究 (2009)
  • Author(s): 宗和誠
  • Journal Title: 電気学会論文誌C 129 Pages: 229-232
  • Peer Reviewed
• [Journal Article] 超熱酸素分子線による銅ならびに銅合金表面の酸化反応研究(解説) (2009)
  • Author(s): 岡田美智雄
  • Journal Title: Journal of the Vacuum Society of Japan 52 Pages: 80-84
  • Peer Reviewed
• [Journal Article] Al(111)表面における超音速N_2ビームによる極薄AlN膜形成 (2008)
  • Author(s): 寺岡有殿
  • Journal Title: 電気学会論文誌C 129 Pages: 294-295
  • NAID: 10023999821
  • Peer Reviewed
• [Journal Article] Mechanisms of concurrent SiO desorption with oxide layer formation at Si(001) surface (2008)
  • Author(s): Y. Teraoka
  • Journal Title: Electrical Engineering in Japan 164 Pages: 60-68
  • NAID: 210000165562
  • Peer Reviewed
• [Journal Article] High resolution X-ray photoelectron spectroscopy study on initial oxidation of 4H-SiC(0001)-(√<3x>√<3>)R30゜surface (2008)
  • Author(s): S. Takahashi
  • Journal Title: Surface Science 603 Pages: 221-225
  • Peer Reviewed
• [Journal Article] Si(110)面上熱酸化膜形成時におけるSiサブオキサイド時間発展のXPSリアルタイム測定 (2008)
  • Author(s): 山本喜久
  • Journal Title: 電子情報通信学会技術研究報告 108 Pages: 65-70
  • Peer Reviewed
• [Journal Article] SR-PES and STM observation of metastable chemisorption state of oxygen on Si(110)-16x2 surface (2008)
  • Author(s): Y. Yamamoto
  • Journal Title: Appl. Surf. Sci. 254 Pages: 6232-6234
  • Peer Reviewed
• [Journal Article] Hydrogen adsorption on single-walled carbon nanotubes studied by photoelectron spectroscopy and Raman spectroscopy (2008)
  • Author(s): A. Tokura
  • Journal Title: Carbon 46 Pages: 1903-1908
  • Peer Reviewed
• [Journal Article] Stereodynamics in dissociative adsorption of NO on Si(111) (2008)
  • Author(s): M. Hashinokuchi
  • Journal Title: Phys. Rev. Lett. 100
  • Peer Reviewed
• [Journal Article] Reconstruction of Cu(111) induced by a hyperthermal oxygen molecular beam (2008)
  • Author(s): K. Moritani
  • Journal Title: J. Phys. Chem. C 112 Pages: 8662-8667
  • Peer Reviewed
• [Journal Article] New oriented-molecular-beam machine for surface stereochemistry with x-ray photo-emission spectroscopy (2008)
  • Author(s): M. Okada
  • Journal Title: Jpn. J. Appl. Phys. 47 Pages: 3686-3691
  • Peer Reviewed
• [Journal Article] Dissociative adsorption of Nitric Oxide on Si(111)-7x7 surface (2008)
  • Author(s): M. Hashinokuchi
  • Journal Title: Jpn. J. Appl. Phys. 47 Pages: 1672-1676
  • Peer Reviewed
• [Presentation] Ni(111)表面への超音速O_2分子線照射による酸化膜の形成過程及び初期吸着レートの運動エネルギー依存性 (2011)
  • Author(s): 井上敬介
  • Organizer: 第58回応用物理学関係連合講演会
  • Place of Presentation: 神奈川工科大学(厚木市)
  • Year and Date: 2011-03-26
• [Presentation] 面方位回転エピタキシャル成長3C-SiC(111)/Si(110)薄膜上グラフェン成長過程のLEED、SR-XPS観察 (2011)
  • Author(s): 高橋良太
  • Organizer: 第58回応用物理学関係連合講演会
  • Place of Presentation: 神奈川工科大学(厚木市)
  • Year and Date: 2011-03-26
• [Presentation] 重水素化V表面のSR-XPSの熱変性特性と昇温脱離ガス分析 (2011)
  • Author(s): 戸出真由美
  • Organizer: 日本金属学会2011年春期(第148回)大会
  • Place of Presentation: 東京都市大学(東京都)
  • Year and Date: 2011-03-25
• [Presentation] Si高指数面初期酸化過程のリアルタイム光電子分光計測 (2011)
  • Author(s): 大野真也
  • Organizer: 第58回応用物理学関係連合講演会
  • Place of Presentation: 神奈川工科大学(厚木市)
  • Year and Date: 2011-03-24
• [Presentation] 3C-SiC(100)/Si(100)薄膜上グラフェン形成過程のLEED、SR-XPS観察 (2011)
  • Author(s): 猪俣州哉
  • Organizer: 平成22年度日本表面科学会東北・北海道支部講演会
  • Place of Presentation: 東北大学多元研(仙台市)
  • Year and Date: 2011-03-10
• [Presentation] JEM-EUSO用MgF_2光学薄膜の原子状酸素耐性について (2011)
  • Author(s): 田川雅人
  • Organizer: 第27回宇宙利用シンポジウム
  • Place of Presentation: 宇宙科学研究所(相模原市)
  • Year and Date: 2011-01-25
• [Presentation] Si_<1-x>Ge_x合金層における酸化誘起Ge濃縮過程:リアルタイム光電子分光による解明 (2011)
  • Author(s): 小川修一
  • Organizer: 第16回ゲートスタック研究会
  • Place of Presentation: 東京工業大学(東京都)
  • Year and Date: 2011-01-23
• [Presentation] In situ synchrotron radiation photoemission study of Ge_3N_4/Ge structures formed by plasma nitridation (2011)
  • Author(s): T.Hosoi
  • Organizer: 2011 International Workshop on Dielectric Thin Films for Future Electron Devices : Science and Technology
  • Place of Presentation: Tokyo Institute of Technology (Tokyo)
  • Year and Date: 2011-01-20
• [Presentation] 酸化グラフェン還元過程のリアルタイムXPS観察 (2011)
  • Author(s): 小川修一
  • Organizer: 第24回日本放射光学会・放射光科学合同シンポジウム
  • Place of Presentation: つくば国際会議場(つくば市)
  • Year and Date: 2011-01-10
• [Presentation] 高分解能軟X線放射光光電子分光によるバナジウム表面酸化被膜の熱変性分析 (2011)
  • Author(s): 戸出真由美
  • Organizer: 第24回日本放射光学会・放射光科学合同シンポジウム
  • Place of Presentation: つくば国際会議場(つくば市)
  • Year and Date: 2011-01-10
• [Presentation] Ni(111)表面の超音速O_2分子線による初期吸着確率の運動エネルギー依存性 (2011)
  • Author(s): 井上敬介
  • Organizer: 第24回日本放射光学会・放射光科学合同シンポジウム
  • Place of Presentation: つくば国際会議場(つくば市)
  • Year and Date: 2011-01-10
• [Presentation] Energy band structure of thermally grown SiO_2/4H-SiC interfaces and its modulation induced by post-oxidation treatments (2010)
  • Author(s): T.Kirino, Y.Kagei, A.Yoshigoe, Y.Teraoka, S.Mitani, Y.Nakano, T.Nakamura, T.Hosoi, T.Shimura, H.Watanabe
  • Organizer: 41^<st> IEEE Semiconductor Interface Specialists Conference
  • Place of Presentation: San Diego (USA)
  • Year and Date: 2010-12-02
• [Presentation] Influence of oxide over-layers formed by supersonic O_2 beam on deuterium desorption from V(001) (2010)
  • Author(s): Y.Teraoka, M.Tode, J.Harries, A.Yoshigoe
  • Organizer: Nano and Surface Science Approaches to Production and Storage of Hydrogen
  • Place of Presentation: Noordwijkerhout(The Netherlands)
  • Year and Date: 2010-11-14
• [Presentation] Influence of oxide over-layers formed by supersonic O_2 beam on deuterium desorption from V(001) (2010)
  • Author(s): Y.Teraoka
  • Organizer: Nano and Surface Science Approaches to Production and Storage of Hydrogen
  • Place of Presentation: Noordwijkerhout (The Netherlands)
  • Year and Date: 2010-11-14
• [Presentation] Relationship between adsorption states and surface morphology in oxidation of Si(111)-7x7 surface at 300 K studied using real-time synchrotron radiation photoelectron spectroscopy, LEED and STM (2010)
  • Author(s): A.Yoshigoe
  • Organizer: 6^<th> International Forum on the Science and Technology of Silicon Materials
  • Place of Presentation: Okayama University (Okayama)
  • Year and Date: 2010-11-14
• [Presentation] 酸化グラフェンの高温加熱処理過程のリアルタイム放射光光電子分光観察 (2010)
  • Author(s): 穂積英彬
  • Organizer: 第51回真空に関する連合講演会
  • Place of Presentation: 大阪大学(吹田市)
  • Year and Date: 2010-11-05
• [Presentation] Si(111)-7×7表面の室温酸化における酸素分子の並進運動エネルギーに依存した表面形状 (2010)
  • Author(s): 吉越章隆
  • Organizer: 第30回表面科学学術講演会
  • Place of Presentation: 大阪大学(吹田市)
  • Year and Date: 2010-11-04
• [Presentation] Si(111)-7×7表面の室温酸化に伴う酸化状態と表面形状の相関 (2010)
  • Author(s): 吉越章隆
  • Organizer: 第30回表面科学学術講演会
  • Place of Presentation: 大阪大学(吹田市)
  • Year and Date: 2010-11-04
• [Presentation] 放射光光電子分光により実測したSiO_2の有効減衰長(EAL)と非弾性平均自由行程(IMFP)計算値の比較 (2010)
  • Author(s): 井上敬介
  • Organizer: 第30回表面科学学術講演会
  • Place of Presentation: 大阪大学(吹田市)
  • Year and Date: 2010-11-04
• [Presentation] Si混晶表面の酸化過程のリアルタイムXPS観察:CとGe混入効果の比較 (2010)
  • Author(s): 穂積英彬
  • Organizer: 第30回表面科学学術講演会
  • Place of Presentation: 大阪大学(吹田市)
  • Year and Date: 2010-11-04
• [Presentation] 水素貯蔵合金VCrTiおよびTiFeにおける表面熱変性と水素脱離温度特性 (2010)
  • Author(s): 戸出真由美
  • Organizer: 第51回真空に関する連合講演会
  • Place of Presentation: 大阪大学(吹田市)
  • Year and Date: 2010-11-04
• [Presentation] 放射光X線光電子分光を用いたTiAl表面酸化反応の研究 (2010)
  • Author(s): 橋之口道宏
  • Organizer: 第51回真空に関する連合講演会
  • Place of Presentation: 大阪大学(吹田市)
  • Year and Date: 2010-11-04
• [Presentation] 超音速O_2分子線によるNi(111)表面の酸素初期吸着確率の運動エネルギー依存性 (2010)
  • Author(s): 井上敬介
  • Organizer: 第6回励起ナノプロセス研究会
  • Place of Presentation: 国際障害者交流センター(堺市)
  • Year and Date: 2010-11-02
• [Presentation] 放射光光電子分光による光電子のSiO_2中の実測有効減衰長と非弾性平均自由行程計算値の比較 (2010)
  • Author(s): 井上敬介
  • Organizer: 第6回励起ナノプロセス研究会
  • Place of Presentation: 国際障害者交流センター(堺市)
  • Year and Date: 2010-11-02
• [Presentation] 放射光リアルタイム光電子分光で観測した超音速酸素分子線によるSi(111)-7×7表面の室温酸化の促進効果 (2010)
  • Author(s): 吉越章隆
  • Organizer: 第6回励起ナノプロセス研究会
  • Place of Presentation: 国際障害者交流センター(堺市)
  • Year and Date: 2010-11-02
• [Presentation] STMで観る酸素分子の並進運動エネルギーに由来したSi(111)室温酸化後の表面状態の違い (2010)
  • Author(s): 吉越章隆
  • Organizer: 第6回励起ナノプロセス研究会
  • Place of Presentation: 国際障害者交流センター(堺市)
  • Year and Date: 2010-11-02
• [Presentation] Kinetic energy effects on initial sticking of O_2 molecular beams on Ni(111) surface (2010)
  • Author(s): K.Inoue
  • Organizer: 6^<th> International Workshop on Nano-scale Spectroscopy and Nanotechnology
  • Place of Presentation: Kobe University (Japan)
  • Year and Date: 2010-10-25
• [Presentation] SiO_2/4H-SiCエネルギーバンド構造に対する界面特性改善処理の影響 (2010)
  • Author(s): 細井卓治
  • Organizer: SiC及び関連ワイドギャップ半導体研究会第19回講演会
  • Place of Presentation: つくば国際会議場(つくば市)
  • Year and Date: 2010-10-21
• [Presentation] Oxidation kinetics of SiGe alloy layer studied by real-time XPS (2010)
  • Author(s): H.Hozumi, S.Ogawa, A.Yoshigoe, S.Ishidzuka, J.R.Harries, Y.Teraoka, Y.Takakuwa
  • Organizer: 5^<th> International Symposium on Practical Surface Analysis (PSA-10)
  • Place of Presentation: Gyeongju (Korea)
  • Year and Date: 2010-10-03
• [Presentation] 超音速酸素分子線照射によるV表面酸化膜の形成とD_2昇温脱離との関係 (2010)
  • Author(s): 戸出真由美
  • Organizer: 日本金属学会2010年秋期(第147回)大会
  • Place of Presentation: 北海道大学(札幌市)
  • Year and Date: 2010-09-25
• [Presentation] Temperature dependence of exclusive SiO_2 formation during thermal oxidation of Si_<1-x>Ge_x alloy layer on Si(001) surfaces (2010)
  • Author(s): H.Hozumi
  • Organizer: 2010 International Conference on Solid State Devices and Materials (SSDM 2010)
  • Place of Presentation: Tokyo (Japan)
  • Year and Date: 2010-09-22
• [Presentation] 【Invited】Orientation-mediated control of interfacial structure in epitaxial graphene on silicon substrates (2010)
  • Author(s): M.Suemitsu, H.Fukidome, R.Takahashi, K.Imaizumi, H.Handa, A.Yoshigoe, Y.Teraoka
  • Organizer: 2^<nd>International Symposium on the Science and Technology of Epitaxial Graphene
  • Place of Presentation: Amelia Island (Florida, USA)
  • Year and Date: 2010-09-14
• [Presentation] Orientation-mediated control of interfacial structure in epitaxial graphene on silicon substrates (2010)
  • Author(s): M.Suemitsu
  • Organizer: 2^<nd> International Symposium on the Science and Technology of Epitaxial Graphene
  • Place of Presentation: Amelia Island (Florida, USA)(Invited)
  • Year and Date: 2010-09-14
• [Presentation] SiGe/Si表面の酸化反応機構(1):GeO_2形成の温度依存 (2010)
  • Author(s): 穂積英彬
  • Organizer: 第71回応用物理学学術講演会
  • Place of Presentation: 長崎大学(長崎市)
  • Year and Date: 2010-09-14
• [Presentation] Si高指数面におけるリアルタイム光電子分光計測 (2010)
  • Author(s): 大野真也
  • Organizer: 第71回応用物理学学術講演会
  • Place of Presentation: 長崎大学(長崎市)
  • Year and Date: 2010-09-14
• [Presentation] 超低圧酸素雰囲気下でのSi基板上低温グラフェン形成過程のリアルタイム放射光光電子分光 (2010)
  • Author(s): 今泉京
  • Organizer: 第71回応用物理学学術講演会
  • Place of Presentation: 長崎大学(長崎市)
  • Year and Date: 2010-09-14
• [Presentation] 光電子分光で観た酸素分子線照射量に依存したSi(111)-7×7のレストアトム強度の変化とSTM像との対応 (2010)
  • Author(s): 吉越章隆
  • Organizer: 第71回応用物理学学術講演会
  • Place of Presentation: 長崎大学(長崎市)
  • Year and Date: 2010-09-14
• [Presentation] SiO_2/4H-SiC界面構造と伝導帯オフセットの相関 (2010)
  • Author(s): 桐野嵩史
  • Organizer: 第71回応用物理学学術講演会
  • Place of Presentation: 長崎大学(長崎市)
  • Year and Date: 2010-09-14
• [Presentation] 3C-SiC(111)極薄膜上エピタキシャルグラフェン形成過程のLEED観察 (2010)
  • Author(s): 高橋良太
  • Organizer: 第71回応用物理学学術講演会
  • Place of Presentation: 長崎大学(長崎市)
  • Year and Date: 2010-09-14
• [Presentation] In-situ STM observation after exposing Si(111)-7x7 surface to supersonic O_2 beam at 300 K (2010)
  • Author(s): A.Yoshigoe, Y.Teraoka
  • Organizer: 27^<th> European Conference on Surface Science
  • Place of Presentation: Groningen (The Netherlands)
  • Year and Date: 2010-08-29
• [Presentation] Thermal degradation analysis of deuterium ion implanted hydrogen storage materials (TiFe and V_<25>Cr_<40>Ti_<35>)using synchrotron radiation photoelectron spectroscopy (2010)
  • Author(s): M.Tode, J.R.Harries, Y.Teraoka, A.Yoshigoe
  • Organizer: International Symposium on Metal-Hydrogen Systems MH2010
  • Place of Presentation: Moscow (Russia)
  • Year and Date: 2010-07-19
• [Presentation] Thermal degradation analysis of deuterium ion implanted hydrogen storage materials (TiFe and V_<25>Cr_<40>Ti_<35>) using synchrotron radiation photoelectron spectroscopy (2010)
  • Author(s): M.Tode
  • Organizer: International Symposium on Metal-Hydrogen Systems MH2010
  • Place of Presentation: Moscow (Russia)
  • Year and Date: 2010-07-19
• [Presentation] AlN thin film formed by exposing Al(111) to 2.0 eV N_2 molecules and studied in real time and in situ using synchrotron XPS (2010)
  • Author(s): J.R.Harries, Y.Teraoka, A.Yoshigoe
  • Organizer: 37^<th> International Conference on Vacuum Ultraviolet and X-ray Physics (VUVX2010)
  • Place of Presentation: Vancouver (Canada)
  • Year and Date: 2010-07-11
• [Presentation] 【Invited】Viability of graphene-on-silicon technology toward fusion of graphene with advanced Si-CMOS technologies (2010)
  • Author(s): H.Fukidome, R.Takahashi, Y.Miyamoto,H.Handa, H.-C.Kang, H.Karasawa, T.Suemitsu, T.Otsuji, A.Yoshigoe, Y.Teraoka, M.Suemitsu
  • Organizer: 8^<th>International Workshop on Epitaxial Semiconductors on Patterned Substrates and Novel Index Surfaces
  • Place of Presentation: Como (Italy)
  • Year and Date: 2010-06-14
• [Presentation] Viability of graphene-on-silicon technology toward fusion of graphene with advanced Si-CMOS technologies (2010)
  • Author(s): H.Fukidome
  • Organizer: 8^<th> International Workshop on Epitaxial Semiconductors on Patterned Substrates and Novel Index Surfaces
  • Place of Presentation: Como (Italy)(Invited)
  • Year and Date: 2010-06-14
• [Presentation] 【Invited】Interface engineering of ZrO_2/Ge gate stacks by post-deposition annealing and Al_2O_3 capping layers (2010)
  • Author(s): H.Watanabe, G.Okamoto, K.Kutsuki, J.Harries, A.Yoshigoe, Y.Teraoka, T.Hosoi, T.Shimura
  • Organizer: International Symposium on Technology Evolution for Silicon Nano-Electronics
  • Place of Presentation: Tokyo Tech Front (Tokyo)
  • Year and Date: 2010-06-03
• [Presentation] Interface engineering of ZrO_2/Ge gate stacks by post-deposition annealing and Al_2O_3 capping layers (2010)
  • Author(s): H.Watanabe
  • Organizer: International Symposium on Technology Evolution for Silicon Nano-Electronics
  • Place of Presentation: Tokyo Tech Front (Tokyo)(Invited)
  • Year and Date: 2010-06-03
• [Presentation] Radiation effect of the soft X-ray on the highly-hydrogenated diamond-like carbon film (2010)
  • Author(s): K.Kanda
  • Organizer: 4^<th> International Conference on New Diamond and Nano Carbons (NDNC2010)
  • Place of Presentation: Suzhou (China)
  • Year and Date: 2010-05-16
• [Presentation] グラフェン・オン・シリコン形成過程の放射光光電子分光評価 (2010)
  • Author(s): 末光眞希
  • Organizer: 平成21年度文部科学省ナノテクノロジー・ネットワーク/重点ナノテクノロジー支援放射光利用研究成果報告会ナノテクノロジー放射光利用研究の最前線2009
  • Place of Presentation: 立命館大学(草津市)
  • Year and Date: 2010-05-07
• [Presentation] 熱酸化SiO_2/4H-SiC界面原子構造と伝導帯オフセット評価 (2010)
  • Author(s): 渡部平司
  • Organizer: 平成21年度文部科学省ナノテクノロジー・ネットワーク/重点ナノテクノロジー支援放射光利用研究成果報告会ナノテクノロジー放射光利用研究の最前線2009
  • Place of Presentation: 立命館大学(草津市)
  • Year and Date: 2010-05-07
• [Presentation] Controlling the interface between graphene and SiC by use of graphene-on-silicon technology (2010)
  • Author(s): H.Fukidome, R.Takahashi, K.Imaizumi, H.Handa, M.Suemitsu, A.Yoshigoe, Y.Teraoka
  • Organizer: 2010 Material Research Society Spring Meeting
  • Place of Presentation: San Francisco (USA)
  • Year and Date: 2010-04-05
• [Presentation] 酸素分子線照射量に依存したSi(111)表面の形状変化のSTM観察 -並進運動エネルギーを2.2 eVとした場合- (2010)
  • Author(s): 吉越章隆
  • Organizer: 第57回応用物理学関係連合講演会
  • Place of Presentation: 東海大学(平塚市)
  • Year and Date: 2010-03-17
• [Presentation] 超音速酸素分子線によるSi(111)-7×7表面の室温酸化後のSTM観察 (2010)
  • Author(s): 吉越章隆
  • Organizer: 第57回応用物理学関係連合講演会
  • Place of Presentation: 東海大学(平塚市)
  • Year and Date: 2010-03-17
• [Presentation] 放射光XPSによるSiO_2/4H-SiC構造の伝導帯オフセット評価 (2010)
  • Author(s): 桐野嵩史
  • Organizer: 第57回応用物理学関係連合講演会
  • Place of Presentation: 東海大学(平塚市)
  • Year and Date: 2010-03-17
• [Presentation] 極薄EOT実現に向けたプラズマ窒化応用high-k/Geゲートスタックの提案 (2010)
  • Author(s): 朽木克博
  • Organizer: 第57回応用物理学関係連合講演会
  • Place of Presentation: 東海大学(平塚市)
  • Year and Date: 2010-03-17
• [Presentation] 高水素化DLC膜からの水素脱離に対する表面金属酸化膜の効果 (2010)
  • Author(s): 田川雅人
  • Organizer: 第57回応用物理学関係連合講演会
  • Place of Presentation: 東海大学(平塚市)
  • Year and Date: 2010-03-17
• [Presentation] 高水素化DLC膜への真空紫外線照射効果 (2010)
  • Author(s): 横田久美子
  • Organizer: 第57回応用物理学関係連合講演会
  • Place of Presentation: 東海大学(平塚市)
  • Year and Date: 2010-03-17
• [Presentation] リアルタイム放射光光電子分光によるSi(110)表面上数層の熱酸化膜形成過程の評価 (2010)
  • Author(s): 鈴木康
  • Organizer: 第57回応用物理学関係連合講演会
  • Place of Presentation: 東海大学(平塚市)
  • Year and Date: 2010-03-17
• [Presentation] グラフェン・オン・シリコン形成過程のLEED, XPS観察 (2010)
  • Author(s): 高橋良太
  • Organizer: 第57回応用物理学関係連合講演会
  • Place of Presentation: 東海大学(平塚市)
  • Year and Date: 2010-03-17
• [Presentation] 酸素添加によるSiC表面グラフェン化プロセスの低温化 (2010)
  • Author(s): 今泉京
  • Organizer: 第57回応用物理学関係連合講演会
  • Place of Presentation: 東海大学(平塚市)
  • Year and Date: 2010-03-17
• [Presentation] SiO_2/Si界面酸化における格子歪みの役割(3):酸化誘起炭素濃縮による3C-SiC成長 (2010)
  • Author(s): 穂積英彬
  • Organizer: 第57回応用物理学関係連合講演会
  • Place of Presentation: 東海大学(平塚市)
  • Year and Date: 2010-03-17
• [Presentation] 軟X線照射によるDLC膜からの水素脱離過程 (2010)
  • Author(s): 神田一浩
  • Organizer: 兵庫県立大学高度産業技術研究所先端技術セミナー2010
  • Place of Presentation: イーグレ姫路(姫路市)
  • Year and Date: 2010-03-11
• [Presentation] 酸素によるSi(001)表面エッチングにおける炭素濃縮 (2010)
  • Author(s): 穂積英彬
  • Organizer: 平成21年度日本表面科学会東北・北海道支部講演会
  • Place of Presentation: 東北大学(仙台市)
  • Year and Date: 2010-03-10
• [Presentation] Effect of Vacuum Ultraviolet Exposure and Surface Oxide Layer on the Hydrogen Desorption from Hydrogenated Diamond-like Carbon Films (2010)
  • Author(s): M.Tagawa
  • Organizer: JAEA-Symposium on Synchrotron Radiation Research 2010-Material Science on Metal Hydride-
  • Place of Presentation: SPring-8(Sayo-cho)
  • Year and Date: 2010-02-25
• [Presentation] Departure process of hydrogen from highly-hydrogenated diamond-like carbon film by exposure to synchrotron radiation (2010)
  • Author(s): K.Kanda
  • Organizer: JAEA-Symposium on Synchrotron Radiation Research 2010-Material Science on Metal Hydride-
  • Place of Presentation: SPring-8(Sayo-cho)
  • Year and Date: 2010-02-25
• [Presentation] The study of oxidation on TiAl with photoemission spectroscopy in conjunction with synchrotron radiation (2010)
  • Author(s): M.Hashinokuchi
  • Organizer: JAEA-Symposium on Synchrotron Radiation Research 2010-Material Science on Metal Hydride-
  • Place of Presentation: SPring-8(Sayo-cho)
  • Year and Date: 2010-02-25
• [Presentation] Thermal degradation process of deuterium ion implanted V_<25>Cr_<40>Ti_<35> using high-resolution soft X-ray synchrotron radiation (2010)
  • Author(s): M.Tode
  • Organizer: JAEA-Symposium on Synchrotron Radiation Research 2010-Material Science on Metal Hydride-
  • Place of Presentation: SPring-8(Sayo-cho)
  • Year and Date: 2010-02-25
• [Presentation] Carbon condensation and 3C-SiC growth caused by oxidizing Si_<1-x>C_x alloy layers on Si(001)substrate (2010)
  • Author(s): H.Hozumi
  • Organizer: The 5th international Workshop on New Group IV Semiconductor Nanoelectronics
  • Place of Presentation: Sendai (Japan)
  • Year and Date: 2010-01-29
• [Presentation] Si_<1-x>C_x合金層/Si(001)表面における酸化誘起炭素拡散:酸化膜成長とエッチング条件での比較 (2010)
  • Author(s): 穂積英彬
  • Organizer: 第15回ゲートスタック研究会
  • Place of Presentation: 東レ総合研修センター(三島市)
  • Year and Date: 2010-01-22
• [Presentation] ZrO_2ゲート絶縁膜を用いたGeMOSデバイスの界面設計 (2010)
  • Author(s): 細井卓治
  • Organizer: 第15回ゲートスタック研究会
  • Place of Presentation: 東レ総合研修センター(三島市)
  • Year and Date: 2010-01-22
• [Presentation] 放射光光電子分光によるSiO_2の有効減衰長(EAL)の実験的決定 (2010)
  • Author(s): 井上敬介
  • Organizer: 第23回日本放射光学会年会・放射光科学合同シンポジウム
  • Place of Presentation: イーグレ姫路(姫路市)
  • Year and Date: 2010-01-06
• [Presentation] 表面反応分析装置への走査型プローブ顕微鏡の導入-実空間"その場"観察の実現- (2010)
  • Author(s): 吉越章隆
  • Organizer: 第23回日本放射光学会年会・放射光科学合同シンポジウム
  • Place of Presentation: イーグレ姫路(姫路市)
  • Year and Date: 2010-01-06
• [Presentation] 酸素分子の並進運動エネルギーによるSi(111)-7x7表面の酸化反応の促進機構 (2010)
  • Author(s): 吉越章隆
  • Organizer: 第23回日本放射光学会年会・放射光科学合同シンポジウム
  • Place of Presentation: イーグレ姫路(姫路市)
  • Year and Date: 2010-01-06
• [Presentation] Si(111)-7x7表面の室温酸化の放射光XPS、LEEDおよびSTMによるリアルタイム観察 (2010)
  • Author(s): 吉越章隆
  • Organizer: 第23回日本放射光学会年会・放射光科学合同シンポジウム
  • Place of Presentation: イーグレ姫路(姫路市)
  • Year and Date: 2010-01-06
• [Presentation] 高分解能軟X線放射光光電子分光にまる重水素化VCrTi表面の熱安定性の評価 (2010)
  • Author(s): 戸出真由美
  • Organizer: 第23回日本放射光学会年会・放射光科学合同シンポジウム
  • Place of Presentation: イーグレ姫路(姫路市)
  • Year and Date: 2010-01-06
• [Presentation] Nitridation of Al(111)by supersonic N_2 molecules (2010)
  • Author(s): James.R.Harries
  • Organizer: 第23回日本放射光学会年会・放射光科学合同シンポジウム
  • Place of Presentation: イーグレ姫路(姫路市)
  • Year and Date: 2010-01-06
• [Presentation] TiAl合金表面酸化過程の放射光X線光電子分光分析 (2010)
  • Author(s): 橋之口道宏
  • Organizer: 第23回日本放射光学会年会・放射光科学合同シンポジウム
  • Place of Presentation: イーグレ姫路(姫路市)
  • Year and Date: 2010-01-06
• [Presentation] 表面変性層制御と水素脱離温度特性との相関研究 -TiFe合金の熱処理による表面皮膜の変性- (2009)
  • Author(s): 戸出真由美
  • Organizer: 第3回水素貯蔵材料先端基盤研究事業技術検討会議
  • Place of Presentation: 産総研臨海副都心センター(東京都江東区)
  • Year and Date: 2009-12-18
• [Presentation] プラズマ窒化技術とAlON/SiO_2積層絶縁膜によるSiC-MOSデバイスの高機能化(招待講演) (2009)
  • Author(s): 渡部平司
  • Organizer: SiC及び関連ワイドギャップ半導体研究会第18回講演会
  • Place of Presentation: 神戸国際会議場(神戸)
  • Year and Date: 2009-12-17
• [Presentation] 放射光XPSによる熱酸化SiO_2/4H中SiC界面のエネルギーバンド構造分析 (2009)
  • Author(s): 桐野嵩史
  • Organizer: SiC及び関連ワイドギャップ半導体研究会第18回講演会
  • Place of Presentation: 神戸国際会議場(神戸)
  • Year and Date: 2009-12-17
• [Presentation] Real-time photoelectron spectroscopy study of 3C-SiC nucleation and growth on Si(001) surface by carbonization with ethylene (2009)
  • Author(s): H.Hozumi, S.Ogawa, A.Yoshigoe, S.Ishidzuka, J.Harries, Y.Teraoka, Y.Takakuwa
  • Organizer: 7^<th> International Symposium on Atomic Level Characterizations for New Materials and Devices'09
  • Place of Presentation: Hawaii (USA)
  • Year and Date: 2009-12-06
• [Presentation] Photoemission spectroscopic analysis with synchrotron radiation of direct nitridation of Al(111) by supersonic N_2 molecular beam (2009)
  • Author(s): Y.Teraoka, J.Harries, A.Yoshigoe
  • Organizer: 22^<nd> International Microprocesses and Nanotechnology Conference
  • Place of Presentation: Sheraton Sapporo Hotel (Hokkaido)
  • Year and Date: 2009-11-16
• [Presentation] Photoemission spectroscopic analysis with synchrotron radiation of direct nitridation of Al(111)by supersonic N_2 molecular beam (2009)
  • Author(s): Y.Teraoka
  • Organizer: 22^<nd> International Microprocesses and Nanotechnology Conference
  • Place of Presentation: Sheraton Sapporo Hotel (Hokkaido)
  • Year and Date: 2009-11-16
• [Presentation] Chemical state resolved depth-profiling using synchrotron XPS and the maximum entropy method (2009)
  • Author(s): J.R.Harries
  • Organizer: 5^<th> International Workshop on High-Resolution Depth Profiling
  • Place of Presentation: Kyoto University (Kyoto)
  • Year and Date: 2009-11-15
• [Presentation] In-situ XPS depth-profiling of hydrogen storage material VCrTi during thermal annealing (2009)
  • Author(s): J.R.Harries, Y.Teraoka, A.Yoshigoe, M.Tode
  • Organizer: AVS 56^<th> International Symposium and Exhibition
  • Place of Presentation: San Jose (USA)
  • Year and Date: 2009-11-08
• [Presentation] 重水素イオン注入した水素貯蔵材(V_<25>Cr_<40>Ti_<35>)の高分解能軟X線放射光光電子分光による自然酸化膜の熱安定性の評価 (2009)
  • Author(s): 戸出真由美
  • Organizer: 第50回真空に関する連合講演会
  • Place of Presentation: 学習院大学(東京都豊島区)
  • Year and Date: 2009-11-04
• [Presentation] SPring-8 BL23SUの表面化学反応分析装置における実空間"その場"観察の実現 (2009)
  • Author(s): 吉越章隆
  • Organizer: 第50回真空に関する連合講演会
  • Place of Presentation: 学習院大学(東京都豊島区)
  • Year and Date: 2009-11-04
• [Presentation] グラフエン・オン・シリコン表面構造のLEED観察 (2009)
  • Author(s): 高橋良太
  • Organizer: 第29回表面科学学術講演会
  • Place of Presentation: タワーホール船堀(東京都江戸川区)
  • Year and Date: 2009-10-26
• [Presentation] Si(111)-7x7表面酸化の促進と酸素分子の並進運動エネルギーの関係 (2009)
  • Author(s): 吉越章隆
  • Organizer: 第29回表面科学学術講演会
  • Place of Presentation: タワーホール船堀(東京都江戸川区)
  • Year and Date: 2009-10-26
• [Presentation] 放射光表面化学反応分析装置に導入した走査型プローブ顕微鏡 (2009)
  • Author(s): 吉越章隆
  • Organizer: 第29回表面科学学術講演会
  • Place of Presentation: タワーホール船堀(東京都江戸川区)
  • Year and Date: 2009-10-26
• [Presentation] Si(001)表面炭化反応における3C-SiC核発生の時間遅れ:表面近傍の臨海炭素濃度 (2009)
  • Author(s): 穂積英彬
  • Organizer: 第29回表面科学学術講演会
  • Place of Presentation: タワーホール船堀(東京都江戸川区)
  • Year and Date: 2009-10-26
• [Presentation] Real-time observation of oxidation of Si(111)-7x7 surface at 300K by using synchrotron radiation XPS, LEED and STM (2009)
  • Author(s): A.Yoshigoe, Y.Teraoka
  • Organizer: International Workshop on Electronic Spectroscopy for Gas-phase Molecules and Solid Surfaces
  • Place of Presentation: Hotel Matsushima Taikanso (Miyagi)
  • Year and Date: 2009-10-12
• [Presentation] Chemical-state resolved depth-profiling using angle-resolved X-ray photoelectron spectroscopy and the maximum entropy method (2009)
  • Author(s): J.Harries
  • Organizer: International Workshop on Electronic Spectroscopy for Gas-phase Molecules and Solid Surfaces
  • Place of Presentation: Hotel Matsushima Taikanso (Miyagi)
  • Year and Date: 2009-10-12
• [Presentation] Strained Si atoms at SiO_2/Si interface during oxidation of Si_<1-x>C_x alloy layer on Si(001) surfaces (2009)
  • Author(s): H.Hozumi
  • Organizer: International Workshop on Electronic Spectroscopy for Gas-phase Molecules and Solid Surfaces
  • Place of Presentation: Hotel Matsushima Taikanso (Miyagi)
  • Year and Date: 2009-10-12
• [Presentation] Epitaxy of graphene on Si substrates toward three-dimensional graphene devices (2009)
  • Author(s): H.Fukidome
  • Organizer: The 2009 International Conference on Solid State Devices and Materials
  • Place of Presentation: Sendai Kokusai Hotel (Miyagi)
  • Year and Date: 2009-10-07
• [Presentation] Enhancement of carbon diffusion caused by thermal oxidation on Si_<1-x>C_x alloy layer/Si(001) surfaces (2009)
  • Author(s): H.Hozumi
  • Organizer: The 2009 International Conference on Solid State Devices and Materials
  • Place of Presentation: Sendai Kokusai Hotel (Miyagi)
  • Year and Date: 2009-10-07
• [Presentation] Induced oxidation on Ni(111) by kinetic energy of O_2 molecular beams (2009)
  • Author(s): Y.Teraoka, Y.Kawakami, A.Yoshigoe, J.Harries, A.Hiraya
  • Organizer: 11^<th> International Conference on Electronic Spectroscopy and Structure
  • Place of Presentation: Nara Prefectural New Public Hall (Nara)
  • Year and Date: 2009-10-06
• [Presentation] Induced oxidation on Ni(111)by kinetyic energy of O_2 molecular beams (2009)
  • Author(s): Y.Teraoka
  • Organizer: 11^<th> International Conference on Electronic Spectroscopy and Structure
  • Place of Presentation: Nara Prefectural New Public Hall (Nara)
  • Year and Date: 2009-10-06
• [Presentation] X-ray photoemission study of oxidation process on Cu(110) surface using a hyperthermal O_2 molecular beam (2009)
  • Author(s): M.Hashinokuchi
  • Organizer: 11^<th> International Conference on Electronic Spectroscopy and Structure
  • Place of Presentation: Nara Prefectural New Public Hall (Nara)
  • Year and Date: 2009-10-06
• [Presentation] Synchrotron radiation photoemission study on native oxides of VCrTi alloy and its modification by deuterium ion implantation (2009)
  • Author(s): Y.Teraoka, J.Harries, M.Tode, A.Yoshigoe
  • Organizer: 10^<th> Atomically Controlled Surface, Interface and Nanostructures
  • Place of Presentation: Granada (Spain)
  • Year and Date: 2009-09-21
• [Presentation] 高分解能軟X線放射光光電子分光による重水素化VCrTiの表面分析 (2009)
  • Author(s): 戸出真由美
  • Organizer: 日本金属学会2009年秋季講演大会
  • Place of Presentation: 京都大学(京都市)
  • Year and Date: 2009-09-15
• [Presentation] SiO2/Si界面酸化における格子歪みの役割(2):2次元島成長における炭素拡散 (2009)
  • Author(s): 穂積英彬
  • Organizer: 第70回応用物理学会学術講演会
  • Place of Presentation: 富山大学(富山市)
  • Year and Date: 2009-09-08
• [Presentation] 4H-SiC(0001)面の熱酸化により形成したSiO_2/SiC界面の放射光XPS評価 (2009)
  • Author(s): 桐野嵩史
  • Organizer: 第70回応用物理学会学術講演会
  • Place of Presentation: 富山大学(富山市)
  • Year and Date: 2009-09-08
• [Presentation] 界面特性に優れたAl_2O_3/ZrO_2/GeO_2積層構造ゲート絶縁膜の作製と評価 (2009)
  • Author(s): 岡本学
  • Organizer: 第70回応用物理学会学術講演会
  • Place of Presentation: 富山大学(富山市)
  • Year and Date: 2009-09-08
• [Presentation] Si(111)-7×7表面の室温酸化のLEED、STMおよび放射光XPSによるリアルタイム観察 (2009)
  • Author(s): 吉越章隆
  • Organizer: 第70回応用物理学会学術講演会
  • Place of Presentation: 富山大学(富山市)
  • Year and Date: 2009-09-08
• [Presentation] 放射光X線光電子分光によるTiAl酸化過程の研究 (2009)
  • Author(s): 橋之口道宏
  • Organizer: 第70回応用物理学会学術講演会
  • Place of Presentation: 富山大学(富山市)
  • Year and Date: 2009-09-08
• [Presentation] Role of translational kinetic energy of O_2 in adsorption process on Si(111)-7x7 surface at room temperature (2009)
  • Author(s): A.Yoshigoe, Y.Teraoka
  • Organizer: 26^<th> European Conference on Surface Science
  • Place of Presentation: Parma (Italy)
  • Year and Date: 2009-08-30
• [Presentation] Oxidation of Si(111)-7x7 enhanced by translational kinetic energy of O_2 (2009)
  • Author(s): A.Yoshigoe
  • Organizer: 5^<th> International Workshop on Reactions Involving Oxygen & Hydrogen
  • Place of Presentation: Osaka University (Suita)
  • Year and Date: 2009-06-17
• [Presentation] Depth-profiling using angular-resolved X-ray photoelectron spectroscopy and the maximum entropy method (2009)
  • Author(s): J.R.Harries
  • Organizer: 5^<th> International Workshop on Reactions Involving Oxygen & Hydrogen
  • Place of Presentation: Osaka University (Suita)
  • Year and Date: 2009-06-17
• [Presentation] SR-XPS study on the native oxide of VCrTi and its modification by deuterium ion implantation (2009)
  • Author(s): M.Tode
  • Organizer: 5^<th> International Workshop on Reactions Involving Oxygen & Hydrogen
  • Place of Presentation: Osaka University (Suita)
  • Year and Date: 2009-06-17
• [Presentation] High-temperature oxidation of titanium-nickel alloy and its effect on the formation of protective layer (2009)
  • Author(s): T.Kasai
  • Organizer: 5^<th> International Workshop on Reactions Involving Oxygen & Hydrogen
  • Place of Presentation: Osaka University (Suita)
  • Year and Date: 2009-06-17
• [Presentation] Nitridation on Al(111)by an energetic N_2 beam (2009)
  • Author(s): J.Harries
  • Organizer: 第25回化学反応討論会
  • Place of Presentation: 大宮ソニックシティ(さいたま市)
  • Year and Date: 2009-06-01
• [Presentation] 放射光リアルタイム光電子分光で観たSi(111)表面の酸化過程 (2009)
  • Author(s): 吉越章隆
  • Organizer: 電気学会光・量子デバイス研究会
  • Place of Presentation: 神戸大学(神戸市)
  • Year and Date: 2009-05-07
• [Presentation] 超熱酸素分子線によるTiNi表面の酸化物生成過程のX線光電子分光研究 (2009)
  • Author(s): 宗和誠
  • Organizer: 第56回応用物理学関係連合講演会
  • Place of Presentation: 筑波大学(つくば市)
  • Year and Date: 2009-03-30
• [Presentation] Si(111)-7×7への室温での酸素吸着過程に及ぼす酸素分子の並進運動エネルギーの役割 (2009)
  • Author(s): 吉越章隆
  • Organizer: 第56回応用物理学関係連合講演会
  • Place of Presentation: 筑波大学(つくば市)
  • Year and Date: 2009-03-30
• [Presentation] SPring-8 BL23SU表面化学反応分析実験ステーションにおける走査型プローブ顕微鏡 (2009)
  • Author(s): 吉越章隆
  • Organizer: 第56回応用物理学関係連合講演会
  • Place of Presentation: 筑波大学(つくば市)
  • Year and Date: 2009-03-30
• [Presentation] プラズマ窒化SiC表面の熱酸化により形成したSiO_2/SiC界面の放射光XPS評価 (2009)
  • Author(s): 景井悠介
  • Organizer: 第56回応用物理学関係連合講演会
  • Place of Presentation: 筑波大学(つくば市)
  • Year and Date: 2009-03-30
• [Presentation] SiO_2/Si界面酸化における格子歪みの役割(1):炭素原子の挙動 (2009)
  • Author(s): 穂積英彬
  • Organizer: 第56回応用物理学関係連合講演会
  • Place of Presentation: 筑波大学(つくば市)
  • Year and Date: 2009-03-30
• [Presentation] Si(111)表面上でのNO解離吸着過程における立体効果の解明 (2009)
  • Author(s): 橋之口道宏
  • Organizer: 第56回応用物理学関係連合講演会
  • Place of Presentation: 筑波大学(つくば市)
  • Year and Date: 2009-03-30
• [Presentation] Synchrotron Radiation Photoemission Spectroscopy for Native Oxide Layer on Vanadium and VCrTa (2009)
  • Author(s): Y. Teraoka
  • Organizer: The International Workshop for Surface analysis and Standardization 2009
  • Place of Presentation: Ginowan (Japan)
  • Year and Date: 2009-03-15
• [Presentation] SiO_2/Si(001)界面の炭素原子によるSi酸化反応機構への影響 (2009)
  • Author(s): 穂積英彬
  • Organizer: 第14回ゲートスタック研究会
  • Place of Presentation: 東レ総合研修センター(三島市)
  • Year and Date: 2009-01-23
• [Presentation] 光電子分光と基板曲率測定によるSi(110)初期酸化過程の評価 (2009)
  • Author(s): 山本喜久
  • Organizer: 第14回ゲートスタック研究会
  • Place of Presentation: 東レ総合研修センター(三島市)
  • Year and Date: 2009-01-23
• [Presentation] 酸素分子の並進運動エネルギーによるSi(111)-7x7表面への吸着促進機構の放射光リアルタイム光電子分光観察 (2009)
  • Author(s): 吉越章隆
  • Organizer: 第22回日本放射光学会年会・放射光科学合同シンポジウム
  • Place of Presentation: 東京大学(東京都文京区)
  • Year and Date: 2009-01-09
• [Presentation] 放射光Ols光電子分光法によるNi(111)表面酸化反応ダイナミクスのその場観察 (2009)
  • Author(s): 川上泰典
  • Organizer: 第22回日本放射光学会年会・放射光科学合同シンポジウム
  • Place of Presentation: 東京大学(東京都文京区)
  • Year and Date: 2009-01-09
• [Presentation] 高輝度放射光XPSによるSi(001)表面炭化・酸化反応過程のリアルタイム観察 (2008)
  • Author(s): 穂積英彬
  • Organizer: 第8回東北大学多元物質科学研究所研究発表会
  • Place of Presentation: 東北大学(仙台市)
  • Year and Date: 2008-12-11
• [Presentation] Si(110)初期酸化時の化学結合状態および基板曲率のリアルタイム計測 (2008)
  • Author(s): 山本喜久
  • Organizer: 第63回応用物理学会東北支部学術講演会
  • Place of Presentation: 東北大学(仙台市)
  • Year and Date: 2008-12-04
• [Presentation] Si_<1-x>C_x合金層/Si(001)酸化反応過程のリアルタイムXPS観察 (2008)
  • Author(s): 穂積英彬
  • Organizer: 第28回表面科学学術講演会
  • Place of Presentation: 早稲田大学(東京都新宿区)
  • Year and Date: 2008-11-13
• [Presentation] 【Invited】 Chemical reactions dynamics : From atomic level to global view (2008)
  • Author(s): T. Kasai
  • Organizer: The International Workshop on Molecular Information and Dynamics 2008
  • Place of Presentation: Taipei (Taiwan)
  • Year and Date: 2008-11-10
• [Presentation] Photoemission analyses on oxides at single crystal Vanadium surfaces (2008)
  • Author(s): Y. Teraoka
  • Organizer: The 5^<th> International Symposium on Surface Science and Nanotechnology
  • Place of Presentation: Tokyo (Japan)
  • Year and Date: 2008-11-09
• [Presentation] Time evolution of oxygen adsorption states and its translational kinetic energy dependence on Si(111)-7x7 (2008)
  • Author(s): A. Yoshigoe
  • Organizer: The 5^<th> International Symposium on Surface Science and Nanotechnology
  • Place of Presentation: Tokyo (Japan)
  • Year and Date: 2008-11-09
• [Presentation] Time-resolved observation of trapping-mediated O_2 Adsorption on Si(111)-7x7 by synchrotron radiation photoelectron spectroscopy (2008)
  • Author(s): A. Yoshigoe
  • Organizer: 2008 International Workshop on Dielectric Thin Films for Future ULSI Devices
  • Place of Presentation: Tokyo (Japan)
  • Year and Date: 2008-11-05
• [Presentation] Photoemission study on oxide at poly-vanadium surface (2008)
  • Author(s): Y. Teraoka
  • Organizer: 4^<th> Vacuum and Surface Sciences Conference of Asia and Australia
  • Place of Presentation: Matsue (Japan)
  • Year and Date: 2008-10-28
• [Presentation] Selective etching of sp^2 carbon in a diamond-like carbon film by hyperthermal atomic oxygen exposures (2008)
  • Author(s): M. Tagawa
  • Organizer: 4^<th> Vacuum and Surface Sciences Conference of Asia and Australia
  • Place of Presentation: Matsue (Japan)
  • Year and Date: 2008-10-28
• [Presentation] Change in hydrogen amount in a diamond-like carbon film under hyperthermal atomic oxygen exposure (2008)
  • Author(s): K. Yokota
  • Organizer: 4^<th> Vacuum and Surface Sciences Conference of Asia and Australia
  • Place of Presentation: Matsue (Japan)
  • Year and Date: 2008-10-28
• [Presentation] Si(001)表面炭化/酸化過程のリアルタイムXPS測定 (2008)
  • Author(s): 穂積英彬
  • Organizer: 2008年度実用表面分析講演会
  • Place of Presentation: 東北大学(仙台市)
  • Year and Date: 2008-10-14
• [Presentation] 【Invited】Stereodynamics of chemical reactions in heterogeneous systems : Dissociative adsorption of NO on Si(111) (2008)
  • Author(s): M. Hashinokuchi
  • Organizer: The 12^<th> International Symposium of Stereodynamics of Chemical Reactions
  • Place of Presentation: Dalian (China)
  • Year and Date: 2008-10-13
• [Presentation] シンクロトロン放射光と表面電子状態 (2008)
  • Author(s): 寺岡有殿
  • Organizer: 日本表面科学会主催第46回表面科学基礎講座
  • Place of Presentation: 神戸大学(神戸市)
  • Year and Date: 2008-10-01
• [Presentation] New oxide layer formed by oxygen molecular beam on vanadium and its alloys as observed by photoemission spectroscopy with synchrotron radiation (2008)
  • Author(s): Y. Teraoka
  • Organizer: European Materials Research Society Fall Meeting
  • Place of Presentation: Warsaw (Poland)
  • Year and Date: 2008-09-15
• [Presentation] 原子状酸素を照射した水素化ダイヤモンドライクカーボン薄膜の水素分布 (2008)
  • Author(s): 田川雅人
  • Organizer: 第69回応用物理学会学術講演会
  • Place of Presentation: 中部大学(春日井市)
  • Year and Date: 2008-09-02
• [Presentation] 放射光Ols光電子分光で観た超音速O_2分子線照射によるNi(111)の室温酸化反応 (2008)
  • Author(s): 川上泰典
  • Organizer: 第69回応用物理学会学術講演会
  • Place of Presentation: 中部大学(春日井市)
  • Year and Date: 2008-09-02
• [Presentation] 統合Si酸化反応モデルの実験的検証(4):表面酸化反応様式への依存 (2008)
  • Author(s): 小川修一
  • Organizer: 第69回応用物理学会学術講演会
  • Place of Presentation: 中部大学(春日井市)
  • Year and Date: 2008-09-02
• [Presentation] エチレンによるSi(001)表面炭化反応過程のリアルタイムXPS観察 (2008)
  • Author(s): 高桑雄二
  • Organizer: 第69回応用物理学会学術講演会
  • Place of Presentation: 中部大学(春日井市)
  • Year and Date: 2008-09-02
• [Presentation] Si(110)面上1原子層酸化膜の結合構造のSR-PESによる評価 (2008)
  • Author(s): 山本喜久
  • Organizer: 第69回応用物理学会学術講演会
  • Place of Presentation: 中部大学(春日井市)
  • Year and Date: 2008-09-02
• [Presentation] Temperature dependence of Cu-oxide formation with hyperthermal oxygen molecular beam (2008)
  • Author(s): M. Okada
  • Organizer: 4^<th> International Workshop on Reactions involving Oxidation and Hydrogen
  • Place of Presentation: Suita (Japan)
  • Year and Date: 2008-08-22
• [Presentation] ERDA/RBS/SR-PES study on the effect of reactive atomic beam exposures to hydrogenated diamond-like carbon films relevance to hydrogen storage applications (2008)
  • Author(s): M. Tagawa
  • Organizer: 4^<th> International Workshop on Reactions involving Oxidation and Hydrogen
  • Place of Presentation: Suita (Japan)
  • Year and Date: 2008-08-22
• [Presentation] Effect of preadsorbed O atom on the reaction of hydrogen on Ti(0001) (2008)
  • Author(s): M. Sowa
  • Organizer: 4^<th> International Workshop on Reactions involving Oxidation and Hydrogen
  • Place of Presentation: Suita (Japan)
  • Year and Date: 2008-08-22
• [Presentation] Real time observation of O_2 adsorption on Si(111)-7x7 by using synchrotron radiation photoelectron spectroscopy (2008)
  • Author(s): A. Yoshigoe
  • Organizer: 4^<th> International Workshop on Reactions involving Oxidation and Hydrogen
  • Place of Presentation: Suita (Japan)
  • Year and Date: 2008-08-22
• [Presentation] Synchrotron radiation photoemission spectroscopy for native oxide, its thermal instability and re-oxidation of hydrogen storage metals (2008)
  • Author(s): Y. Teraoka
  • Organizer: 4^<th> International Workshop on Reactions involving Oxidation and Hydrogen
  • Place of Presentation: Suita (Japan)
  • Year and Date: 2008-08-22
• [Presentation] Real-time monitoring of rest atoms during oxidation at 300K of Si(111)-7x7 using synchrotron radiation photoelectron spectroscopy (2008)
  • Author(s): A. Yoshigoe
  • Organizer: The 25^<th> European Conference on Surface Science
  • Place of Presentation: Liverpool (England)
  • Year and Date: 2008-07-27
• [Presentation] Initial oxidation of Si(110) as studied by real-time SR-XPS (2008)
  • Author(s): M. Suemitsu
  • Organizer: 15^<th> Workshop on Dielectrics in Microelectronics
  • Place of Presentation: Berlin (Germany)
  • Year and Date: 2008-06-23
• [Presentation] Si(110)面上熱酸化膜形成時におけるSiサブオキサイド時間発展のXPSリアルタイム測定 (2008)
  • Author(s): 山本喜久
  • Organizer: 電子情報通信学会SDM研究会
  • Place of Presentation: 東京大学駒場(東京都)
  • Year and Date: 2008-06-09
• [Presentation] Si-doping for the protection of hydrogenated diamond-like carbon films in a simulated atomic oxygen environment in LEO (2008)
  • Author(s): K. Yokota
  • Organizer: The 26^<th> International Symposium on Space Technology and Science
  • Place of Presentation: Hamamatsu (Japan)
  • Year and Date: 2008-06-01
• [Presentation] Protection of diamond-like carbon films from an energetic atomic oxygen bombardment with Si-doping technology (2008)
  • Author(s): M. Tagawa
  • Organizer: The 9^<th> International Conference on Protection of Materials and Structures from Space Environment
  • Place of Presentation: Toronto (Canada)
  • Year and Date: 2008-05-20
• [Book] American Scientific Publishers, Fabrication of Cu oxides on single crystal Cu surfaces using hyperthermal O_2 molecular beams, eds.(Vol.1, Chapter 6, Metal Oxide Nanostructures and Their Applications) (2010)
  • Author(s): M.Okada, K.Moritani, L.Vattuone, L.Savio, Y.Teraoka, T.Kasai, M.Rocca
  • Total Pages: 33
  • Publisher: Ahmad Umar and Yoon-Bong Hahn
• [Book] Fabrication of Cu oxides on single crystal Cu surfaces using hyperthermal O_2 molecular beams, eds.Ahmad Umar and Yoon-Bong Hahn, Vol.1, Chapter 6, Metal Oxide Nanostructures and Their Applications (2010)
  • Author(s): M.Okada
  • Total Pages: 33
  • Publisher: American Scientific Publishers
• [Patent(Industrial Property Rights)] グラフェンの形成方法およびグラフェンの形成装置 (2010)
  • Inventor(s): 寺岡有殿、吉越章隆、吹留博一、末光眞希、今泉京
  • Industrial Property Rights Holder: 独立行政法人日本原子力研究開発機構、国立大学法人東北大学
  • Industrial Property Number: 2010-045842
  • Filing Date: 2010-03-02