Development of of boron doped nano-diamond film and application for glucose sensor

• Project/Area Number: 20360056
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Materials/Mechanics of materials
• Research Institution: The University of Tokushima
• Principal Investigator: MURAKAMI Ri-Ichi The University of Tokushima, 大学院・ソシオテクノサイエンス研究部, 教授 (00112235)
• Co-Investigator(Renkei-kenkyūsha): YONEKURA Daisuke 徳島大学, 大学院・ソシオテクノサイエンス研究部, 准教授 (70314846) ; KOINKAR Pankaj 徳島大学, 大学院・ソシオテクノサイエンス研究部, 助教
• Project Period (FY): 2008 – 2010
• Project Status: Completed (Fiscal Year 2010)
• Budget Amount: ¥19,630,000 (Direct Cost: ¥15,100,000、Indirect Cost: ¥4,530,000); Fiscal Year 2010: ¥2,210,000 (Direct Cost: ¥1,700,000、Indirect Cost: ¥510,000); Fiscal Year 2009: ¥7,280,000 (Direct Cost: ¥5,600,000、Indirect Cost: ¥1,680,000); Fiscal Year 2008: ¥10,140,000 (Direct Cost: ¥7,800,000、Indirect Cost: ¥2,340,000)
• Keywords: 材料加工・処理 / 導電性ダイヤモンド / グルコースセンサー / 表面・界面物性 / 半導体ダイヤモンド / 酵素反応

Research Abstract

In this study, we have developed the surface treatment method to immobilize an enzyme on the boron doped nano-diamond film and we have also developed glucose sensor using immobilized enzyme on the boron doped nano-diamond film. As a result, we clarified the glucose sensor indicates high sensitivity when the diamond film has high boron concentration.

Research Products

• [Journal Article] Enhanced field emission characteristics of boron doped diamond films grown by microwave plasma assisted chemical vapor deposition (2011)
  • Author(s): Pankaj M.Koinkar, Sandip S.Patil, Tae-Gyu Kim, D.Yonekura, Mahendra A.More, Dilip S.Joag, Ri-ichi Murakami
  • Journal Title: Applied Surface Science Vol.257 Pages: 1854-1858
  • Peer Reviewed
• [Journal Article] Enhanced field emission characteristics of boron doped diamond films grown by microwave plasma assisted chemical vapor deposition (2011)
  • Author(s): Pankaj M.Koinkar
  • Journal Title: Applied Surface Science Volume: 257 Pages: 1854-1858
  • Peer Reviewed
• [Presentation] MPCVD法により成膜した導電性ダイヤモンド薄膜の表面化学修飾の評価 (2010)
  • Author(s): 石川洋三, 米倉大介, 村上理一
  • Organizer: 日本機械学会中国四国支部・九州支部合同企画
  • Place of Presentation: 徳島講演会
  • Year and Date: 2010-10-16
• [Presentation] MPCVD法により成膜した導電性ダイヤモンド薄膜の表面化学修飾の評価 (2010)
  • Author(s): 村上理一
  • Organizer: 日本機械学会中国四国支部・九州支部合同企画徳島講演会
  • Place of Presentation: 徳島大学
  • Year and Date: 2010-10-16
• [Presentation] Field emission investigation of boron doped diamond thin films synthesized by microwave plasa chemical vapor : Effect of vacuum annealing (2009)
  • Author(s): P.M.Koinkar, D.Yonekura, T.G.Kim, M.A.More, R.Murakami
  • Organizer: 2009 22nd International Vacuum Nanoelectronics Conference, pp.247-248
  • Place of Presentation: Hamamatsu, Japan
  • Year and Date: 2009-07-22
• [Presentation] Field emission investigation of boron doped diamond thin films synthesized by microwave plasma chemical vapor deposition : Effect of vacuum annealing (2009)
  • Author(s): R.Murakami
  • Organizer: 2009 22nd International Vacuum Nanoelectronics Conference
  • Place of Presentation: 浜松
  • Year and Date: 2009-07-22
• [Presentation] Chemical Modification of Diamond Films on Pure Titanium Deposited By MPCVD Method (2008)
  • Author(s): R. Murakami
  • Organizer: International Conference on Advanced Materials Development and Performance 2008
  • Place of Presentation: 北京航空航大学
  • Year and Date: 2008-10-15
• [Presentation] Electrochemical Properties of Boron-doped Diamond Deposited by Microwave Plasma CVD Method (2008)
  • Author(s): K.Oka, D.Yonekura, R. Murakami
  • Organizer: International Conference on Advanced Materials Development & Performance 2008
  • Place of Presentation: Bei jing
  • Year and Date: 2008-10-14
• [Presentation] Electrochemical properties of Boron-doped diamond deposited by microwave plasma cvd method (2008)
  • Author(s): R. Murakami
  • Organizer: International Conference on Advanced Materials Development and Performance 2008
  • Place of Presentation: 北京航空航大学
  • Year and Date: 2008-10-14