| Budget Amount *help |
¥18,590,000 (Direct Cost: ¥14,300,000、Indirect Cost: ¥4,290,000)
Fiscal Year 2010: ¥3,250,000 (Direct Cost: ¥2,500,000、Indirect Cost: ¥750,000)
Fiscal Year 2009: ¥5,590,000 (Direct Cost: ¥4,300,000、Indirect Cost: ¥1,290,000)
Fiscal Year 2008: ¥9,750,000 (Direct Cost: ¥7,500,000、Indirect Cost: ¥2,250,000)
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| Research Abstract |
Mixing metallic Al into the starting material for silicate glass is proposed as a means of forming Si structures in glass. We confirmed that Si nanocrystals are space-selectively deposited in silicate glass via a thermite reaction triggered by femtosecond laser pulses. Small Si particles were transformed into larger, but still micrometer sized, Si particles by laser irradiation. These structures grew to micro-size particles due to the thermite reaction promoted by heat treatment. We discuss what effect the irradiation of the focused laser pulse had on the Si deposition process in the laser-irradiated region. Localized high temperatures and pressures and generation of shock waves appear to be very important in forming Si-rich structures that contribute to the growth of Si particles. The diffusion of calcium ions by the generation of shock waves and the presence of Al-rich structures is important for forming Si-rich structures such as Si clusters, which is achieved by continuously breaking Si-O bonds using localized high temperatures. These findings have opened up new possibilities in the field of Si-integrated devices and Si photonics.
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