Interaction between Bubble and Substrate by In-Liquid Plasma CVD Process

• Project/Area Number: 20360335
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Material processing/treatments
• Research Institution: Ehime University
• Principal Investigator: TOYOTA Hiromichi Ehime University, 大学院・理工学研究科, 准教授 (00217572)
• Co-Investigator(Kenkyū-buntansha): NOMURA Shinfuku 愛媛大学, 大学院・理工学研究科, 教授 (20263957)
• Project Period (FY): 2008 – 2010
• Project Status: Completed (Fiscal Year 2010)
• Budget Amount: ¥16,380,000 (Direct Cost: ¥12,600,000、Indirect Cost: ¥3,780,000); Fiscal Year 2010: ¥2,340,000 (Direct Cost: ¥1,800,000、Indirect Cost: ¥540,000); Fiscal Year 2009: ¥2,340,000 (Direct Cost: ¥1,800,000、Indirect Cost: ¥540,000); Fiscal Year 2008: ¥11,700,000 (Direct Cost: ¥9,000,000、Indirect Cost: ¥2,700,000)
• Keywords: 薄膜プロセス / 液中プラズマ / プラズマ加工 / 表面・界面物性 / 材料加工・処理

Research Abstract

The film formation mechanism of in-liquid plasma CVD method is clarified by analyzing the high-speed camera photographs of the bubbles surrounding in-liquid plasma The experimental condition for the uniform film formation is shown. The control method of the chemical reaction for synthesizing a compound semiconductor like diamond, silicon carbide and aluminum nitride is proved. The chemical reaction between the atom that has the highest electronegativity and the atom that has the lowest ionization energy occurs with first priority.

Research Products

• [Journal Article] Diamond synthesis by plasma chemical vapor deposition in liquid and gas (2010)
  • Author(s): H.Toyota, S.Nomura, S.Mukasa, Y.Takahashi, S.Okuda
  • Journal Title: Diamond & Related Materials 19 Pages: 418-422
  • Peer Reviewed
• [Journal Article] Growth of bubbles containing plasma in water by high-frequency irradiation (2010)
  • Author(s): Shinobu Mukasa, Tsunehiro Maehara, Shinfuku Nomura, Hiromichi Toyota, Hiroshi Yamashita, Fumito Kawashima, Yoshiaki Hattori, Yukio Hashimoto
  • Journal Title: International Journal of Heat and Mass Transfer Volume: 53 Pages: 3067-3074
  • Peer Reviewed
• [Journal Article] A comparison of diamond growth rate using in-liquid and conventional plasma chemical vapor deposition methods (2009)
  • Author(s): Yoshiyuki Takahashi, Hiromichi Toyota, Shinfuku Nomura, Shinobu Mukasa, Toru Inoue
  • Journal Title: JOURNAL OF APPLIED PHYSICS 105
  • Peer Reviewed
• [Presentation] 液中プラズマ化学蒸着におけるプラズマ泡と基板の相互作用 (2010)
  • Author(s): 豊田洋通, 飯坂康介, 野村信福, 向笠忍, 服部吉晃
  • Organizer: 日本機械学会中国四国支部・九州支部合同企画徳島講演会
  • Place of Presentation: 徳島県徳島市
  • Year and Date: 2010-10-16
• [Presentation] 液中プラズマ化学蒸着におけるプラズマ泡と基板の相互作用 (2010)
  • Author(s): 豊田洋通, 野村信福, 向笠忍
  • Organizer: 日本機械学会 中国四国支部・九州支部 合同企画 徳島講演会
  • Place of Presentation: 徳島大学
  • Year and Date: 2010-10-16
• [Presentation] A consideration of ternary C-H-O diagram for diamond deposition using microwave in-liquid and gas phase plasma (2010)
  • Author(s): H.Toyota, S.Nomura, S.Mukasa, T.Shimo, S.Okuda
  • Organizer: 21st European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides
  • Place of Presentation: ハンガリー国ブダペスト市
  • Year and Date: 2010-09-06
• [Presentation] A synthesis method of compound semiconductors using in-liquid plasma (2010)
  • Author(s): Hiromichi Toyota, Shinfuku Nomura, Shinobu Mukasa
  • Organizer: International Workshop on Plasmas with Liquids
  • Place of Presentation: 愛媛県松山市
  • Year and Date: 2010-03-23
• [Presentation] A synthesis method of compound semiconductors using in-liquid plasma (2009)
  • Author(s): Hiromichi Toyota, Shinfuku Nomura, Shinobu Mukasa
  • Organizer: 日本機械学会熱工学コンファレンス2009
  • Place of Presentation: 山口県宇部市
  • Year and Date: 2009-11-07
• [Presentation] Diamond synthesis by plasma chemical vapor deposition in liquid and gas (2009)
  • Author(s): H.Toyota, S.Nomura, S.Mukasa, Y.Takahashi, S.Okuda
  • Organizer: 20th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides
  • Place of Presentation: ギリシャ国アテネ市
  • Year and Date: 2009-09-07
• [Presentation] Diamond synthesis by plasma chemical vapor deposition in liquid and gas (2009)
  • Author(s): H.Toyota, S.Nomura, S.Mukasa, Y.Takahashi, S.Okuda
  • Organizer: 20st European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides
  • Place of Presentation: ギリシャ国アテネ市
  • Year and Date: 2009-09-07
• [Book] レアメタル便覧 (2011)
  • Author(s): 多数共著
  • Total Pages: 1800
  • Publisher: 丸善
• [Remarks] ホームページ等
  • URL: http://www.me.ehime-u.ac.jp/labo/plasma/index.htm
• [Remarks]
  • URL: http://www.me.ehime-u.ac.jp/labo/plasma/index.htm
• [Remarks]
  • URL: http://www.me.ehime-u.ac.jp/labo/plasma/index.htm
• [Patent(Industrial Property Rights)] 液中プラズマ反応装置,液中プラズマによる反応方法および結晶合成方法 (2010)
  • Inventor(s): 豊田洋通, 野村信福, 他
  • Industrial Property Rights Holder: 愛媛大学
  • Acquisition Date: 2010-06-21
• [Patent(Industrial Property Rights)] プラズマ用アンテナ電極及びプラズマ発生装置 (2010)
  • Inventor(s): 豊田洋通, 他
  • Industrial Property Rights Holder: 愛媛大学
  • Industrial Property Number: 2010-267354
  • Filing Date: 2010
• [Patent(Industrial Property Rights)] 液中プラズマ反応装置,液中プラズマによる反応方法および結晶合成方法 (2010)
  • Inventor(s): 豊田洋通, 他
  • Industrial Property Rights Holder: 愛媛大学
  • Acquisition Date: 2010
• [Patent(Industrial Property Rights)] 液中プラズマ発生方法 (2009)
  • Inventor(s): 豊田洋通, 野村信福, 他
  • Industrial Property Rights Holder: 愛媛大学
  • Industrial Property Number: 2009-114083
  • Filing Date: 2009-05-11
• [Patent(Industrial Property Rights)] 多孔質膜およびその生成装置と生成方法 (2009)
  • Inventor(s): 豊田洋通, 野村信福, 他
  • Industrial Property Rights Holder: 愛媛大学
  • Acquisition Date: 2009-09-11
• [Patent(Industrial Property Rights)] 液中プラズマ発生方法 (2009)
  • Inventor(s): 豊田洋通, 他
  • Industrial Property Rights Holder: 愛媛大学
  • Industrial Property Number: 2009-114083
  • Filing Date: 2009-05-11