Plasma-Assist Effect on the Sputter-Deposition Process of Transparent Conductive Metal-doped Zinc Oxide Thin Films

• Project/Area Number: 20540485
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Plasma science
• Research Institution: Nagasaki University
• Principal Investigator: MATSUDA Yoshinobu Nagasaki University, 工学部, 准教授 (60199817)
• Project Period (FY): 2008 – 2010
• Project Status: Completed (Fiscal Year 2010)
• Budget Amount: ¥4,550,000 (Direct Cost: ¥3,500,000、Indirect Cost: ¥1,050,000); Fiscal Year 2010: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000); Fiscal Year 2009: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000); Fiscal Year 2008: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
• Keywords: スパッタリング / 誘導結合プラズマ / 透明導電膜 / 酸化亜鉛 / プレーナマグネトロン / 電気導電率 / 吸収分光 / 熱流束 / アルミ添加酸化亜鉛

Research Abstract

Zinc oxide (ZnO) is an environmentally-friendly, low-cost and promising transparent conductive material to replace indium tin oxide (ITO) which has been widely-used so far. Inductively coupled plasma assisted magnetron sputtering has been applied for the deposition of transparent conductive aluminum-doped zinc oxide (AZO) thin films. Good quality AZO thin films with high transmittance and low resistivity have been successfully obtained by the assist with ICP.

Research Products

• [Journal Article] Deposition of Transparent Conducting Al-Doped ZnO Thin Films by ICP-Assisted Sputtering (2010)
  • Author(s): R.Shindo, Y.Matsuda
  • Journal Title: Proceedings of TENCON 2010 IEEE Region 10 Conference, Fukuoka Japan Pages: 1002-1006
  • NAID: 120006985178
  • Peer Reviewed
• [Journal Article] Thermal Probe Measurements of Energy Flux onto a Substrate during ICP Assisted Sputter-Deposition (2010)
  • Author(s): H.Kitagawa, Y.Matsuda
  • Journal Title: Proceedings of TENCON 2010 IEEE Region 10 Conference, Fukuoka Japan Pages: 2208-2212
  • NAID: 120006985179
  • Peer Reviewed
• [Journal Article] Energy Flux onto a Substrate during ICP Assisted Sputter-Deposition (2010)
  • Author(s): Y.Matsuda
  • Journal Title: Conference Proceedings CD of 63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas, October 4-8, 2010, Paris, France Volume: 55
  • Peer Reviewed
• [Journal Article] Inductively Coupled Plasma Assisted Sputter-Deposition of Al-doped ZnO Thin Films (2010)
  • Author(s): Y.Matsuda
  • Journal Title: Conference Proceedings CD of 63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas, October 4-8, 2010, Paris, France Volume: 55
  • Peer Reviewed
• [Journal Article] Deposition of Transparent Conducting Al-Doped ZnO Thin Films by ICP-Assisted Sputtering (2010)
  • Author(s): R.Shindo
  • Journal Title: TENCON 2010 IEEE Region 10 Conference CD, November 21-24, 2010, Fukuoka Japan. Volume: ISBN:978-1-4244-6888-1 Pages: 1002-1006
  • Peer Reviewed
• [Journal Article] Thermal Probe Measurements of Energy Flux onto a Substrate during ICP Assisted Sputter-Deposition (2010)
  • Author(s): H.Kitagawa
  • Journal Title: TENCON 2010 IEEE Region 10 Conference CD, November 21-24, 2010, Fukuoka Japan. Volume: ISBN:978-1-4244-6888-1 Pages: 2208-2212
  • Peer Reviewed
• [Journal Article] 誘導結合プラズマ支援スパッタによるアルミ添加酸化亜鉛薄膜の作成 (2009)
  • Author(s): 岩田忠
  • Journal Title: 電気学会プラズマ研究会研究会資料 PST-09-11-14・16-21 Pages: 23-28
• [Journal Article] Diagnostic Study of ICP Assisted Sputter-Deposition of Al-doped ZnO Thin Films (2009)
  • Author(s): Y.Matsuda
  • Journal Title: Proceedings CD of the 19th International Symposium on Plasma Chemistry(ISPC19), edited by A.von Keudell, J.Winter, M.Boke, V.Schulz-von der Gathen, Bochum, Germany, July 26th-31st, 2009 Pages: 4-4
  • Peer Reviewed
• [Journal Article] Absorption Measurement of Metal Atom Density in ICP Assisted Sputter-Deposition of Al-doped ZnO Thin Films (2009)
  • Author(s): T.Iwata
  • Journal Title: Proc.of 31st Int.Symposium on Dry Process, Busan Exhibition & Convention Center, Busan, Korea, September 24 to 25, 2009 Pages: 151-152
  • Peer Reviewed
• [Journal Article] Measurement of Gas Phase Metal Atom Densities during ICP Assisted Sputter-Deposition Process of Al-Doped ZnO Thin Films (2009)
  • Author(s): Tadashi Iwata
  • Journal Title: Proceedings CD of the 27th Symposium on Plasma Processing, Kaiyo Kinen Kaikan, Yokohama, February 1-3, 2010 Pages: 157-158
  • Peer Reviewed
• [Journal Article] Heat Influx to a Substrate during ICP Assisted Sputter-Deposition (2009)
  • Author(s): Ryoji Kan
  • Journal Title: Proceedings CD of the 27th Symposium on Plasma Processing, Kaiyo Kinen Kaikan, Yokohama, February 1-3, 2010 Pages: 159-160
  • Peer Reviewed
• [Journal Article] (2009)
  • Author(s): メタルスパッタプラズマの高度化調査専門委員会編(松田良信 : 分担)
  • Journal Title: メタルスパッタリングプラズマの高度化とその最新動向,基礎・材料・共通部門技術報告,No.1162(電気学会(電子図書館))
• [Journal Article] Influence of hydrogen addition on the electrical and optical properties of Al-doped ZnO thin films deposited by ICP assisted sputtering (2009)
  • Author(s): Ryoji Kan
  • Journal Title: Plasma Science Symposium 2009 and The 26th Symposium on Plasma Processing (PSS-2009/SPP-26), February 2-4 2009, Nagoya, Japan Pages: 250-251
  • Peer Reviewed
• [Journal Article] Plasma diagnostics in ICP assisted sputter-deposition process of Al-doped ZnO thin films (2009)
  • Author(s): Tadashi Iwata
  • Journal Title: Plasma Science Symposium 2009 and The 26th Symposium on Plasma Processing (PSS-2009/SPP-26), February 2-4 2009, Nagoya, Japan Pages: 286-287
  • Peer Reviewed
• [Presentation] 誘導結合プラズマ支援スパッタ過程における基板入射熱流束測定 (2011)
  • Author(s): 松田良信
  • Organizer: 2011年春季第58回応用物理学会関係連合講演会
  • Place of Presentation: 厚木市
  • Year and Date: 2011-03-24
• [Presentation] 紫外LEDを用いたスパッタAl原子密度の吸収計測(II) (2011)
  • Author(s): 松田良信
  • Organizer: 2011年春季第58回応用物理学会関係連合講演会
  • Place of Presentation: 厚木市
  • Year and Date: 2011-03-24
• [Presentation] 紫外LEDを用いたスパッタAl原子密度の吸収計測(II) (2011)
  • Author(s): 松田良信
  • Organizer: 2011年春季第58回応用物理学会関係連合講演会
  • Place of Presentation: 神奈川工科大学(厚木市)
  • Year and Date: 2011-03-24
• [Presentation] 誘導結合プラズマ支援スパッタ過程における基板入射熱流束測定 (2011)
  • Author(s): 松田良信
  • Organizer: 2011年春季第58回応用物理学会関係連合講演会
  • Place of Presentation: 神奈川工科大学(厚木市)
  • Year and Date: 2011-03-24
• [Presentation] LEDを用いたスパッタAl原子の吸収スペクトル測定 (2010)
  • Author(s): 平嶋彰典
  • Organizer: プラズマ・核融合学会第14回九州・沖縄・山口支部講演会
  • Place of Presentation: 九州大学(福岡市)
  • Year and Date: 2010-12-18
• [Presentation] 温度平衡型サーマルプローブの時間応答特性解析による熱流束測定の時間短縮 (2010)
  • Author(s): 嶺健二
  • Organizer: プラズマ・核融合学会第14回九州・沖縄・山口支部講演会
  • Place of Presentation: 九州大学(福岡市)
  • Year and Date: 2010-12-18
• [Presentation] 基板入射熱流束測定用サーマルプローブの作製 (2010)
  • Author(s): 北川博章
  • Organizer: 第116回日本物理学会九州支部例会
  • Place of Presentation: 長崎大学(長崎市)
  • Year and Date: 2010-12-04
• [Presentation] 熱流束捕集面積がサーマルプローブの時間応答特性に及ぼす影響 (2010)
  • Author(s): 北川博章
  • Organizer: 平成22年度応用物理学会九州支部学術講演会
  • Place of Presentation: 九州大学(福岡市)
  • Year and Date: 2010-11-27
• [Presentation] 紫外LEDを用いたスパッタAl原子吸収スペクトルの多チャンネル計測 (2010)
  • Author(s): 進藤亮太
  • Organizer: 平成22年度応用物理学会九州支部学術講演会
  • Place of Presentation: 九州大学(福岡市)
  • Year and Date: 2010-11-27
• [Presentation] Al添加ZnO薄膜のICP支援スパッタにおける金属原子密度吸収分光測定の信頼性 (2010)
  • Author(s): 進藤亮太
  • Organizer: 平成22年度応用物理学会九州支部学術講演会
  • Place of Presentation: 九州大学(福岡市)
  • Year and Date: 2010-11-27
• [Presentation] Deposition of Transparent Conducting Al-Doped ZnO Thin Films by ICP-Assisted Sputtering (2010)
  • Author(s): Yoshinobu Matsuda
  • Organizer: TENCON 2010 IEEE Region 10 Conference
  • Place of Presentation: Fukuoka, Japan(invited)
  • Year and Date: 2010-11-23
• [Presentation] Thermal Probe Measurements of Energy Flux onto a Substrate during ICP Assisted Sputter-Deposition (2010)
  • Author(s): Hiroaki Kitagawa
  • Organizer: TENCON 2010 IEEE Region 10 Conference
  • Place of Presentation: Fukuoka, Japan
  • Year and Date: 2010-11-22
• [Presentation] Energy Flux onto a Substrate during ICP Assisted Sputter-Deposition (2010)
  • Author(s): Yoshinobu Matsuda
  • Organizer: 63rd Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas
  • Place of Presentation: Paris, France
  • Year and Date: 2010-10-05
• [Presentation] Inductively Coupled Plasma Assisted Sputter-Deposition of Al-doped ZnO Thin Films (2010)
  • Author(s): Yoshinobu Matsuda
  • Organizer: 63rd Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas
  • Place of Presentation: Paris, France
  • Year and Date: 2010-10-05
• [Presentation] 誘導結合プラズマ支援スパッタ過程における基板入射熱流束の測定 (2010)
  • Author(s): 嶺健二
  • Organizer: 電気関係学会九州支部第63回連合大会
  • Place of Presentation: 九州産業大学(福岡市)
  • Year and Date: 2010-09-26
• [Presentation] Al添加ZnO薄膜のICP支援マグネトロンスパッタ過程における金属原子の挙動 (2010)
  • Author(s): 平嶋彰典
  • Organizer: 電気関係学会九州支部第63回連合大会
  • Place of Presentation: 九州産業大学(福岡市)
  • Year and Date: 2010-09-26
• [Presentation] 紫外LEDを用いたスパッタAl原子密度の吸収計測 (2010)
  • Author(s): 松田良信
  • Organizer: 第71回応用物理学会学術講演会
  • Place of Presentation: 長崎大学(長崎市)
  • Year and Date: 2010-09-15
• [Presentation] Energy influx to a substrate during inductively-coupled-plasma assisted sputtering (2010)
  • Author(s): Yoshinobu Matsuda
  • Organizer: 10th APCPST & 23rd SPSM
  • Place of Presentation: Jeju, Korea
  • Year and Date: 2010-07-06
• [Presentation] Al添加ZnO薄膜のICP支援スパッタ過程における金属原子の挙動 (2010)
  • Author(s): 松田良信
  • Organizer: 2010年春季第57回応用物理学会関係連合講演会
  • Place of Presentation: 東海大学 湘南キャンパス(平塚市)
  • Year and Date: 2010-03-17
• [Presentation] 誘導結合プラズマ支援スパッタ過程における基板入射熱流束 (2010)
  • Author(s): 松田良信
  • Organizer: 2010年春季第57回応用物理学会関係連合講演会
  • Place of Presentation: 東海大学 湘南キャンパス(平塚市)
  • Year and Date: 2010-03-17
• [Presentation] Measurement of Gas Phase Metal Atom Densities during ICP Assisted Sputter-Deposition Process of Al-Doped ZnO Thin Films (2010)
  • Author(s): Yoshinobu Matsuda
  • Organizer: The 27th Symposium on Plasma Processing(SPP27)
  • Place of Presentation: 横浜市開港記念会館(横浜市)
  • Year and Date: 2010-02-01
• [Presentation] Heat Influx to a Substrate during ICP Assisted Sputter-Deposition (2010)
  • Author(s): Yoshinobu Matsuda
  • Organizer: The 27th Symposium on Plasma Processing(SPP27)
  • Place of Presentation: 横浜市開港記念会館(横浜市)
  • Year and Date: 2010-02-01
• [Presentation] Measurement of Metal Atom Densities during Sputter-deposition of Al-doped ZnO Thin Films (2010)
  • Author(s): Ryota Shindo
  • Organizer: Nagasaki Symposium on Nano-Dynamics 2010(NSND2010)
  • Place of Presentation: 長崎大学.(長崎市)
  • Year and Date: 2010-01-21
• [Presentation] Thermal Probe Measurements of Energy Flux onto a Substrate in Inductively Coupled Plasmas (2010)
  • Author(s): Hiroaki Kitagawa
  • Organizer: Nagasaki Symposium on Nano-Dynamics 2010(NSND2010)
  • Place of Presentation: 長崎大学.(長崎市)
  • Year and Date: 2010-01-21
• [Presentation] ICP支援マグネトロンスパッタ過程におけるサーマルプローブによる熱流束測定 (2009)
  • Author(s): 北川博章
  • Organizer: プラズマ・核融合学会九州・沖縄・山口支部第13回支部大会
  • Place of Presentation: 山口大学(宇部市)
  • Year and Date: 2009-12-22
• [Presentation] ICP支援スパッタによるAl添加ZnO薄膜作成過程における金属原子密度の吸収分光計測 (2009)
  • Author(s): 進藤亮太
  • Organizer: プラズマ・核融合学会九州・沖縄・山口支部第13回支部大会
  • Place of Presentation: 山口大学(宇部市)
  • Year and Date: 2009-12-22
• [Presentation] Inductively-Coupled-Plasma Assisted Sputter-Deposition of Aluminum-doped Zinc Oxide Thin Films (2009)
  • Author(s): Y.Matsuda
  • Organizer: The 5th DAE-BRNS National Symposium on Pulsed Laser Deposition of Thin Films and Nanostructured Materials(PLD-2009), December 2-4, 2009, IIT Madras, Chennai India
  • Place of Presentation: IIT Madras, Chennai India
  • Year and Date: 2009-12-03
• [Presentation] 誘導結合プラズマ支援マグネトロンスパッタ過程における熱流束測定 (2009)
  • Author(s): 閑亮史
  • Organizer: 平成21年度応用物理学会九州支部学術講演会
  • Place of Presentation: 熊本大学(熊本市)
  • Year and Date: 2009-11-21
• [Presentation] Al添加ZnO薄膜のICP支援マグネトロンスパッタにおける金属原子密度の吸収分光計測 (2009)
  • Author(s): 岩田忠
  • Organizer: 平成21年度応用物理学会九州支部学術講演会
  • Place of Presentation: 熊本大学(熊本市)
  • Year and Date: 2009-11-21
• [Presentation] Al添加ZnO薄膜のICP支援マグネトロンスパッタにおける金属原子密度の吸収分光計測 (2009)
  • Author(s): 進藤亮太
  • Organizer: 電気関係学会九州支部第62回連合大会
  • Place of Presentation: 九州工業大学(飯塚市)
  • Year and Date: 2009-09-29
• [Presentation] 誘導結合プラズマ支援マグネトロンスパッタ過程における熱流束の測定 (2009)
  • Author(s): 北川博章
  • Organizer: 電気関係学会九州支部第62回連合大会
  • Place of Presentation: 九州工業大学(飯塚市)
  • Year and Date: 2009-09-29
• [Presentation] Absorption Measurement of Metal Atom Density in ICP Assisted Sputter-Deposition of Al-doped ZnO Thin Films (2009)
  • Author(s): Y.Matsuda
  • Organizer: 31st Int. Symposium on Dry Process, Busan Exhibition & Convention Center, Busan, Korea, September 24 to 25, 2009
  • Place of Presentation: Busan Exhibition & Convention Center, Busan, Korea
  • Year and Date: 2009-09-24
• [Presentation] Diagnostic Study of ICP Assisted Sputter-Deposition of Al-doped ZnO Thin Films (2009)
  • Author(s): Y.Matsuda
  • Organizer: The 19th International Symposium on Plasma Chemistry(ISPC19)
  • Place of Presentation: Bochum, Germany
  • Year and Date: 2009-07-28
• [Presentation] 誘導結合プラズマ支援スパッタによるアルミ添加酸化亜鉛薄膜の作成 (2009)
  • Author(s): 松田良信
  • Organizer: 電気学会プラズマ研究会
  • Place of Presentation: 佐賀大学(佐賀市)
  • Year and Date: 2009-06-13
• [Presentation] Al添加ZnO薄膜のICP支援スパッタ成膜過程における気相金属原子密度測定 (2009)
  • Author(s): 松田良信
  • Organizer: 第70回応用物理学会学術講演会
  • Place of Presentation: 富山大学(富山)
• [Presentation] Al添加ZnOターゲットを用いたマグネトロンスパッタ におけるアーキング現象の観察 (2008)
  • Author(s): 松田良信
  • Organizer: 2008年秋季第69回応用物理学会学術講演会
  • Place of Presentation: 中部大学(愛知)
  • Year and Date: 2008-09-04
• [Book] 電気学会基礎・材料・共通部門技術報告、メタルスパッタリングプラズマの高度化とその最新動向No.1162 (2009)
  • Author(s): 松田良信, 他
• [Remarks] ホームページ等
  • URL: http://www.eee.nagasaki-u.ac.jp/~plasma/matsuda/index.html