Advanced studies to functionalize the inner wall of microfluidic channels by atmospheric-pressure μplasmas
Project/Area Number |
20540488
|
Research Category |
Grant-in-Aid for Scientific Research (C)
|
Allocation Type | Single-year Grants |
Section | 一般 |
Research Field |
Plasma science
|
Research Institution | Tsuruoka National College of Technology |
Principal Investigator |
YOSHIKI Hiroyuki Tsuruoka National College of Technology, 総合科学科, 教授 (00300525)
|
Project Period (FY) |
2008 – 2010
|
Project Status |
Completed (Fiscal Year 2010)
|
Budget Amount *help |
¥4,680,000 (Direct Cost: ¥3,600,000、Indirect Cost: ¥1,080,000)
Fiscal Year 2010: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000)
Fiscal Year 2009: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2008: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
|
Keywords | 大気圧μプラズマ / 磁化μプラズマ / マイクロ流路チップ / 小口径チューブ / 親水化処理 / プラズマCVD / TiO_2薄膜 / SiO_2薄膜 / μプラズマ / パルスコロナ放電 / 環状ポリオレフィン / ナノカーボン物質 / 大気圧プラズマ / μ磁化プラズマ / マイクロ流路 / ポリプロピレンチューブ / CVD / SiO2薄膜コーティング / ポリイミドフィルムの剥離 / SiO_2薄膜コーティング |
Research Abstract |
TiO_2 and SiO_2 thin films were prepared on the inner wall of narrow tubes or microchannels on a chip by μ plasma-enchanced chemical vapor deposition at low~atmospheric pressure. The chemical properties and surface morphology of the deposited films were analyzed by X-ray photoelectron spectroscopy, infrared spectroscopy and scanning electron microscopy. Magnetized He and Ar μ plasmas were generated inside the microchannels by applying a strong magnetic field of more than 0.4 T to control an electron temperature. Furthermore, a pulsed corona μ plasma was used to modify the surfaces of microchannel walls of commercial polymer microfluidic chips and the plasma-treated microchannels exhibited highly hydrophilic properties.
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Report
(4 results)
Research Products
(48 results)