| Budget Amount *help |
¥4,680,000 (Direct Cost: ¥3,600,000、Indirect Cost: ¥1,080,000)
Fiscal Year 2010: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000)
Fiscal Year 2009: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2008: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
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| Research Abstract |
TiO_2 and SiO_2 thin films were prepared on the inner wall of narrow tubes or microchannels on a chip by μ plasma-enchanced chemical vapor deposition at low～atmospheric pressure. The chemical properties and surface morphology of the deposited films were analyzed by X-ray photoelectron spectroscopy, infrared spectroscopy and scanning electron microscopy. Magnetized He and Ar μ plasmas were generated inside the microchannels by applying a strong magnetic field of more than 0.4 T to control an electron temperature. Furthermore, a pulsed corona μ plasma was used to modify the surfaces of microchannel walls of commercial polymer microfluidic chips and the plasma-treated microchannels exhibited highly hydrophilic properties.
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