Preparation and application of crystalline template layers on no crystalline substrates by a quasi-nanoimprinting method
| Project/Area Number |
20560003
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Applied materials science/Crystal engineering
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| Research Institution | Akita University |
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Principal Investigator |
SATO Yuichi 秋田大学, 大学院・工学資源学研究科, 准教授 (70215862)
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| Project Period (FY) |
2008 – 2010
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| Project Status |
Completed (Fiscal Year 2010)
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| Budget Amount *help |
¥4,680,000 (Direct Cost: ¥3,600,000、Indirect Cost: ¥1,080,000)
Fiscal Year 2010: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000)
Fiscal Year 2009: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000)
Fiscal Year 2008: ¥2,860,000 (Direct Cost: ¥2,200,000、Indirect Cost: ¥660,000)
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| Keywords | 薄膜 / 単結晶 / 非単結晶基板 |
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| Research Abstract |
Materials and growth conditions for the crystalline template layers were investigated. Matching between materials of the template layers and semiconductors were also investigated. Heat-treatment atmosphere of In thin films was varied from inactive to oxygen included one in preparation of In_2O_3 template layers and their crystallization was controlled by it. Other crystalline metal films could be also obtained in narrow windows of their crystallization conditions. The In_2O_3 films were possible to be applied as template layers for several compound semiconductor films.
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Report
(4 results)
Research Products
(31 results)
