| Project/Area Number |
20560006
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Applied materials science/Crystal engineering
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| Research Institution | Niigata University |
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Principal Investigator |
OKA Tetsuo Niigata University, 自然科学系, 教授 (40432091)
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| Co-Investigator(Kenkyū-buntansha) |
FUKUI Satoshi 新潟大学, 自然科学系, 准教授 (70293199)
OGAWA Jun 新潟大学, 自然科学系, 准教授 (60377182)
SHIMIZU Hidehiko 新潟大学, 自然科学系, 准教授 (00313502)
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| Project Period (FY) |
2008 – 2010
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| Project Status |
Completed (Fiscal Year 2010)
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| Budget Amount *help |
¥4,810,000 (Direct Cost: ¥3,700,000、Indirect Cost: ¥1,110,000)
Fiscal Year 2010: ¥260,000 (Direct Cost: ¥200,000、Indirect Cost: ¥60,000)
Fiscal Year 2009: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000)
Fiscal Year 2008: ¥3,640,000 (Direct Cost: ¥2,800,000、Indirect Cost: ¥840,000)
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| Keywords | 超伝導体 / 磁性 / 超伝導材料・素子 / 低温物性 / 表面、界面物性 / プラズマ加工 / 表面・界面物性 |
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| Research Abstract |
We constructed a novel type of magnetron sputtering device characterized by its strong magnetic field generation with face-to-face settled target cathodes. By using the device, strong magnetic field of 3.2 T enabled us to obtain a novel sputtering source. As a result of experimental operations, we observed DC plasma discharges under the circumstance of strong field 1 T with the power application up to 650 V. The difference of the property of plasma discharges showed us a plasma magnetron discharge which varied its shapes with changing magnetic field distributions. The deposition rate of 0.06nm/min derived from the results of rate measurement by ICP analysis was estimated as same level of commercially-supplied sputtering devices, which showed possible high rate sputtering machines. We succeeded in obtaining a new sputtering equipment and actual deposition of copper film with several ten times faster than usual magnetic field equipped in ordinary sputtering machines. Sustainable and stable plasma discharge was observed by containing plasma and magnetic field between the poles.
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