Study on crystalline growth of phase transition oxide and electric field-induced switching phenomena

• Project/Area Number: 20560016
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Applied materials science/Crystal engineering
• Research Institution: Tokai University
• Principal Investigator: OKIMURA Kunio Tokai University, 工学部, 教授 (00194473)
• Project Period (FY): 2008 – 2010
• Project Status: Completed (Fiscal Year 2010)
• Budget Amount: ¥4,810,000 (Direct Cost: ¥3,700,000、Indirect Cost: ¥1,110,000); Fiscal Year 2010: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000); Fiscal Year 2009: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000); Fiscal Year 2008: ¥2,990,000 (Direct Cost: ¥2,300,000、Indirect Cost: ¥690,000)
• Keywords: 結晶成長 / 機能性酸化物 / バナジウム酸化膜 / スパッタ成膜法 / 相共存 / スイッチングデバイス / 相転移 / 酸化状態制御 / エピタキシャル成長 / ICP支援スパッタ成膜法 / プラズマプロセス / メモリーデバイス

Research Abstract

In this project, we fabricated planer-type switching device utilizing vanadium dioxide (VO_2) films with metal-insulator transition (MIT) and investigated electric-field induced switching phenomena. We showed fast switching with response time of around 100 ns under electric pulse addition. This phenomenon was considered to be responsible for strong electron correlation effect. The results will be of importance for realizing next generation switching device utilizing phase transition oxide materials.

Research Products

• [Journal Article] 反応性スパッタ法による相転移V_2O_3薄膜のサファイア基板上へのエピタキシャル成長 (2011)
  • Author(s): 沖村邦雄, 鈴木康史
  • Journal Title: Journal of Vacuum Society of Japan Volume: 54(印刷中)
  • NAID: 10028057028
  • Peer Reviewed
• [Journal Article] Characterization of structural dynamics of VO2 thin film on c-Al2O3 using in-air time-resolved X-ray diffraction (2010)
  • Author(s): M.Hada, K.Okimura, J.Matsuo
  • Journal Title: Phy.Rev.B 82 Pages: 153401-153401
  • NAID: 120002661515
  • Peer Reviewed
• [Journal Article] In-situ X-ray diffraction studies on epitaxial VO_2 films grown on c-Al_2O_3 during thermally induced insulator-metal transition (2010)
  • Author(s): K.Okimura, J.Sakai, S.Ramanatha
  • Journal Title: J.Appl.Phys. Vol.107
  • Peer Reviewed
• [Journal Article] Characterization of structural dynamics of VO_2 thin film on c-Al_2O_3 using in-air time-resolved X-ray diffraction (2010)
  • Author(s): M.Hada, K.Okimura, J.Matsuo
  • Journal Title: Physical Review B Volume: 82
  • Peer Reviewed
• [Journal Article] In-situ X-ray diffraction studies on epitaxial VO_2 films grown on c-Al_2O_3 during thermally induced insulator-metal transition (2010)
  • Author(s): K.Okimura, J.Sakai, S.Ramanathan
  • Journal Title: Journal of Applied Physics Volume: 107
  • Peer Reviewed
• [Journal Article] Effect of annealing with Ar plasma irradiation for transparent conductive Nb-doped TiO_2 films on glass substrate (2009)
  • Author(s): M.Hojo, K.Okimura
  • Journal Title: Jpn.J.Appl.Phys. Vol.48, Special Issue
  • Peer Reviewed
• [Journal Article] Electric Field-Induced Multi-Step Resistance Switching Phenomena in a Planer VO_2/c-Al_2O_3 Structure (2009)
  • Author(s): K.Okimura, Nurul Ezreena, Y.Sasakawa, J.Sakai
  • Journal Title: Jpn.J.Appl.Phys. Vol.48, No.6
  • Peer Reviewed
• [Journal Article] Changes in Lattice Parameters of VO_2 Films Grown on c-Al_2O_3 Substrate across Metal-Insulator Transition (2009)
  • Author(s): K.Okimura, J.Sakai
  • Journal Title: Jpn.J.Appl.Phys. Vol.48, No.4
  • Peer Reviewed
• [Journal Article] サファイア基板上VO_2薄膜の結晶構造転移の温度依存性 (2009)
  • Author(s): 小池秀明,野中利倫,沖村邦雄
  • Journal Title: 真空 Vol.52, No3 Pages: 167-1970
  • NAID: 10024897925
  • Peer Reviewed
• [Journal Article] Effect of Light Irradiation on Electric Field Induced Resistance Switching Phenomenon in Planer VO_2/c-Al_2O_3 Structure (2009)
  • Author(s): Nurul Ezreena Mohamad, K.Okimura, J.Sakai
  • Journal Title: International Journal of Nanoscience Nos.1 & 2 Pages: 147-150
  • Peer Reviewed
• [Journal Article] Effect of annealing with Ar plasma irradiation for transparent conductive Nb-doped TiO_2 films on glass substrate (2009)
  • Author(s): M.Hojo, K.Okimura
  • Journal Title: Japanese Journal of Applied Physics Vol.48
  • Peer Reviewed
• [Journal Article] Electric Field-Induced Multi-Step Resistance Switching Phenomena in a Planer VO_2/c-Al_2O_3 Structure (2009)
  • Author(s): K.Okimura, Nurul Ezreena, Y.Sasakawa, J.Sakai
  • Journal Title: Japanese Journal of Applied Physics Vol.48
  • Peer Reviewed
• [Journal Article] Changes in Lattice Parameters of VO_2 Films Grown on c-Al_2O_3 Sub-strate across Metal-Insulator Transition (2009)
  • Author(s): K.Okimura, J.Sakai
  • Journal Title: Japanese Journal of Applied Physics Vol.48
  • Peer Reviewed
• [Journal Article] サファイア基板上VO_2薄膜の結晶構造転移の温度依存性 (2009)
  • Author(s): 小池秀明, 野中利倫, 沖村邦雄
  • Journal Title: Journal of the Vacuum Society of Japan 第52巻3号 Pages: 167-170
  • NAID: 10024897925
  • Peer Reviewed
• [Journal Article] Advantages of Inductively Coupled Plasma -Assisted Sputtering for Preparation of Stoichiometric VO_2 films with Metal-Insulator Transition (2008)
  • Author(s): Y.Nihei, Y.Sasakawa, K.Okimura
  • Journal Title: Thin Solid Films Vol.516 Pages: 3572-3576
  • Peer Reviewed
• [Journal Article] Effect of annealing with Ar plasma irradiation for transparent conductive Nb-doped TiO_2 films on glass substrate (2008)
  • Author(s): Mika Hojo, Kunio Okimura
  • Journal Title: Proceedings of International Symposium on Dry Process 2008 Pages: 195-196
  • Peer Reviewed
• [Journal Article] Advantages of Inductively Coupled Plasma -Assisted Sputtering for Preparation of Stoichiometric VO_2 films with Metal-Insulator Transition (2008)
  • Author(s): Y. Nihei, Y. Sasakawa, K. Okimura
  • Journal Title: Thin Solid Films Vol. 516 Pages: 3572-3576
  • Peer Reviewed
• [Presentation] 反応性スパッタ法による金属-絶縁体相転移VO2薄膜の成長とその応用 (2010)
  • Author(s): 沖村邦雄
  • Organizer: 表面技術協会第121回講演大会
  • Place of Presentation: 成蹊大学
  • Year and Date: 2010-03-15
• [Presentation] 反応性スパッタ法による相転移V2O3薄膜のサファイア基板上へのエピタキシャル成長 (2010)
  • Author(s): 沖村邦雄,鈴木康史
  • Organizer: 第51回真空に関する連合講演会(真空・表面科学合同講演会
  • Place of Presentation: 大阪大学
• [Presentation] サファイア基板上エピタキシャルV_2O_3薄膜成長とアニールによるVO_2への変態 (2010)
  • Author(s): 沖村邦雄,鈴木亮太,鈴木康史
  • Organizer: 第71回応用物理学会学術講演会
  • Place of Presentation: 長崎大学
• [Presentation] 時間分解X線回折法を用いたVO2薄膜の構造ダイナミクスの評価 (2010)
  • Author(s): 羽田真毅,沖村邦雄,松尾二郎
  • Organizer: 第71回応用物理学会学術講演会
  • Place of Presentation: 長崎大学
• [Presentation] サファイア基板上に成長したバナジウム酸化膜の相転移特性に対するポストアニール効果 (2010)
  • Author(s): 沖村邦雄
  • Organizer: 第57回応用物理学関係連合講演会
  • Place of Presentation: 東海大学
• [Presentation] Effect of annealing with Ar plasma irradiation for transparent conductive Nb-doped TiO_2 films on glass substrate (2008)
  • Author(s): Mika Hojo, Kunio Okimura
  • Organizer: International Symposium on Dry Process
  • Place of Presentation: Tokyo
  • Year and Date: 2008-11-27
• [Presentation] Effect of Light Irradiation on Electric Field Induced Resistance Switching Phenomenon in Planer VO_2/c-Al_2O_3 Structure (2008)
  • Author(s): Nurul Ezreena Mohamad, Kunio Okimura, Joe Sakai
  • Organizer: The 2008 Asian Conference on Nanoscience and Nanotechnology (AsiaNANO 2008)
  • Place of Presentation: Singapore
  • Year and Date: 2008-11-03
• [Presentation] Nurul Ezreena and Joe Sakai : X-ray diffraction study on structures of vanadium dioxide films with metal-insulator transition (2008)
  • Author(s): 沖村邦雄
  • Organizer: XXI Congress of the International Union of Crystallography
  • Place of Presentation: Osaka
  • Year and Date: 2008-08-28
• [Presentation] X-ray diffraction study on structures of vanadium dioxide films with metal-insulator transition (2008)
  • Author(s): Kunio Okimura, Nurul Ezreena, Joe Sakai
  • Organizer: XXI Congress of the International Union of Crystallography
  • Place of Presentation: Osaka International Convention Center
  • Year and Date: 2008-08-28
• [Presentation] サファイア基板上VO_2薄膜の結晶構造転移の温度依存性 (2008)
  • Author(s): 小池秀明,野中利倫,沖村邦雄
  • Organizer: 第49回真空に関する連合講演会
  • Place of Presentation: くにびきメッセ,松江
• [Presentation] ICP支援スパッタ法による相転移VO_2薄膜成長におけるバナジウムバッファ層の効果 (2008)
  • Author(s): 野中利倫,沖村邦雄
  • Organizer: 第69回応用物理学会学術講演会
  • Place of Presentation: 中部大学
• [Presentation] PLD法及びスパッタ法により堆積した相転移VO_2薄膜の結晶格子長測定 (2008)
  • Author(s): 小池秀明,沖村邦雄,坂井穣
  • Organizer: 第69回応用物理学会学術講演会
  • Place of Presentation: 中部大学
• [Presentation] ガラス基板上NbドープTiO_2スパッタ薄膜へのICP高密度Arプラズマアニール処理の効果(II) (2008)
  • Author(s): 北条美加,沖村邦雄
  • Organizer: 第69回応用物理学会学術講演会
  • Place of Presentation: 中部大学
• [Presentation] ICP支援スパッタ法により堆積したVO_2薄膜の電界誘起相転移(II) (2008)
  • Author(s): ヌルルエズリナ,笹川裕介,沖村邦雄
  • Organizer: 第55回応用物理学関係連合講演会
  • Place of Presentation: 日本大学
• [Presentation] In-situ連続成膜ICP支援スパッタによる相転移VO_2薄膜堆積 (2008)
  • Author(s): 野中利倫,二瓶祐輔,沖村邦雄
  • Organizer: 第55回応用物理学関係連合講演会
  • Place of Presentation: 日本大学
• [Presentation] ガラス基板上NbドープTiO_2スパッタ薄膜へのICP高密度Arプラズマアニール処理の効果 (2008)
  • Author(s): 北条美加,沖村邦雄
  • Organizer: 第55回応用物理学関係連合講演会
  • Place of Presentation: 日本大学
• [Presentation] 反応性スパッタ法による酸化ビスマス薄膜の堆積と光記録膜への応用 (2008)
  • Author(s): 小池秀明,上村隆久,村田吉正,沖村邦雄,後藤廣則
  • Organizer: 第55回応用物理学関係連合講演会
  • Place of Presentation: 日本大学