Investigation of VHF plasmas with narrow gap under high gas pressure for the fabrication of microcrystalline silicon thin films.

• Project/Area Number: 20560022
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Thin film/Surface and interfacial physical properties
• Research Institution: Gifu University
• Principal Investigator: MUTA Hiroshi Gifu University, 工学研究科, 准教授 (10219850)
• Project Period (FY): 2008 – 2010
• Project Status: Completed (Fiscal Year 2010)
• Budget Amount: ¥4,940,000 (Direct Cost: ¥3,800,000、Indirect Cost: ¥1,140,000); Fiscal Year 2010: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000); Fiscal Year 2009: ¥390,000 (Direct Cost: ¥300,000、Indirect Cost: ¥90,000); Fiscal Year 2008: ¥3,900,000 (Direct Cost: ¥3,000,000、Indirect Cost: ¥900,000)
• Keywords: 薄膜シリコン太陽電池 / VHFプラズマ / 高圧狭ギャップ / 微結晶シリコン / プラズマパラメータ / バラン給電法 / 太陽電池

Research Abstract

Characteristics of VHF plasmas with narrow gap under high gas pressure were experimentally and numerically investigated. Simultaneously, the suitable power feeding method-balanced power feed was proposed. The measurement results of the plasma parameters showed that the elctron density was a few times higher and the electron temperature was lower in the case of the balanced power feed. In addition, the simulation results indicated that the plasma potential was lower. As a result of preparation of the microcrystalline silicon thin films, it was considered that the balanced power feed is advantageous for high speed deposition and low ion damage.

Research Products

• [Journal Article] (2011)
  • Author(s): T.Nishimiya, T.Yamane, S.Nakao, Y.Takeuchi, Y.Yamauchi, H.Takatsuka, H.Muta K.Uchino, Y.Kawai
  • Journal Title: Surf.Coat.Technol. in press
  • Peer Reviewed
• [Journal Article] (2011)
  • Author(s): T.Nishimiya, T.Yamane, Y.Takeuchi, Y.Yamauchi, H.Takatsuka, H.Muta, K.Uchino, Y.Kawai
  • Journal Title: Thin Solid Films in press
  • Peer Reviewed
• [Journal Article] (2011)
  • Author(s): H.Muta S.Nishida, S.Kuribayashi, N.Yoshikawa, R.Komatsu, K.Uchino, Y.Kawai
  • Journal Title: Jpn.J.Appl.Physics Vol.50
  • Peer Reviewed
• [Journal Article] Effect of Excitation Frequency on the Spatial Distributions of a Surface Wave Plasma (2011)
  • Author(s): H.Muta, S.Nishida, S.Kunbayashi, N.Yoshikawa, R.Komatsu, K.Uchino, Y.Kawai
  • Journal Title: Japanese Journal of Applied Physics Volume: 50
  • NAID: 210000138242
  • Peer Reviewed
• [Journal Article] Characteristics of SiH_4/H_2 VHF Plasma Produced by a Short Gap Discharge (2011)
  • Author(s): T.Nishimiya, T.Yamane, S.Nakao, Y.Takeuchi, Y.Yamauchi, H.Takatsuka, H.Muta, K.Uchino, Y.Kawai
  • Journal Title: Surface & Coatings Technology Volume: (in press,in press)
  • Peer Reviewed
• [Journal Article] (2010)
  • Author(s): Y.Yamauchil, T.Baba, T.Yamanel, Y.Takeuchi, H.Takatsuka, H.Muta, K.Uchino, Y.Kawai
  • Journal Title: Phys.Status Solidi C Vol.7 Pages: 549-552
  • Peer Reviewed
• [Journal Article] (2010)
  • Author(s): Y.Kawai, K.Uchino, H.Muta S.Kawai, T.
  • Journal Title: Rowf, Vacuum Vol.84 Pages: 1381-1384
  • Peer Reviewed
• [Journal Article] Dominant Ion Species in VHF SiH_4/H_2 Plasma (2010)
  • Author(s): Y.Yamauchi, T.Baba, T.Yamane, Y.Takeuchi, H.Takatsuka, H.Muta, K.Uchino, Y.Kawai
  • Journal Title: Physica Status Solidi C Volume: 7 Pages: 549-552
  • Peer Reviewed
• [Journal Article] Development of Large Diameter ECR Plasma Source (2010)
  • Author(s): Y.Kawai, K.Uchino, H.Muta, S.Kawai, T.Rowfi
  • Journal Title: Vacuum Volume: 84 Pages: 1381-1384
  • Peer Reviewed
• [Journal Article] (2009)
  • Author(s): Y.Yamauchi, T. Baba, Y. Takeuchi, H.Takatsuka, H.Muta, K.Uchino, Y.Kawai
  • Journal Title: Plasma Process.Polym. Vol.6
  • Peer Reviewed
• [Journal Article] (2009)
  • Author(s): H.Muta, S.Kishida, M.Tanaka, Y.Yamauchi, T.Baba, Y.Takeuchi, H.Takatsuka, Y.Kawai
  • Journal Title: Plasma Process.Polym. Vol.6
  • Peer Reviewed
• [Journal Article] Investigation of Plasma Parameters in a VHF plasma with Narrow Gap under High Gaseous Pressure (2009)
  • Author(s): H.Mita, S.Kishida, M.Tanaka, Y.Yamauchi, T.Baba, Y.Takeuchi, H.Takatsila, Y.Kawai
  • Journal Title: Plasma Processes and Polymers 6 Pages: 792-795
  • Peer Reviewed
• [Journal Article] Development of VHF Plasma Source with Short Discharge Gap for Solar Cells (2009)
  • Author(s): Y.Yamauchi, T.Baba, Y.Takeuchi, H.Takastsuka, H.Muta, K.Uchino, Y.Kawai
  • Journal Title: Plasma Processes and Polymers 6 Pages: 273-277
  • Peer Reviewed
• [Journal Article] Investigation of Plasma Paramclers in a VHF Plasma with Narrow Gapunder High Gaseous Pressure (2009)
  • Author(s): H Muta, S, Kishida, M. Tanaka, Y. Yamauchi, T. Baba. Y. Takcuchi, H. Takatsuka. Y. Kawai
  • Journal Title: Plasma Processes and Polymers 4(印刷中)
  • Peer Reviewed
• [Journal Article] (2008)
  • Author(s): Y.Yamauchi, Y.Takeuchi, H.Takatsuka, H.Yamashita, H.Muta, Y.Kawai
  • Journal Title: Contributions to Plasma Physics Vol.48 Pages: 326-330
  • Peer Reviewed
• [Journal Article] (2008)
  • Author(s): Y.Yamauchi, Y.Takeuchi, H.Takatsuka, Y.Kai, H.Muta, Y.Kawai
  • Journal Title: Surf.Coat.Technol. Vol.202 Pages: 5668-5671
  • Peer Reviewed
• [Journal Article] (2008)
  • Author(s): D.H.Thang, H.Muta, Y.Kawai
  • Journal Title: Thin Solid Films Vol.516 Pages: 4452-4455
  • Peer Reviewed
• [Journal Article] (2008)
  • Author(s): T.Nishnniya, Y.Takeuchi, Y.Yamauchi, H.Takatsuka, T.Shioya, H.Muta, Y.Kawai
  • Journal Title: Thin Solid Films Vol.516 Pages: 4430-4434
  • Peer Reviewed
• [Presentation] Numerical Investigation of VHF Plasmas Produced by a Balanced Power Feeding Method (2011)
  • Author(s): H.Muta, S.Nishida, S.Kuribayashi, K.Uchino, Y.Kawai
  • Organizer: 第3回先進プラズマ科学と窒化物及びナノ材料への応用に関する国際シンポジウム(ISPlasma2011)
  • Place of Presentation: 名古屋工業大学
• [Presentation] Analysis of Si Deposition Using Under-expanded Supersonic Jet in SiH_4/H_2 PE-CVD (2011)
  • Author(s): S.Nishida, Y.Tsunekawa, M.Ukai, D.Ando, N.Okamoto, S.Tanaka, N.Tanaka, J.Nakamura, Y.Nomura, H.Muta, S.Kuribayashi
  • Organizer: 第3回先進プラズマ科学と窒化物及びナノ材料への応用に関する国際シンポジウム(ISPlasma2011)
  • Place of Presentation: 名古屋工業大学
• [Presentation] Characteristics of SiH_4/H_2 VHF Plasma Produced by a Short Gap Discharge (2010)
  • Author(s): T.Nishimiya, T.Yamane, S.Nakao, Y.Takeuchi, Y.Yamauchi, H.Takatsuka, H.Muta, K.Uchino, Y.Kawai
  • Organizer: Twelfth International Conference on Plasma Surface Engineering
  • Place of Presentation: Garmisch-Partenkirchen, (Germany)
  • Year and Date: 2010-09-15
• [Presentation] 高圧狭ギャップVHFプラズマの空間分布特性 (2010)
  • Author(s): 丸尾幸一郎, 高比良将, 牟田浩司, 西田哲, 栗林志頭眞
  • Organizer: 秋季第71回応用物理学会学術講演会
  • Place of Presentation: 長崎大学
  • Year and Date: 2010-09-14
• [Presentation] 高圧狭ギャップVHFプラズマの数値シミュレーション (2010)
  • Author(s): S.Nishida, Y.Tsunekawa, M.Ukai,, D.Ando, N.Okamoto, S.Tanaka, N.Tanaka, J.Nakamura, Y.Nomura, H.Muta, S.Kuribayashi
  • Organizer: 秋季第71回応用物理学会学術講演会
  • Place of Presentation: 長崎大学
  • Year and Date: 2010-09-14
• [Presentation] 不足膨張噴流を用いた非平衡プラズマCVDによるα/μc-Si:H膜成長 (2010)
  • Author(s): 安藤大輔, 中村次郎, 恒川佳寛, 栗林志頭眞, 西田哲, 牟田浩司, 竹内良昭, 山内康弘, 高塚汎
  • Organizer: 電気学会プラズマ研究会
  • Place of Presentation: 県民文化ホール未来会館(岐阜)
  • Year and Date: 2010-08-12
• [Presentation] バラン給電法によるVHFプラズマの特性 (2010)
  • Author(s): 水野健太, 松岡正典, 牟田浩司, 西田哲, 栗林志頭眞, 竹内良昭, 山内康弘, 高塚汎
  • Organizer: 電気学会プラズマ研究会
  • Place of Presentation: 県民文化ホール未来会館(岐阜)
  • Year and Date: 2010-08-12
• [Presentation] 高圧狭ギャップVHFプラズマの空間分布特性 (2010)
  • Author(s): 丸尾幸一郎, 高比良将, 牟田浩司, 西田哲, 栗林志頭眞
  • Organizer: 秋季第71回応用物理学会学術講演会
  • Place of Presentation: 長崎
• [Presentation] 高圧狭ギャップVHFプラズマの数値シミュレーション (2010)
  • Author(s): 高比良将, 丸尾幸一郎, 牟田浩司, 西田哲, 栗林志頭眞
  • Organizer: 秋季第71回応用物理学会学術講演会
  • Place of Presentation: 長崎
• [Presentation] 衝突噴流群を用いた非平衡プラズマCVDによる高速シリコン成膜 (2010)
  • Author(s): 鵜飼正夫, 恒川佳寛, 岡本直樹, 田中翔, 西田哲, 牟田浩司, 栗林志頭眞, 竹内良昭, 山内康弘, 高塚汎
  • Organizer: 秋季第71回応用物理学会学術講演会
  • Place of Presentation: 長崎
• [Presentation] 超音速不足膨張噴流を用いた非平衡プラズマCVDによるSi製膜に及ぼすVHF周波数の影響 (2010)
  • Author(s): 恒川佳寛, 安藤大輔, 中村次郎, 西田哲, 牟田浩司, 栗林志頭眞, 竹内良昭, 山内康弘, 高塚汎
  • Organizer: 秋季第71回応用物理学会学術講演会
  • Place of Presentation: 長崎
• [Presentation] バラン給電法によるVHFプラズマの特性 (2010)
  • Author(s): 水野健太, 松岡正典, 牟田浩司, 西田哲, 栗林志頭眞, 竹内良昭, 山内康弘, 高塚汎
  • Organizer: 電気学会プラズマ研究会
  • Place of Presentation: 岐阜
• [Presentation] 不足膨張噴流を用いた非平衡プラズマCVDによるα/μc-Si:H膜成長 (2010)
  • Author(s): 安藤大輔, 中村次郎, 恒川佳寛, 栗林志頭眞, 西田哲, 牟田浩司, 竹内良昭, 山内康弘, 高塚汎
  • Organizer: 電気学会プラズマ研究会
  • Place of Presentation: 岐阜
• [Presentation] Observation of Negative Ions in VHF SiH_4/H_2 Plasma (2010)
  • Author(s): Y.Kawai, T.Yamane, Y. Takeuchi, Y.Yamauchi, H.Takatsuka, H.Muta, K.Uchino
  • Organizer: 7th International Conference on Reactive Plasmas and 63rd Gaseous Electronics Conference
  • Place of Presentation: Paris (France)
• [Presentation] Characteristics of SiH_4/H_2 VHF Plasma Produced by a Short Gap Discharge (2010)
  • Author(s): T.Nishimiya, T.Yamane, S.Nakao, Y.Takeuchi, Y.Yamauchi, H.Takatsuka, H.Muta, K.Uchino, Y.Kawai
  • Organizer: Twelfth International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen
  • Place of Presentation: Germany
• [Presentation] Control of Large Area VHF Plasma Produced at High Pressure (2010)
  • Author(s): T.Nishimiya, T.Yamane, Y.Takeuchi, Y.Yamauchi, H.Takatsuka, H.Muta, K.Uchino, Y.Kawai
  • Organizer: 10th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 23th SPSM (Symposium on Plasma Science for Materials
  • Place of Presentation: Jeju (Korea)
• [Presentation] Characteristics of VHF Plasma Produced by a Balance Power Feeding Method (2010)
  • Author(s): H.Muta, S.Nishida, S.Kuribayashi, Y.Takeuchi, Y.Yamauchi, H.Takatsuka, K.Uchino, Y.Kawai
  • Organizer: 10th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 23th SPSM (Symposium on Plasma Science for Materials
  • Place of Presentation: Jeju (Korea)
• [Presentation] Proceedings of the 24th European Photovoltaic Solar Energy Conference (Hamburg) (2009)
  • Author(s): Y.Yamauchi, T.Baba, Y.Takeuchi, H.Takatsuka, H.Muta, K.Uchino, Y.Kawai
  • Organizer: 20090000
  • Place of Presentation: 2333-2336
• [Presentation] Dominant ion species in VHF SiH_4/H_2 plasma (2009)
  • Author(s): Y.Yamauchi, T.Baba, T.Yamane, Y.Takeuchi, H.Takatsuka, H.Muta, K.Uchino, Y.Kawai
  • Organizer: 23rd International Conference on Amorphous and Nanocrystalline Semiconductors
  • Place of Presentation: Utrecht, Netherlands
• [Presentation] Investigation of Plasma Parameters in a VHF Plasma with Narrow Gapunder High Gascous Pressure (2008)
  • Author(s): H. Mula. S. Kishida. M. Tanaka, Y. Yamauchi, T. Baba. Y. Takeuchi, H. Takalsuka, Y. Kawai
  • Organizer: The 11^<th> International Conference on Plasma Surface Engineering
  • Place of Presentation: ガルミッシュ・バルテンキルヒェン(ドイツ)
  • Year and Date: 2008-09-17