Nano-crystalline Germanium for Thermo-Photovoltaic

• Project/Area Number: 20560047
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Applied physics, general
• Research Institution: Tokai University
• Principal Investigator: ISOMURA Masao Tokai University, 工学部, 教授 (70365998)
• Project Period (FY): 2008 – 2010
• Project Status: Completed (Fiscal Year 2010)
• Budget Amount: ¥4,810,000 (Direct Cost: ¥3,700,000、Indirect Cost: ¥1,110,000); Fiscal Year 2010: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000); Fiscal Year 2009: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000); Fiscal Year 2008: ¥3,250,000 (Direct Cost: ¥2,500,000、Indirect Cost: ¥750,000)
• Keywords: 熱光発電 / ゲルマニウム / 反応性スパッター / ナノ結晶 / 不活性ガス / 水素 / イオン衝撃 / 結晶性

Research Abstract

We have investigated nano-crystalline germanium as a photovoltaic material. It usually shows no photo-sensitivity became of the strong p-type conduction due to negatively changed grain boundary defects. We could successfully suppress the p-type conduction, due to slight oxygen doping, and show that nano-crystalline germanium is a good candidate of narrow gap materials for photovoltaic devices.

Research Products

• [Journal Article] Microcrystalline Germanium Thin Films Prepared By Reactive RF Sputtering (2010)
  • Author(s): N.Yoshida, Y.Hatano, M.Isomura
  • Journal Title: Sol.Energy Mater.& Sol.Cells 95 Pages: 175-178
  • Peer Reviewed
• [Journal Article] Microcrystalline Germanium Thin Films Prepared By Reactive RF Sputtering (2010)
  • Author(s): N.Yoshida, Y.Hatano, M.Isomura
  • Journal Title: Sol.Energy Mater & Sol.Cells Volume: 95 Pages: 175-178
  • Peer Reviewed
• [Journal Article] Microcrystalline Silicon thin films deposited by the reactive RF magnetron sputtering system (2009)
  • Author(s): Yuki Tomita, Masao Isomura
  • Journal Title: Sol.Energy Mater.& Sol.Cells 93 Pages: 816-819
  • Peer Reviewed
• [Journal Article] Microcrystalline Germanium Thin Films Prepared by the Reactive RF Sputtering (2008)
  • Author(s): M.Sugita, Y.Sano, Y.Tomita, M.Isomura
  • Journal Title: Method J.Non-Cryst Solids 354 Pages: 2113-2116
  • Peer Reviewed
• [Journal Article] Microcrystalline Silicon-Germanium Thin Films Prepared by the Chemical Transport Process Using Hydrogen Radicals (2008)
  • Author(s): H.Kawauchi, M.Isomura, T.Matsui, M.Kondo
  • Journal Title: J.Non-Cryst.Solids 354 Pages: 109-2112
  • Peer Reviewed
• [Journal Article] 反応性スパッター法による微結晶シリコンゲルマニウム半導体薄膜の作製 (2008)
  • Author(s): 磯村雅夫、中村勲
  • Journal Title: J.Vac.Soc.Jpn. 51 Pages: 663-667
  • NAID: 10024407181
  • Peer Reviewed
• [Presentation] 高圧水蒸気処理による多結晶Ge薄膜の膜質改善に関する検討 (2011)
  • Author(s): 鷺坂建, 高津貴大, 磯村雅夫
  • Organizer: 第58回応用物理学関係連合演会
  • Place of Presentation: 神奈川工科大学
  • Year and Date: 2011-03-27
• [Presentation] 微結晶SiGe太陽電池の現状と展望 (2011)
  • Author(s): 磯村雅夫、近藤道夫、松井卓也
  • Organizer: 表面技術協会材料機能ドライプロセス部会第86回例会
  • Place of Presentation: 大田区産業プラザPiO
  • Year and Date: 2011-01-26
• [Presentation] Effects of CO_2 introduction to the reactive RF sputtering processes for micro-crys talline Ge thin films (2010)
  • Author(s): Y.Hatano, N.Yoshida, M.Isomura
  • Organizer: 5th World Conference on Photovoftaic Energy Conversion
  • Place of Presentation: Valencia, Spain
  • Year and Date: 2010-09-06
• [Presentation] 反応性スパッタ法によって作製した微結晶Ge薄膜におけるCO_2添加効果 (2010)
  • Author(s): 片岡拓郎、江川淳一、畑野雄太、吉田直広、磯村雅夫
  • Organizer: 第57回応用物理学関係連合演会
  • Place of Presentation: 東海大学湘南校舎
  • Year and Date: 2010-03-18
• [Presentation] Effects of CO_2 introduction to the reactive RF sputtering processes for micro-crystalline Ge thin films (2010)
  • Author(s): Y.Hatano, N.Yoshida, M.Isomura
  • Organizer: 25th European Photovoltaic Solar Energy Conference and 5th World Conference on Photovoltaic Energy Conversion
  • Place of Presentation: Valencia
• [Presentation] 反応性スパッタ法によって作製した微結晶Ge薄膜におけるCO_2添加効果 (2010)
  • Author(s): 片岡拓郎、江川淳一、畑野雄太、吉田直広、磯村雅夫
  • Organizer: 第57回応用物理学関係連合演会
  • Place of Presentation: 東海大学
• [Presentation] Microcrystalline Germanium Thin Films Prepared By Reactive RF Sputtering (2009)
  • Author(s): N.Yoshida, Y.Hatano, M.Isomura
  • Organizer: 19th International Photovoltaic Science and Engineering
  • Place of Presentation: Jeju, Korea
  • Year and Date: 2009-11-11
• [Presentation] 単結晶Si基板上に形成した非晶質Ge薄膜の固相成長による結晶成長 (2009)
  • Author(s): 井口正太郎、西村友秀、磯村雅夫
  • Organizer: 第70回応用物理学会学術講演会
  • Place of Presentation: 富山大学
  • Year and Date: 2009-09-10
• [Presentation] Crystalline growth of Ge on single crystal Si substrates by solid phase crystallization (2009)
  • Author(s): T.Nishimura, M.Isomura
  • Organizer: 23rd International Conference on Amorphous and Nanocrystalline Semiconductors
  • Place of Presentation: Utrecht, Netherlands
  • Year and Date: 2009-08-25
• [Presentation] Microcrystalline Germanium Thin Films Prepared By Reactive RF Sputtering (2009)
  • Author(s): N.Yoshida, Y.Hatano, M.Isomura
  • Organizer: 19th International Photovoltaic Science and Engineering Conference
  • Place of Presentation: Jeju, Korea, Nov.
• [Presentation] 水素と不活性ガスの混合ガスを用いた反応性RFスパッタ法により作製した微結晶Ge薄膜 (2009)
  • Author(s): 畑野雄太、吉田直弘、磯村雅夫
  • Organizer: 第56回応用物理学関係連合演会
  • Place of Presentation: 筑波大学
• [Presentation] 化学輸送堆積法により作製した微結晶SiGe薄膜における不活性ガス添加効果 (2008)
  • Author(s): 上坂祐介、川内弘美、磯村雅夫
  • Organizer: 第69回応用物理学会学術講演会
  • Place of Presentation: 中部大学
• [Remarks] ホームページ等
  • URL: http://www.ei.u-tokai.ac.jp/Isomura-lab/
• [Remarks]
  • URL: http://www.ei.u-tokai.ac.jp/Isomura-lab/
• [Remarks]
  • URL: http://www.ei.u-tokai.ac.jp/Isomura-lab/
• [Remarks]
  • URL: http://www.ei.u-tokai.ac.jp/Isomura-lab/
• [Patent(Industrial Property Rights)] 多結晶ゲルマニウムおよび多結晶シリコンゲルマニウム (2010)
  • Inventor(s): 磯村雅夫
  • Industrial Property Rights Holder: 学校法人東海大学
  • Filing Date: 2010-03-02
• [Patent(Industrial Property Rights)] 多結晶ゲルマニウムおよび多結晶シリコンゲルマニウム (2010)
  • Inventor(s): 磯村雅夫
  • Industrial Property Rights Holder: 学校法人東海大学
  • Filing Date: 2010-03-02