| Project/Area Number |
20560316
|
|---|
| Research Category |
Grant-in-Aid for Scientific Research (C)
|
| Allocation Type | Single-year Grants |
|---|
| Section | 一般 |
|---|
| Research Field |
Electron device/Electronic equipment
|
|---|
| Research Institution | Gunma University |
|---|
Principal Investigator |
HANAIZUMI Osamu Gunma University, 大学院・工学研究科, 教授 (80183911)
|
|---|
| Co-Investigator(Kenkyū-buntansha) |
MIURA Kenta 群馬大学, 大学院・工学研究科, 准教授 (40396651)
|
|---|
| Co-Investigator(Renkei-kenkyūsha) |
YOSHIKAWA Masahito 独立行政法人日本原子力研究開発機構, 量子ビーム応用研究部門, 研究主幹 (40354948)
|
|---|
| Project Period (FY) |
2008 – 2010
|
| Project Status |
Completed (Fiscal Year 2010)
|
| Budget Amount *help |
¥4,680,000 (Direct Cost: ¥3,600,000、Indirect Cost: ¥1,080,000)
Fiscal Year 2010: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2009: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2008: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
|
|---|
| Keywords | シリコン / ナノ結晶 / イオン注入 / 発光 / フォトニック結晶 / 光デバイス / ナノ結晶シリコン / 紫外発光 |
|---|
| Research Abstract |
We observed ultraviolet (UV)-light emission from Si-ion-implanted fused-silica substrates under an implanting condition different from our previous work. A single UV-light photoluminescence (PL) peak has been achieved. The implantation energy was 80 keV, with the implantation dose 2 x 10^<17> ions/cm^2. The Si-ion-implanted samples were annealed in ambient air at 1100, 1150, 1200, and 1250℃ for 25 min. UV-PL spectra having peaks around a wavelength of 370 nm were observed from all samples at room temperature under excitation using a He-Cd laser (・=325 nm). The maximum intensity was observed after annealing at 1250℃, and the longer wavelength PL peak around 800 nm observed from the samples annealed at 1100 and 1150℃ disappeared by annealing above 1200℃. We have successfully obtained only the UV-light emission peaks by selecting the proper annealing temperatures. UV-light emitting materials are expected to be useful as light sources for next-generation optical-disk systems whose data densities are higher than Blu-ray Disc systems.
|
