Improved deposition technique of nanoparticles on substrates for the better performance of nanopaticle-based devices
Project/Area Number |
20560715
|
Research Category |
Grant-in-Aid for Scientific Research (C)
|
Allocation Type | Single-year Grants |
Section | 一般 |
Research Field |
Reaction engineering/Process system
|
Research Institution | Tohoku University |
Principal Investigator |
TAKAMI Seiichi 東北大学, 多元物質科学研究所, 准教授 (40311550)
|
Co-Investigator(Renkei-kenkyūsha) |
HAYAKAWA Ryoma 物質・材料研究機構, 研究員 (90469768)
|
Project Period (FY) |
2008 – 2010
|
Project Status |
Completed (Fiscal Year 2010)
|
Budget Amount *help |
¥4,680,000 (Direct Cost: ¥3,600,000、Indirect Cost: ¥1,080,000)
Fiscal Year 2010: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
Fiscal Year 2009: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2008: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
|
Keywords | 金属酸化物ナノ粒子 / ナノ粒子デバイス / 有機分子表面修飾 / ボトムゲート基板 / トランジスタ特性 / ナノ粒子堆積膜 / 電界効果トランジスタ / チャネル材料 / n型半導体 |
Research Abstract |
This research aims to realize the electronic devices that use metal oxide nanoparticles as semiconducting materials. The metal oxide nanoparticles, which were drop-cast on to the bottom-gate substrates, acted as a channel layer of a field-effect transistor. This research also developed a method to arrange the metal oxide nanoparticles in a well-defied manner.
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Report
(4 results)
Research Products
(28 results)