High-Speed Defect Measurement of Next-Generation Semiconductor Wafer Using Active Control of Evanescent Light
| Project/Area Number |
20569001
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Production engineering/Processing studies
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| Research Institution | Shizuoka University |
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Principal Investigator |
USUKI Shin Shizuoka University, 若手グローバル研究リーダー育成拠点, 特任助教 (60508191)
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| Project Period (FY) |
2008 – 2010
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| Project Status |
Completed (Fiscal Year 2010)
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| Budget Amount *help |
¥3,830,000 (Direct Cost: ¥3,200,000、Indirect Cost: ¥630,000)
Fiscal Year 2010: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2009: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
Fiscal Year 2008: ¥1,100,000 (Direct Cost: ¥1,100,000)
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| Keywords | 複数画像再構成 / 定在エバネッセント照明 / 空間変調照明 / エバネッセント光 / 欠陥計測 / 超解像 / ナノ計測 / 半導体表面計測 / 複数画像再構成演算 |
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| Research Abstract |
First of all, the experimental apparatus was developed for fundamental verifications in generating and control of standing evanescent illumination, and in super-resolution microscopy based on multiple-image iterative reconstruction. As a result of experiments using scattered light imaging of discrete specimen, basic principles of the proposed method was confirmed. Furthermore, numerical simulations were performed to investigate the relationship between pixel size and resolving power in the proposed microscopic imaging technique. It was found that nano-scale displacements of standing evanescent illumination possibly provided us sub-pixel resolution (sub-pixel spatial sampling). Related works of this research were proposals and efficacy analyses of resolution improvement technique based on active shift of imaging path and wide-field three dimensional structured illumination generation technique using multiple-beam interference.
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Report
(4 results)
Research Products
(32 results)
