| Budget Amount *help |
¥21,190,000 (Direct Cost: ¥16,300,000、Indirect Cost: ¥4,890,000)
Fiscal Year 2011: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
Fiscal Year 2010: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
Fiscal Year 2009: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
Fiscal Year 2008: ¥13,390,000 (Direct Cost: ¥10,300,000、Indirect Cost: ¥3,090,000)
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| Research Abstract |
We investigated plasma enhanced chemical vapor deposition (PECVD) mechanism of an amorphous carbon film with infrared spectroscopy in multiple internal reflection geometry (MIR-IRAS). If methane plasma is used, sp^-hydrocarbon species, such as CH_2CH_3, are main precursors, contributed to film deposition. In the deposition process the relases of hydrogen from the precursors is needed to film growth. On the other hand, sp-hydrocarbon species, such as C_2H are the main precursors if acethylene plasma used. The species can be deposited through addition reaction without the relase of hydrogen. Then, the film deposition rate is higher with acethylene plasma than with methane plasma.
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