| Budget Amount *help |
¥25,610,000 (Direct Cost: ¥19,700,000、Indirect Cost: ¥5,910,000)
Fiscal Year 2010: ¥6,500,000 (Direct Cost: ¥5,000,000、Indirect Cost: ¥1,500,000)
Fiscal Year 2009: ¥6,500,000 (Direct Cost: ¥5,000,000、Indirect Cost: ¥1,500,000)
Fiscal Year 2008: ¥12,610,000 (Direct Cost: ¥9,700,000、Indirect Cost: ¥2,910,000)
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| Research Abstract |
Mesoplasma environment for high rate and low temperature epitaxy was revealed to possess low electron temperature and high ion density characteristics. Atomic hydrogen is also distributed at high concentration uniformly spatially. Nanoclusters, growth precursors for mesoplasma epitaxy, are not affected by a change in the hydrogen partial pressure. These enable us to deposit high quality epitaxial films with no special pre-treatment for substrate prior to deposition, suggesting its advantageous characteristics for large area epitaxial deposition.
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