Stimulated emission from phonon sideband of electron-hole plasma in a ZnO thin film
Project/Area Number |
20760015
|
Research Category |
Grant-in-Aid for Young Scientists (B)
|
Allocation Type | Single-year Grants |
Research Field |
Applied materials science/Crystal engineering
|
Research Institution | Osaka University |
Principal Investigator |
ICHIDA Hideki Osaka University, 先端科学イノベーションセンター, 助教 (50379129)
|
Project Period (FY) |
2008 – 2009
|
Project Status |
Completed (Fiscal Year 2009)
|
Budget Amount *help |
¥4,030,000 (Direct Cost: ¥3,100,000、Indirect Cost: ¥930,000)
Fiscal Year 2009: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2008: ¥2,730,000 (Direct Cost: ¥2,100,000、Indirect Cost: ¥630,000)
|
Keywords | ZnO / 時間分解ダイナミクス / 高密度励起 / 誘導放出 |
Research Abstract |
We have investigated stimulated emission processes in ZnO, which has been intensively studied from the interest in the application of optoelectronic device in a near ultraviolet region. In this work, we report on the existence of the stimulated emission process from a phonon sideband of an electron-hole plasma in a ZnO thin film.
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Report
(3 results)
Research Products
(5 results)