| Project/Area Number |
20860081
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| Research Category |
Grant-in-Aid for Young Scientists (Start-up)
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| Allocation Type | Single-year Grants |
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| Research Field |
Applied materials science/Crystal engineering
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| Research Institution | Kochi University of Technology |
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Principal Investigator |
KAWAHARAMURA Toshiyuki Kochi University of Technology, ナノデバイス研究所, 助教 (00512021)
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| Project Period (FY) |
2008 – 2009
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| Project Status |
Completed (Fiscal Year 2009)
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| Budget Amount *help |
¥3,289,000 (Direct Cost: ¥2,530,000、Indirect Cost: ¥759,000)
Fiscal Year 2009: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2008: ¥1,729,000 (Direct Cost: ¥1,330,000、Indirect Cost: ¥399,000)
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| Keywords | ミスト化学気相成長(CVD)法 / 大気圧プラズマ / 薄膜成長 / 酸化亜鉛(ZnO) / ミスト液滴 / 機能薄膜 / 薄膜エッチング / ミスト / 薄膜食刻(エッチング) / 装置開発 / 大気圧中プラズマ発生 / 表面反応促進 / 結晶成長 / 半導体物性 / ミストCVD法 / 酸化亜鉛薄膜 / ZnO / 新手法開発 |
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| Research Abstract |
A novel low temperature thin-film fabricating method was created and developed using mist chemical vapor deposition with atmospheric-pressure plasma. In the development, the dynamics of the mist droplets at a reaction area were analyzed and the reaction of the mist rapidly proceeded with high reaction efficiency was revealed. Moreover, a novel etching technique using the mist was developed as a related technology. The developed methods can save the usages of chemical resources and total energy.
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