• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to previous page

Investigation of steep-slope transistor using ferroelectric polarization dynamics

Research Project

Project/Area Number 20H00240
Research Category

Grant-in-Aid for Scientific Research (A)

Allocation TypeSingle-year Grants
Section一般
Review Section Medium-sized Section 21:Electrical and electronic engineering and related fields
Research InstitutionJapan Advanced Institute of Science and Technology

Principal Investigator

Tokumitsu Eisuke  北陸先端科学技術大学院大学, 先端科学技術研究科, 教授 (10197882)

Co-Investigator(Kenkyū-buntansha) 藤村 紀文  大阪公立大学, 大学院工学研究科, 教授 (50199361)
森田 行則  国立研究開発法人産業技術総合研究所, エレクトロニクス・製造領域, 研究グループ長 (60358190)
太田 裕之  国立研究開発法人産業技術総合研究所, エレクトロニクス・製造領域, 研究グループ長 (70356640)
右田 真司  国立研究開発法人産業技術総合研究所, エレクトロニクス・製造領域, 総括研究主幹 (00358079)
Project Period (FY) 2020-04-01 – 2023-03-31
Project Status Completed (Fiscal Year 2022)
Budget Amount *help
¥45,500,000 (Direct Cost: ¥35,000,000、Indirect Cost: ¥10,500,000)
Fiscal Year 2022: ¥11,960,000 (Direct Cost: ¥9,200,000、Indirect Cost: ¥2,760,000)
Fiscal Year 2021: ¥14,300,000 (Direct Cost: ¥11,000,000、Indirect Cost: ¥3,300,000)
Fiscal Year 2020: ¥19,240,000 (Direct Cost: ¥14,800,000、Indirect Cost: ¥4,440,000)
Keywords強誘電体 / 分極ダイナミクス / 急峻スロープトランジスタ / 負性容量 / 急峻スイッチトランジスタ
Outline of Research at the Start

本研究では、強誘電体の分極ダイナミクスを利用した急峻スイッチトランジスタの基盤技術を構築して、次世代の低電圧動作トランジスタ実現の新しい指針を示す。現在注目されている強誘電体ゲート負性容量トランジスタには動作原理に不明確な点が多く、また使用されているモデルも単純化されすぎている。本研究では、強誘電体の分極ダイナミクスをフル分極、マイクロ分極、相互作用という観点から把握し、実際の分極の描像を正確に反映した新しいデバイス動作モデルを構築するとともに、実験的にデバイスを試作して立証する。さらに分極およびドメインを制御する技術を開発して、急峻スイッチトランジスタ基盤技術を確立する。

Outline of Final Research Achievements

In this research, we have investigated the operation mechanism of ferroelectric gate transistors, which have steep slope characteristics due to the “negative capacitance”, from the viewpoint of polarization domain dynamics. It is strongly suggested from pulse response analysis of RC circuits and calculation of surface potential of ferroelectric/semiconductor structures that the “negative capacitance” appears with the polarization reversal of the ferroelectric film. It is not always necessary to interpret this phenomenon according to Landau’s phase transition theory. In addition, we have obtained several important results, such as oxidation control during the formation of HfO2-based ferroelectric films, polarization control by nanolaminate structures, and new measurement technique using positive piezoelectric response.

Academic Significance and Societal Importance of the Research Achievements

半導体デバイスの低電圧動作、低消費電力化が求められる中、本研究では急峻なスイッチング特性が得られる強誘電体ゲートトランジスタに関して、従来から言われているランダウの相転移理論上の「負性容量」によるという解釈ではなく、強誘電体の分極反転に伴って発現する現象であることを強く示唆する結果が得られた。これは今後の低電圧動作デバイス設計に大きな指針を与える成果である。また上記に加えて、HfO2系強誘電体膜形成時の酸化状態制御、ナノラミネート構造による物性制御、正圧電応答を用いた新たな測定技術など、今後の当該分野の発展に向けてのいくつかの新たな研究成果が得られた。

Report

(5 results)
  • 2022 Annual Research Report   Final Research Report ( PDF )
  • 2021 Annual Research Report
  • 2020 Comments on the Screening Results   Annual Research Report
  • Research Products

    (59 results)

All 2023 2022 2021 2020

All Journal Article (14 results) (of which Int'l Joint Research: 2 results,  Peer Reviewed: 14 results,  Open Access: 4 results) Presentation (45 results) (of which Int'l Joint Research: 16 results,  Invited: 9 results)

  • [Journal Article] Electrical properties of ferroelectric Y-doped Hf-Zr-O thin films prepared by chemical solution deposition2022

    • Author(s)
      Sasaki Keisuke、Mohit、Hashiguchi Sho、Tokumitsu Eisuke
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 61 Issue: SN Pages: SN1027-SN1027

    • DOI

      10.35848/1347-4065/ac7fda

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Variable-area capacitors controlled by HfO2-based ferroelectric-gate field-effect transistors2022

    • Author(s)
      Miyasako Takaaki、Yoneda Shingo、Hosokura Tadasu、Kimura Masahiko、Tokumitsu Eisuke
    • Journal Title

      Applied Physics Letters

      Volume: 120 Issue: 26 Pages: 262901-262901

    • DOI

      10.1063/5.0089049

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Fabrication of Ferroelectric Gate Thin‐Film Transistors with a Lanthanum‐Doped HZO Gate Insulator and Indium‐Tin‐Oxide Channel via a Solution Process2022

    • Author(s)
      Mohit、Murakami Tatsuya、Tokumitsu Eisuke
    • Journal Title

      physica status solidi (RRL) Rapid Research Letters

      Volume: 2022 Issue: 10 Pages: 2100581-2100581

    • DOI

      10.1002/pssr.202100581

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Enhancement of ferroelectricity in sputtered HZO thin films by catalytically generated atomic hydrogen treatment2022

    • Author(s)
      Mohit、Wen Yuli、Hara Yuki、Migita Shinji、Ota Hiroyuki、Morita Yukinori、Ohdaira Keisuke、Tokumitsu Eisuke
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 61 Issue: SH Pages: SH1004-SH1004

    • DOI

      10.35848/1347-4065/ac5a95

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Improvement of Amorphous InGaZnO Thin-Film Transistor With Ferroelectric ZrOx/HfZrO Gate Insulator by 2 Step Sequential Ar/O2 Treatment2022

    • Author(s)
      Hasan Md Mehedi、Mohit、Islam Md Mobaidul、Bukke Ravindra Naik、Tokumitsu Eisuke、Chu Hye-Yong、Kim Sung Chul、Jang Jin
    • Journal Title

      IEEE Electron Device Letters

      Volume: 43 Issue: 5 Pages: 725-728

    • DOI

      10.1109/led.2022.3162325

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed / Int'l Joint Research
  • [Journal Article] Anomalous change of carrier transport property of ferroelectric Hf0.5Zr0.5O2 thin films in the first poling treatment2022

    • Author(s)
      Morita Yukinori、Ota Hiroyuki、Migita Shinji
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 61 Issue: SC Pages: SC1070-SC1070

    • DOI

      10.35848/1347-4065/ac48ce

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Impact of reduced pressure crystallization on ferroelectric properties in hafnium-zirconium dioxide films deposited by sputtering2021

    • Author(s)
      Hara Yuki、Mohit、Murakami Tatsuya、Migita Shinji、Ota Hiroyuki、Morita Yukinori、Tokumitsu Eisuke
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 60 Issue: SF Pages: SFFB05-SFFB05

    • DOI

      10.35848/1347-4065/ac1250

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] High performance ferroelectric ZnO thin film transistor using AlOx/HfZrO/ZrOx gate insulator by spray pyrolysis2021

    • Author(s)
      Hasan Md Mehedi、Mohit、Bae Jinbaek、Tokumitsu Eisuke、Chu Hye-Yong、Kim Sung Chul、Jang Jin
    • Journal Title

      Applied Physics Letters

      Volume: 119 Issue: 9 Pages: 093502-093502

    • DOI

      10.1063/5.0058127

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed / Int'l Joint Research
  • [Journal Article] Time‐Dependent Imprint in Hf0.5Zr0.5O2 Ferroelectric Thin Films2021

    • Author(s)
      Takada Kenshi、Takarae Shuya、Shimamoto Kento、Fujimura Norifumi、Yoshimura Takeshi
    • Journal Title

      Advanced Electronic Materials

      Volume: 7 Issue: 8 Pages: 2100151-2100151

    • DOI

      10.1002/aelm.202100151

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Investigation of the wake-up process and time-dependent imprint of Hf0.5Zr0.5O2 film through the direct piezoelectric response2021

    • Author(s)
      Takada Kenshi、Murase Mikio、Migita Shinji、Morita Yukinori、Ota Hiroyuki、Fujimura Norifumi、Yoshimura Takeshi
    • Journal Title

      Applied Physics Letters

      Volume: 119 Issue: 3 Pages: 032902-032902

    • DOI

      10.1063/5.0047104

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Indium oxide and indium-tin-oxide channel ferroelectric gate thin film transistors with yttrium doped hafnium-zirconium dioxide gate insulator prepared by chemical solution process2021

    • Author(s)
      Mohit、Miyasako Takaaki、Tokumitsu Eisuke
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 60 Issue: SB Pages: SBBM02-SBBM02

    • DOI

      10.35848/1347-4065/abd6da

    • Related Report
      2020 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Thermal stability of ferroelectricity in hafnium?zirconium dioxide films deposited by sputtering and chemical solution deposition for oxide-channel ferroelectric-gate transistor applications2021

    • Author(s)
      Mohit、Migita Shinji、Ota Hiroyuki、Morita Yukinori、Tokumitsu Eisuke
    • Journal Title

      Applied Physics Express

      Volume: 14 Issue: 4 Pages: 041006-041006

    • DOI

      10.35848/1882-0786/abebf4

    • Related Report
      2020 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Electrical properties of yttrium-doped hafnium-zirconium dioxide thin films prepared by solution process for ferroelectric gate insulator TFT application2020

    • Author(s)
      Mohit、Haga Ken-ichi、Tokumitsu Eisuke
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 59 Issue: SM Pages: SMMB02-SMMB02

    • DOI

      10.35848/1347-4065/ab86de

    • Related Report
      2020 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Impact of annealing environment on electrical properties of yttrium-doped hafnium zirconium dioxide thin films prepared by the solution process2020

    • Author(s)
      Mohit、Murakami Tatsuya、Haga Ken-ichi、Tokumitsu Eisuke
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 59 Issue: SP Pages: SPPB03-SPPB03

    • DOI

      10.35848/1347-4065/aba50b

    • Related Report
      2020 Annual Research Report
    • Peer Reviewed
  • [Presentation] 酸化物半導体デバイスへの期待―強誘電体ゲートトランジスタを中心として-2023

    • Author(s)
      徳光永輔
    • Organizer
      第70回応用物理学会春季学術講演会
    • Related Report
      2022 Annual Research Report
    • Invited
  • [Presentation] HfO2-ZrO2 Nanolaminate構造における強誘電相の生成促進2023

    • Author(s)
      右田真司、太田裕之、浅沼周太郎、森田行則、鳥海明
    • Organizer
      第70回応用物理学会春季学術講演会
    • Related Report
      2022 Annual Research Report
    • Invited
  • [Presentation] 製膜後の最初の電界印加によって誘起されるHf0.5Zr0.5O2薄膜の伝導特性の変化および強誘電化2023

    • Author(s)
      森田行則、女屋崇、浅沼周太郎、太田裕之、右田真司
    • Organizer
      第70回応用物理学会春季学術講演会
    • Related Report
      2022 Annual Research Report
  • [Presentation] 圧電MEMS振動子によるリザバーコンピューティング2023

    • Author(s)
      吉村 武, 芳賀 大樹, 藤村 紀文, 神田 健介, 神野 伊策
    • Organizer
      第70回応用物理学会学術講演会
    • Related Report
      2022 Annual Research Report
  • [Presentation] 正圧電応答顕微鏡法を用いた電極下分極ドメイン観察における空間分解能2023

    • Author(s)
      萩原 拓永, トープラサートポン カシディット,高木 信一, 藤村 紀文, 吉村 武
    • Organizer
      第70回応用物理学会学術講演会
    • Related Report
      2022 Annual Research Report
  • [Presentation] 複数圧電振動子でのリザバーコンピューティング2023

    • Author(s)
      庄野 武洋, 芳賀 大樹, 藤村 紀文, 吉村 武
    • Organizer
      第70回応用物理学会学術講演会
    • Related Report
      2022 Annual Research Report
  • [Presentation] ALD法によりGa2O3基板上に作製したHfZrO2薄膜の結晶化過程Ⅱ2023

    • Author(s)
      内藤 圭吾, 山口 晃一, 吉村 武, 藤村 紀文
    • Organizer
      第70回応用物理学会学術講演会
    • Related Report
      2022 Annual Research Report
  • [Presentation] 基板近傍に成長空間を制限して作製したHfO2薄膜のALD成長機構2023

    • Author(s)
      市川 龍斗, 宝栄 周弥, 内藤 圭吾, 吉村 武, 藤村 紀文
    • Organizer
      第70回応用物理学会学術講演会
    • Related Report
      2022 Annual Research Report
  • [Presentation] Ferroelectric gate thin films transistors with Y-doped Hf-Zr-O gate insulator and In-Sn-O channel2022

    • Author(s)
      E. Tokumitsu, Y. Kubota, Mohit, K. Sasaki
    • Organizer
      14th Japan-China Symposium on Ferroelectric Materials and Their Applicatiopns (JCFMA-14),
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] 溶液プロセスによるIn-Sn-O(ITO)薄膜の形成と強誘電体ゲート薄膜トランジスタへの応用2022

    • Author(s)
      久保田剛郎、徳光永輔
    • Organizer
      第19回薄膜材料デバイス研究会
    • Related Report
      2022 Annual Research Report
  • [Presentation] 化学溶液堆積法によるHf-Zr-O膜へのドーピングと強誘電性評価2022

    • Author(s)
      橋口 渉、徳光永輔
    • Organizer
      第19回薄膜材料デバイス研究会
    • Related Report
      2022 Annual Research Report
  • [Presentation] HfO2-based ferroelectric-gated variable-area capacitors2022

    • Author(s)
      Takaaki Miyasako, Shingo Yoneda, Tadasu Hoisokura, Masahiko Kimura, Eisuke Tokumitsu
    • Organizer
      2022 International Conference on Solid State Devices and Materials
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] ITO Channel Thin Film Transistor using Solution-Derived Ferroelectric Hf-Zr-O Gate Insulator2022

    • Author(s)
      Eisuke Tokumitsu
    • Organizer
      13th Korea-Japan Conference on Ferroelectrics
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] 溶液プロセスによる薄膜CeOx/(Hf,Zr)O2/CeOx積層構造の形成2022

    • Author(s)
      齋藤 瑞、モヒート、東嶺 孝一、徳光 永輔
    • Organizer
      日本ゾルゲル学会第20回討論会
    • Related Report
      2022 Annual Research Report
  • [Presentation] 原子状水素処理を用いたスパッタHf-Zr-O膜の強誘電特性改善2022

    • Author(s)
      徳光永輔、モヒート、文 昱力、原 佑樹、右田真司、太田裕之、森田行則、大平圭介
    • Organizer
      第19回Cat-CVD研究会
    • Related Report
      2022 Annual Research Report
    • Invited
  • [Presentation] Yドープ Hf-Zr-O 薄膜の化学溶液堆積における仮焼成の効果2022

    • Author(s)
      佐々木啓介、モヒート、徳光永輔
    • Organizer
      第39回強誘電体会議
    • Related Report
      2022 Annual Research Report
  • [Presentation] Perspective of ferroelectric-HfO2 materials for electron device applications2022

    • Author(s)
      Shinji Migita
    • Organizer
      2022 Silicon Nanoelectronics Workshop
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] HfO2-ZrO2 Laminate構造か強誘電相生成をアシストするメカニズム2022

    • Author(s)
      右田真司、森田行則、浅沼周太郎、太田裕之、齊藤雄太
    • Organizer
      第83回応用物理学会秋季学術講演会
    • Related Report
      2022 Annual Research Report
  • [Presentation] Transition of Ferroelectric and Antiferroelectric Properties in Atomic-Scale-Engineered HfO2 and ZrO2 Superlattice Films2022

    • Author(s)
      Shinji Migita, Shutaro Asanuma, Yuta Saito, Yukinori Morita, and Hiroyuki Ota
    • Organizer
      International Microprocesses and Nanotechnology Conferences
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] 正圧電応答顕微鏡法によるHfO2薄膜の分極ドメイン構造の観察Ⅱ2022

    • Author(s)
      萩原 拓永, Kasidit Toprasertpong, 高木信一, 藤村 紀文, 吉村 武
    • Organizer
      第83回応用物理学会秋季学術講演会
    • Related Report
      2022 Annual Research Report
  • [Presentation] ALD法によりGa2O3基板上に作製したHfZrO2薄膜の結晶化過程2022

    • Author(s)
      内藤 圭吾, 山口 晃一, 吉村 武, 藤村 紀文
    • Organizer
      第83回応用物理学会秋季学術講演会
    • Related Report
      2022 Annual Research Report
  • [Presentation] 機能性セラミックス薄膜の新規なプロセッシングと物性制御2022

    • Author(s)
      藤村 紀文
    • Organizer
      フルラス・岡崎記念会 2022年度定期総会・講演会
    • Related Report
      2022 Annual Research Report
    • Invited
  • [Presentation] Recent Progress of Hafnium Oxide based Ferroelectric Thin Films for Microelectronics2022

    • Author(s)
      N. Fujimura
    • Organizer
      8th International Symposium on Transparent Conductive Materials & 12th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] ポーリング処理前後における強誘電性Hf0.5Zr0.5O2薄膜の不可逆的な伝導特性変化2022

    • Author(s)
      森田行則、太田裕之、右田真司
    • Organizer
      第27回 電子デバイス界面テクノロジー研究会 (EDIT27)
    • Related Report
      2021 Annual Research Report
  • [Presentation] 正圧電応答顕微鏡法によるHfO2薄膜の分極ドメイン構造の観察2022

    • Author(s)
      萩原 拓永, 森田 行則, 太田 裕之, 右田 真司, 藤村 紀文, 吉村 武
    • Organizer
      第69回応用物理学会春季学術講演会
    • Related Report
      2021 Annual Research Report
  • [Presentation] Preparation of ferroelectric lanthanum doped hafnium-zirconium oxide thin films by solution process2021

    • Author(s)
      Mohit and Eisuke Tokumitsu
    • Organizer
      The 8th International Symposium on Organic and Inorganic Materials and Related Nanotechnologies (EM-NANO 2021)
    • Related Report
      2021 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Comparison of electrical properties of indium-tin-oxide channel ferroelectric-gate thin film transistors using solution processed and sputtered Hf-Zr-O2021

    • Author(s)
      Mohit, Shinji Migita, Hiroyuki Ota, Yukinori Morita and Eisuke Tokumitsu
    • Organizer
      2021 International Conference on Solid State Devices and Materials
    • Related Report
      2021 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Ferroelectric gate thin film transistor with La-HZO gate insulator and indium-tin-oxide channel prepared by solution process2021

    • Author(s)
      Mohit, and Eisuke Tokumitsu
    • Organizer
      European Materials Research Society
    • Related Report
      2021 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Enhancement of ferroelectricity in sputtered hafnium-zirconium oxide thin films by catalytically generated atomic hydrogen treatment2021

    • Author(s)
      Mohit, Yuli Wen, Yuki Hara, Shinji Migita, Hiroyuki Ota, Yukinori Morita, Keisuke Ohdaira and Eisuke Tokumitsu
    • Organizer
      2021 International Wiorkshop on Dielectric Thin Films for Future Electron Devices: Science and Technology
    • Related Report
      2021 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Yttrium Doping Concentration Dependence on Ferroelectric Properties of Hafnium-Zirconium Oxide Prepared by Chemical Solution Deposition2021

    • Author(s)
      Keisuke Sasaki, Mohit, and Eisuke Tokumitsu
    • Organizer
      Materials Research Meeting 2021
    • Related Report
      2021 Annual Research Report
    • Int'l Joint Research
  • [Presentation] 化学溶液プロセスによるYドープHZO薄膜の作製と評価2021

    • Author(s)
      佐々木啓介、モヒート、徳光永輔
    • Organizer
      第82回応用物理学会秋季学術講演会
    • Related Report
      2021 Annual Research Report
  • [Presentation] 溶液プロセスによるCeOx/ Hf-Zr-O積層構造の形成と評価2021

    • Author(s)
      齋藤 瑞、Mohit、徳光永輔
    • Organizer
      第82回応用物理学会秋季学術講演会
    • Related Report
      2021 Annual Research Report
  • [Presentation] スパッタHf-Zr-O膜における強誘電性の安定性向上2021

    • Author(s)
      原 佑樹, モヒート, 右田 真司 , 太田 裕之, 森田 裕史, 徳光 永輔
    • Organizer
      第38回強誘電体会議
    • Related Report
      2021 Annual Research Report
  • [Presentation] Carrier Transport properties of Ferroelectric Hf0.5Zr0.5O2 Thin Films in Poling Treatment2021

    • Author(s)
      Yukinori Morita, Hiroyuki Ota, Shinji Migita
    • Organizer
      2021 International Conference on Solid State Devices and Materials
    • Related Report
      2021 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Why do the HfO2-based ferroelectric thin films show unique properties? - Negative Capacitance, Wake-up Process and Time-dependent Imprint -2021

    • Author(s)
      Norifumi FUJIMURA
    • Organizer
      Materials Research Meeting 2021 (MRM2021)
    • Related Report
      2021 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] Fabrication of ferroelectric gate thin film transistors using CSD Y-HZO and sputtered HZO with sputtered ITO channel2021

    • Author(s)
      Mohit, Shinji Migita, Hiroyuki Ota, Yukinori Morita, Eisuke Tokumitsu
    • Organizer
      第68回応用物理学会春季学術講演会
    • Related Report
      2020 Annual Research Report
  • [Presentation] Fabrication of Indium-Tin-Oxide Channel Ferroelectric-Gate Thin Film Transistors using Yttrium Doped Hafnium-Zirconium Dioxide by Chemical Solution Process2020

    • Author(s)
      Mohit, Takaaki Miyasako and Eisuke Tokumitsu
    • Organizer
      2020 International Conference on Solid State Devices and Materials
    • Related Report
      2020 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Robustness of Ferroelectricity in Hafnium- Zirconium Dioxide Films Deposited By Sputtering and Chemical Solution Deposition for Ferroelectric Transistor Applications2020

    • Author(s)
      Mohit, S. Migita, H. Ota, Y. Morita, and E. Tokumitsu
    • Organizer
      PRiME (Pacific Rim Meeting on Electrochemical & Solid State Science) 2020
    • Related Report
      2020 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Effect of Annealing Environment on Ferroelectric Properties of Hf-Zr-O (HZO) Thin Films Prepared by Solution Process2020

    • Author(s)
      Mohit,Ken-Ichi Haga,Eisuke Tokumitsu
    • Organizer
      第37回強誘電体会議
    • Related Report
      2020 Annual Research Report
  • [Presentation] Ferroelectric Properties of Hafnium-Zirconium-Dioxide Prepared by Chemical Solution Process for MFM and MFS Structures2020

    • Author(s)
      Mohit,Eisuke Tokumitsu
    • Organizer
      第81回応用物理学会秋季学術講演会
    • Related Report
      2020 Annual Research Report
  • [Presentation] 強誘電体薄膜Hf0.5Zr0.5O2およびHfO2の強誘電特性の比較2020

    • Author(s)
      森田行則、太田裕之、右田真司
    • Organizer
      2020年日本表面真空学会 学術講演会
    • Related Report
      2020 Annual Research Report
  • [Presentation] Formation Process of Metastable Phases of Al-Doped HfO2 Films Directly on Si by Atomic Layer Deposition2020

    • Author(s)
      Shuya Takarae, Kenshi Takada, Yuki Saho, Takeshi Yoshimura, Norifumi Fujimura
    • Organizer
      Joint Conference of the IEEE International Frequency Control Symposium & IEEE International Symposium on Applications of Ferroelectrics
    • Related Report
      2020 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Si直上Y:HfO2エピタキシャル薄膜の界面誘電特性2020

    • Author(s)
      佐保 勇樹, 宝栄 周弥, 高田 賢志, 吉村 武, 藤村 紀文
    • Organizer
      第81回応用物理学会秋季学術講演会
    • Related Report
      2020 Annual Research Report
  • [Presentation] ALD法を用いて作成したSi直上Al:HfO2準安定相の結晶化過程2020

    • Author(s)
      宝栄 周弥, 桐谷 乃輔, 吉村 武, 芦田 淳, 藤村 紀文
    • Organizer
      第81回応用物理学会秋季学術講演会
    • Related Report
      2020 Annual Research Report
  • [Presentation] Formation of the metastable phase of HfxZr1-xO2 ferroelectric films deposited by atomic layer deposition method2020

    • Author(s)
      K. Takada, S. Takarae, T. Yoshimura, and N. Fujimura
    • Organizer
      第39回電子材料シンポジウム
    • Related Report
      2020 Annual Research Report

URL: 

Published: 2020-04-28   Modified: 2024-01-30  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi