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Development of ultra-low power neural network chips using non-volatile tunnel FET memory

Research Project

Project/Area Number 20H02193
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Review Section Basic Section 21060:Electron device and electronic equipment-related
Research InstitutionTohoku University

Principal Investigator

Kino Hisashi  東北大学, 医工学研究科, 特任准教授 (10633406)

Co-Investigator(Kenkyū-buntansha) 田中 徹  東北大学, 医工学研究科, 教授 (40417382)
福島 誉史  東北大学, 工学研究科, 准教授 (10374969)
Project Period (FY) 2020-04-01 – 2023-03-31
Project Status Completed (Fiscal Year 2022)
Budget Amount *help
¥17,550,000 (Direct Cost: ¥13,500,000、Indirect Cost: ¥4,050,000)
Fiscal Year 2022: ¥5,200,000 (Direct Cost: ¥4,000,000、Indirect Cost: ¥1,200,000)
Fiscal Year 2021: ¥6,110,000 (Direct Cost: ¥4,700,000、Indirect Cost: ¥1,410,000)
Fiscal Year 2020: ¥6,240,000 (Direct Cost: ¥4,800,000、Indirect Cost: ¥1,440,000)
Keywordsスパイキングニューラルネットワーク / トンネルFET / 不揮発性メモリ / STDP / SNN / ニューラルネットワーク / 半導体メモリ
Outline of Research at the Start

本研究ではシナプスの特性を再現した不揮発性トンネルFETメモリによる大規模ニューラルネットワークの低消費電力化を目指す。近年、脳の階層的情報処理を模したディープニューラルネットワークの活躍は目覚ましいものがある。一方で、神経細胞の発火スパイクの影響まで模したスパイキングニューラルネットワークには次世代の大規模ニューラルネットワークとして高い関心が寄せられており、様々なメモリデバイスによるシナプスの再現が提案されている。本研究ではこれまでのメモリにない特長を有する不揮発性トンネルFETメモリを活用した大規模な超低消費電力ニューラルネットワークを研究開発する。

Outline of Final Research Achievements

In this study, we proposed a non-volatile tunnel FET memory as a memory element for constructing next-generation large-scale neural networks with ultra-low power consumption. Then, we fabricated them.
We confirmed that the fabricated devices can reproduce synaptic "weight" retention by retaining electric charge. We also confirmed that the steep subthreshold slope characteristic, one of our goals, can be realized by the tunnel FET structure. We also attempted to reproduce the STDP property, which is a change in synaptic strength that depends on the spike timing of neurons. We have confirmed that the fabricated devices can reproduce both symmetric and asymmetric STDP characteristics.
We believe that we have achieved our initial goal. We will continue our research to realize of SNN with non-volatile tunnel FET memories.

Academic Significance and Societal Importance of the Research Achievements

半導体集積回路は、今日の高度情報化社会の基盤技術として多くの人々の生活を支えている。近年では集積回路に脳の神経回路網(ニューラルネットワーク)の動作機構を取り入れ、柔軟な処理に対する性能を向上させようとする取り組みが近年活発に行われている。
しかし、取り扱うデータが大規模になるにつれ、ニューラルネットワークへの大規模化と低消費電力化の要望は増大している。本研究で開発した不揮発性トンネルFETメモリは大規模化と低消費電力化の両立のための有望な候補であり、今後のニューラルネットワークの進展に大きく貢献すると考えられる。

Report

(4 results)
  • 2022 Annual Research Report   Final Research Report ( PDF )
  • 2021 Annual Research Report
  • 2020 Annual Research Report
  • Research Products

    (6 results)

All 2023 2022 2021

All Journal Article (3 results) (of which Peer Reviewed: 3 results,  Open Access: 3 results) Presentation (3 results) (of which Int'l Joint Research: 3 results)

  • [Journal Article] Enhancement of carrier mobility in metal-oxide semiconductor field-effect transistors using negative thermal expansion gate electrodes2022

    • Author(s)
      Kino Hisashi、Fukushima Takafumi、Tanaka Tetsu
    • Journal Title

      Applied Physics Express

      Volume: 15 Issue: 11 Pages: 111004-111004

    • DOI

      10.35848/1882-0786/ac9d24

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Electrochemical characterization of ZnO-based transparent materials as recording electrodes for neural probes in optogenetics2022

    • Author(s)
      Miwa Yuki、Kino Hisashi、Fukushima Takafumi、Tanaka Tetsu
    • Journal Title

      Journal of Vacuum Science & Technology B

      Volume: 40 Issue: 5 Pages: 052202-052202

    • DOI

      10.1116/6.0001836

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] High-thermal-stability resistor formed from manganese nitride compound that exhibits the saturation state of the mean free path2021

    • Author(s)
      Kino Hisashi、Fukushima Takafumi、Tanaka Tetsu
    • Journal Title

      Applied Physics Express

      Volume: 14 Issue: 9 Pages: 091003-091003

    • DOI

      10.35848/1882-0786/ac18b0

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed / Open Access
  • [Presentation] Negative-Thermal-Expansion Gate Electrode to Introduce Tensile Strain into the Channel of MOSFETs for Mobility Enhancement2023

    • Author(s)
      Hisashi Kino, Takafumi Fukushima, Tetsu Tanaka
    • Organizer
      2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Developing a Low-Temperature Flip-Chip Bonding Technology with In/Au Microbumps to Suppress the Thermal Load on Spintronics Devices2022

    • Author(s)
      Hisashi Kino, Takafumi Fukushima, Tetsu Tanaka
    • Organizer
      2022 IEEE International Interconnect Technology Conference (IITC)
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Development of Manganese Nitride Resistor with Near-Zero Temperature-Coefficient of Resistance to Achieve High-Thermal-Stability ICs2021

    • Author(s)
      Hisashi Kino
    • Organizer
      2021IEEE International Interconnect Technology Conference, IITC 2021
    • Related Report
      2021 Annual Research Report
    • Int'l Joint Research

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Published: 2020-04-28   Modified: 2024-01-30  

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