• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to previous page

Creation of Metal Ultrafine Fabrication Materials and Processes for Realization of Direct Lithography

Research Project

Project/Area Number 20H02489
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Review Section Basic Section 26050:Material processing and microstructure control-related
Research InstitutionNational Institutes for Quantum Science and Technology

Principal Investigator

YAMAMOTO HIROKI  国立研究開発法人量子科学技術研究開発機構, 高崎量子応用研究所 量子機能創製研究センター, 主幹研究員 (00516958)

Project Period (FY) 2020-04-01 – 2023-03-31
Project Status Completed (Fiscal Year 2023)
Budget Amount *help
¥17,680,000 (Direct Cost: ¥13,600,000、Indirect Cost: ¥4,080,000)
Fiscal Year 2022: ¥4,810,000 (Direct Cost: ¥3,700,000、Indirect Cost: ¥1,110,000)
Fiscal Year 2021: ¥5,850,000 (Direct Cost: ¥4,500,000、Indirect Cost: ¥1,350,000)
Fiscal Year 2020: ¥7,020,000 (Direct Cost: ¥5,400,000、Indirect Cost: ¥1,620,000)
Keywords材料・加工 / 半導体微細化 / ナノ加工 / ナノ材料 / レジスト材料 / リソグラフィ / レジスト
Outline of Research at the Start

人工知能など情報技術を支えるコンピュータ性能の更なる向上のため、次世代リソグラフィ技術では10nm未満の加工が必要不可欠である。従来の紫外光から、電離作用を引き起こす極端紫外光(EUV)や電子線(EB)など量子ビーム利用が求められているが、レジスト材料の要求性能を向上させる設計指針がない。本研究では、量子ビームに対応した新規レジスト材料として金属酸化物ナノ粒子レジストに着目し、量子ビームによるナノ空間で誘起される物理・化学過程を解析することで高感度、高解像度を達成し、シングルナノパターンの熱処理による金属ナノ配線の創製技術を確立することを目指す。

Outline of Final Research Achievements

In order to improve the performance of computer, which support IT such as artificial intelligence, it is essential for next generation lithography to achieve less than 10 nm ultrafine fabrication technique. In this study, six kinds of hybrid inorganic-organic resist materials were synthesized and examined the lithographic performances of sensitivity, resolution using extreme ultraviolet (EUV) exposure tool and electron beam (EB) lithography system. In the case of all hybrid inorganic-organic resist materials, the phenomena induced by EB account for a negative tone resist because the exposed areas undergo a crosslinking reaction. Hf-based metal resists showed best resolution and sensitivity compared to commercial ZEP 520A. Also, it was clarified metal resists remained after annealing and etch durability increased by annealing metal resists. From these studies, the knowledge for realization for ultrafine patterns with less than 10 nm for direct lithography was obtained.

Academic Significance and Societal Importance of the Research Achievements

本研究はメタルレジストと極端紫外線(EUV)や電子線(EB)といった電離放射線との反応性および、メタルレジストのアグリゲーションの現象を解明する点で、学術的に高い意義がある。また、本研究のダイレクトリソグラフィの実現を指向した金属極細線加工材料・プロセスの創出で得られた研究成果は、最先端の半導体リソグラフィでも現在のところ開発の糸口さえ掴めていない10 nm未満の加工を1nm以下の精度で行うことができる新しい微細加工材料の開発につながり、将来のナノテクノロジーあるいはナノサイエンスの産業応用の実現に繋がるダイレクトリソグラフィのような新規微細加工技術として期待される。

Report

(4 results)
  • 2023 Final Research Report ( PDF )
  • 2022 Annual Research Report
  • 2021 Annual Research Report
  • 2020 Annual Research Report
  • Research Products

    (16 results)

All 2024 2023 2022 2021 2020 Other

All Int'l Joint Research (1 results) Journal Article (4 results) (of which Int'l Joint Research: 1 results,  Peer Reviewed: 4 results,  Open Access: 1 results) Presentation (10 results) (of which Int'l Joint Research: 3 results,  Invited: 4 results) Patent(Industrial Property Rights) (1 results)

  • [Int'l Joint Research] University of Birmingham(英国)

    • Related Report
      2020 Annual Research Report
  • [Journal Article] A study on the resist performance of inorganic-organic resist materials for EUV and electron-beam lithography2024

    • Author(s)
      Yamamoto Hiroki、Ito Yuko Tsutsui、Okamoto Kazumasa、Shimoda Shuhei、Kozawa Takahiro
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 63 Issue: 4 Pages: 04SP87-04SP87

    • DOI

      10.35848/1347-4065/ad38c5

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Competitive coexistence of ferromagnetism and metal insulator transition of VO2 nanoparticles2024

    • Author(s)
      Hatano Tsuyoshi、Fukawa Akihiro、Yamamoto Hiroki、Akiba Keiichirou、Demura Satoshi、Takase Kouichi
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 63 Issue: 4 Pages: 04SP07-04SP07

    • DOI

      10.35848/1347-4065/ad2d04

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Study on Irradiation Effects by Femtosecond-pulsed Extreme Ultraviolet in Resist Materials2021

    • Author(s)
      Hosaka Yuji、Yamamoto Hiroki、Ishino Masahiko、Dinh Thanh-Hung、Nishikino Masaharu、Kon Akira、Owada Shigeki、Inubushi Yuichi、Kubota Yuya、Maekawa Yasunari
    • Journal Title

      Journal of Photopolymer Science and Technology

      Volume: 34 Issue: 1 Pages: 95-98

    • DOI

      10.2494/photopolymer.34.95

    • NAID

      130008119663

    • ISSN
      0914-9244, 1349-6336
    • Year and Date
      2021-06-11
    • Related Report
      2021 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Lamellar Orientation of a Block Copolymer via an Electron-Beam Induced Polarity Switch in a Nitrophenyl Self-Assembled Monolayer or Si Etching Treatments2020

    • Author(s)
      Yamamoto Hiroki、Dawson Guy、Kozawa Takahiro、Robinson Alex P. G.
    • Journal Title

      Quantum Beam Science

      Volume: 4 Issue: 2 Pages: 1-10

    • DOI

      10.3390/qubs4020019

    • Related Report
      2020 Annual Research Report
    • Peer Reviewed / Open Access / Int'l Joint Research
  • [Presentation] Study on Resist Performance of Inorganic-Organic Resist Materials for EUV and EB Lithography2024

    • Author(s)
      Hiroki Yamamoto, Yuko Tsutsui Ito, Kazumasa Okamoto and Takahiro Kozawa
    • Organizer
      SPIE Advanced Lithography + Patterning 2024
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] フォトリソグラフィと電子線リソグラフィのメタルレジストの リソグラフィ特性における基礎研究2023

    • Author(s)
      山本 洋揮,古澤孝弘
    • Organizer
      第84回応用物理学会秋季学術講演会
    • Related Report
      2022 Annual Research Report
  • [Presentation] メタルレジストのレジスト性能に関する研究2023

    • Author(s)
      山本洋揮,岡本一将,古澤孝弘,前川康成
    • Organizer
      第66回放射線化学討論会
    • Related Report
      2022 Annual Research Report
  • [Presentation] レジスト材料における超短パルスEUV照射効果に関する研究2023

    • Author(s)
      山本洋揮,保坂勇志,石野雅彦,ヂンタンフン,古澤 孝弘,前川康成
    • Organizer
      第72回高分子討論会
    • Related Report
      2022 Annual Research Report
    • Invited
  • [Presentation] Study on Resist Performance of Inorganic-Organic Resist Materials for EUV and EB Lithography2023

    • Author(s)
      Hiroki Yamamoto, Yuko Tsutsui Ito, Kazumasa Okamoto and Takahiro Kozawa
    • Organizer
      36th International Microprocesses and Nanotechnology Conference (MNC 2023)
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Study on Irradiation Effects by Femtosecond-pulsed Extreme Ultraviolet in Resist Materials2021

    • Author(s)
      Hiroki Yamamoto、Yuji Hosaka、Ishino Masahiko、Dinh Thanh-Hung、Nishikino Masaharu、Kon Akira、Owada Shigeki、Inubushi Yuichi、Kubota Yuya、Maekawa Yasunari
    • Organizer
      The 38th International Conference of Photopolymer Science and Technology, Online meeting
    • Related Report
      2021 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] 最先端量子ビームによる次世代リソグラフィ材料・プロセスの開発2021

    • Author(s)
      山本洋揮
    • Organizer
      第18回放射線プロセスシンポジウム
    • Related Report
      2021 Annual Research Report
    • Invited
  • [Presentation] 金ナノパターン上のジチオールで修飾した金属ナノ粒子の配列制御2021

    • Author(s)
      山本洋揮
    • Organizer
      第68回 応用物理学春季学術講演会
    • Related Report
      2020 Annual Research Report
  • [Presentation] 電子線によるポリマー膜中の金属ナノ粒子の生成およびパターニングに関する研究2020

    • Author(s)
      山本 洋揮
    • Organizer
      第69回高分子学会年次大会
    • Related Report
      2020 Annual Research Report
  • [Presentation] 電子ビーム照射による有機・無機ハイブリッド微細パターンの直接形成2020

    • Author(s)
      山本洋揮
    • Organizer
      第69回高分子討論会
    • Related Report
      2020 Annual Research Report
    • Invited
  • [Patent(Industrial Property Rights)] レジスト材料、レジストパターンの製造方法、及び レジストパターン2022

    • Inventor(s)
      吉村公男、山本洋揮、出崎亮、古澤孝弘、前川康成、他3名
    • Industrial Property Rights Holder
      量子科学技術研究開発機構
    • Industrial Property Rights Type
      特許
    • Filing Date
      2022
    • Related Report
      2022 Annual Research Report

URL: 

Published: 2020-04-28   Modified: 2025-01-30  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi