• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to previous page

Elucidation of plasma-assisted atomic layer etching (ALE) mechanism for magnetic materials using organic gas

Research Project

Project/Area Number 20J10393
Research Category

Grant-in-Aid for JSPS Fellows

Allocation TypeSingle-year Grants
Section国内
Review Section Basic Section 14030:Applied plasma science-related
Research InstitutionOsaka University

Principal Investigator

YASSIN Abdulrahman Hikm (2021)  大阪大学, 工学研究科, 特別研究員(PD)

Basher Abdulrahman H. (2020)  大阪大学, 工学研究科, 特別研究員(DC2)

Project Period (FY) 2020-04-24 – 2022-03-31
Project Status Completed (Fiscal Year 2021)
Budget Amount *help
¥2,300,000 (Direct Cost: ¥2,300,000)
Fiscal Year 2021: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
Fiscal Year 2020: ¥1,200,000 (Direct Cost: ¥1,200,000)
KeywordsThermal ALE / DFT simulation / Etching of metals
Outline of Research at the Start

Three different codes are used; Gaussian, Turbomole, and STATE code to investigate the interaction of different organic molecules with magnetic materials (Ni, Co, and Fe) to establish an ALE processes. The effect of the system temperature will be studied by running MD-DFT calculations, which I expect it will provide more realistic model for ALE processes. The promising simulation results will be confirmed experimentally. Moreover, a CAPP jet system will be developed to study the possibility of developing ALE processes of magnetic materials at atmospheric pressure.

Outline of Annual Research Achievements

The mechanisms of thermal atomic layer etching (ALE) for metals have been elucidated in this study. The chemical interaction of Beta-diketon, i.e., hexafluoroacetylacetone (hfacH), trifluoroacetylacetone (tfacH), and acetylacetone (acacH), with nickel (Ni) and nickel oxide (NiO) have been investigated. Then, the best etchant, which is hfacH molecules, have been nominated and examined with a magnesium oxide (MgO) surface and we could successfully generalize the investigated mechanism for all metals using density functional theory (DFT) simulation. Because of the pandemic COVID-19, I could not travel to Prof. Kessel lab in Eindhoven University of Technology (TU/e) to run some experiments. However, I will writing and publishing the remaining results during my new fellowship.

Research Progress Status

令和3年度が最終年度であるため、記入しない。

Strategy for Future Research Activity

令和3年度が最終年度であるため、記入しない。

Report

(2 results)
  • 2021 Annual Research Report
  • 2020 Annual Research Report
  • Research Products

    (10 results)

All 2021 2020

All Journal Article (5 results) (of which Int'l Joint Research: 5 results,  Peer Reviewed: 5 results,  Open Access: 5 results) Presentation (5 results) (of which Int'l Joint Research: 5 results)

  • [Journal Article] Susceptibility of Staphylococcus epidermidis to argon cold plasma jet by 0.2% oxygen admixture2021

    • Author(s)
      A-A H. Mohamed, Abdulrahman H. Basher, J. Q. M. Almarashi, S. A. Ouf
    • Journal Title

      Applied Sciences MDPI

      Volume: 11, 3455 Issue: 8 Pages: 1-12

    • DOI

      10.3390/app11083455

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed / Open Access / Int'l Joint Research
  • [Journal Article] Erratum: “Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)2 on a nickel oxide surface in atomic layer etching processes” [J. Vac. Sci. Technol. A 38, 052602 (2020)]2021

    • Author(s)
      Basher Abdulrahman H.、Krstic Marjan、Fink Karin、Ito Tomoko、Karahashi Kazuhiro、Wenzel Wolfgang、Hamaguchi Satoshi
    • Journal Title

      Journal of Vacuum Science and Technology A

      Volume: 39 Issue: 5 Pages: 057001-057001

    • DOI

      10.1116/6.0001319

    • Related Report
      2021 Annual Research Report
    • Peer Reviewed / Open Access / Int'l Joint Research
  • [Journal Article] Stability of hexafluoroacetylacetone molecules on metallic and oxidized nickel surfaces in atomic-layer-etching processes2020

    • Author(s)
      Basher Abdulrahman H.、Krstic Marjan、Takeuchi Takae、Isobe Michiro、Ito Tomoko、Kiuchi Masato、Karahashi Kazuhiro、Wenzel Wolfgang、Hamaguchi Satoshi
    • Journal Title

      Journal of Vacuum Science & Technology A

      Volume: 38 Issue: 2 Pages: 022610-022610

    • DOI

      10.1116/1.5127532

    • Related Report
      2020 Annual Research Report
    • Peer Reviewed / Open Access / Int'l Joint Research
  • [Journal Article] Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)2 on a nickel oxide surface in atomic layer etching processes2020

    • Author(s)
      Basher Abdulrahman H.、Krstic Marjan、Fink Karin、Ito Tomoko、Karahashi Kazuhiro、Wenzel Wolfgang、Hamaguchi Satoshi
    • Journal Title

      Journal of Vacuum Science & Technology A

      Volume: 38 Issue: 5 Pages: 052602-052602

    • DOI

      10.1116/6.0000293

    • Related Report
      2020 Annual Research Report
    • Peer Reviewed / Open Access / Int'l Joint Research
  • [Journal Article] Self-limiting processes in thermal atomic layer etching of nickel by hexafluoroacetylacetone2020

    • Author(s)
      A. H. Basher, I. Hamada, and S. Hamaguchi
    • Journal Title

      Jpn J. Appl. Phys.

      Volume: 59 Issue: 9 Pages: 1-3

    • DOI

      10.35848/1347-4065/aba9a7

    • NAID

      120006953382

    • Related Report
      2020 Annual Research Report
    • Peer Reviewed / Open Access / Int'l Joint Research
  • [Presentation] Mechanisms of Thermal Atomic Layer Etching (ALE) of Nickel by Acetylacetone (acacH) Molecules2021

    • Author(s)
      Abdulrahman H. Basher, M. Krstic, T. Takeuchi, T. Ito, M. Kiuchi, K. Karahashi, W. Wenzel, and S. Hamaguchi
    • Organizer
      SVC TechCon 2021
    • Related Report
      2021 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Mechanisms of Self Limiting Processes in Thermal Atomic Layer Etching of Nickel by beta-diketones2021

    • Author(s)
      Abdulrahman H. Basher, I. Hamada, T. Ito, K. Karahashi, and S. Hamaguchi
    • Organizer
      ALD/ALE 2021
    • Related Report
      2021 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Mechanisms of Thermal Atomic Layer Etching (ALE) for Metals2021

    • Author(s)
      Abdulrahman H. Basher, M. Krstic, T. Takeuchi, T. Ito, K. Fink, M. Kiuchi, K. Karahashi, W. Wenzel, and S. Hamaguchi
    • Organizer
      1st Workshop on Artificial Intelligence in Plasma Science Satellite Workshop of EU-Japan Joint Symposium on Plasma Processing
    • Related Report
      2021 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Mechanisms of Thermal Atomic Layer Etching (ALE) of Metal by β-Diketones2021

    • Author(s)
      Abdulrahman H. Basher, I. Hamada, M. Krstic, T. Ito, K. Karahashi, W. Wenzel, and S. Hamaguchi
    • Organizer
      AVS 67 Virtual Symposium
    • Related Report
      2021 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Mechanisms of Thermal Etching of Magnesium Oxide (MgO) by Hexafluoroacetylacetone (hfacH)2021

    • Author(s)
      Abdulrahman H. Basher, M. Krstic, W. Wenzel, and S. Hamaguchi
    • Organizer
      at the 12th EU-Japan Joint Symposium on Plasma Processing (JSPP-12)
    • Related Report
      2020 Annual Research Report
    • Int'l Joint Research

URL: 

Published: 2020-07-07   Modified: 2024-03-26  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi