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Reliability improvement of GaN transistors based on the control of electronic states and a nobel gate structure

Research Project

Project/Area Number 21246007
Research Category

Grant-in-Aid for Scientific Research (A)

Allocation TypeSingle-year Grants
Section一般
Research Field Thin film/Surface and interfacial physical properties
Research InstitutionHokkaido University

Principal Investigator

HASHIZUME Tamotsu  北海道大学, 量子集積エレクトロニクス研究センター, 教授 (80149898)

Co-Investigator(Kenkyū-buntansha) SATO Taketomo  北海道大学, 量子集積エレクトロニクス研究センター, 准教授 (50343009)
KOGA Hiroaki  北海道大学, 量子集積エレクトロニクス研究センター, 助教 (80519413)
KUBO Toshiharu  北海道大学, 量子集積エレクトロニクス研究センター, 非常勤研究員 (10422338)
AKAZAWA Masamichi  北海道大学, 量子集積エレクトロニクス研究センター, 准教授 (30212400)
Project Period (FY) 2009 – 2012
Project Status Completed (Fiscal Year 2012)
Budget Amount *help
¥45,630,000 (Direct Cost: ¥35,100,000、Indirect Cost: ¥10,530,000)
Fiscal Year 2012: ¥8,450,000 (Direct Cost: ¥6,500,000、Indirect Cost: ¥1,950,000)
Fiscal Year 2011: ¥9,620,000 (Direct Cost: ¥7,400,000、Indirect Cost: ¥2,220,000)
Fiscal Year 2010: ¥12,740,000 (Direct Cost: ¥9,800,000、Indirect Cost: ¥2,940,000)
Fiscal Year 2009: ¥14,820,000 (Direct Cost: ¥11,400,000、Indirect Cost: ¥3,420,000)
Keywords窒化ガリウム / 表面・界面 / 電子準位 / 絶縁膜 / トランジスタ / GaN / AlGaN / C-V / MMC / 界面準位 / へテロ接合 / ALD / ICP / ドライエッチング / 窒素空孔 / AlInN / 多重台形チャネル / HEMT / 電流コラプス / 電気化学酸化
Research Abstract

To improve the operation stability of GaN-heterostructure transistors, we have carried out characterization and control of electronic states at insulator-semiconductor interfaces, fabrication and characterization of the multi-mesa-channel (MMC) transistors, and the related experiments. By applying the novel simulation and photo-assisted capacitance-voltage methods to Al_2O_3/ AlGaN/GaN structures, we determined the density distribution of electronic states at the Al_2O_3/AlGaN for the first time. It was also found that the MMC structure is very effective in improving the current stability of the GaN-based transistors.

Report

(5 results)
  • 2012 Annual Research Report   Final Research Report ( PDF )
  • 2011 Annual Research Report
  • 2010 Annual Research Report
  • 2009 Annual Research Report
  • Research Products

    (119 results)

All 2013 2012 2011 2010 2009 Other

All Journal Article (36 results) (of which Peer Reviewed: 21 results) Presentation (74 results) (of which Invited: 7 results) Remarks (9 results)

  • [Journal Article] Effects of Cl_2-Based Inductively Coupled Plasma Etching of AlGaN on Interface Properties of Al_2O_3/AlGaN/GaN Heterostructures2013

    • Author(s)
      Z. Yatabe, Y. Hori, S. Kim, and T. Hashizume
    • Journal Title

      Appl. Phys

      Volume: Express 6 Issue: 1 Pages: 16502-16502

    • DOI

      10.7567/apex.6.016502

    • NAID

      10031140462

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Determination of the deep donor-like interface state density distribution in metal/Al_2O_3/n-GaN structures from the photocapacitance-light intensity measurement2012

    • Author(s)
      M. Matys, B. Adamowicz, and T. Hashizume
    • Journal Title

      Appl. Phys. Lett

      Volume: 101 Issue: 23 Pages: 231608-231608

    • DOI

      10.1063/1.4769815

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Non-localized trapping effects in AlGaN/GaN heterojunction field-effect transistors subjected to on-state bias stress2012

    • Author(s)
      C.-Y. Hu and T. Hashizume
    • Journal Title

      J. Appl. Phys

      Volume: 111 Issue: 14 Pages: 84504-84504

    • DOI

      10.1063/1.470439

    • NAID

      120004146567

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
  • [Journal Article] Interface properties of Al2O3/n-GaN structures with inductively coupled plasma etching of GaN surfaces2012

    • Author(s)
      S. Kim, Y. Hori, W.-C. Ma, D. Kikuta, T. Narita, H. Iguchi, T. Uesugi, T. Kachi, and T. Hashizume
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 51 Issue: 6R Pages: 60201-60201

    • DOI

      10.1143/jjap.51.060201

    • NAID

      210000140662

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
  • [Journal Article] Interface state characterization of ALD-Al_2O_3/GaN and ALD-Al_2O_3/AlGaN structures2012

    • Author(s)
      Y.Hori, C, Mizue, T.Hashizume
    • Journal Title

      Physica status solidi C

      Volume: 9 Issue: 6 Pages: 1356-1360

    • DOI

      10.1002/pssc.201100656

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Reduction of current collapse in the multi-mesa-channel AlGaN/GaN HEMT2012

    • Author(s)
      Kota Ohi, Tamotsu Hashizume
    • Journal Title

      physica status solidi (c)

      Volume: Volume 9 Issue: 3-4 Pages: 898-902

    • DOI

      10.1002/pssc.201100301

    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] GaN電子デバイスにおける絶縁膜界面制御(最近の展望)2012

    • Author(s)
      橋詰 保
    • Journal Title

      応用物理

      Volume: 81 Pages: 479-484

    • Related Report
      2012 Annual Research Report
    • Peer Reviewed
  • [Journal Article] The influence of interface states and bulk carrier lifetime on the minority carrier behavior in an illuminated metal/ insulator/GaN structure2011

    • Author(s)
      M. Miczek, P. Bidzinski, B.Adamowicz, C. Mizue and T. Hashizume
    • Journal Title

      Solid State Commun

      Volume: 151 Issue: 11 Pages: 830-833

    • DOI

      10.1016/j.ssc.2011.03.021

    • Related Report
      2012 Final Research Report 2011 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Impact of gate and passivation structures on current collapse of AlGaN/GaN HEMTs under off-state-bias stress2011

    • Author(s)
      M. Tajima and T. Hashizume
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 50 Issue: 6R Pages: 61001-61001

    • DOI

      10.1143/jjap.50.061001

    • Related Report
      2012 Final Research Report 2011 Annual Research Report
  • [Journal Article] Impact of Interface States and Bulk Carrier Lifetime on Photocapacitance of Metal/Insulator/GaN Structure for Ultraviolet Light Detection2011

    • Author(s)
      P. Bidzinski, M. Miczek, B.Adamowicz, C. Mizue and T. Hashizume
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 50 Issue: 4S Pages: 04DF08-04DF08

    • DOI

      10.1143/jjap.50.04df08

    • NAID

      210000070314

    • Related Report
      2012 Final Research Report 2011 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Al_0.44Ga_0.56N spacer layer to prevent electron accumulation inside barriers in lattice-matched InAlN/AlGaN/AlN/GaN heterostructures2011

    • Author(s)
      M. Akazawa, B. Gao, T. Hashizume, M. Hiroki, S. Yamahata, and N. Shigekawa
    • Journal Title

      Appl. Phys. Lerr.

      Volume: 98 Issue: 14 Pages: 142117-142117

    • DOI

      10.1063/1.3578449

    • Related Report
      2012 Final Research Report 2011 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Formation of recessed-oxide gate for normally-off AlGaN/GaN HEMTs using a selective electrochemical oxidation2011

    • Author(s)
      N. Harada, Y. Hori, N. Azumaishi, K. Ohi and T. Hashizume
    • Journal Title

      Appl. Phys. Express

      Volume: 4 Issue: 2 Pages: 21002-21002

    • DOI

      10.1143/apex.4.021002

    • Related Report
      2012 Final Research Report
  • [Journal Article] Capacitance-voltage characteristics of Al_2O_3/AlGaN/GaN structures and state density distribution at Al_2O_3/AlGaN interface2011

    • Author(s)
      C. Mizue, Y. Hori, M. Miczek, and T. Hashizume
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 50 Issue: 2R Pages: 21001-21001

    • DOI

      10.1143/jjap.50.021001

    • Related Report
      2012 Final Research Report
  • [Journal Article] Variation of Chemical and Photoluminescence Properties of Mg-Doped GaN Caused by High-Temperature Process2011

    • Author(s)
      E. Ogawa and T. Hashizune
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 50 Issue: 2R Pages: 21002-21002

    • DOI

      10.1143/jjap.50.021002

    • Related Report
      2012 Final Research Report
  • [Journal Article] Measurement of valence-band offsets of InAlN/ GaN heterostructures grown by metal-organic vapor phase epitaxy2011

    • Author(s)
      M. Akazawa, B. Gao, T. Hashizume, M. Hiroki, S. Yamahata, and N. Shigekawa
    • Journal Title

      J. Appl. Phys.

      Volume: 109 Issue: 1 Pages: 13703-13703

    • DOI

      10.1063/1.3527058

    • Related Report
      2012 Final Research Report
  • [Journal Article] Variation of Chemical and Photoluminescence Properties of Mg-Doped GaN Caused by High-Temperature Process2011

    • Author(s)
      E.Ogawa, T.Hashizune
    • Journal Title

      Jpn.J.Appl.Phys

      Volume: 50

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Capacitance-voltage characteristics of Al_2O_3/AlGaN/GaN structures and state density distribution at Al_2O_3/AlGaN interface2011

    • Author(s)
      C.Mizue, Y.Hori, M.Miczek, T.Hashizume
    • Journal Title

      Jpn.J.Appl.Phys

      Volume: 60

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Formation of recessed-oxide gate for normally-off AlGaN/GaN HEMTs using a selective electrochemical oxidation2011

    • Author(s)
      N.Harada, Y.Hori, N.Azumaishi, K.Ohi, T.Hashizume
    • Journal Title

      Appl.Phys.Express

      Volume: 4

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Trapping effect evaluation of gateless AlGaN/ GaN heterojunction field-effect transistors using transmission-line-model method2010

    • Author(s)
      C.-Y. Hu, T. Hashizume, K. Ohi, M. Tajima
    • Journal Title

      Appl. Phys. Lett .

      Volume: 97 Issue: 22 Pages: 222103-222103

    • DOI

      10.1063/1.3506583

    • Related Report
      2012 Final Research Report
  • [Journal Article] Deep electronic levels of AlxGa1-xN with a wide range of Al composition grown by metal-organic vapor phase epitaxy2010

    • Author(s)
      K. Ooyama, K. Sugawara, S. Okuzaki, H. Taketomi, H. Miyake, K. Hiramatsu, and T. Hashizume
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 49 Issue: 10R Pages: 101001-101001

    • DOI

      10.1143/jjap.49.101001

    • NAID

      210000069281

    • Related Report
      2012 Final Research Report
  • [Journal Article] Process conditions for improvement of electrical properties of Al_2O_3/n-GaN structures prepared by atomic layer deposition2010

    • Author(s)
      Y. Hori, C. Mizue, and T. Hashizume
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 49 Issue: 8R Pages: 80201-80201

    • DOI

      10.1143/jjap.49.080201

    • Related Report
      2012 Final Research Report
  • [Journal Article] Trap states in AlGaN/GaN metal-oxide-semiconductor structures with Al2O3 prepared by atomic layer deposition2010

    • Author(s)
      D. Gregusova, R. Stoklas, C. Mizue, Y. Hori, J. Novak, T. Hashizume, and P. Kordos
    • Journal Title

      J. Appl. Phys.

      Volume: 107 Issue: 10 Pages: 106104-106104

    • DOI

      10.1063/1.3428492

    • Related Report
      2012 Final Research Report
  • [Journal Article] Small valence-band offset of In0.17Al0.83N/GaN heterostructure grown by metal-organic vapor phase epitaxy2010

    • Author(s)
      M. Akazawa, T. Matsuyama, T. Hashizume, M. Hiroki, S. Yamahata, and N. Shigekawa
    • Journal Title

      Appl. Phys. Lett.

      Volume: 96 Issue: 13 Pages: 132104-132104

    • DOI

      10.1063/1.3368689

    • Related Report
      2012 Final Research Report
  • [Journal Article] Variation of surface potentials of Si-doped Al_xGa_1-xN (0 < x < 0.87) grown on AlN/sapphire template by metal-organic vapor phase epitaxy2010

    • Author(s)
      T. Kubo, H. Taketomi, H. Miyake, K. Hiramatsu, and T. Hashizume
    • Journal Title

      Appl. Phys. Express

      Volume: 3 Issue: 2 Pages: 21004-21004

    • DOI

      10.1143/apex.3.021004

    • Related Report
      2012 Final Research Report
  • [Journal Article] Small valence-band offset of In0.17A10.83N/GaN heterostructure grown by metal-organic vapor phase epitaxy2010

    • Author(s)
      M.Akazawa, T.Matsuyama, T.Hashizume, M.Hiroki, S.Yamahata, N.Shigekawa
    • Journal Title

      Appl.Phys.Lett.

      Volume: 96

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Process conditions for improvement of electrical properties of Al_2O_3/n-GaN structures prepared by atomic layer deposition2010

    • Author(s)
      Y.Hori, C.Mizue, T.Hashizume
    • Journal Title

      Jpn.J.Appl.Phys

      Volume: 49

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Deep electronic levels of Al_xGa_<1-x>N with a wide range of Al composition grown by metal-organic vapor phase epitaxy2010

    • Author(s)
      K.Ooyama, K.Sugawara, S.Okuzaki, H.Taketomi, H.Miyake, K.Hiramatsu, T.Hashizume
    • Journal Title

      Jpn.J.Appl.Phys

      Volume: 49

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Trap states in AlGaN/GaN metal-oxide-semiconductor structures with Al_2O_3 prepared by atomic layer deposition2010

    • Author(s)
      D.Gregusova, R.Stoklas, C.Mizue, Y.Hori, J.Novak, T.Hashizume, P.Kordos
    • Journal Title

      J.Appl.Phys.

      Volume: 107

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Variation of surface potentials of Si-doped Al_xGa_<1-x>N(0<x<0.87)grown on AlN/sapphire template by metal-organic vapor phase epitaxy2010

    • Author(s)
      T.Kubo, H.Taketomi, H.Miyake, K.Hiramatsu, T.Hashizume
    • Journal Title

      Appl.Phys.Express 3(論文番号021004-1-3)

    • Related Report
      2009 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Drain Current Stability and Controllability of Threshold Voltage and Subthreshold Current in a Multi-Mesa-Channel AlGaN/GaN High Electron Mobility Transistor2009

    • Author(s)
      K. Ohi and T. Hashizume
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 48 Issue: 8 Pages: 081002-081002

    • DOI

      10.1143/jjap.48.081002

    • NAID

      40016704629

    • Related Report
      2012 Final Research Report
  • [Journal Article] Near-midgap deep levels in Al_0.26Ga_0.74N grown by metal-organic chemical vapor deposition2009

    • Author(s)
      K. Sugawara, J. Kotani and T. Hashizume
    • Journal Title

      Appl. Phys. Lett.

      Volume: 94 Issue: 15

    • DOI

      10.1063/1.3119643

    • Related Report
      2012 Final Research Report
  • [Journal Article] Near-midgap deep levels in Al_<0.26>Ga_<0.74>N grown by metal-organic chemical vapord eposition2009

    • Author(s)
      K.Sugawara, J.Kotani, T.Hashizume
    • Journal Title

      Appl.Phys.Lett. 94(論文番号152106-1-3)

    • Related Report
      2009 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Simulations of C-V-T Behavior of Metal/Insulator/AlGaN and Metal/Insulator/AlGaN/GaN Structures2009

    • Author(s)
      M.Miczek, B.Adamowicz, C.Mizue, T.Hashizume
    • Journal Title

      Jpn.J.Appl.Phys. 48(論文番号04C092-1-6)

    • Related Report
      2009 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Drain Current Stability and Controllability of Threshold Voltage and Subthreshold Current in a Multi-Mesa-Channel AlGaN/GaN High Electron Mobility Transistor2009

    • Author(s)
      K.Ohi, T.Hashizume
    • Journal Title

      Jpn.J.Appl.Phys. 48(論文番号081002-1-5)

    • NAID

      40016704629

    • Related Report
      2009 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Surface control of GaN alloys for photonic and electronic devices2009

    • Author(s)
      T.Hashizume, N.Shiozaki, K.Ohi
    • Journal Title

      Proc.of SPIE, Gallium Nitride Materials and Devices IV 7216(論文番号7216-0U-1-8)

    • Related Report
      2009 Annual Research Report
    • Peer Reviewed
  • [Journal Article] GaNおよびAlGaNの深い電子準位-電気的評価結果を中心として-(解説)2009

    • Author(s)
      橋詰保
    • Journal Title

      日本結晶成長学会誌 36(論文番号205-213)

    • Related Report
      2009 Annual Research Report
    • Peer Reviewed
  • [Presentation] GaNパワーデバイスにおける異種接合界面の制御2013

    • Author(s)
      橋詰保
    • Organizer
      日本表面科学会第74回表面科学研究会平成24年度中部表面科学シンポジウム
    • Place of Presentation
      名古屋大学、名古屋
    • Year and Date
      2013-01-26
    • Related Report
      2012 Final Research Report
  • [Presentation] 「InAlN/GaNヘテロ構造の表面・界面の評価と制御」、応用物理学関係連合講演会シンポジウム:GaN系材料表面・界面評価の進展2013

    • Author(s)
      赤澤正道、橋詰保
    • Organizer
      第60回応用物理学関係連合講演会
    • Place of Presentation
      神奈川工科大学、神奈川
    • Related Report
      2012 Final Research Report
  • [Presentation] GaNパ ワーデバイスにおける異種接合界面の制御2013

    • Author(s)
      橋詰 保
    • Organizer
      表面科学会第74回表面科学研究会平成24年度中部表面科学シンポジウム
    • Place of Presentation
      名古屋大学、名古屋
    • Related Report
      2012 Annual Research Report
    • Invited
  • [Presentation] InAlN/GaN ヘテロ構造の表面・界面の評価と制御2013

    • Author(s)
      赤澤正道、橋詰 保
    • Organizer
      応用物理学関係連合講演会シンポジウム
    • Place of Presentation
      神奈川工科大学、神奈川県
    • Related Report
      2012 Annual Research Report
    • Invited
  • [Presentation] GaN系絶縁膜界面の制御とパワートランジスター応用2012

    • Author(s)
      橋詰保
    • Organizer
      応用電子物性分科会研究例会
    • Place of Presentation
      金沢工業大学大学院虎ノ門キャンパス、東京。
    • Year and Date
      2012-11-02
    • Related Report
      2012 Final Research Report
  • [Presentation] In-grown and process-induced deep levels in AlGaN alloys2012

    • Author(s)
      T. Hashizume
    • Organizer
      International Workshop on "Frontier of Nitride Semiconductor Alloy Photonics (NSAP)"
    • Place of Presentation
      Hotel Springs, Chiba
    • Year and Date
      2012-05-10
    • Related Report
      2012 Final Research Report
  • [Presentation] GaNおよびAlGaNのバルク準位と界面準位評価2012

    • Author(s)
      橋詰保
    • Organizer
      第4回窒化物半導体結晶成長講演会
    • Place of Presentation
      東大生研、東京
    • Year and Date
      2012-04-27
    • Related Report
      2012 Final Research Report
  • [Presentation] GaN系ヘテロ界面構造の特徴とその評価2012

    • Author(s)
      橋詰保
    • Organizer
      2012年春季第59回応用物理学関係連合講演会シンポジウム[窒化物半導体における特異構造の理解と制御]
    • Place of Presentation
      早稲田大学(東京)(招待講演)
    • Year and Date
      2012-03-15
    • Related Report
      2011 Annual Research Report
  • [Presentation] GaN-based MOS structures processed with plasma-assisted dry etching (Invited)2012

    • Author(s)
      T.Hashizume
    • Organizer
      4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2012)
    • Place of Presentation
      中部大学(愛知県)(招待講演)
    • Year and Date
      2012-03-07
    • Related Report
      2011 Annual Research Report
  • [Presentation] GaN transistors for next-generation power conversion system2012

    • Author(s)
      J.T.Asubar, T.Hashizume
    • Organizer
      International Symposium on Technology for Sustainability
    • Place of Presentation
      King Mongkuts Institute of Technology (Thailand)(招待講演)
    • Year and Date
      2012-01-27
    • Related Report
      2011 Annual Research Report
  • [Presentation] Characterization and control of insulated gates for GaN power switching transistors2012

    • Author(s)
      T. Hashizume
    • Organizer
      The Ninth International Conference on Advanced Semiconductor Devices and Microsystems (ASDAM-2012)
    • Place of Presentation
      House of Scientists of Slovak Academy of Sciences, Slovakia.
    • Related Report
      2012 Final Research Report
  • [Presentation] Insulated gate technologies for high-performance GaN transistors2012

    • Author(s)
      T. Hashizume
    • Organizer
      International Workshop on Nitride Semiconductors 2012 (IWN2012)
    • Place of Presentation
      Sapporo Convention Center, Japan.
    • Related Report
      2012 Final Research Report
  • [Presentation] GaN-based MOS structures processed with plasma-assisted dry etching2012

    • Author(s)
      T. Hashizume
    • Organizer
      4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2012)
    • Place of Presentation
      Chubu University, Kasugai
    • Related Report
      2012 Final Research Report
  • [Presentation] GaN transistors for next-generation power conversion system2012

    • Author(s)
      J. T. Asubar and T. Hashizume
    • Organizer
      International Symposium on Technology for Sustainability
    • Place of Presentation
      King Mongkut's Institute of Technology, Bangkok, Thailand
    • Related Report
      2012 Final Research Report
  • [Presentation] In-grown and process-induced deep levels in AlGaN alloys2012

    • Author(s)
      T. Hashizume
    • Organizer
      International Workshop on "Frontier of Nitride Semiconductor Alloy Photonics (NSAP)
    • Place of Presentation
      Hotel Springs, Chiba
    • Related Report
      2012 Annual Research Report
    • Invited
  • [Presentation] Insulated gate technologies for high-performance GaN transistors2012

    • Author(s)
      T. Hashizume
    • Organizer
      International Workshop on Nitride Semiconductors 2012 (IWN2012)
    • Place of Presentation
      Sapporo Convention Center (Japan)
    • Related Report
      2012 Annual Research Report
    • Invited
  • [Presentation] Characterization and control of insulated gates for GaN power switching transistors2012

    • Author(s)
      T. Hashizume
    • Organizer
      The Ninth International Conference on Advanced Semiconductor Devices and Microsystems (ASDAM-2012)
    • Place of Presentation
      House of scientists of Slovak academy of sciences (Slovakia)
    • Related Report
      2012 Annual Research Report
    • Invited
  • [Presentation] GaNおよびAlGaNのバルク準位と界面準位評価2012

    • Author(s)
      橋詰 保
    • Organizer
      第4回窒化物半導体結晶成長講演会
    • Place of Presentation
      東大生研、東京
    • Related Report
      2012 Annual Research Report
    • Invited
  • [Presentation] GaN系絶縁膜界面の制御とパワートランジスター応用2012

    • Author(s)
      橋詰 保
    • Organizer
      応用電子物性分科会研究例会:ワイドギャップ半導体パワーデバイスの進展
    • Place of Presentation
      金沢工業大学大学院 虎ノ門キャンパス、東京
    • Related Report
      2012 Annual Research Report
    • Invited
  • [Presentation] Reduction of off-stress-induced current co;;apse in multi-mesa-channel AlGaN/GaN HEMT2012

    • Author(s)
      K. Ohi and T. Hashizume
    • Organizer
      36th Workshop on Semiconductor Devices and Integrated Circuits (WOCSDICE-2012)
    • Place of Presentation
      Village Club IGESA (France)
    • Related Report
      2012 Annual Research Report
  • [Presentation] Effects of ICP Etching of AlGaN on Interface Properties of Al2O3/AlGaN/GaN Structures2012

    • Author(s)
      Z. Yatabe, Y. Hori, S. Kim and T. Hashizume
    • Organizer
      36th Workshop on Semiconductor Devices and Integrated Circuits (WOCSDICE-2012)
    • Place of Presentation
      Village Club IGESA (France)
    • Related Report
      2012 Annual Research Report
  • [Presentation] Characterization of MOS interfaces based on GaN-related heterostructures2012

    • Author(s)
      Y. Hori, Z. Yatabe and T. Hashizume
    • Organizer
      Workshop on Dielectrics in Microellectronics (WoDiM 2012)
    • Place of Presentation
      Quality Hotel Plaza Dresden (Germany)
    • Related Report
      2012 Annual Research Report
  • [Presentation] Interface characterization of Al2O3/AlGaN/GaN structure with inductively coupled plasma etching of AlGaN surface2012

    • Author(s)
      Z. Yatabe, Y. Hori, S. Kim and T. Hashizume
    • Organizer
      2012 International Conference on Solid-State Devices and Materials (SSDM2012)
    • Place of Presentation
      Kyoto Convention Center (Japan)
    • Related Report
      2012 Annual Research Report
  • [Presentation] A novel method for the determination of the full energetic distribution of interface state density in metal/insulator/GaN structures from capacitance–voltage and photocapacitance–light intensity measurements2012

    • Author(s)
      M. Matysi, M. Miczek, B. Adamowicz, and T. Hashizume
    • Organizer
      31st International Conference on the Physics of Semiconductors (ICPS 2012)
    • Place of Presentation
      ETH Zurich (Switzerland)
    • Related Report
      2012 Annual Research Report
  • [Presentation] Characterization and control of GaN-based MOS structures2011

    • Author(s)
      T.Hashizume, Y.Hori, C.Mizue
    • Organizer
      2011 Meijo International Symposium on Nitride Semiconductors (MSN 2011)
    • Place of Presentation
      名城大学(名古屋市)(招待講演)
    • Year and Date
      2011-12-10
    • Related Report
      2011 Annual Research Report
  • [Presentation] GaNヘテロ接合トランジスタの次世代インバータ展開2011

    • Author(s)
      橋詰保
    • Organizer
      日本金属学会第3分科会シンポジウム「環境・医療・IT調和型デバイス、及び材料の最前線」
    • Place of Presentation
      科学技術館(東京)(招待講演)
    • Year and Date
      2011-10-14
    • Related Report
      2011 Annual Research Report
  • [Presentation] Characterization and control of GaN-based MOS structures2011

    • Author(s)
      T. Hashizume, Y. Hori, and C. Mizue
    • Organizer
      2011 Meijo International Symposium on Nitride Semiconductors (MSN2011)
    • Place of Presentation
      Meijo University, Nagoya
    • Year and Date
      2011-10-10
    • Related Report
      2012 Final Research Report
  • [Presentation] GaNヘテロ接合トランジスタの次世代インバータ展開2011

    • Author(s)
      橋詰保
    • Organizer
      日本金属学会第3分科会シンポジウム「環境・医療・IT調和型デバイス、及び材料の最前線」
    • Place of Presentation
      科学技術館、東京
    • Year and Date
      2011-09-22
    • Related Report
      2012 Final Research Report
  • [Presentation] The Role of the Gate-Source Region on the Off-state Bias-induced Current Collapse of AlGaN/GaN HEMTs2011

    • Author(s)
      J.T.Asubar, T.Tajima, T.Hashizume
    • Organizer
      5th Asia-Pacific Workshop on Widegap Semiconductors (APWS)
    • Place of Presentation
      鳥羽国際ホテル(三重県)
    • Related Report
      2011 Annual Research Report
  • [Presentation] Electronic State Characterization of Al2O3/AlGaN/GaN Structures Prepared by Atomic Layer Deposition2011

    • Author(s)
      Y.Hori, C.Mizue, T.Hashizume
    • Organizer
      13th International Conference on Formation of Semiconductor Interfaces (ICFSI-13)
    • Place of Presentation
      Academy of Science (Czech Republic)
    • Related Report
      2011 Annual Research Report
  • [Presentation] Normally-Off AlGaN/GaN HEMT with Recessed-Oxide Gate by Selective Electrochemical Oxidation2011

    • Author(s)
      K.Ohi, N.Harada, N.Azumaishi, T.Hashizume
    • Organizer
      13th International Conference on Formation of Semiconductor Interfaces (ICFSI-13)
    • Place of Presentation
      Academy of Science (Czech Republic)
    • Related Report
      2011 Annual Research Report
  • [Presentation] Control of Electronic States at Al2O3/GaN and Al2O3/AlGaN Interfaces Prepared by Atomic Layer Deposition2011

    • Author(s)
      Y.Hori, C.Mizue, T.Hashizume
    • Organizer
      9th International Conference on Nitride Semiconductors (ICNS-9)
    • Place of Presentation
      Scottish Exhibition and Conference Centre (UK)
    • Related Report
      2011 Annual Research Report
  • [Presentation] Multi-Mesa-Channel AlGaN/GaN HEMT with Resistance to Off-Stress-Induced Current Collapse2011

    • Author(s)
      K.Ohi, T.Hashizume
    • Organizer
      9th International Conference on Nitride Semiconductors (ICNS-9)
    • Place of Presentation
      Scottish Exhibition and Conference Centre (UK)
    • Related Report
      2011 Annual Research Report
  • [Presentation] Characterization of Off-State-Induced Current Collapse in AlGaN/GaN HEMTs Using Dual-gate Architecture2011

    • Author(s)
      J.T.Asubar, M.Tajima, T.Hashizume
    • Organizer
      9th International Conference on Nitride Semiconductors (ICNS-9)
    • Place of Presentation
      Scottish Exhibition and Conference Centre (UK)
    • Related Report
      2011 Annual Research Report
  • [Presentation] On-State Bias Stress Induced Trapping Effects in Access Region of AlGaN/GaN HEMTs2011

    • Author(s)
      C.-Y. Hu, T.Hashizume
    • Organizer
      9th International Conference on Nitride Semiconductors (ICNS-9)
    • Place of Presentation
      Scottish Exhibition and Conference Centre (UK)
    • Related Report
      2011 Annual Research Report
  • [Presentation] Selective Electrochemical Formation of Recessed-Oxide-Gate Structures for AlGaN/GaN HEMTs2011

    • Author(s)
      N.Azumaishi, N.Harada, T.Hashizume
    • Organizer
      2011 International Conference on Solid-state Devices and Materials (SSDM2011)
    • Place of Presentation
      愛知県産業労働センター(名古屋市)
    • Related Report
      2011 Annual Research Report
  • [Presentation] Impacts of Dry Etching of GaN and AlGaN Surfaces on Interface Properties of GaN-based MOS Structures2011

    • Author(s)
      S.Kim, Y.Hori, N.Azumaishi, T.Hashziume
    • Organizer
      2011 International Conference on Solid-state Devices and Materials (SSDM2011)
    • Place of Presentation
      愛知県産業労働センター(名古屋市)
    • Related Report
      2011 Annual Research Report
  • [Presentation] Characterization and control of dry-etched GaN surfaces2011

    • Author(s)
      Z.Yatabe, S.-S.Kim, N.Azumaishi, T.Sato, T.Hashizume
    • Organizer
      6th Interbnnational Symposium on Surface Science (ISSS-6)
    • Place of Presentation
      タワーホール船堀(東京)
    • Related Report
      2011 Annual Research Report
  • [Presentation] MOVPE法によるAlGaN中の深い準位2010

    • Author(s)
      橋詰保
    • Organizer
      応用物理学会シンポジウム(ワイドギャップ窒化物AlGaNの結晶評価と深紫外光デバイス応用)
    • Place of Presentation
      長崎大学、長崎
    • Year and Date
      2010-09-16
    • Related Report
      2012 Final Research Report
  • [Presentation] MOVPE法によるAlGaN中の深い準位(Invited)2010

    • Author(s)
      橋詰保
    • Organizer
      応用物理学会シンポジウム(ワイドギャップ窒化物AlGaNの結晶評価と深紫外光デバイス応用)
    • Place of Presentation
      長崎 招待講演
    • Year and Date
      2010-09-16
    • Related Report
      2010 Annual Research Report
  • [Presentation] 窒化物半導体の表面・界面制御とパワートランジスタ展開2010

    • Author(s)
      橋詰保
    • Organizer
      日本学術振興会アモルファス・ナノ材料第147委員会第108回研究会
    • Place of Presentation
      主婦会館、東京
    • Year and Date
      2010-07-09
    • Related Report
      2012 Final Research Report
  • [Presentation] 窒化物半導体の表面・界面制御とパワートランジスタ展開(Invited)2010

    • Author(s)
      橋詰保
    • Organizer
      日本学術振興会アモルファス・ナノ材料第147委員会第108回研究会
    • Place of Presentation
      東京 招待講演
    • Year and Date
      2010-07-09
    • Related Report
      2010 Annual Research Report
  • [Presentation] AlGaNの深い電子準位と表面ポテンシャル2010

    • Author(s)
      橋詰保
    • Organizer
      応用物理学会応用電子物
    • Place of Presentation
      大阪大学銀杏会館、大阪
    • Year and Date
      2010-05-21
    • Related Report
      2012 Final Research Report
  • [Presentation] AlGaNの深い電子準位と表面ポテンシャル(Invited)2010

    • Author(s)
      橋詰保
    • Organizer
      防用物理学会応用電子物性分科会研究会
    • Place of Presentation
      大阪 招待講演
    • Year and Date
      2010-05-21
    • Related Report
      2010 Annual Research Report
  • [Presentation] 窒化物半導体の特徴とデバイス展開2010

    • Author(s)
      橋詰保
    • Organizer
      第27回無機材料に関する最近の研究成果発表会-材料研究の最前線から-
    • Place of Presentation
      東海大学校友会館、東京
    • Year and Date
      2010-01-25
    • Related Report
      2012 Final Research Report
  • [Presentation] 窒化物半導体の特徴とデバイス展開(Invited)2010

    • Author(s)
      橋詰保
    • Organizer
      第27回無機材料に関する最近の研究成果発表会-材料研究の最前線から-
    • Place of Presentation
      東京
    • Year and Date
      2010-01-25
    • Related Report
      2009 Annual Research Report
  • [Presentation] Interface control technologies of GaN-based MOS structures for high-efficiency power switching transistors2010

    • Author(s)
      T. Hashizume, Y. Hori and C. Mizue
    • Organizer
      Workshop on Dielectrics in Microellectronics (WoDiM 2010)
    • Place of Presentation
      Hotel SUZA, Bratislava, Slovak
    • Related Report
      2012 Final Research Report
  • [Presentation] Current controllability and stability of multi-mesa- channel lGaN/GaN HEMTs2010

    • Author(s)
      T. Hashizume and K. Ohi
    • Organizer
      2010 International Meeting for Future of Electron Devices, Kansai (IMFEDK)
    • Place of Presentation
      Kansai Univ., Osaka
    • Related Report
      2012 Final Research Report
  • [Presentation] Effects of plasma processing on surface properties of GaN and AlGaN2010

    • Author(s)
      T. Hashizume
    • Organizer
      2nd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma-2010)
    • Place of Presentation
      Meijo Univ., Nagoya
    • Related Report
      2012 Final Research Report
  • [Presentation] Current controllability and stability of multi-mesa-channel AlGaN/GaN HEMTs (Invited)2010

    • Author(s)
      T.Hashizume, K.Ohi
    • Organizer
      2010 International Meeting for Future of Electron Devices, Kansai (IMFEDK)
    • Place of Presentation
      Osaka 招待講演
    • Related Report
      2010 Annual Research Report
  • [Presentation] Interface control technologies of GaN-based MOS structures for high-efficiency power switching transistors (Invited)2010

    • Author(s)
      T.Hashizume, Y.Hori, C.Mizue
    • Organizer
      Workshop on Dielectrics in Microellectronics(WoDiM 2010)
    • Place of Presentation
      Bratislava, Slovak 招待講演
    • Related Report
      2010 Annual Research Report
  • [Presentation] Interface state properties of Al_2O_3/n-GaN prepared by atomic layer deposition2010

    • Author(s)
      Y.Hori, C.Mizue, T.Hashizume
    • Organizer
      International Meeting for Future of Electron Devices, Kansai (IMFEDK)
    • Place of Presentation
      Osaka
    • Related Report
      2010 Annual Research Report
  • [Presentation] C-V characterization of ALD-Al_2O_3 insulated gates on AlGaN/GaN structure2010

    • Author(s)
      C.Mizue, T.Hashizume
    • Organizer
      Workshop on Dielectrics in Microellectronics (WoDiM 2010)
    • Place of Presentation
      Bratislava, Slovak
    • Related Report
      2010 Annual Research Report
  • [Presentation] A recessed oxide gate structure for threshold voltage control in AlGaN/GaN HEMTs by electrochemical process2010

    • Author(s)
      N.Harada, T.Hashizume
    • Organizer
      2010 International Workshop on Nitride Semiconductors (IWN-2010)
    • Place of Presentation
      Tampa, USA
    • Related Report
      2010 Annual Research Report
  • [Presentation] Effects of Mg-doping density and high-temperature annealing on deep levels in Mg-doped GaN2010

    • Author(s)
      E.Ogawa, T.Hashizume
    • Organizer
      2010 International Workshop on Nitride Semiconductors (IWN-2010)
    • Place of Presentation
      Tampa, USA
    • Related Report
      2010 Annual Research Report
  • [Presentation] Current Controllability and Stability in Multi-Mesa-Channel AlGaN/GaN HEMT2010

    • Author(s)
      K.Ohi, T.Hashizume
    • Organizer
      2010 International Workshop on Nitride Semiconductors (IWN-2010)
    • Place of Presentation
      Tampa, USA
    • Related Report
      2010 Annual Research Report
  • [Presentation] Effects of fabrication processes on electrical properties of Al_2_O_3/n-GaN structures prepared by atomic layer deposition2010

    • Author(s)
      Y.Hori, T.Hashizume
    • Organizer
      2010 International Workshop on Nitride Semiconductors (IWN-2010)
    • Place of Presentation
      Tampa, USA
    • Related Report
      2010 Annual Research Report
  • [Presentation] Trapping Region Extension at the Gate-Drain Opening of AlGaN/GaN Heterojunction Field-Effect Transistors Subjected to On-State Stress2010

    • Author(s)
      C.-Y.Hu, T.Hashizume, K.Ohi, M.Tajima
    • Organizer
      2010 International Workshop on Nitride Semiconductors (IWN-2010)
    • Place of Presentation
      Tampa, USA
    • Related Report
      2010 Annual Research Report
  • [Presentation] Deep level characterization of MOVPE-grown AlGaN with high Al compositions2010

    • Author(s)
      S.Okuzaki, K.Sugawara, H.Taketomi, H.Miyake, K.Hiramatsu, T.Hashizume
    • Organizer
      2010 International Conference on Solid-State Devices and Materials (SSDM2010)
    • Place of Presentation
      Tokyo
    • Related Report
      2010 Annual Research Report
  • [Presentation] Effects of plasma processing on surface properties of GaN and AlGaN(Invited)2010

    • Author(s)
      T.Hashizume
    • Organizer
      2^<nd> International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials(ISPlasma-2010)
    • Place of Presentation
      Nagoya, Japan
    • Related Report
      2009 Annual Research Report
  • [Presentation] Characterization and control of GaN and AlGaN surfaces for high- performance GaN-based transistors2009

    • Author(s)
      T. Hashizume
    • Organizer
      Huang Kun Forum
    • Place of Presentation
      Chinese Academy of Science, Beijin, China
    • Year and Date
      2009-11-06
    • Related Report
      2012 Final Research Report
  • [Presentation] Characterization and control of GaN and AlGaN surfaces for high-performance GaN-based transistors(Invited)2009

    • Author(s)
      T.Hashizume
    • Organizer
      Huang Kun Forum
    • Place of Presentation
      Chinese Academy of Science, Beijin, China
    • Year and Date
      2009-11-06
    • Related Report
      2009 Annual Research Report
  • [Presentation] 窒化物半導体のMIS界面電子準位2009

    • Author(s)
      橋詰保
    • Organizer
      日本学術振興会第154委員会・第162委員会合同研究会
    • Place of Presentation
      キャンパスイノベーションセンター東京
    • Year and Date
      2009-10-26
    • Related Report
      2012 Final Research Report
  • [Presentation] 窒化物半導体のMIS界面電子準位(Invited)2009

    • Author(s)
      橋詰保
    • Organizer
      日本学術振興会第154委員会・第162委員会合同研究会
    • Place of Presentation
      東京
    • Year and Date
      2009-10-26
    • Related Report
      2009 Annual Research Report
  • [Presentation] Effects of high-temperature anneal on surface properties of Mg-doped GaN2009

    • Author(s)
      E.Ogawa, T.Hashizume
    • Organizer
      2009 International Meeting for Future of Electron Devices, Kansai(IMFEDK)
    • Place of Presentation
      Osaka, Japan
    • Related Report
      2009 Annual Research Report
  • [Presentation] Interface characterization of Al2O3/n-GaN structure prepared by atomic layer deposition2009

    • Author(s)
      K.Ooyama, C.Mizue, Y.Hori, T.Hashizume
    • Organizer
      2009 Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices(AWAD 2009)
    • Place of Presentation
      Busan, Korea
    • Related Report
      2009 Annual Research Report
  • [Presentation] Electrochemical oxidation of GaN for surface control of GaN-based device structures2009

    • Author(s)
      N.Harada, N.Shiozaki, T.Hashizume
    • Organizer
      2009 International Conference on Solid-State Devices and Malerials(SSDM2009)
    • Place of Presentation
      Sendai, Japan
    • Related Report
      2009 Annual Research Report
  • [Presentation] Chemical and electronic properties of ALD-Al_2O_3/AlGaN interfaces2009

    • Author(s)
      Y.Hori, C.Mizue, K.Ooyama, M.Miczek, T.Hashizume
    • Organizer
      2009 International Conference on Solid-State Devices and Materials(SSDM2009)
    • Place of Presentation
      Sendai, Japan
    • Related Report
      2009 Annual Research Report
  • [Presentation] Chemical and Electronic Properties of MOVPE-grown Al_xGa_<1-x>N Surfaces(0.25<x<0.68)2009

    • Author(s)
      T.Kubo, K.Sugawara, H.Taketomi, H.Miyake, K.Hiramatsu, T.Hashizume
    • Organizer
      8th International Conference on Nitride Semiconductors(ICNS-8)
    • Place of Presentation
      Jeju, Korea
    • Related Report
      2009 Annual Research Report
  • [Presentation] Correlation between surface leakage current and operation degradation of AlGaN/GaN HEMTs2009

    • Author(s)
      M.Tajima, T.Hashizume
    • Organizer
      8th International Conference on Nitride Semiconductors(ICNS-8)
    • Place of Presentation
      Jeju, Korea
    • Related Report
      2009 Annual Research Report
  • [Presentation] Characterization of interface electronic states in ALD-Al_2O_3/AlGaN/GaN structures2009

    • Author(s)
      C.Mizue, Y.Hori, M.Miczek, T.Hashizume
    • Organizer
      8th International Conference on Nitride Semiconductors(ICNS-8)
    • Place of Presentation
      Jeju, Korea
    • Related Report
      2009 Annual Research Report
  • [Presentation] Mg accumulation and defect formation at p-GaN surfaces caused by a high-temperature annealing2009

    • Author(s)
      E.Ogawa, T.Hashizume
    • Organizer
      8th International Conference on Nitride Semiconductors(ICNS-8)
    • Place of Presentation
      Jeju, Korea
    • Related Report
      2009 Annual Research Report
  • [Presentation] Multi-Mesa-Channel Structure for Improvement of Gate Controllability and Current Stability in AlGaN/GaN HEMTs2009

    • Author(s)
      K.Ohi, T.Hashizume
    • Organizer
      8th International Conference on Nitride Semiconductors(ICNS-8)
    • Place of Presentation
      Jeju, Korea
    • Related Report
      2009 Annual Research Report
  • [Presentation] Characterization of Schottky interface properties and deep levels of Al_xGa_<1-x>N(0.25<x<0.68)grown by MOVPE2009

    • Author(s)
      K.Sugawara, T.Kubo, H.Taketomi, H.Miyake, K.Hiramatsu, T.Hashizume
    • Organizer
      8th International Conference on Nitride Semiconductors(ICNS-8)
    • Place of Presentation
      Jeju, Korea
    • Related Report
      2009 Annual Research Report
  • [Remarks]

    • URL

      http://www.rciqe.hokudai.ac.jp/qcp

    • Related Report
      2012 Final Research Report
  • [Remarks] 北海道大学学術成果コレクション

    • URL

      http://eprints.lib.hokudai.ac.jp/dspace/

    • Related Report
      2012 Annual Research Report
  • [Remarks] 北海道大学量子集積エレクトロニクス研究センター

    • Related Report
      2012 Annual Research Report
  • [Remarks] 北海道大学学術成果コレクション

    • URL

      http://eprints.lib.hokudai.ac.jp/dspace/

    • Related Report
      2011 Annual Research Report
  • [Remarks] 北海道大学量子集積エレクトロニクス研究センター

    • URL

      http://www.rciqe.hokudai.ac.jp

    • Related Report
      2011 Annual Research Report
  • [Remarks] 北海道大学学術成果コレクション

    • URL

      http://eprints.lib.hokudai.ac.jp/dspace/

    • Related Report
      2010 Annual Research Report
  • [Remarks] 北海道大学量子集積エレクトロニクス研究センター

    • URL

      http://www.rciqe.hokudai.ac.jp

    • Related Report
      2010 Annual Research Report
  • [Remarks] 北海道大学学術成果コレクション

    • URL

      http://eprints.lib.hokudai.ac.jp/dspace/

    • Related Report
      2009 Annual Research Report
  • [Remarks] 北海道大学量子集積エレクトロニクス研究センター

    • URL

      http://www.rciqe.hokudai.ac.jp

    • Related Report
      2009 Annual Research Report

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Published: 2009-04-01   Modified: 2019-07-29  

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