Investigation on Evanescent-to-Propagating Light Transformation Technique in a Patterned Substrate
Project/Area Number |
21360016
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Research Category |
Grant-in-Aid for Scientific Research (B)
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Allocation Type | Single-year Grants |
Section | 一般 |
Research Field |
Applied materials science/Crystal engineering
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Research Institution | National Institute of Advanced Industrial Science and Technology |
Principal Investigator |
WANG Xuelun 独立行政法人産業技術総合研究所, ナノシステム研究部門, 主任研究員 (80356609)
|
Co-Investigator(Kenkyū-buntansha) |
SHIMIZU Mitsuaki 独立行政法人産業技術総合研究所, 先進パワーエレクトロニクス研究センター, 研究チーム長 (10357212)
OGURA Mutsuo 独立行政法人産業技術総合研究所, ナノシステム研究部門, 主任研究員 (90356717)
|
Project Period (FY) |
2009 – 2011
|
Project Status |
Completed (Fiscal Year 2011)
|
Budget Amount *help |
¥15,860,000 (Direct Cost: ¥12,200,000、Indirect Cost: ¥3,660,000)
Fiscal Year 2011: ¥3,120,000 (Direct Cost: ¥2,400,000、Indirect Cost: ¥720,000)
Fiscal Year 2010: ¥4,810,000 (Direct Cost: ¥3,700,000、Indirect Cost: ¥1,110,000)
Fiscal Year 2009: ¥7,930,000 (Direct Cost: ¥6,100,000、Indirect Cost: ¥1,830,000)
|
Keywords | 光物性 / エバネッセント光 / リッジ構造 / 指向性 / 空気伝播光 / 結合 / GaAs / GaN / FDTD / 光取り出し効率 / AlGaAs / 放射パターン / MOCVD / 光取出し効率 / SiO_2 / 屈折率 |
Research Abstract |
The evanescent-to-propagating light transformation phenomenon in a fine ridge structure was investigated by optical techniques. It is found that light-extraction efficiency can be further enhanced by about 1.5 times by depositing a thin SiO_2 film on the ridge surface, due to occurrence of the evanescent wave coupling effect at both the semiconductor-SiO_2 and SiO_2-air interfaces. It is also shown that high spatial directionality could be achieved by localizing the light-emitting area around the ridge center.
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Report
(5 results)
Research Products
(30 results)
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[Patent(Industrial Property Rights)] 発光ダイオード2013
Inventor(s)
王 学論
Industrial Property Rights Holder
産業技術総合研究所
Industrial Property Rights Type
特許
Industrial Property Number
2013-049079
Filing Date
2013-03-12
Acquisition Date
2016-11-18
Related Report
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