| Budget Amount *help |
¥18,200,000 (Direct Cost: ¥14,000,000、Indirect Cost: ¥4,200,000)
Fiscal Year 2011: ¥3,640,000 (Direct Cost: ¥2,800,000、Indirect Cost: ¥840,000)
Fiscal Year 2010: ¥3,640,000 (Direct Cost: ¥2,800,000、Indirect Cost: ¥840,000)
Fiscal Year 2009: ¥10,920,000 (Direct Cost: ¥8,400,000、Indirect Cost: ¥2,520,000)
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| Research Abstract |
About a functional film deposition apparatus using the vacuum arc discharge plasma, we designed and developed a new filtered-arc-deposition system for doping dissimilar element into DLC film and preparing high-quality(high smoothness, uniform and droplet-free) DLC film. Apparatus function was assessed and dissimilar element doped DLC film was prepared.
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