Development of Magnetic thin film devices with large saturation magnetization and high anisotropy field with resonance frequency above 10 GHz
Project/Area Number |
21360145
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Research Category |
Grant-in-Aid for Scientific Research (B)
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Allocation Type | Single-year Grants |
Section | 一般 |
Research Field |
Electronic materials/Electric materials
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Research Institution | Tokyo Institute of Technology |
Principal Investigator |
NAKAGAWA Shigeki 東京工業大学, 大学院・理工学研究科, 教授 (60180246)
|
Project Period (FY) |
2009 – 2011
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Project Status |
Completed (Fiscal Year 2011)
|
Budget Amount *help |
¥18,200,000 (Direct Cost: ¥14,000,000、Indirect Cost: ¥4,200,000)
Fiscal Year 2011: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
Fiscal Year 2010: ¥5,850,000 (Direct Cost: ¥4,500,000、Indirect Cost: ¥1,350,000)
Fiscal Year 2009: ¥9,880,000 (Direct Cost: ¥7,600,000、Indirect Cost: ¥2,280,000)
|
Keywords | 大飽和磁化 / 高磁気異方性 / FeCoB / 異方性磁界 / 高共鳴周波数 / 磁歪 / 高周波透磁率 |
Research Abstract |
FeCoB films prepared on Ru underlayer using oblique incidence of sputtered particles have high in-plane magnetic anisotropy H_k of 500 Oe. There is an anisotropic residual stress which is an origin of the in-plane magnetic anisotropy. Such anistotropic crystalline structures may affect to the anisotropic residual stress in FeCoB layer on Ru underlayer. B content of around 6 at.% is appropriate to induce such an anisotropic residual stress. Multilayered structure with Si/NiFe is effective to reduce Bloch type domain walls. The FeCoB films with H_k of 500 Oe revealed 9. 2 GHz of resonance frequency.
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Report
(4 results)
Research Products
(40 results)
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[Journal Article] Magnetic Recording Measurements of Sputtered Media on Tape at an Areal Density of 14 Gbits/in^22009
Author(s)
Berman, D.; Chembrolu, V.H.; Topuria, T.; Matsunuma, S.; Inoue, T.; Doi, T.; Matsuu, T.; Hashimoto, S.; Hirata, K.; Nakagawa, S.
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Journal Title
IEEE Transactions on Magnetics 45(10)
Pages: 3584-3586
Related Report
Peer Reviewed
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