Preparation of Ferromagnetic and Ferroelectric Thin Films by Pulsed Laser Deposition and Their Characterization
Project/Area Number |
21360150
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Research Category |
Grant-in-Aid for Scientific Research (B)
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Allocation Type | Single-year Grants |
Section | 一般 |
Research Field |
Electronic materials/Electric materials
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Research Institution | Osaka University |
Principal Investigator |
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Co-Investigator(Kenkyū-buntansha) |
KANASHIMA Takeshi 大阪大学, 基礎工学研究科, 准教授 (30283732)
SOHGAWA Masayuki 大阪大学, 基礎工学研究科, 助教 (70403128)
RICINSCHI Dan 東京工業大学, 総合理工学研究科, 特任准教授 (60403127)
|
Project Period (FY) |
2009 – 2011
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Project Status |
Completed (Fiscal Year 2011)
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Budget Amount *help |
¥18,590,000 (Direct Cost: ¥14,300,000、Indirect Cost: ¥4,290,000)
Fiscal Year 2011: ¥2,730,000 (Direct Cost: ¥2,100,000、Indirect Cost: ¥630,000)
Fiscal Year 2010: ¥2,730,000 (Direct Cost: ¥2,100,000、Indirect Cost: ¥630,000)
Fiscal Year 2009: ¥13,130,000 (Direct Cost: ¥10,100,000、Indirect Cost: ¥3,030,000)
|
Keywords | 強誘電体 / 強磁性体 / マルチフェロイック / 薄膜 / レーザアブレーション / 磁場 / 強誘電性 / 強磁性 / 物性実験 / 電子・電気材料 / 結晶成長 / 磁性 / 誘電物性 |
Research Abstract |
Multiferroic BiFeO_3 has giant dielectric hysteresis at room temperature but very small magnetic hysteresis and so little magneto-electric effect. Then, BiFeO_3 and BiFe_<1-x> M_xO_3 thin films are prepared by pulsed laser deposition under magnetic field and/ or annealed under magnetic field. So, magnetic hysteresis of the prepare thin films could be increased by antiparallel arrangement of different spins of adjacent magnetic ions, defect generation and/ or microscopic texture variation, keeping large ferroelectricity and moreover magneto-electric effect is expected to be enhance.
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Report
(4 results)
Research Products
(78 results)
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[Presentation] Structural and Ferroelectric Properties of BiFeO_3 Thin Films Prepared by Dual Ion Beam Sputtering Process2011
Author(s)
S.Nakashima, H.Suminaga, Y.Tsujita, H.Fujisawa, M.Kobune, H.Nishioka, J.M.Park, T.Kanashima, M.Okuyama, M.Shimizu
Organizer
The 20th IEEE ISIF 2011
Place of Presentation
Vancouver, Canada
Year and Date
2011-07-24
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[Book] Ferroelectrics Material Aspects, chapter 72011
Author(s)
Le Van Hai, Takeshi Kanashima, Masanori Okuyama
Publisher
Studies on Electrical and Retention Enhancement Properties of Metal-Ferroelectric-Insulator-Semiconductor with Radical Irradiation Treatments(電子ジャーナルも有)
Related Report
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