Three dimensional dielectrophoretic devices using high-aspect-ratio structures fabricated by proton beam writing
Project/Area Number |
21360154
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Research Category |
Grant-in-Aid for Scientific Research (B)
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Allocation Type | Single-year Grants |
Section | 一般 |
Research Field |
Electronic materials/Electric materials
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Research Institution | Shibaura Institute of Technology |
Principal Investigator |
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Co-Investigator(Kenkyū-buntansha) |
UCHIDA Satoshi 首都大学東京, 理工学研究科, 准教授 (90305417)
HASEGAWA Tadahiro 芝浦工業大学, 工学部, 准教授 (10340605)
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Project Period (FY) |
2009 – 2011
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Project Status |
Completed (Fiscal Year 2011)
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Budget Amount *help |
¥17,680,000 (Direct Cost: ¥13,600,000、Indirect Cost: ¥4,080,000)
Fiscal Year 2011: ¥4,550,000 (Direct Cost: ¥3,500,000、Indirect Cost: ¥1,050,000)
Fiscal Year 2010: ¥5,070,000 (Direct Cost: ¥3,900,000、Indirect Cost: ¥1,170,000)
Fiscal Year 2009: ¥8,060,000 (Direct Cost: ¥6,200,000、Indirect Cost: ¥1,860,000)
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Keywords | 電気 / 電子材料 / 集束陽子線描画 / 三次元微細構造 / 誘電泳動 / レジスト / マイクロ流路 / 転写技術 / 高アスペクト比構造 / 微生物捕集 / 高アスベクト比構造 |
Research Abstract |
Aiming at the development of dielectrophotic(DEP) devices working for three-dimensional trapping of micro particles, we introduced high-aspect-ratio microstructures fabricated by proton beam writing(PBW). Three issues including beam engineering, materials and processing, and device applications have been studied. Using the PBW technique with flexible micromachining capability, superior characteristics of the three-dimensional DEP devices for electric-micro filters have been successfully demonstrated.
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Report
(4 results)
Research Products
(57 results)
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[Journal Article] Soft-lithographic methods for the fabrication of dielectrophoretic devices using molds by proton beam writing2010
Author(s)
Y.Shiine, H.Nishikawa, Y.Furuta, K.Kanamitsu, T.Satoh, Y.Ishii, T.Kamiya, R.Nakao, S.Uchida
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Journal Title
Microelectronic Engineering, Volume 87, Issues 5-8, pp.835-838 (May-August 2010)
Volume: 87
Pages: 835-838
Related Report
Peer Reviewed
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[Presentation] Electroforming of Ni mold using high-aspect-ratio PMMA microstructures fabricated by proton beam writing2010
Author(s)
Yusuke Tanabe, Hiroyuki Nishikawa, Takahiro Satoh, Yasuyuki Ishii, Tomihiro Kamiya, Tohru Watanabe, Atsushi Sekiguchi
Organizer
36th International Conference on Micro & Nano Engine Bring (MNE), Paper No.P-LITH-112(Genoa, Italy, 19-22 September 2010)
Place of Presentation
Genoa, Italy
Year and Date
2010-09-21
Related Report
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[Presentation] Fabrication of Three-Dimensional Pillar Arrays by PBW for Improved Trapping Performance of Dielectrophoretic Devices2010
Author(s)
Yasuharu Shiine, Yusuke Sakashita, Hiroyuki Nishikawa, Takahiro Satoh, Yasuyuki Ishii, Tomihiro Kamiya, Ryota Nakao, Satoshi Uchida
Organizer
12th International Conference on Nuclear Microprobe Technology and Applications (Germany, July 26-30), Paper P2-50, Book of Abstracts p.150
Place of Presentation
Leipzig, Germany
Year and Date
2010-07-29
Related Report
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[Presentation] Controlling Spatial Curing Reactions of Epoxy Resin Systems on Ion Beam Writing2010
Author(s)
Katsuyoshi Takano, Takahiro Satoh, Masashi Koka, Tomihiro Kamiya, Yasuyuki Ishii, Takeru Ohkubo, Masaki Sugimoto, Hiroyuki Nishikawa, Shu Seki
Organizer
12th International Conference on Nuclear Microprobe Technology and Applications (Germany, July 26-30), Paper No.P2-181, Book of Abstracts p.173
Place of Presentation
Leipzig, Germany
Year and Date
2010-07-29
Related Report
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[Presentation] Microbeam Complex in TIARA : Technologies to Meet Wide Range of Applications2010
Author(s)
Tomihiro Kamiya, Katsuyoshi Takano, Takahiro Satoh, Yasuyuki Ishii, Susumu Okumura, Hiroyuki Nishikawa, Shu Seki, Masaki Sugimoto, Wataru Yokota, Mitsuhiro Fukuda
Organizer
12th International Conference on Nuclear Microprobe Technology and Applications (Germany, July 26-30), Paper No.FBOI2-84, Book of Abstracts p.40
Place of Presentation
Leipzig, Germany
Year and Date
2010-07-26
Related Report
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