Development of micro-plasma molding using integrated fine electrodes
Project/Area Number |
21360362
|
Research Category |
Grant-in-Aid for Scientific Research (B)
|
Allocation Type | Single-year Grants |
Section | 一般 |
Research Field |
Material processing/treatments
|
Research Institution | Osaka University |
Principal Investigator |
|
Co-Investigator(Kenkyū-buntansha) |
NISHIYAMA Hiroaki 北海道大学, 電子科学研究所, 准教授 (80403153)
|
Project Period (FY) |
2009 – 2011
|
Project Status |
Completed (Fiscal Year 2011)
|
Budget Amount *help |
¥17,940,000 (Direct Cost: ¥13,800,000、Indirect Cost: ¥4,140,000)
Fiscal Year 2011: ¥2,990,000 (Direct Cost: ¥2,300,000、Indirect Cost: ¥690,000)
Fiscal Year 2010: ¥2,990,000 (Direct Cost: ¥2,300,000、Indirect Cost: ¥690,000)
Fiscal Year 2009: ¥11,960,000 (Direct Cost: ¥9,200,000、Indirect Cost: ¥2,760,000)
|
Keywords | プラズマ処理 / レーザ加工 / マイクロ放電 / 微細電極 / プラズマ / グロー / パワー密度 / 電解研磨 / アーク / 半導体加工プロセス / アークプラズマ / 表面加工 / フェムト秒レーザ / エッチング |
Research Abstract |
Generation method of very small size plasma beam was developed through controlling the electrical discharge in the range from glow region to arc region with use of the new type nozzle made from BN ceramics and the fast high voltage power source. The power density of newly developed plasma beam reaches higher than 10^9 W/ m^2 and sub-millimeter sized melt spot can be obtained at the surface of stainless steel anode. In order to obtain much smaller diameter of BN nozzle, characterizations of plasma etching properties of BN and nonlinear optical lithography were performed. The etching rate was approximately 2. 5 ilm/ h when BN was exposed to NLD Ar plasma.
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Report
(4 results)
Research Products
(51 results)