Electrochemical tailoring of semiconductor nanowire arrays and their application to photo-energy devices
| Project/Area Number |
21360363
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Material processing/treatments
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| Research Institution | Waseda University |
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Principal Investigator |
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| Co-Investigator(Kenkyū-buntansha) |
福中 康博 早稲田大学, ナノ理工学研究機構, 教授 (60111936)
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| Co-Investigator(Renkei-kenkyūsha) |
ミランダ カエタノ 京都大学, 工学研究科, 助教 (30456800)
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| Project Period (FY) |
2009 – 2011
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| Project Status |
Completed (Fiscal Year 2011)
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| Budget Amount *help |
¥18,200,000 (Direct Cost: ¥14,000,000、Indirect Cost: ¥4,200,000)
Fiscal Year 2011: ¥3,120,000 (Direct Cost: ¥2,400,000、Indirect Cost: ¥720,000)
Fiscal Year 2010: ¥4,420,000 (Direct Cost: ¥3,400,000、Indirect Cost: ¥1,020,000)
Fiscal Year 2009: ¥10,660,000 (Direct Cost: ¥8,200,000、Indirect Cost: ¥2,460,000)
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| Keywords | 電気化学反応 / シリコン電析 / 光エネルギーデバイス / 反応解析 / ナノ構造創製 / ナノ構造形成 / ナノ材料創製 |
|---|
| Research Abstract |
Novel process for the electrodeposition of Si thin film from ionic liquid electrolyte has been developed and the initial stage of the deposition process was investigated using EQCM, TEM, and Raman Spectroscopy. It was found that amorphous Si was electrodeposited while a certain amount of ionic liquid was included in the films. Moreover, uniform array of Si nanodots was successfully electrodeposited using 150 nm diameter dot array patterns fabricated by UV nanoimprinting lithography.
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Report
(4 results)
Research Products
(52 results)
