Budget Amount *help |
¥18,200,000 (Direct Cost: ¥14,000,000、Indirect Cost: ¥4,200,000)
Fiscal Year 2011: ¥3,120,000 (Direct Cost: ¥2,400,000、Indirect Cost: ¥720,000)
Fiscal Year 2010: ¥4,420,000 (Direct Cost: ¥3,400,000、Indirect Cost: ¥1,020,000)
Fiscal Year 2009: ¥10,660,000 (Direct Cost: ¥8,200,000、Indirect Cost: ¥2,460,000)
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Research Abstract |
Novel process for the electrodeposition of Si thin film from ionic liquid electrolyte has been developed and the initial stage of the deposition process was investigated using EQCM, TEM, and Raman Spectroscopy. It was found that amorphous Si was electrodeposited while a certain amount of ionic liquid was included in the films. Moreover, uniform array of Si nanodots was successfully electrodeposited using 150 nm diameter dot array patterns fabricated by UV nanoimprinting lithography.
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