A Study of Plasma Chemistry Involving Liquid

• Project/Area Number: 21540511
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Plasma science
• Research Institution: Osaka City University (2010-2011); Nagoya University (2009)
• Principal Investigator: SHIRAFUJI Tatsuru 大阪市立大学, 大学院・工学研究科, 教授 (10235757)
• Research Collaborator: TAKAI Osamu 関東学院大学, 大学院・工学研究科, 教授 (40110712) ; SAITO Nagahiro 名古屋大学, 大学院・工学研究科, 教授 (00329096) ; HIEDA Junko 東北大学, 金属材料研究所, 助教 (40566717)
• Project Period (FY): 2009 – 2011
• Project Status: Completed (Fiscal Year 2011)
• Budget Amount: ¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000); Fiscal Year 2011: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000); Fiscal Year 2010: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000); Fiscal Year 2009: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
• Keywords: プラズマ化学 / 水中プラズマ / 水浄化 / プラズマ / 液体 / 反応 / シミュレーション / ラジカル / バリア / 放電 / 誘電体 / 環境 / Ar / 水 / OHラジカル

Research Abstract

In order to establish scientific and technological foundation for materials processes using the plasmas generated in underwater bubbles, we have performed modeling and simulation of the plasma chemical reaction processes involving water and the bubble generation processes. Moreover, on the basis of these achievements, we have proposed a novel underwater plasma process using integrated micro bubbles, and proved its materials processing capability through methylene-blue-decolorization experiments.

Research Products

• [Journal Article] Mechanisms of pattern formation in dielectric barrier discharges (2011)
  • Author(s): S. N. Abolmasov, K. Tachibana and T. Shirafuji
  • Journal Title: IEEE Trans. Plasma Sci. Volume: Vol.39, No.11 Pages: 2090-2091
• [Journal Article] Modification of semianalytical finite element model for radio frequency sheaths in single^-and dual-frequency capacitively coupled plasmas : II. Effects of nonuniform bulk plasma density and charging at dielectric surface (2011)
  • Author(s): K. Denpoh and T. Shirafuji
  • Journal Title: Jpn. J. Appl. Phys. Volume: Vol.50, No.3
  • NAID: 210000070137
• [Journal Article] Mechanisms of pattern formation in dielectric barrier discharges (2011)
  • Author(s): S.N.Abolmasov
  • Journal Title: IEEE Trans.Plasma Sci. Volume: 39 Issue: 11 Pages: 2090-2091
  • DOI: 10.1109/tps.2011.2160362
  • Peer Reviewed
• [Journal Article] FTIR study of methylene blue plasma degradation products through plasma treatment on water (2010)
  • Author(s): T. Shirafuji, J. Hieda, O. Takai, N. Saito, T. Morita, O. Sakai and K. Tachibana
  • Journal Title: Proc. 2010 IEEE Region 10 Conf. Volume: Vol.TenCon2010 Pages: 1938-1942
• [Journal Article] Modification of semianalytical finite element model for radio frequency sheaths in single-and dual-frequency capacitively coupled plasmas : Incorporating ion density oscillation at low frequency (2010)
  • Author(s): K.Denpoh
  • Journal Title: Jpn.J.Appl.Phys. Volume: 49
  • Peer Reviewed
• [Journal Article] FTIR study of methylene blue plasma degradation products through plasma treatment on water (2010)
  • Author(s): T.Shirafuji
  • Journal Title: Proc.2010 IEEE Region 10 Conf. Volume: TenCon2010 Pages: 1938-1942
  • Peer Reviewed
• [Journal Article] プラズマ滅菌に於けるプラズマ源の装置と特徴について (2010)
  • Author(s): 白藤立
  • Journal Title: 防菌防黴学会誌 Volume: 38 Pages: 679-685
  • NAID: 10026732759
  • Peer Reviewed
• [Journal Article] Semianalytical finite element method model for radio frequency sheaths in single and dual-frequency capacitively coupled plasmas (2009)
  • Author(s): K. Denpoh and T. Shirafuji
  • Journal Title: Jpn. J. Appl. Phys. Volume: Vol.48
  • NAID: 40016742985
• [Journal Article] Semianalytical finite element method model for radio frequency sheaths in single- and dual-frequency capacitively coupled plasmas (2009)
  • Author(s): K.Denpoh, T.Shirafuji
  • Journal Title: Jpn. J. Appl. Phys. 48
  • NAID: 40016742985
  • Peer Reviewed
• [Presentation] 3D integrated micro solution plasmas～Effects of electrical conductivity of liquid medium～ (2012)
  • Author(s): T. Shirafuji
  • Organizer: The 5th International Conference on Plasma-Nano Technology & Science
  • Place of Presentation: 大山,日本
  • Year and Date: 2012-03-10
• [Presentation] 3D integrated micro solution plasmas～Effects of electrical conductivity of liquid medium～ (2012)
  • Author(s): T.Shirafuji
  • Organizer: The 5th International Conference on Plasma-Nano Technology & Science
  • Place of Presentation: 犬山
  • Year and Date: 2012-03-10
• [Presentation] 気液二相が関与するプラズマプロセスの応用とその理解 (2012)
  • Author(s): 白藤立
  • Organizer: 応用物理学会関西支部2011年度第2回講演会
  • Place of Presentation: 大阪(招待講演)
  • Year and Date: 2012-01-27
• [Presentation] Solution plasmas in bio-inspired cellular structure-3D integration of micro solution plasmas- (2012)
  • Author(s): T.Shirafuji
  • Organizer: The 12th International Symposium on Biomimetic Materials Processing
  • Place of Presentation: 名古屋(招待講演)
  • Year and Date: 2012-01-24
• [Presentation] Generation of plasmas in porous materials with a gas-liquid mixed phase medium (2011)
  • Author(s): T.Shirafuji
  • Organizer: Plasma Conference 2011
  • Place of Presentation: 金沢
  • Year and Date: 2011-11-22
• [Presentation] On the effects of bubble-size-fluctuation in the plasma in liquid (2011)
  • Author(s): T.Shirafuji
  • Organizer: 第72回応用物理学会学術講演会
  • Place of Presentation: 山形
  • Year and Date: 2011-08-30
• [Presentation] Effects of solution plasmas on the structure of MWNTs (2011)
  • Author(s): T.Shirafuji
  • Organizer: The 24th Symposium on Plasma Science for Materials
  • Place of Presentation: 吹田
  • Year and Date: 2011-07-20
• [Presentation] Application of integrated micro solution plasma to decomposition of organic substances in water (2011)
  • Author(s): T.Shirafuji
  • Organizer: The 20th International Symposium on Plasma Chemistry
  • Place of Presentation: Philadelphia, U.S.A.
  • Year and Date: 2011-06-27
• [Presentation] 多相媒質が関与するプラズマ材料プロセシング (2011)
  • Author(s): 白藤立
  • Organizer: 真空協会SP部会第123回定例研究会
  • Place of Presentation: 吹田(招待講演)
  • Year and Date: 2011-05-20
• [Presentation] Numerical investigation of bubble formation in solution plasma processing (2011)
  • Author(s): T. Shirafuji
  • Organizer: The 4th International Conference on Plasma-Nano Technology and Science
  • Place of Presentation: 高山,日本
  • Year and Date: 2011-03-11
• [Presentation] Numerical investigation of bubble formation in solution plasma processing (2011)
  • Author(s): T.Shirafuji
  • Organizer: The 4th International Conference on Plasma-Nano Technology and Science
  • Place of Presentation: 高山市民文化会館(岐阜県)
  • Year and Date: 2011-03-11
• [Presentation] Superhydrophobic treatment at a local area using atmospheric pressure plasma jet (2011)
  • Author(s): Y.Takahashi
  • Organizer: The 11th International Symposium on Biomimetic Materials Processing
  • Place of Presentation: 名古屋大学(愛知県)(招待講演)
  • Year and Date: 2011-01-26
• [Presentation] On the possibility of micro-solution plasma for materials processing (2011)
  • Author(s): T.Shirafuji
  • Organizer: The 11th International Symposium on Biomimetic Materials Processing
  • Place of Presentation: 名古屋大学(愛知県)
  • Year and Date: 2011-01-25
• [Presentation] Solution plasma processing of carbon nano-fillers in ammonia aqueous solution for preparation of polymer nano-composite materials (2010)
  • Author(s): T. Shirafuji
  • Organizer: The 57th International Symposium and Exhibition of American Vacuum Society
  • Place of Presentation: Albuquerque, U. S. A
  • Year and Date: 2010-10-19
• [Presentation] Integrated-micro-solution plasma in porous dielectric electrodes and its application to water treatment (2010)
  • Author(s): T. Shirafuji, K. Asano, J. Hieda, N. Saito and O. Takai
  • Organizer: The 7th International Conference on Reactive Plasmas, The 28th Symposium on Plasma Processing, and The 63rd Gaseous Electronics Conference
  • Place of Presentation: Paris, France
  • Year and Date: 2010-10-07
• [Presentation] Integrated-micro-solution plasma in porous dielectric electrodes and its application to water treatment (2010)
  • Author(s): T.Shirafuji
  • Organizer: The 7th International Conference on Reactive Plasmas, The 28th Symposium on Plasma Processing, and The 63rd Gaseous Electronics Conference
  • Place of Presentation: Maison de la Chimie, Paris (France)
  • Year and Date: 2010-10-07
• [Presentation] Water-repellent thin film deposition using a gas-liquid mixed-phase plasma jet (2010)
  • Author(s): Y.Takahashi
  • Organizer: The 7th International Conference on Reactive Plasmas, The 28th Symposium on Plasma Processing, and The 63rd Gaseous Electronics Conference
  • Place of Presentation: Maison de la Chimie, Paris (France)
  • Year and Date: 2010-10-05
• [Presentation] 気液混合相プラズマジェットによるはっ水膜形成 (2010)
  • Author(s): 高橋嘉仁
  • Organizer: 第71回応用物理学会学術講演会
  • Place of Presentation: 長崎大学(長崎県)
  • Year and Date: 2010-09-16
• [Presentation] Decomposition of organic materials using dielectric barrier discharges with porous dielectric electrodes (2010)
  • Author(s): T.Shirafuji
  • Organizer: The 10th Asia-Pacific Conference on Plasma Science and Technology and The 23rd Symposium on Plasma Science for Materials
  • Place of Presentation: Lotte Hotel, Jeju (Korea)
  • Year and Date: 2010-07-05
• [Presentation] Semianalytical FEM model for RF sheaths in single-and dual-frequency capacitively coupled plasmas (2010)
  • Author(s): K.Denpoh
  • Organizer: The 10th Asia-Pacific Conference on Plasma Science and Technology and The 23rd Symposium on Plasma Science for Materials
  • Place of Presentation: Lotte Hotel, Jeju (Korea)
  • Year and Date: 2010-07-05
• [Presentation] 液面上気相放電の化学反応と液中放電における気泡の効果 (2009)
  • Author(s): 白藤立
  • Organizer: 応用物理学会九州支部シンポジウム
  • Place of Presentation: 崇城大学, 熊本
  • Year and Date: 2009-11-20
• [Presentation] 水が関与するプラズマ中の化学反応過程 (2009)
  • Author(s): 白藤立
  • Organizer: 電気学会研究フォーラム
  • Place of Presentation: 名古屋大学, 名古屋
  • Year and Date: 2009-09-29
• [Presentation] Enhancement of OH production rate in plasma on water by mixing Ar (2009)
  • Author(s): T.Shirafuji, T.Morita, O.Sakai, K.Tachibana
  • Organizer: The 19th International Symposium on Plasma Chemistry
  • Place of Presentation: Ruhr-University Bochum, Germany
  • Year and Date: 2009-07-28
• [Remarks]
  • URL: http://www.t-shirafuji.jp/
• [Remarks]
  • URL: http://www.t-shirafuji.jp/
• [Patent(Industrial Property Rights)] 液中プラズマ発生法,液中プラズマ発生装置,被処理液浄化装置及びイオン含有液体生成装置 (2012)
  • Inventor(s): 白藤立,高井治,齋藤永宏,西村芳実,堀部博志,杉原雅彦,柿谷真一,荒木学
  • Industrial Property Rights Holder: 公立大学法人大阪市立大学,国立大学法人名古屋大学,株式会社栗田製作所
  • Industrial Property Number: 2012-081750
  • Filing Date: 2012-03-30
• [Patent(Industrial Property Rights)] 液中プラズマ発生法,液中プラズマ発生装置,被処理液浄化装置及びイオン含有液体生成装置 (2012)
  • Inventor(s): 白藤立, 高井治, 齋藤永宏, 西村芳実, 堀部博志, 杉原雅彦, 柿谷真一, 荒木学
  • Industrial Property Rights Holder: 大阪市立大学,名古屋大学,株式会社栗田製作所
  • Industrial Property Number: 2012-081750
  • Filing Date: 2012-03-30
• [Patent(Industrial Property Rights)] 水処理方法および水処理装置 (2010)
  • Inventor(s): 高井治,齋藤永宏,白藤立
  • Industrial Property Rights Holder: 国立大学法人名古屋大学
  • Industrial Property Number: 2010-149629
  • Filing Date: 2010-06-30
• [Patent(Industrial Property Rights)] 水処理方法および水処理装置 (2010)
  • Inventor(s): 高井治, 齋藤永宏, 白藤立
  • Industrial Property Rights Holder: 名古屋大学
  • Industrial Property Number: 2010-149629
  • Filing Date: 2010-06-30