| Project/Area Number |
21560727
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Structural/Functional materials
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| Research Institution | Kanazawa Institute of Technology |
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Principal Investigator |
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| Co-Investigator(Kenkyū-buntansha) |
KISHI Yoichi 金沢工業大学, 工学部, 教授 (70265370)
IKENAGA Noriaki 金沢工業大学, ものづくり研究所, 講師 (30512371)
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| Co-Investigator(Renkei-kenkyūsha) |
SAKUDO Noriyuki 金沢工業大学, 工学部, 教授 (20267719)
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| Project Period (FY) |
2009 – 2011
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| Project Status |
Completed (Fiscal Year 2011)
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| Budget Amount *help |
¥4,680,000 (Direct Cost: ¥3,600,000、Indirect Cost: ¥1,080,000)
Fiscal Year 2011: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2010: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2009: ¥2,210,000 (Direct Cost: ¥1,700,000、Indirect Cost: ¥510,000)
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| Keywords | インテリジェント材料 / 非平衡相薄膜 / 形状記憶合金 / DLC / 非平衡相薄膜材料 |
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| Research Abstract |
We developed an RF magnetron sputtering system equipped with separate sources as well as with a heating and ion-irradiation system for substrates. The ion irradiation system is basically similar to PBII & D(plasma based ion implantation and deposition) system which was applied to surface modification of plastic bottle, ion implantation for polymeric materials, deposition of a diamond-like carbon film, and so on. The hardness and fexlibility of the DLC formed by the developed system can be widely changed by adequately selecting RF power, pulse bias voltage, gas species and gas pressure.
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