Study on the expanse of thermalized electrons in condensed matters

• Project/Area Number: 21656238
• Research Category: Grant-in-Aid for Challenging Exploratory Research
• Allocation Type: Single-year Grants
• Research Field: Nuclear engineering
• Research Institution: Osaka University
• Principal Investigator: KOZAWA Takahiro 大阪大学, 産業科学研究所, 教授 (20251374)
• Co-Investigator(Kenkyū-buntansha): YAMAMOTO Hiroki 大阪大学, 産業科学研究所, 助教 (00516958)
• Project Period (FY): 2009 – 2011
• Project Status: Completed (Fiscal Year 2011)
• Budget Amount: ¥3,170,000 (Direct Cost: ¥2,900,000、Indirect Cost: ¥270,000); Fiscal Year 2011: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000); Fiscal Year 2010: ¥1,000,000 (Direct Cost: ¥1,000,000); Fiscal Year 2009: ¥1,000,000 (Direct Cost: ¥1,000,000)
• Keywords: 放射線 / X線 / 粒子線 / 原子・分子物理 / 原子力エネルギー / 計算物理 / 放射線、X線、粒子線

Research Abstract

The expansion of the wave function of thermalized electrons in the quasi-free state in PHS films has been estimated. On the basis of experiment results, the reaction of thermalized electrons with electron scavengers immediately after ionization was formulated. We developed a code which calculates electron dynamics from ionization to electron localization.

Research Products

• [Journal Article] Geminate Charge Recombination in Liquid Alkane with Concentrated CCl4 : Effects of CCl4 Radical Anion and Narrowing of Initial Distribution of Cl- (2011)
  • Author(s): A.Saeki, N.Yamamoto, Y.Yoshida, T.Kozawa
  • Journal Title: J.Phys.Chem.A Volume: 115 Issue: 36 Pages: 10166-10173
  • DOI: 10.1021/jp205989r
  • Peer Reviewed
• [Journal Article] Determination of Optimum Thermalization Distance Based on Trade-off Relationship between Resolution, Line Edge Roughness, and Sensitivity of Chemically Amplified Extreme Ultraviolet Resists (2011)
  • Author(s): T. Kozawa and S. Tagawa
  • Journal Title: J. Photopolym. Sci. Technol Volume: 24巻 Pages: 137-142
  • NAID: 130004833385
  • Peer Reviewed
• [Journal Article] Thermalization Distance of Electrons Generated in Poly(4-hydroxystyrene) Film Containing Acid Generator upon Exposure to Extreme Ultraviolet Radiation (2011)
  • Author(s): T. Kozawa and S. Tagawa
  • Journal Title: Jpn. J. Appl. Phys Volume: 50巻 Issue: 3R Pages: 30209-30209
  • DOI: 10.1143/jjap.50.030209
  • NAID: 210000070073
  • Peer Reviewed
• [Journal Article] Determination of Optimum Thermalization Distance Based on Trade-off Relationship between Resolution, Line Edge Roughness, and Sensitivity of Chemically Amplified Extreme Ultraviolet Resists (2011)
  • Author(s): T.Kozawa, S.Tagawa
  • Journal Title: J.Photopolym.Sci.Technol. Volume: 24 Pages: 137-142
  • NAID: 130004833385
  • Peer Reviewed
• [Journal Article] Radiation Chemistry in Chemically Amplified Resists (2010)
  • Author(s): T. Kozawa and S. Tagawa
  • Journal Title: Jpn. J. Appl. Phys Volume: 49巻 Issue: 3R Pages: 30001-30001
  • DOI: 10.1143/jjap.49.030001
  • NAID: 40017033684
  • Peer Reviewed
• [Journal Article] Radiation Chemistry of Fluoronaphthalene as a Candidate for Absorption Enhancement Component of Chemically Amplified Extreme Ultraviolet Resists (2010)
  • Author(s): S. Ikeda, K. Okamoto, H. Yamamoto, A. Saeki, S. Tagawa, T. Kozawa
  • Journal Title: Jpn. J. Appl. Phys Volume: 49巻 Issue: 9R Pages: 96504-96504
  • DOI: 10.1143/jjap.49.096504
  • NAID: 40017294753
  • Peer Reviewed
• [Journal Article] Formation and Decay of Fluorobenzene Radical Anions Affected by Their Isomeric Structures and the Number of Fluorine Atoms (2010)
  • Author(s): S. Higashino, A. Saeki, K. Okamoto, S. Tagawa, T. Kozawa
  • Journal Title: J. Phys. Chem. A Volume: 114巻 Issue: 31 Pages: 8069-8074
  • DOI: 10.1021/jp102828g
  • Peer Reviewed
• [Journal Article] Formation and Decay of Fluorobenzene Radical Anions Affected by Their Isomeric Structures and the Number of Fluorine Atoms (2010)
  • Author(s): S.Higashino, A.Saeki, K.Okamoto, S.Tagawa, T.Kozawa
  • Journal Title: J.Phys.Chem.A Volume: 114 Pages: 8069-8074
  • Peer Reviewed
• [Journal Article] Radiation Chemistry of Fluoronbphthalene as a Candidate for Absorption Enhancement Component of Chemically Amplified Extreme Ultraviolet Resists (2010)
  • Author(s): S.Ikeda, K.Okamoto, H.Yamamoto, A.Saeki, S.Tagawa, T.Kozawa
  • Journal Title: Jpn.J.Appl.Phys. Volume: 49 Pages: 96504-96504
  • Peer Reviewed
• [Journal Article] Radiation Chemistry in Chemically Amplified Resists (2010)
  • Author(s): T.Kozawa, S.Tagawa
  • Journal Title: Jpn.J.Appl.Phys. Volume: 49 Pages: 30001-30001
  • NAID: 40017033684
  • Peer Reviewed
• [Journal Article] Evaluation of Chemical Gradient Enhancement Methods for Chemically Amplified Extreme Ultraviolet Resists (2009)
  • Author(s): T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa
  • Journal Title: Jpn. J. Appl. Phys Volume: 48巻 Issue: 12 Pages: 126004-126004
  • DOI: 10.1143/jjap.48.126004
  • NAID: 40016890521
  • Peer Reviewed
• [Journal Article] Latent Image Created Using Small-Field Exposure Tool for Extreme Ultraviolet Lithography (2009)
  • Author(s): T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa
  • Journal Title: Jpn. J. Appl. Phys Volume: 48巻 Issue: 10 Pages: 106506-106506
  • DOI: 10.1143/jjap.48.106506
  • NAID: 40016796079
  • Peer Reviewed
• [Journal Article] Correlation between C37 Parameters and Acid Yields in Chemically Amplified Resists upon Exposure to 75 keV Electron Beam (2009)
  • Author(s): K. Natsuda, T. Kozawa, K. Okamoto, A. Saeki, and S. Tagawa
  • Journal Title: Jpn. J. Appl. Phys Volume: 48巻 Issue: 6S Pages: 06FC05-06FC05
  • DOI: 10.1143/jjap.48.06fc05
  • NAID: 210000066905
  • Peer Reviewed
• [Journal Article] Reactivity of Halogenated Resist Polymer with Low-Energy Electrons (2009)
  • Author(s): H. Yamamoto, T. Kozawa, A. Saeki, S. Tagawa, T. Mimura, H. Yukawa, and J. Onodera
  • Journal Title: Jpn. J. Appl. Phys Volume: 48巻 Issue: 6S Pages: 06FC09-06FC09
  • DOI: 10.1143/jjap.48.06fc09
  • NAID: 210000066909
  • Peer Reviewed
• [Journal Article] Reactivity of Haloge nated Resist Polymer with Low-Energy Electrons (2009)
  • Author(s): H.Yamamoto, T.Kozawa, A.Saeki, S.Tagawa, T.Mimura, H.Yukawa, J.Onodera
  • Journal Title: Jpn.J.Appl.Phys. 48 Pages: 6-9
  • Peer Reviewed
• [Journal Article] Correlation between C37 Parameters and Acid Yields in Chemically Amplified Resists upon Exposure to 75 keV Electron Beam (2009)
  • Author(s): K.Natsuda, T.Kozawa, K.Okamoto, A.Saeki, S.Tagawa
  • Journal Title: Jpn.J.Appl.Phys. 48 Pages: 6-5
  • NAID: 210000066905
  • Peer Reviewed
• [Journal Article] Latent Image Created Using Small-Field Exposure Tool for Extreme Ultraviolet Lithography (2009)
  • Author(s): T.Kozawa, H.Oizumi, T.Itani, S.Tagawa
  • Journal Title: Jpn.J.Appl.Phys. 48 Pages: 106506-106506
  • NAID: 40016796079
  • Peer Reviewed
• [Journal Article] Evaluation of Chemical Gradient Enhancement Methods for Chemically Amplified Extreme Ultraviolet Resists (2009)
  • Author(s): T.Kozawa, H.Oizumi, T.Itani, S.Tagawa
  • Journal Title: Jpn.J.Appl.Phys. 48 Pages: 126004-126004
  • NAID: 40016890521
  • Peer Reviewed
• [Presentation] Reaction of thermalized electrons in resist materials (2011)
  • Author(s): T. Kozawa
  • Organizer: 14th International Congress of Radiation Research(招待講演)
  • Place of Presentation: Warsaw, Poland
  • Year and Date: 2011-08-31
• [Presentation] Reaction of thermalized electrons in resist materials (2011)
  • Author(s): T.Kozawa
  • Organizer: 14th International Congress of Radiation Research
  • Place of Presentation: Warsaw, Poland(招待講演)
  • Year and Date: 2011-08-31
• [Presentation] Use Efficiency of Photon, Electron, and Proton in Chemically Amplified Resists-Resist Design for Cost Effective Lithography (2010)
  • Author(s): T. Kozawa
  • Organizer: 23rd International Microprocesses and Nanotechnology Conference
  • Place of Presentation: 小倉(福岡)
  • Year and Date: 2010-11-12
• [Presentation] Use Efficiency of Photon, Electron, and Proton in Chemically Amplified Resists -Resist Design for Cost Effective Lithography (2010)
  • Author(s): T.Kozawa
  • Organizer: 23rd International Microprocesses and Nanotechnology Conference
  • Place of Presentation: 小倉(福岡)
  • Year and Date: 2010-11-12
• [Presentation] Dynamics of Radical Cation of Poly(4-hydroxystyrene) Generated in Thin Film upon Exposure to Electron Beam (2010)
  • Author(s): K. Natsuda, T. Kozawa, K. Okamoto, A. Saeki, and S. Tagawa
  • Organizer: SPIE Advanced Lithography
  • Place of Presentation: San Jose, California, USA
  • Year and Date: 2010-02-22
• [Presentation] Modeling and simulation of chemically amplified resists for EUV lithography (2009)
  • Author(s): T. Kozawa and S. Tagawa
  • Organizer: 7th Fraunhofer IISB Lithography Simulation Workshop
  • Place of Presentation: Hersbruck, Germany
  • Year and Date: 2009-09-27
• [Remarks]
  • URL: http://www.sanken.osaka-u.ac.jp/bms/