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Dislocation-less heteroepitaxy by control of lattice mismatch strain using arranged elastically-strain-relaxed nanodots

Research Project

Project/Area Number 21686006
Research Category

Grant-in-Aid for Young Scientists (A)

Allocation TypeSingle-year Grants
Research Field Thin film/Surface and interfacial physical properties
Research InstitutionOsaka University

Principal Investigator

NAKAMURA Yoshiaki  大阪大学, 大学院・基礎工学研究科, 准教授 (60345105)

Project Period (FY) 2009 – 2011
Project Status Completed (Fiscal Year 2011)
Budget Amount *help
¥26,780,000 (Direct Cost: ¥20,600,000、Indirect Cost: ¥6,180,000)
Fiscal Year 2011: ¥2,860,000 (Direct Cost: ¥2,200,000、Indirect Cost: ¥660,000)
Fiscal Year 2010: ¥7,410,000 (Direct Cost: ¥5,700,000、Indirect Cost: ¥1,710,000)
Fiscal Year 2009: ¥16,510,000 (Direct Cost: ¥12,700,000、Indirect Cost: ¥3,810,000)
Keywords薄膜 / ナノドット / MBE、エピタキシャル / ナノ材料 / 超格子 / 結晶成長 / 表面・界面物性 / 自己組織化 / IV族半導体 / 極薄Si酸化膜
Research Abstract

Self-organization technique of Ge nanodots epitaxially grown on Si substrates was developed. Using nanodots formed by ultrathin SiO_2 film technique as seed crystals, we developed epitaxial growth technique of films with ultrasmall amount of dislocations on Si substrates, which we call as nanocontact epitaxy. We formed epitaxial growth of Ge and GaSb films on Si substrates. Ge films on Si(001) substrates formed by nanocontact epitaxy, which were as thin as 100 nm, had surface roughness of~0. 4 nm, etch pit density of 10^4-10^5cm^<-2>, namely, high quality. In these Ge epitaxial films, lattice mismatch strain was almost completely relaxed due to the elastically-strain-relaxed nanodots which were seed crystals, despite the ultrasmall amount of dislocations.

Report

(4 results)
  • 2011 Annual Research Report   Final Research Report ( PDF )
  • 2010 Annual Research Report
  • 2009 Annual Research Report
  • Research Products

    (57 results)

All 2012 2011 2010 2009

All Journal Article (17 results) (of which Peer Reviewed: 7 results) Presentation (40 results)

  • [Journal Article] Luminescence at 1. 5μm from Si/ GeSn nanodot/ Si structures22012

    • Author(s)
      Y. Nakamura, N. Fujinoki and M. Ichikawa
    • Journal Title

      J. Phys. D : Appl. Phys

      Volume: 45

    • Related Report
      2011 Final Research Report
  • [Journal Article] Luminescence at 1.5μm from Si/GeSn nanodot/Si structures2012

    • Author(s)
      Yoshiaki Nakamura, Norihito Fujinoki, Masakazu Ichikawa
    • Journal Title

      J.Phys.D : Appl.Phys.

      Volume: 45 Issue: 3 Pages: 035304-035304

    • DOI

      10.1088/0022-3727/45/3/035304

    • Related Report
      2011 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Photoabsorption properties ofβ-FeSi_2 nanoislands grown on Si(111) and Si(001): Dependence on substrate orientation studied by nano-spectroscopic measurements2011

    • Author(s)
      N. Naruse, Y. Nakamura, Y. Mera, M. Ichikawa, K. Maeda
    • Journal Title

      Thin Solid Films

      Volume: 519 Pages: 8477-8479

    • Related Report
      2011 Final Research Report
  • [Journal Article] Structural Analysis of Si-Based Nanodot Arrays Self-Organized by Selective Etching of SiGe/ Si Films2011

    • Author(s)
      M. Takahashi, Y. Nakamura, J. Kikkawa, O. Nakatsuka1, S. Zaima, and Akira Sakai
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 50

    • NAID

      210000071140

    • Related Report
      2011 Final Research Report
  • [Journal Article] Epitaxial Growth of High Quality Ge Films on Si(001) Substrates by Nanocontact Epitaxy2011

    • Author(s)
      Y. Nakamura, A. Murayama, and M. Ichikawa
    • Journal Title

      Cryst. Growth & Des

      Volume: 11 Pages: 3301-3305

    • Related Report
      2011 Final Research Report
  • [Journal Article] Fe_3Si nanodots epitaxially grown on Si(111) substrates using ultrathin SiO_2 film technique2011

    • Author(s)
      Y. Nakamura, K. Fukuda, S. Amari, M. Ichikawa
    • Journal Title

      Thin Solid Films

      Volume: 519 Pages: 8512-8515

    • Related Report
      2011 Annual Research Report 2011 Final Research Report
  • [Journal Article] Nanocontact heteroepitaxy of thin GaSb and AlGaSb films on Si substrates using ultrahigh-density nanodot seeds2011

    • Author(s)
      Y. Nakamura, T. Miwa and M. Ichikawa
    • Journal Title

      Nanotechnology

      Volume: 22

    • Related Report
      2011 Final Research Report
  • [Journal Article] Self-organization of two-dimensional SiGe nanodot arrays using selective etching of pure-edge dislocation network2011

    • Author(s)
      Y. Nakamura, M. Takahashi, T. Fujiwara, J. Kikkawa, A. Sakai, O. Nakatsuka, and S. Zaima
    • Journal Title

      J. Appl Phys

      Volume: 109

    • Related Report
      2011 Final Research Report
  • [Journal Article] Formation and Magnetic Properties of Ultrahigh Density Fe_3Si Nanodots Epitaxially Grown on Si(111) Substrates Covered with Ultrathin SiO_2 Films2011

    • Author(s)
      Y. Nakamura, S. Amari, S.-P. Cho, N. Tanaka, and M. Ichikawa
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 90

    • Related Report
      2011 Final Research Report
  • [Journal Article] Nanocontact heteroepitaxy of thin GaSb and AlGaSb films on Si substrates using ultrahigh-density nanodot seeds2011

    • Author(s)
      Yoshiaki Nakamtura, Takafumi Miwa, Masakazu Ichikawa
    • Journal Title

      Nanotechnology

      Volume: 22 Issue: 26 Pages: 265301-265301

    • DOI

      10.1088/0957-4484/22/26/265301

    • Related Report
      2011 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Epitaxial Growth of High Quality Ge Films on Si(001) Substrates by Nanocontact Epitaxy2011

    • Author(s)
      Yoshiaki Nakamura, Akiyuki Murayama, Masakazu Ichikawa
    • Journal Title

      Cryst.Growth Des.

      Volume: 11 Issue: 7 Pages: 3301-3305

    • DOI

      10.1021/cg200609u

    • Related Report
      2011 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Structural Analysis of Si-Based Nanodot Arrays Self-Organized by Selective Etching of SiGe/Si Films2011

    • Author(s)
      Masahiko Takahashi, Yoshiaki Nakamura, Jun Kikkawa, Osamu Nakatsukal, Shigeaki Zaimal, Akira Sakai
    • Journal Title

      Jpn.J.Appl.Phys.

      Volume: 50 Issue: 8S3 Pages: 08LB11-08LB11

    • DOI

      10.1143/jjap.50.08lb11

    • NAID

      210000071140

    • Related Report
      2011 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Formation and Magnetic Properties of Ultrahigh Density Fe_3Si Nanodots Epitaxially Grown on Si(111) Substrates Covered with Ultrathin SiO_2 Films2011

    • Author(s)
      Y.Nakamura, S.Amari, S.-P.Cho, N.Tanaka, M.Ichikawa
    • Journal Title

      Jpn.J.Appl.Phys.

      Volume: 50

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Self-organization of two-dimensional SiGe nanodot arrays using selective etching of pure-edge dislocation network2011

    • Author(s)
      Y.Nakamura, M.Takahashi, T.Fujiwara, J.Kikkawa, A.Sakai, O.Nakatsuka, S.Zaima
    • Journal Title

      J.Appl Phys.

      Volume: 109

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Journal Article] 極薄Si酸化膜を用いたエピタキシャル量子ドット二次元ナノ配列構造の自己組織化と自己修復2010

    • Author(s)
      中村芳明、村山昭之、渡邉亮子、彌田智一、市川昌和
    • Journal Title

      表面科学

      Volume: 31 Pages: 626-636

    • NAID

      10027573827

    • Related Report
      2011 Final Research Report 2010 Annual Research Report
  • [Journal Article] Self-organized formation and self-repair of a two-dimensional nanoarray of Ge quantum dots epitaxially grown on ultrathin SiO_2-covered Si substrates2010

    • Author(s)
      Y. Nakamura, A. Murayama, R. Watanabe, T. Iyoda and M. Ichikawa
    • Journal Title

      Nanotechnology

      Volume: 21

    • Related Report
      2011 Final Research Report
  • [Journal Article] Self-organized formation and self-repair of a two-dimensional nanoarray of Ge quantum dots epitaxially grown on ultrathin SiO_2-covered Si substrates2010

    • Author(s)
      Y.Nakamura, A.Murayama, R.Watanabe, T.Iyoda, M.Ichikawa
    • Journal Title

      Nanotechnology 21

    • Related Report
      2009 Annual Research Report
    • Peer Reviewed
  • [Presentation] Nanocontact epitaxy of thin films on Si substrates using nanodot seeds fabricated by ultrathin SiO_2 film technique2012

    • Author(s)
      Y. Nakamura and M. Ichikawa
    • Organizer
      Electrochemical Society(221st ECS Meeting)
    • Place of Presentation
      Seattle, USA
    • Year and Date
      2012-05-07
    • Related Report
      2011 Final Research Report
  • [Presentation] Ge核制御を施したSi基板上超高密度鉄系ナノドットの形成2012

    • Author(s)
      杉元亮太, 中村芳明, 吉川純, 酒井朗
    • Organizer
      第59回応用物理学会関係連合講演会
    • Place of Presentation
      早稲田大学、(東京都)
    • Year and Date
      2012-03-17
    • Related Report
      2011 Final Research Report
  • [Presentation] Ge核制御を施したSi基板上超高密度鉄系ナノドットの形成2012

    • Author(s)
      杉元亮太, 中村芳明, 吉川純, 酒井朗
    • Organizer
      第59回応用物理学会関係連合講演会
    • Place of Presentation
      早稲田大学、東京
    • Year and Date
      2012-03-17
    • Related Report
      2011 Annual Research Report
  • [Presentation] ナノコンタクトエピタキシーによるSi(111)基板上Ge薄膜の形成と発光特性2012

    • Author(s)
      田中一樹, 中村芳明, 五十川雅之, 吉川純, 酒井朗
    • Organizer
      第59回応用物理学会関係連合講演会
    • Place of Presentation
      早稲田大学、(東京都)
    • Year and Date
      2012-03-16
    • Related Report
      2011 Final Research Report
  • [Presentation] Self-organization and self-repair of two-dimensional periodic nanoarray of epitaxial Ge nanodots using ultrathin SiO_2 film technique2011

    • Author(s)
      Yoshiaki Nakamura
    • Organizer
      BIT' s 1st Annual World Congress of Nano-S & T
    • Place of Presentation
      Dalian, China
    • Year and Date
      2011-10-24
    • Related Report
      2011 Final Research Report
  • [Presentation] Self-organization and self-repair of two-dimensional periodic nanoarray of epitaxial Ge nanodots using ultrathin SiO_2 film technique2011

    • Author(s)
      Yoshiaki Nakamura
    • Organizer
      BIT's 1st Annual World Congress of Nano-S&T
    • Place of Presentation
      Dalian, China(招待講演)
    • Year and Date
      2011-10-24
    • Related Report
      2011 Annual Research Report
  • [Presentation] Formation of iron oxide nanodot structures on Si substrates by controlling nanometer-sized interface using ultrathin SiO_2 film technique2011

    • Author(s)
      Y. Nakamura, H. Hamanaka, K. Tanaka, J. Kikkawa, and A. Sakai
    • Organizer
      11th International Conference on Atomically Controlled Surfaces, Interfaces and Nanostructures(ACSIN 11)
    • Place of Presentation
      St. Petersburg, Russia
    • Year and Date
      2011-10-04
    • Related Report
      2011 Final Research Report
  • [Presentation] Formation of iron oxide nanodot structures on Si substrates by controlling nanometer-sized interface using ultrathin SiO_2 film technique2011

    • Author(s)
      Yoshiaki Nakamura, Hironobu Hamanaka, Kazuki Tanaka, Jun Kikkawa, Akira Sakai
    • Organizer
      11th International Conference on Atomically Controlled Surfaces, Interfaces and Nanostructures (ACSIN 11)
    • Place of Presentation
      St.Petersburg, Russia
    • Year and Date
      2011-10-04
    • Related Report
      2011 Annual Research Report
  • [Presentation] High density Ir on silicde nanodots formed by ultrathin SiO_2 film technique2011

    • Author(s)
      Yoshiaki Nakamura
    • Organizer
      12th IUMRS Inter national conference in Asia(IUMRS-ICA 2011)
    • Place of Presentation
      Taipei, Taiwan
    • Year and Date
      2011-09-20
    • Related Report
      2011 Final Research Report
  • [Presentation] High density Iron silicde nanodots formed by ultrathin SiO_2 film technique2011

    • Author(s)
      Yoshiaki Nakamura
    • Organizer
      12th IUMRS International conference in Asia (IUMRS-ICA 2011)
    • Place of Presentation
      Taipei, Taiwan(招待講演)
    • Year and Date
      2011-09-20
    • Related Report
      2011 Annual Research Report
  • [Presentation] 極薄Si酸化膜を用いてナノ界面制御したSi基板上超高密度鉄酸化物ナノドットの形成技術開発2011

    • Author(s)
      濱中啓伸, 中村芳明, 杉元亮太, 吉川純, 酒井朗
    • Organizer
      第72回応用物理学会学術講演会
    • Place of Presentation
      山形大学、山形県
    • Year and Date
      2011-08-30
    • Related Report
      2011 Final Research Report
  • [Presentation] 極薄Si酸化膜を用いてナノ界面制御したSi基板上超高密度鉄酸化物ナノドットの形成技術開発2011

    • Author(s)
      濱中啓伸, 中村芳明, 杉元亮太, 吉川純, 酒井朗
    • Organizer
      第72回応用物理学会学術講演会
    • Place of Presentation
      山形大学、山形
    • Year and Date
      2011-08-30
    • Related Report
      2011 Annual Research Report
  • [Presentation] Nanocontact heteroepitaxy of high-quality thin III-V films on Si substrates using nanodot seeds2011

    • Author(s)
      Yoshiaki Nakamura, Masakazu Ichikawa
    • Organizer
      International Symposium on Integrated Molecular/Materials Engineering (ISIMME 2011)
    • Place of Presentation
      Beijing, China(招待講演)
    • Year and Date
      2011-07-07
    • Related Report
      2011 Annual Research Report
  • [Presentation] Nanoc ontact heteroepitaxy of high-quality th in III-V films on Si substrates using n anodot seeds2011

    • Author(s)
      Y. Nakamura and M. Ichikawa
    • Organizer
      International Symposium on Integrated Molecular/ Materials Engin eering(ISIMME 2011)
    • Place of Presentation
      Beijing, China
    • Year and Date
      2011-06-07
    • Related Report
      2011 Final Research Report
  • [Presentation] Structural analysis of Si-based nan odot arrays self-organized by selective etching of SiGe/ Si films2010

    • Author(s)
      M. Takahashi, Y. Nakamura, J. Kikka wa, O. Nakatsuka, S. Zaima, and A. Saka i
    • Organizer
      18th Intern ational Colloquiumon Scanning Probe Mic roscopy(ICSPM18)
    • Place of Presentation
      Izuatagawa, Japan
    • Year and Date
      2010-12-10
    • Related Report
      2011 Final Research Report
  • [Presentation] Structural analysis of Si-based nanodot arrays self-organized by selective etching of SiGe/Si films2010

    • Author(s)
      M.Takahashi, Y.Nakamura, J.Kikkawa, O.Nakatsuka, S.Zaima, A.Sakai
    • Organizer
      18th International Colloquiumon Scanning Probe Microscopy (ICSPM18)
    • Place of Presentation
      Izuatagawa, Japan
    • Year and Date
      2010-12-10
    • Related Report
      2010 Annual Research Report
  • [Presentation] Two-dimensional nanoarray of SiGe epitaxial nanodots self-organized by selective etching of edge dislocation network2010

    • Author(s)
      Y. Nakamura, M. Takahashi, J. Kikkawa, O. Nakatsuka, S. Zaima, and A. Sakai
    • Organizer
      2010 Material Research Society Fall Meeting
    • Place of Presentation
      Boston USA
    • Year and Date
      2010-12-02
    • Related Report
      2011 Final Research Report 2010 Annual Research Report
  • [Presentation] Optical properties of GaSb thin films on Si substrates grown by nano-channel epitaxy2010

    • Author(s)
      M. Ichikawa, T. Miwa, A. Murayama, Y. Nakamura
    • Organizer
      2010 Material Research Society Fall Meeting
    • Place of Presentation
      Boston USA
    • Year and Date
      2010-11-30
    • Related Report
      2011 Final Research Report 2010 Annual Research Report
  • [Presentation] 刃状転位ネットワークの選択エッチングによるSiGeナノドット二次元配列構造の形成2010

    • Author(s)
      中村芳明, 高橋雅彦, 吉川純、中塚修、財満鎭明, 酒井朗
    • Organizer
      第30回表面科学学術講演会、第51回真空に関する連合講演会
    • Place of Presentation
      大阪大学(大阪)
    • Year and Date
      2010-11-05
    • Related Report
      2011 Final Research Report
  • [Presentation] 刃状転位ネットワークの選択エッチングによるSiGeナノドット二次元配列構造の形成2010

    • Author(s)
      Y.Nakamura, M.Takahashi, J.Kikkawa, O.Nakatsuka, S.Zaima, A.Sakai
    • Organizer
      第30回表面科学学術講演会、第51回真空に関する連合講演会
    • Place of Presentation
      大阪大学、日本
    • Year and Date
      2010-11-05
    • Related Report
      2010 Annual Research Report
  • [Presentation] Selforganization and self-repair of a two-d imensional nanoarray of epitaxial Ge qu antum dots using ultrathin SiO_2 film tec hnique2010

    • Author(s)
      Y. Nakamura, A. Murayama, R. Watan abe, T. Iyoda, and M., Ichikawa
    • Organizer
      International Symposium on Int egrated Molecular/ Materials Engineering 2010
    • Place of Presentation
      Changzhou, China
    • Year and Date
      2010-09-20
    • Related Report
      2011 Final Research Report
  • [Presentation] Self-organization and self-repair of a two-dimensional nanoarray of epitaxial Ge quantum dots using ultrathin SiO_2 film technique2010

    • Author(s)
      Y.Nakamura, A.Murayama, R.Watanabe, T.Iyoda, M., Ichikawa
    • Organizer
      International Symposium on Integrated Molecular/Materials Engineering 2010
    • Place of Presentation
      Changzhou, China(招待講演)
    • Year and Date
      2010-09-20
    • Related Report
      2010 Annual Research Report
  • [Presentation] 極薄Si酸化膜を用いたSi(111)基板上超高密度鉄系ナノドットの形成2010

    • Author(s)
      濱中啓伸, 中村芳明, 田中一樹, 吉川純, 酒井朗
    • Organizer
      第71回応用物理学会学術講演会
    • Place of Presentation
      長崎大学文教キャンパス,長崎県
    • Year and Date
      2010-09-16
    • Related Report
      2011 Final Research Report
  • [Presentation] ナノチャネルヘテロエピタキシーによるSi基板上への薄膜成長2010

    • Author(s)
      市川昌和, 三羽貴文, 村山昭之, 中村芳明
    • Organizer
      第71回応用物理学会学術講演会
    • Place of Presentation
      長崎大学文教キャンパス,長崎県
    • Year and Date
      2010-09-16
    • Related Report
      2011 Final Research Report
  • [Presentation] ナノチャネルヘテロェピタキシーによるSi基板上への薄膜成長2010

    • Author(s)
      市川昌和, 三羽貴文, 村山昭之, 中村芳明
    • Organizer
      第71回応用物理学会学術講演会
    • Place of Presentation
      長崎大学文教キャンパス・長崎
    • Year and Date
      2010-09-16
    • Related Report
      2010 Annual Research Report
  • [Presentation] 極薄Si酸化膜を用いたSi(111)基板上超高密度鉄系ナノドットの形成2010

    • Author(s)
      濱中啓伸, 中村芳明, 田中一樹, 吉川純, 酒井朗
    • Organizer
      第71回応用物理学会学術講演会
    • Place of Presentation
      長崎大学文教キャンパス・長崎
    • Year and Date
      2010-09-16
    • Related Report
      2010 Annual Research Report
  • [Presentation] Fe_3Si nanodots epitaxially grown on Si(111) substrates using ultrathin SiO_2 film technique2010

    • Author(s)
      Y. Nakamura, S. Amari, and M. Ichikawa
    • Organizer
      Asia-Pacific Conference on Semiconducting Silicide and Related materials Science and Technology Towards Sustainable Optoelectronics 2010
    • Place of Presentation
      Tsukuba, Japan
    • Year and Date
      2010-07-24
    • Related Report
      2011 Final Research Report 2010 Annual Research Report
  • [Presentation] Formation of ultrahigh density iron-based nanodots on Si(111) substrates using ultrathin SiO_2 films2010

    • Author(s)
      H. Hamanaka, Y. Nakamura, K. Tanaka, J. Kikkawa, and A. Sakai
    • Organizer
      Asia-Pacific Conference on Semiconducting Silicide and Related materials Sicence and Technology Towards Sustainable Optoelectronics 2010
    • Place of Presentation
      Tsukuba, Japan
    • Year and Date
      2010-07-24
    • Related Report
      2011 Final Research Report
  • [Presentation] Formation of ultrahigh density iron-based nanodots on Si (111) substrates using ultrathin SiO_2 films2010

    • Author(s)
      H.Hamanaka, Y.Nakamura, K.Tanaka, J.Kikkawa, A.Sakai
    • Organizer
      Asia-Pacific Conference on Semiconducting Silicide and Related materials Sicence and Technology Towards Sustainable Optoelectronics 2010
    • Place of Presentation
      Tsukuba, Japan
    • Year and Date
      2010-07-24
    • Related Report
      2010 Annual Research Report
  • [Presentation] 極薄Si酸化膜を用いたSi基板上へのエピタキシャルGaSb薄膜の形成過程と発光特性2010

    • Author(s)
      三羽貴文, 中村芳明, 市川昌和
    • Organizer
      第57回応用物理学関係連合講演会
    • Place of Presentation
      東海大学湘南キャンパス(神奈川県)
    • Year and Date
      2010-03-18
    • Related Report
      2011 Final Research Report 2009 Annual Research Report
  • [Presentation] ブロックコポリマーPEO_m-b-PMA(Az)_nを用いたSi(001)極薄酸化膜上Ge量子ドット配列構造の結晶性および発光特性の評価2010

    • Author(s)
      村山昭之, 中村芳明, 渡辺亮子, 彌田智一, 市川昌和
    • Organizer
      第57回応用物理学関係連合講演会
    • Place of Presentation
      東海大学湘南キャンパス(神奈川県)
    • Year and Date
      2010-03-18
    • Related Report
      2011 Final Research Report
  • [Presentation] ブロックコポリマ-PEOm-b-PMA(Az)nを用いたSi(001)極薄酸化膜上Ge量子ドット配列構造の結晶性および発光特性の評価2010

    • Author(s)
      村山昭之, 中村芳明, 渡辺亮子, 彌田智一, 市川昌和
    • Organizer
      第57回応用物理学関係連合講演会
    • Place of Presentation
      東海大学湘南キャンパス(神奈川県)
    • Year and Date
      2010-03-18
    • Related Report
      2009 Annual Research Report
  • [Presentation] GaAs/ AlGaAsダブルヘテロpin-構造のSTM-EL分光評価2010

    • Author(s)
      渡辺健太郎, 中村芳明, 窪谷茂幸, 片山竜二, 尾鍋研太郎, 市川昌和
    • Organizer
      第57回応用物理学関係連合講演会
    • Place of Presentation
      東海大学湘南キャンパス(神奈川県)
    • Year and Date
      2010-03-17
    • Related Report
      2011 Final Research Report
  • [Presentation] GaAs/AlGaAsダブルヘテロpin-構造のSTM-EL分光評価2010

    • Author(s)
      渡辺健太郎, 中村芳明, 窪谷茂幸, 片山竜二, 尾鍋研太郎, 市川昌和
    • Organizer
      第57回応用物理学関係連合講演会
    • Place of Presentation
      東海大学湘南キャンパス(神奈川県)
    • Year and Date
      2010-03-17
    • Related Report
      2009 Annual Research Report
  • [Presentation] Self-assembly technique of ultrahigh density quantum dots of group IV semiconductor epitaxially grown on Si substrates using ultrathin SiO_2 films2009

    • Author(s)
      Y. Nakamura
    • Organizer
      The 4th International Symposium on Integrated Molecular/ Materials Engineering(ISIMME2009)
    • Place of Presentation
      Sichuan University(Chengdu, CHINA)
    • Year and Date
      2009-10-27
    • Related Report
      2011 Final Research Report
  • [Presentation] Self-assembly technique of ultrahigh density quantum dots of group IV semicond uctor epitaxially grown on Si substrates using ultrathin SiO_2 films2009

    • Author(s)
      Y.Nakamura
    • Organizer
      The 4`<th> International Symposium on Integrated Molecular/Materials Engineering (ISIMME2009)
    • Place of Presentation
      Sichuan University (Chengdu, CHINA)
    • Year and Date
      2009-10-27
    • Related Report
      2009 Annual Research Report
  • [Presentation] Self-organization of 2-dimensional array of SiGe epitaxial quantum dots using dislocation network structures2009

    • Author(s)
      Y. Nakamura, T. Fujiwara, M. Takahashi, J. Kikkawa, and A. Sakai
    • Organizer
      10th International Conference on Atomically Controlled Surfaces, Interfaces and Nanostructures(ACSIN-10)
    • Place of Presentation
      Granada Conference Centre(Granada, Spain)
    • Year and Date
      2009-09-22
    • Related Report
      2011 Final Research Report
  • [Presentation] Self-organization of 2-dimensional array of SiGe epitaxial quantum dots using dis location network structure2009

    • Author(s)
      Y.Nakamura, T.Fujiwara, M.Takahashi, J.Kikkawa, A.Sakai
    • Organizer
      10th International Conference on Atomically Controlled Surfaces, Interfaces and Nanostructures (ACSIN-10)
    • Place of Presentation
      Granada Conference Centre (Granada, Spain)
    • Year and Date
      2009-09-22
    • Related Report
      2009 Annual Research Report
  • [Presentation] 極薄Si酸化膜を形成したSi基板上のエピタキシャルGaSb薄膜の発光特性2009

    • Author(s)
      三羽貴文, 中村芳明, 市川昌和
    • Organizer
      第70回応用物理学会学術講演会
    • Place of Presentation
      富山大学(富山県)
    • Year and Date
      2009-09-08
    • Related Report
      2011 Final Research Report 2009 Annual Research Report
  • [Presentation] 刃状転位ネットワークを用いたエピタキシャルナノドットの自己組織化配列2009

    • Author(s)
      高橋雅彦, 藤原達記, 中村芳明, 吉川純, 酒井朗, 中塚理, 財満鎭明
    • Organizer
      第70回応用物理学会学術講演会
    • Place of Presentation
      富山大学(富山県)
    • Year and Date
      2009-09-08
    • Related Report
      2011 Final Research Report 2009 Annual Research Report

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Published: 2009-04-01   Modified: 2016-04-21  

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