A novel fresh surface preparation technique: in-situ solid phase crystallization and its application to STM

Research Project

Project/Area Number	21710096
Research Category	Grant-in-Aid for Young Scientists (B)
Allocation Type	Single-year Grants
Research Field	Nanostructural science
Research Institution	財団法人神奈川科学技術アカデミー (2010) Kanagawa Academy of Science and Technology (2009)
Principal Investigator	NAKAO Shoichiro 財団法人神奈川科学技術アカデミー, 重点研究室透明機能材料グループ, 研究員 (50450771)
Project Period (FY)	2009 – 2010
Project Status	Completed (Fiscal Year 2010)
Budget Amount *help	¥4,550,000 (Direct Cost: ¥3,500,000、Indirect Cost: ¥1,050,000) Fiscal Year 2010: ¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000) Fiscal Year 2009: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
Keywords	表面・界面ナノ構造 / 酸化物・STM / 表面・界面物性 / STM / 酸化物 / 薄膜 / ナノ構造
Research Abstract	NbO_2 thin films were crystallized from amorphous films fabricated on glass substrates by pulsed laser deposition using various oxidative state targets. Weakly (110 oriented films can be grown in a limited condition, which is dependent on target oxidation condition. Functional materials such as Ta:SnO_2 and W:SnO_2 with improved properties were grown on (110) NbO_2 thin films. The surface of as-deposited amorphous films were probed by STM/STS. A irregular shape without atomic resolution, which suggest the existence of absorbed air were observed. An atomic resolution image is expected to be observed after in-situ solid state crystallization in STM chamber.