A novel fresh surface preparation technique: in-situ solid phase crystallization and its application to STM
| Project/Area Number |
21710096
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Single-year Grants |
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| Research Field |
Nanostructural science
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| Research Institution | 財団法人神奈川科学技術アカデミー (2010)
Kanagawa Academy of Science and Technology (2009) |
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Principal Investigator |
NAKAO Shoichiro 財団法人神奈川科学技術アカデミー, 重点研究室透明機能材料グループ, 研究員 (50450771)
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| Project Period (FY) |
2009 – 2010
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| Project Status |
Completed (Fiscal Year 2010)
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| Budget Amount *help |
¥4,550,000 (Direct Cost: ¥3,500,000、Indirect Cost: ¥1,050,000)
Fiscal Year 2010: ¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000)
Fiscal Year 2009: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
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| Keywords | 表面・界面ナノ構造 / 酸化物・STM / 表面・界面物性 / STM / 酸化物 / 薄膜 / ナノ構造 |
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| Research Abstract |
NbO_2 thin films were crystallized from amorphous films fabricated on glass substrates by pulsed laser deposition using various oxidative state targets. Weakly (110 oriented films can be grown in a limited condition, which is dependent on target oxidation condition. Functional materials such as Ta:SnO_2 and W:SnO_2 with improved properties were grown on (110) NbO_2 thin films. The surface of as-deposited amorphous films were probed by STM/STS. A irregular shape without atomic resolution, which suggest the existence of absorbed air were observed. An atomic resolution image is expected to be observed after in-situ solid state crystallization in STM chamber.
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Report
(3 results)
Research Products
(2 results)
