Tension-controlled MEMS spatial light modulator by using bionano particles

• Project/Area Number: 21710128
• Research Category: Grant-in-Aid for Young Scientists (B)
• Allocation Type: Single-year Grants
• Research Field: Microdevices/Nanodevices
• Research Institution: Toyota Technological Institute
• Principal Investigator: KUMAGAI Shinya Toyota Technological Institute, 大学院・工学研究科, 准教授 (70333888)
• Project Period (FY): 2009 – 2010
• Project Status: Completed (Fiscal Year 2010)
• Budget Amount: ¥4,550,000 (Direct Cost: ¥3,500,000、Indirect Cost: ¥1,050,000); Fiscal Year 2010: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000); Fiscal Year 2009: ¥3,250,000 (Direct Cost: ¥2,500,000、Indirect Cost: ¥750,000)
• Keywords: マイクロ・ナノデバイス / マイクロマシン / ナノバイオ

Research Abstract

Generations of crystallization nuclei in amorphous Si thin film are controlled by metal-induced lateral crystallization (MILC) using Ni nanoparticles (NPs) that are synthesized within cage-shaped protein, ferritin. Grain size in the crystallized Si film is increased from less than 1・m (without MILC) to 20・30・m (with MILC). Crystallization-induced stress (tensile stress) is also increased by the MILC using Ni NPs. The tensile stress increases larger with increase in the grain size. Spatial light modulators are fabricated with the crystalized Si film. The resonance frequency is increased and device operation range is extended.

Research Products

• [Presentation] BIONANO CRYSTALLIZED POLY-SI FILM FOR INCREASING TENSILE STRESS IN MEMS/NEMS DEVICE STRUCTURES (2011)
  • Author(s): S.Kumagai, S.Miyachi, I.Yamashita, Y.Uraoka, M.Sasaki
  • Organizer: Proc.Transducers 2011 1733
  • Place of Presentation: Beijing, China.
  • Year and Date: 2011-01-07
• [Presentation] Increasing tensile stress in poly-Si film structure by metal-induced lateral crystallization using ferritin supramolecules with Ni nanoparticles (2010)
  • Author(s): S.Kumagai, S.Miyachi, I.Yamashita, Y.Uraoka, M.Sasaki
  • Organizer: The International Chemical Congress of Pacific Basin Societies
  • Place of Presentation: Honolulu, Hawaii, USA
  • Year and Date: 2010-12-15
• [Presentation] Increasing tensile stress in poly-Si film structure by metal-induced lateral crystallization using ferritin supramolecules with Ni nanoparticles (2010)
  • Author(s): S.Kumagai, S.Miyachi, I.Yamashita, Y.Uraoka, M.Sasaki
  • Organizer: The International Chemical Congress of Pacific Basin Societies #226 46
  • Place of Presentation: Honolulu, Hawaii, USA
  • Year and Date: 2010-10-15
• [Presentation] MEMS 用Si 薄膜材料の内部応力増強に向けたNi フェリチンを用いた金属誘起横方向結晶成長 (2010)
  • Author(s): 熊谷慎也, 宮地修輔, 山下一郎, 浦岡行治, 佐々木実
  • Organizer: 日本機械学会2010年度年次大会 講演論文集(8) 235
  • Place of Presentation: 名古屋工業大学
  • Year and Date: 2010-09-08
• [Presentation] MEMS用Si薄膜材料の内部応力増強に向けたNiフェリチンを用いた金属誘起横方向結晶成長 (2010)
  • Author(s): 熊谷慎也, 宮地修輔, 山下一郎, 浦岡行治, 佐々木実
  • Organizer: 日本機械学会2010年度年次大会
  • Place of Presentation: 名古屋工業大学
  • Year and Date: 2010-09-08
• [Presentation] Larger Grain Size of Poly Si Confirmed by MEMS Strain Gauge (2010)
  • Author(s): Shinya Kumagai
  • Organizer: Proc.The Seventeenth International Workshop on Active-Matrix Flatpanel Displays and Devices 57
  • Place of Presentation: Tokyo Institute of Technology, Tokyo,Japan(招待講演)
  • Year and Date: 2010-07-06
• [Presentation] Larger Grain Size of Poly Si Confirmed by MEMS Strain Gauge (2010)
  • Author(s): Shinya Kumagai
  • Organizer: The Seventeenth International Workshop on Active-Matrix Flatpanel Displays and Devices
  • Place of Presentation: Tokyo Institute of Technology, Tokyo, Japan(招待講演)
  • Year and Date: 2010-07-06
• [Presentation] Niフェリチンを用いた金属誘起横方向結晶成長によるSi薄膜内応力の増強 (2010)
  • Author(s): 宮地修輔, 熊谷慎也, 山下一郎, 浦岡行治, 佐々木実
  • Organizer: 第57回応用物理学関係連合講演会,講演予稿集03-035
  • Place of Presentation: 東海大学湘南キャンパス
  • Year and Date: 2010-03-20
• [Presentation] Niフェリチンを用いた金属誘起横方向結晶成長によるSi薄膜内応力の増強 (2010)
  • Author(s): 宮地修輔, 熊谷慎也, 山下一郎, 浦岡行治, 佐々木実
  • Organizer: 第57回応用物理学関係連合講演会
  • Place of Presentation: 東海大学湘南キャンパス
  • Year and Date: 2010-03-20
• [Presentation] Metal-Induced Lateral Crystallization using Ni Nanoparticles for Increasing Tensile Stress in Si Thin Film (2010)
  • Author(s): Shinya Kumagai
  • Organizer: Proc.The Second International Symposium of Experiment-Integrated Computational Chemistry on Multiscale Fluidics(ECCMF2) 2010 22
  • Place of Presentation: Sendai,Japan(招待講演)
  • Year and Date: 2010-02-23
• [Presentation] Metal-Induced Lateral Crystallization using Ni Nanoparticles for Increasing Tensile Stress in Si Thin Film(招待講演) (2010)
  • Author(s): 熊谷慎也
  • Organizer: The Second International Symposium of Experiment-Integrated Computational Chemistry on Multiscale Fluidics(ECCMF2)
  • Place of Presentation: Sendai, Japan
  • Year and Date: 2010-02-23
• [Remarks] ホームページ等
  • URL: http://www.toyota.ti.ac.jp/mems/index.htm
• [Remarks]
  • URL: http://www.toyota-ti.ac.jp/mems/index.htm