Development of electron spin qubits using silicon quantum dots
Project/Area Number |
21710137
|
Research Category |
Grant-in-Aid for Young Scientists (B)
|
Allocation Type | Single-year Grants |
Research Field |
Microdevices/Nanodevices
|
Research Institution | Tokyo Institute of Technology |
Principal Investigator |
KODERA Tetsuo Tokyo Institute of Technology, 量子ナノエレクトロニクス研究センター, 助教 (00466856)
|
Project Period (FY) |
2009 – 2010
|
Project Status |
Completed (Fiscal Year 2010)
|
Budget Amount *help |
¥4,550,000 (Direct Cost: ¥3,500,000、Indirect Cost: ¥1,050,000)
Fiscal Year 2010: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2009: ¥3,380,000 (Direct Cost: ¥2,600,000、Indirect Cost: ¥780,000)
|
Keywords | 量子ドット / シリコン量子ドット / 量子コンピュータ / 少数電子素子 / 半導体量子ドット / 量子ビット / スピン / スピンコヒーレンス |
Research Abstract |
The purpose of this work is to study physics and develop elemental technologies for realizing quantum information devices using electron spins in silicon quantum dots as qubits. We propose a novel device structure and its fabrication techniques for lithographically-defined silicon QDs. We successfully fabricated coupled QDs utilizing electron beam lithography, reactive ion etching, and oxidation, in a metal-oxide-semiconductor structure on a non-doped silicon-on-insulator substrate. We then succeeded in observing a single-electron regime in the QD and spin-related tunneling phenomena.
|
Report
(3 results)
Research Products
(35 results)