Fabrication of red light-emitting devices using the rare-earth doped nitride semiconductors and the elucidation of luminescence mechanism
Project/Area Number |
21760007
|
Research Category |
Grant-in-Aid for Young Scientists (B)
|
Allocation Type | Single-year Grants |
Research Field |
Applied materials science/Crystal engineering
|
Research Institution | Osaka University |
Principal Investigator |
NISHIKAWA Atsushi Osaka University, 工学研究科, 助教 (60417095)
|
Project Period (FY) |
2009 – 2010
|
Project Status |
Completed (Fiscal Year 2010)
|
Budget Amount *help |
¥4,550,000 (Direct Cost: ¥3,500,000、Indirect Cost: ¥1,050,000)
Fiscal Year 2010: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000)
Fiscal Year 2009: ¥2,730,000 (Direct Cost: ¥2,100,000、Indirect Cost: ¥630,000)
|
Keywords | 窒化物半導体 / ユウロピウム / 赤色発光ダイオード / OMVPE法 / 窒化ガリウム / 有機金属気相エピタキシャル法 / 赤色発光 / フォトルミネセンス / 4f殻内遷移 / LED / 電流注入型デバイス |
Research Abstract |
We have succeeded in the growth of Eu-doped GaN layer grown by organometallic vapor phase epitaxy and demonstrated the first operation of current-injected red emission from a Eu-doped GaN LED. We have found strong influence of growth temperature and pressure on Eu luminescence intensity. As a result, improved light output power of 17 μW was achieved.
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Report
(3 results)
Research Products
(81 results)