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Precise strain evaluation for high-performance bipolar transistor

Research Project

Project/Area Number 21760011
Research Category

Grant-in-Aid for Young Scientists (B)

Allocation TypeSingle-year Grants
Research Field Applied materials science/Crystal engineering
Research InstitutionKyushu University

Principal Investigator

WANG Dong  Kyushu University, 産学連携センター, 特任准教授 (10419616)

Project Period (FY) 2009 – 2010
Project Status Completed (Fiscal Year 2010)
Budget Amount *help
¥4,550,000 (Direct Cost: ¥3,500,000、Indirect Cost: ¥1,050,000)
Fiscal Year 2010: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
Fiscal Year 2009: ¥2,860,000 (Direct Cost: ¥2,200,000、Indirect Cost: ¥660,000)
Keywords解析・評価 / 半導体物性 / 電子・電気材料 / 先端機能デバイス
Research Abstract

The geometry of test sample for local strain evaluation was as small as 5×5μm^2. We established photoluminescence measurement system for such a sample. We fabricated freestanding Si membranes structure (Si-On-Nothing structure), followed by deposition of SiN film. We evaluated strains in these samples using the PL system. As results, a compressive strain of approximately 1% was induced in the 200-nm-thick Si film by 200-nm-thick SiN film ; the strain along <100> direction was much larger than that along <110> direction. Also, we proposed a method for judging uniform or ununiform strain from dependence of PL signal peak position and its intensity on Si film thickness.

Report

(3 results)
  • 2010 Annual Research Report   Final Research Report ( PDF )
  • 2009 Annual Research Report
  • Research Products

    (30 results)

All 2011 2010 2009 Other

All Journal Article (16 results) (of which Peer Reviewed: 14 results) Presentation (11 results) Remarks (3 results)

  • [Journal Article] Defect Evaluation by Photoluminescence for Uniaxially Strained Si-On-Insulator2011

    • Author(s)
      D.Wang, K.Yamamoto, H.Gao, H.Yang, H.Nakashima
    • Journal Title

      The Electrochemical Society Transactions Vol.34

      Pages: 1117-1122

    • Related Report
      2010 Final Research Report
    • Peer Reviewed
  • [Journal Article] Measurement of strain and strain relaxation in free-standingSi membranes by convergent beam electron diffraction and finite element method2011

    • Author(s)
      H.Gao, K.Ikeda, S.Hata, H.Nakashima,D.Wang, H.Nakashima
    • Journal Title

      Acta Materialia Vol.59

      Pages: 2882-2890

    • Related Report
      2010 Final Research Report
    • Peer Reviewed
  • [Journal Article] Defect Evaluation by Photoluminescence for Uniaxially Strained Si-On-Insulator2011

    • Author(s)
      D.Wang, K.Yamamoto, H.Gao, H.Yang, H.Nakashima
    • Journal Title

      The Electrochemical Society Transactions

      Volume: Vol.34 Pages: 1117-1122

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Measurement of strain and strain relaxation in free-standing Si membranes by convergent beam electron diffraction and finite element method2011

    • Author(s)
      H.Gao, K.Ikeda, S.Hata, H.Nakashima, D.Wang, H.Nakashima
    • Journal Title

      Acta Materialia

      Volume: Vol.59 Pages: 2882-2890

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Microphotoluminescence evaluation of local for freestanding Si membranes with SiN deposition2010

    • Author(s)
      D.Wang, H.Yang, H.Nakashima
    • Journal Title

      Proceeding of The Forum on the Science and Technology of Silicon Materials

      Pages: 411-420

    • Related Report
      2010 Final Research Report
  • [Journal Article] Measurement of Strain in Freestanding Si/SixNy Membrane by Convergent Beam Electron Diffraction and Finite Element Method2010

    • Author(s)
      H.Gao, K.Ikeda, S.Hata, H.Nakashima, D.Wang, H.Nakashima
    • Journal Title

      Jpn.J.Appl.Phys. Vol.49

    • Related Report
      2010 Final Research Report
    • Peer Reviewed
  • [Journal Article] Strain distribution in freestanding Si/SixNy membranes studied by transmission electron microscopy2010

    • Author(s)
      H.Gao, K.Ikeda, S.Hata, H.Nakashima, D.Wang, H.Nakashima
    • Journal Title

      Thin Solid Films Vol.518

      Pages: 6787-6791

    • Related Report
      2010 Final Research Report
    • Peer Reviewed
  • [Journal Article] Microstructure and strain distribution in freestanding Si membrane strained by SixNy deposition2010

    • Author(s)
      H.Gao, K.Ikeda, S.Hata, H.Nakashima, D.Wang, H.Nakashima
    • Journal Title

      Materials Science and Engineering A Vol.527

      Pages: 6633-6637

    • Related Report
      2010 Final Research Report
    • Peer Reviewed
  • [Journal Article] 325 nm-laser-excited micro- hotoluminescence for strained Si film2010

    • Author(s)
      D.Wang, H.Yang, T.Kitamura, H.Nakashima
    • Journal Title

      Thin Solid Films Vol.518

      Pages: 2470-2473

    • Related Report
      2010 Final Research Report
    • Peer Reviewed
  • [Journal Article] Influence of freely diffusing excitons on the photoluminescence spectrum of Si thick films with depth distribution of strain2010

    • Author(s)
      D.Wang, H.Yang, T.Kitamura, H.Nakashima
    • Journal Title

      Journal of Applied Physics Vol.117

    • Related Report
      2010 Final Research Report
    • Peer Reviewed
  • [Journal Article] Microphotoluminescence evaluation of local for freestanding Si membranes with SiN deposition2010

    • Author(s)
      D.Wang, H.Yang, H.Nakashima
    • Journal Title

      Proceeding of The Forum on the Science and Technology of Silicon Materials 2010

      Pages: 411-420

    • Related Report
      2010 Annual Research Report
  • [Journal Article] Measurement of Strain in Freestanding Si/Si_xN_y Membrane by Convergent Beam Electron Diffraction and Finite Element Method2010

    • Author(s)
      H.Gao, K.Ikeda, S.Hata, H.Nakashima, D.Wang, H.Nakashima
    • Journal Title

      Jpn.J.Appl.Phys.

      Volume: Vol.49 Pages: 90208-3

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Strain distribution in freestanding Si/Si_xN_y membranes studied by transmission electron microscopy2010

    • Author(s)
      H.Gao, K.Ikeda, S.Hata, H.Nakashima, D.Wang, H.Nakashima
    • Journal Title

      Thin Solid Films

      Volume: Vol.518 Pages: 6787-6791

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Microstructure and strain distribution in freestanding Si membrane strained by Si_xN_y deposition2010

    • Author(s)
      H.Gao, K.Ikeda, S.Hata, H.Nakashima, D.Wang, H.Nakashima
    • Journal Title

      Materials Science and Engineering A

      Volume: Vol.527 Pages: 6633-6637

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Journal Article] 325 nm-laser-excited micro-photoluminescence for strained Si film2010

    • Author(s)
      D.Wang, H.Yang, T.Kitamura, H.Nakashima
    • Journal Title

      Thin Solid Films vol.518

      Pages: 2470-2473

    • Related Report
      2009 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Influence of freely diffusing excitons on the photoluminescence spectrum of Sithick films with depth distribution of strain2010

    • Author(s)
      D.Wang, H.Yang, T.Kitamura, H.Nakashima
    • Journal Title

      Journal of Applied Physics Vol.107, No.3

    • Related Report
      2009 Annual Research Report
    • Peer Reviewed
  • [Presentation] Defect Evaluation by Photoluminescence for Uniaxially Strained Si and Strained Si-on-insulator2011

    • Author(s)
      D.Wang, K.Yamamoto, H.Gao, H.Yang, H.Nakashima
    • Organizer
      China Semiconductor Technology International Conference 2011
    • Place of Presentation
      Shanghai, China
    • Year and Date
      2011-03-14
    • Related Report
      2010 Annual Research Report 2010 Final Research Report
  • [Presentation] Microstructures and defects in freestanding Si membranes in Strained Freestanding Si Membranes2010

    • Author(s)
      H.Gao, K.Ikeda, S.Hata, H.Nakashima, D.Wang, H.Nakashima
    • Organizer
      第52回日本顕微鏡学会九州支部総会
    • Place of Presentation
      九州大学
    • Year and Date
      2010-12-24
    • Related Report
      2010 Final Research Report
  • [Presentation] Microstructures and defects in freestanding Si membranes in Strained Freestanding Si Membranes2010

    • Author(s)
      H.Gao, K.Ikeda, S.Hata, H.Nakashima, D.Wang, H.Nakashima
    • Organizer
      第52回 日本顕微鏡学会九州支部総会
    • Place of Presentation
      九州大学
    • Year and Date
      2010-12-24
    • Related Report
      2010 Annual Research Report
  • [Presentation] Microphotoluminescence evaluation of local for freestanding Si membranes with SiN deposition2010

    • Author(s)
      D.Wang, H.Yang, H.Nakashima
    • Organizer
      The Forum on the Science and Technology of Silicon Materials 2010
    • Place of Presentation
      岡山大学
    • Year and Date
      2010-11-29
    • Related Report
      2010 Annual Research Report
  • [Presentation] SiN膜堆積によるSi基板への局所ひずみ導入と移動度評価手法の構築2010

    • Author(s)
      原田健司、山本圭介、王冬、中島寛
    • Organizer
      2010年応用物理学会九州支部学術講演会
    • Place of Presentation
      九州大学
    • Year and Date
      2010-11-27
    • Related Report
      2010 Final Research Report
  • [Presentation] SiN膜堆積によるSi基板への局所歪み導入と移動度評価手法の構築2010

    • Author(s)
      原田健司、山本圭介、王冬、中島寛
    • Organizer
      2010年応用物理学会九州支部学術講演会
    • Place of Presentation
      九州大学
    • Year and Date
      2010-11-27
    • Related Report
      2010 Annual Research Report
  • [Presentation] Micro photoluminescence evaluation of local for freestanding Si membranes with SiN deposition2010

    • Author(s)
      D.Wang, H.Yang, H.Nakashima
    • Organizer
      The Forum on the Science and Technology of Silicon Materials 2010
    • Place of Presentation
      岡山大学
    • Year and Date
      2010-11-15
    • Related Report
      2010 Final Research Report
  • [Presentation] Microstructure and strain distribution in strained freestandeing Si membrane2010

    • Author(s)
      H.Gao, K.Ikeda, S.Hata, H.Nakashima, D.Wang, H.Nakashima
    • Organizer
      The 17th International Microscopy Congress
    • Place of Presentation
      Brazil
    • Year and Date
      2010-09-22
    • Related Report
      2010 Final Research Report
  • [Presentation] Microstructure and strain distribution in strained freestandeing Si membrane2010

    • Author(s)
      H.Gao, K.Ikeda, S.Hata, H.Nakashima, D.Wang, H.Nakashima
    • Organizer
      The 17^<th> International Microscopy Congress (IMC17)
    • Place of Presentation
      Brazil
    • Year and Date
      2010-09-22
    • Related Report
      2010 Annual Research Report
  • [Presentation] 325 nm-Laser Excited Micro-Photolumines cence for Strained Si Films2009

    • Author(s)
      D.Wang, H.Gao, K.Ikeda, S.Hata, H.Nakashima, T.KitamuraH.Yang, H.Nakashima
    • Organizer
      European Materials Research Society 2009 Spring Meeting
    • Place of Presentation
      Strasbourg, France
    • Year and Date
      2009-06-11
    • Related Report
      2010 Final Research Report
  • [Presentation] 325nm-Laser Excited Micro-Photoluminescence for Strained Si Films2009

    • Author(s)
      D.Wang, H.Gao, K.Ikeda, S.Hata, H.Nakashima, T.Kitamura H.Yang, H.Nakashima
    • Organizer
      European Materials Research Society 2009 Spring Meeting
    • Place of Presentation
      Strasbourg, France
    • Year and Date
      2009-06-11
    • Related Report
      2009 Annual Research Report
  • [Remarks] ホームページ等

    • URL

      http://astec.kyushu-u.ac.jp/nakasima/naka_home.htm

    • Related Report
      2010 Final Research Report
  • [Remarks]

    • URL

      http://astec.kyushu-u.ac.jp/nakasima/naka_home.htm

    • Related Report
      2010 Annual Research Report
  • [Remarks]

    • URL

      http://astec.kyushu-u.ac.jp/nakasima/naka_home.htm

    • Related Report
      2009 Annual Research Report

URL: 

Published: 2009-04-01   Modified: 2016-04-21  

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