Room temperature crystal growth of oxide phosphor thin films under UV irradiation
| Project/Area Number |
21760018
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Single-year Grants |
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| Research Field |
Applied materials science/Crystal engineering
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| Research Institution | National Institute of Advanced Industrial Science and Technology |
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Principal Investigator |
NAKAJIMA Tomohiko National Institute of Advanced Industrial Science and Technology, 先進製造プロセス研究部門, 研究員 (50435749)
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| Project Period (FY) |
2009 – 2010
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| Project Status |
Completed (Fiscal Year 2010)
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| Budget Amount *help |
¥4,420,000 (Direct Cost: ¥3,400,000、Indirect Cost: ¥1,020,000)
Fiscal Year 2010: ¥2,080,000 (Direct Cost: ¥1,600,000、Indirect Cost: ¥480,000)
Fiscal Year 2009: ¥2,340,000 (Direct Cost: ¥1,800,000、Indirect Cost: ¥540,000)
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| Keywords | 結晶成長 / 蛍光体酸化物 / 製膜技術 / 低温製膜 / 蛍光体 / 酸化物薄膜 / 室温結晶成長 / 光照射プロセス / MOD法 / 光MOD法 |
|---|
| Research Abstract |
Room temperature fabrication for the oxide phosphors (especially vanadates) has been developed by means of ultra-violet (UV) irradiation. By using UV lamp, the irradiation at vacuum ultraviolet wavelength in air was effective on the crystallization. In the UV laser irradiation process, various kinds of phosphors have been successfully crystallized by using precursor nano-particles as crystal nuclei. These new processes for room temperature phosphor film fabrication are expected to develop next generation flexible displays.
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Report
(3 results)
Research Products
(10 results)
