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Development of MBE growth technology of InN-based alloys using quasi-LPE method

Research Project

Project/Area Number 21760237
Research Category

Grant-in-Aid for Young Scientists (B)

Allocation TypeSingle-year Grants
Research Field Electronic materials/Electric materials
Research InstitutionKogakuin University (2011)
Ritsumeikan University (2009-2010)

Principal Investigator

YAMAGUCHI Tomohiro  工学院大学, 工学部, 准教授 (50454517)

Project Period (FY) 2009 – 2011
Project Status Completed (Fiscal Year 2011)
Budget Amount *help
¥3,640,000 (Direct Cost: ¥2,800,000、Indirect Cost: ¥840,000)
Fiscal Year 2011: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000)
Fiscal Year 2010: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2009: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Keywords半導体 / 分子線エピタキシー / 薄膜・量子構造 / 製作・評価技術 / 窒化物半導体 / 混晶 / 作製・評価技術 / 分子線エピタキシー法
Research Abstract

The quasi-LPE(Liquid Phase Epitaxy) method, which has been proposed as a new MBE(Molecular Beam Epitaxy) growth of InN, was applied to the growth of InGaN. By controlling the phase separation occurred during the growth of InGaN, simple and reproducible growth of In(Ga) N/InGaN periodic structure and thick InGaN film was realized. This method was also developed to the growth of Mg-doping technique in order to obtain p-type materials.

Report

(4 results)
  • 2011 Annual Research Report   Final Research Report ( PDF )
  • 2010 Annual Research Report
  • 2009 Annual Research Report
  • Research Products

    (78 results)

All 2012 2011 2010 2009 Other

All Journal Article (14 results) (of which Peer Reviewed: 12 results) Presentation (56 results) Remarks (6 results) Patent(Industrial Property Rights) (2 results)

  • [Journal Article] Investigation on InN mole fraction fluctuation in InGaN films grown by RF-MBE2011

    • Author(s)
      T. Kimura, E. Fukumoto, T. Yamaguchi, K. Wang, M. Kaneko, T. Araki, E. Yoon and Y. Nanishi
    • Journal Title

      Physica status solidi(c)

      Volume: Vol.8 Pages: 1499-1502

    • Related Report
      2011 Final Research Report
    • Peer Reviewed
  • [Journal Article] Application of droplet elimination process by radical-beam irradiation to InGaN growth and fabrication of InN/InGaN periodic structure2011

    • Author(s)
      T. Yamaguchi, H. Umeda, T. Araki, and Y. Nanishi
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: Vol.50

    • NAID

      210000070345

    • Related Report
      2011 Final Research Report
    • Peer Reviewed
  • [Journal Article] MBE法による配列制御InNナノコラム成長2011

    • Author(s)
      荒木努、山口智広、名西〓之
    • Journal Title

      日本結晶成長学会誌

      Volume: 38 Pages: 47-53

    • Related Report
      2011 Annual Research Report
  • [Journal Article] Investigation on InN Mole Fraction Fluctuation in InGaN Films Grown by RF-MBE2011

    • Author(s)
      T.Kimura, E.Fukumoto, T.Yamaguchi, K.Wang, M.Kaneko, T.Araki, E.Yoon, Y.Nanishi
    • Journal Title

      phys.stat.sol.(c)

      Volume: 8 Issue: 5 Pages: 1499-1502

    • DOI

      10.1002/pssc.201001203

    • Related Report
      2011 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Application of Droplet Elimination Process by Radical -Beam Irradiation to InGaN Growth and Fabrication of InN/InGaN Periodic Structure2011

    • Author(s)
      T. Yamaguchi, H. Umeda, T. Araki, and Y. Nanishi
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 50巻 Issue: 4S Pages: 04DH08-04DH08

    • DOI

      10.1143/jjap.50.04dh08

    • NAID

      210000070345

    • Related Report
      2011 Annual Research Report
    • Peer Reviewed
  • [Journal Article] In situ Investigation of Growth Mechanism during Molecular Beam Epitaxy of In-Polar InN2011

    • Author(s)
      K.Wang, T.Yamaguchi, T.Araki, E.Yoon, Y.Nanishi
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 50

    • NAID

      210000138257

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Mg doped InN and confirmation of free holes in InN2011

    • Author(s)
      K.Wang, N.Millar, R.Iwamoto, T.Yamaguchi, M.A.Mayer, T.Araki, Y.Nanishi, K.M.Yu, E.E.Haller, W.Walukiewicz, J.W.AgerIII
    • Journal Title

      Applied Physics Letters

      Volume: 98

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Journal Article] New MBE Growth Method for High Quality InN and Related Alloys Using in Situ Monitoring Technology2010

    • Author(s)
      T. Yamaguchiand Y. Nanishi
    • Journal Title

      phys. stat.sol. (a)

      Volume: 207巻 Issue: 1 Pages: 19-23

    • DOI

      10.1002/pssa.200982638

    • Related Report
      2011 Final Research Report
    • Peer Reviewed
  • [Journal Article] RF-MBE growth of InN/InGaN MQW Structures by DERI and their characterization2010

    • Author(s)
      T.Araki, H.Umeda, T.Yamaguchi, T.Sakamoto, E.Yoon, Y.Nanishi
    • Journal Title

      Proceedings of 22nd International Conference on Indium Phosphide and Related Materials

      Pages: 92-95

    • Related Report
      2010 Annual Research Report
  • [Journal Article] Indium droplet elimination by radical beam irradiation for reproducible and high-quality growth of InN by RF molecular beam epitaxy2009

    • Author(s)
      T. Yamaguchi and Y. Nanishi
    • Journal Title

      Applied Physics Express

      Volume: Vol.2

    • NAID

      10025085943

    • Related Report
      2011 Final Research Report
    • Peer Reviewed
  • [Journal Article] Growth and characterization of N-polar and In-polar InN films by RF-MBE2009

    • Author(s)
      T. Yamaguchi, D. Muto, T. Araki, and Y. Nanishi
    • Journal Title

      Journal of Crystal Growth

      Volume: Vol.311 Pages: 2780-2782

    • Related Report
      2011 Final Research Report
    • Peer Reviewed
  • [Journal Article] Indium Droplet Elimination by Radical Beam Irradiation for Reproducible and High-Quality Growth of InN by RF Molecular Beam Epitaxy2009

    • Author(s)
      T.Yamaguchi, Y.Nanishi
    • Journal Title

      Applied Physics Express 2

    • NAID

      10025085943

    • Related Report
      2009 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Growth and Characterization of N-Polar and In-Polar InN Films by RF-MBE2009

    • Author(s)
      T.Yamaguchi, D.Muto, T.Araki, Y.Nanishi
    • Journal Title

      J.Cryst.Growth 311

      Pages: 2780-2782

    • Related Report
      2009 Annual Research Report
    • Peer Reviewed
  • [Journal Article] New MBE Growth Method for High Quality InN and Related Alloys Using in Situ Monitoring Technology2009

    • Author(s)
      T.Yamaguchi, Y.Nanishi
    • Journal Title

      phys.stat.sol.(a) 207

      Pages: 19-23

    • Related Report
      2009 Annual Research Report
    • Peer Reviewed
  • [Presentation] ラジカルモニタリング技術を応用したDERI法InGaN成長の検討2012

    • Author(s)
      阪口順一、上松尚.油谷匡胤、齋藤巧、山口智広、荒木努、名西〓之、T.Fujishima、E.Matioli、T.Palacios
    • Organizer
      2012年春季第59回応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学、東京
    • Year and Date
      2012-03-17
    • Related Report
      2011 Annual Research Report
  • [Presentation] DERI法を応用したInGaN/InGaN量子井戸構造の作製2012

    • Author(s)
      上松尚、山口智広、荒木努、名西〓之
    • Organizer
      2012年春季第59回応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学、東京
    • Year and Date
      2012-03-17
    • Related Report
      2011 Annual Research Report
  • [Presentation] 窒化物半導体新領域開拓にむけての材料技術最近の展開2012

    • Author(s)
      名西〓之、山口智広、王科、荒木努、E.Yoon
    • Organizer
      2012年春季第59回応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学、東京(招待講演)
    • Year and Date
      2012-03-15
    • Related Report
      2011 Annual Research Report
  • [Presentation] Importance of Advanced Plasma for Frontier Nitride Semiconductor Technologies2012

    • Author(s)
      Y.Nanishi, T.Yamaguchi, K.Wang, T.Araki, E.Yoon
    • Organizer
      4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials 2012
    • Place of Presentation
      Nagoya, Japan(invited)
    • Year and Date
      2012-03-05
    • Related Report
      2011 Annual Research Report
  • [Presentation] Application of DERI Method to thick InGaN and InN/InGaN MQW structure Growth2012

    • Author(s)
      Y.Nanishi, T.Yamaguchi, K.Wang, T.Araki, E.Yoon
    • Organizer
      KAUST-UCSB-NSF Workshop on Solid-State Lighting
    • Place of Presentation
      Saudi Arabia(invited)
    • Year and Date
      2012-02-13
    • Related Report
      2011 Annual Research Report
  • [Presentation] InNおよびInGaN成長の最近の進展-DERI法の結果が示唆すること-2012

    • Author(s)
      名西〓之、山口智広、荒木努
    • Organizer
      東北大学多元物質科学研究所窒化物ナノ・エレクトロニクス材料研究センター講演会
    • Place of Presentation
      東北大学、宮城(招待講演)
    • Year and Date
      2012-01-12
    • Related Report
      2011 Annual Research Report
  • [Presentation] Application of DERI Method to InGaN Growth and Mg Doping2011

    • Author(s)
      Y.Nanishi, T.Yamaguchi, K.Wang, T.Araki, E.Yoon
    • Organizer
      Advanced Workshop on 'Frontiers in Electronics' (WOFE 2011)
    • Place of Presentation
      San Juan, Puerto Rico(invited)
    • Year and Date
      2011-12-21
    • Related Report
      2011 Annual Research Report
  • [Presentation] Strong Luminescence from Self-Assembled InN Nanocolumns with Few Dislocations Grown by Molecular Beam Epitaxy2011

    • Author(s)
      K.Wang, T.Araki, T.Yamaguchi, E.Yoon, Y.Nanishi
    • Organizer
      The 9th International Conference on Nitride Semiconductors (ICNS-9) 2011
    • Place of Presentation
      Glasgow, UK
    • Year and Date
      2011-07-15
    • Related Report
      2011 Annual Research Report
  • [Presentation] Proposal of thick InGaN film growth using advanced droplet elimination process by radical-beam irradiation2011

    • Author(s)
      T. Yamaguchi, N. Uematsu, R. Iwamoto, T. Araki, E. Yoon and Y. Nanishi
    • Organizer
      The 9th International Conference on Nitride Semiconductors(ICNS-9)
    • Place of Presentation
      Glasgow, UK
    • Year and Date
      2011-07-13
    • Related Report
      2011 Final Research Report
  • [Presentation] Proposal of Thick InGaN Film Growth Using Advanced Droplet Elimination Process by Radical-Beam Irradiation2011

    • Author(s)
      T.Yamaguchi, N.Uematsu, R.Iwamoto, T.Araki, E.Yoon, Y.Nanishi
    • Organizer
      The 9th International Conference on Nitride Semiconductors (ICNS-9) 2011
    • Place of Presentation
      Glasgow, UK
    • Year and Date
      2011-07-13
    • Related Report
      2011 Annual Research Report
  • [Presentation] Investigation of InN Nanocolumns Grown on GaN Templates by Molecular Beam Epitaxy2011

    • Author(s)
      K.Wang, T.Yamaguchi, T.Araki, E.Yoon, Y.Nanishi
    • Organizer
      The 9th International Conference on Nitride Semiconductors (ICNS-9) 2011
    • Place of Presentation
      Glasgow, UK
    • Year and Date
      2011-07-13
    • Related Report
      2011 Annual Research Report
  • [Presentation] Study on DERI Growth of InN-Role of Indium Droplet-2011

    • Author(s)
      T.Katsuki, T.Yamaguchi, T.Araki, Y.Nanishi
    • Organizer
      30th Electronic Materials Symposium (EMS30)
    • Place of Presentation
      ラフォーレ琵琶湖、滋賀
    • Year and Date
      2011-07-01
    • Related Report
      2011 Annual Research Report
  • [Presentation] Thick InGaN Growth Using DERI Method2011

    • Author(s)
      N.Uematsu, T.Yamaguchi, R.Iwamoto, T.Sakamoto, T.Fujishima, T.Araki, Y.Nanishi
    • Organizer
      30th Electronic Materials Symposium (EMS30)
    • Place of Presentation
      ラフォーレ琵琶湖、滋賀
    • Year and Date
      2011-07-01
    • Related Report
      2011 Annual Research Report
  • [Presentation] Recent Progress of DERI Process for Growth of InN and Related Alloys2011

    • Author(s)
      Y.Nanishi, T.Yamaguchi, T.Araki, E.Yoon
    • Organizer
      40th "Jaszowiec" International School and Conference on the Physics of Semiconductors
    • Place of Presentation
      Jaszowiec, Poland(invited)
    • Year and Date
      2011-06-29
    • Related Report
      2011 Annual Research Report
  • [Presentation] Molecular Beam Epitaxial Growth and Characterization of InN Nanocolumns on GaN2011

    • Author(s)
      K.Wang, T.Yamaguchi, T.Araki, E.Yoon, Y.Nanishi
    • Organizer
      Electronic Materials Conference 2011 (EMC2011)
    • Place of Presentation
      Santa Barbara, USA
    • Year and Date
      2011-06-24
    • Related Report
      2011 Annual Research Report
  • [Presentation] Growth of InN Nanocolumns on GaN Templates and Sapphire by RF-MBE2011

    • Author(s)
      K.Wang, T.Yamaguchi, T.Araki, E.Yoon, Y.Nanishi
    • Organizer
      5th Asia-Pacific Workshop on Widegap Semiconductors
    • Place of Presentation
      Mie, Japan
    • Year and Date
      2011-05-25
    • Related Report
      2011 Annual Research Report
  • [Presentation] Recent Progress of InN and Related Alloys Grown by DERI Method2011

    • Author(s)
      Y.Nanishi, T.Yamaguchi, K.Wang, T.Araki, E.Yoon
    • Organizer
      2011 E-MRS Spring Meeting
    • Place of Presentation
      Strasbourg, France(invited)
    • Year and Date
      2011-05-11
    • Related Report
      2011 Annual Research Report
  • [Presentation] 電流-電圧特性の温度依存性評価によるp型InNの検証2011

    • Author(s)
      櫻井秀昭、井脇明日香、岩本亮輔、山口智広、城川潤二郎、荒木努、名西〓之
    • Organizer
      2011年(平成23年)春季第58回応用物理学関係連合講演会
    • Place of Presentation
      神奈川工科大学(神奈川県)
    • Year and Date
      2011-03-25
    • Related Report
      2010 Annual Research Report
  • [Presentation] N極性及びIn極性のInN-MIS構造の作製と評価2011

    • Author(s)
      森本健太、三木彰、山口智広、前田就彦、荒木努、名西〓之
    • Organizer
      2011年(平成23年)春季第58回応用物理学関係連合講演会
    • Place of Presentation
      神奈川工科大学(神奈川県)
    • Year and Date
      2011-03-25
    • Related Report
      2010 Annual Research Report
  • [Presentation] TEM Study on Microstructure of Mg-doped InN Grown by RF-MBE Using DERI Method2011

    • Author(s)
      T.Araki, T.Sakamoto, R.Iwamto, T.Yamaguchi, E.Yoon, Y.Nanishi
    • Organizer
      Third International Symposium on Advanced Plasma Science and its Applications (ISPlasma 2011)
    • Place of Presentation
      名古屋工業大学(愛知県)
    • Year and Date
      2011-03-09
    • Related Report
      2010 Annual Research Report
  • [Presentation] Development of Radical Beam Monitoring Techniques in RF-MBE Growth of InN2011

    • Author(s)
      T.Yamaguchi, T.Fujishima, T.Araki, E.Yoon, Y.Nanishi
    • Organizer
      Third International Symposium on Advanced Plasma Science and its Applications (ISPlasma 2011)
    • Place of Presentation
      名古屋工業大学(愛知県)
    • Year and Date
      2011-03-07
    • Related Report
      2010 Annual Research Report
  • [Presentation] Growth and fabrication of InN-based III-nitride structure using droplet elimination process by radical beam irradiation2011

    • Author(s)
      T. Yamaguchi and Y. Nanishi
    • Organizer
      SPIE Photonic West 2011
    • Place of Presentation
      San Francisco, USA
    • Year and Date
      2011-01-25
    • Related Report
      2011 Final Research Report
  • [Presentation] Growth and fabrication of InN-based III-nitride structure using droplet elimination process by radical beam irradiation2011

    • Author(s)
      T.Yamaguchi, Y.Nanishi
    • Organizer
      SPIE Photonic West 2011
    • Place of Presentation
      San Francisco, USA(招待講演)
    • Year and Date
      2011-01-25
    • Related Report
      2010 Annual Research Report
  • [Presentation] 窒化物半導体光半導体未踏領域への挑戦-InNと関連混晶の新しい成長技術と評価2010

    • Author(s)
      名西〓之、山口智広、王科、荒木努、E.Yoon
    • Organizer
      応用物理学会九州支部学術講演会
    • Place of Presentation
      九州大学(福岡県)(招待講演)
    • Year and Date
      2010-11-27
    • Related Report
      2010 Annual Research Report
  • [Presentation] Droplet elimination process by radical beam irradiation for the growth of InN-based III-nitrides and its application to device structure2010

    • Author(s)
      T. Yamaguchi and Y. Nanishi
    • Organizer
      2010 International Coference on Solid State Devices and Materials(SSDM2010)
    • Place of Presentation
      Tokyo, Japan
    • Year and Date
      2010-09-24
    • Related Report
      2011 Final Research Report
  • [Presentation] Droplet elimination process by radical beam irradiation for the growth of InN-based III-nitrides and its application to device structure2010

    • Author(s)
      T.Yamaguchi, Y.Nanishi
    • Organizer
      2010 International Coference on Solid State Devices and Materials (SSDM2010)
    • Place of Presentation
      東京大学(東京都)(招待講演)
    • Year and Date
      2010-09-24
    • Related Report
      2010 Annual Research Report
  • [Presentation] Surface Kinetics of Indium Adlayers and Droplets and Their Roles in InN Growth by Molecular Beam Epitaxy2010

    • Author(s)
      K.Wang, T.Yamaguchi, T.Araki, E.Yoon, Y.Nanishi
    • Organizer
      The International Workshop on Nitride semiconductors (IWN2010)
    • Place of Presentation
      Florida, USA
    • Year and Date
      2010-09-23
    • Related Report
      2010 Annual Research Report
  • [Presentation] Wet Etching Process for InN Device Fabrication2010

    • Author(s)
      A.Miki, K.Morimoto, N.Maeda, T.Yamaguchi, T.Araki, Y.Nanishi
    • Organizer
      The International Workshop on Nitride semiconductors (IWN2010)
    • Place of Presentation
      Florida, USA
    • Year and Date
      2010-09-22
    • Related Report
      2010 Annual Research Report
  • [Presentation] Mg Doped InN and Search For Holes2010

    • Author(s)
      K.Wang, R.Iwamoto, T.Yamaguchi, K.Kagawa, T.Araki, Y.Nanishi, N.Miller, M.Mayer, J.W.AgerIII, K.M.Yu, W.Walukiewicz
    • Organizer
      The International Workshop on Nitride semiconductors (IWN2010)
    • Place of Presentation
      Florida, USA
    • Year and Date
      2010-09-22
    • Related Report
      2010 Annual Research Report
  • [Presentation] Growth of InN and related alloys using droplet elimination by radical beam irradiation2010

    • Author(s)
      Y.Nanishi, T.Yamaguchi, K.Wang, T.Araki, M.Kaneko, E.Yoon, N.Miller, J.W.AgerIII, K.M.Yu, W.Walukiewicz
    • Organizer
      The International Workshop on Nitride semiconductors (IWN2010)
    • Place of Presentation
      Florida, USA(招待講演)
    • Year and Date
      2010-09-21
    • Related Report
      2010 Annual Research Report
  • [Presentation] DERI法InGaN成長を用いた厚膜化への試み2010

    • Author(s)
      上松尚、山口智広、岩本亮輔、坂本務、藤嶌辰也、荒木努、名西〓之
    • Organizer
      2010年(平成22年)秋季第71回応用物理学会学術講演会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-14
    • Related Report
      2010 Annual Research Report
  • [Presentation] DERI法を用いたInGaN成長と組成制御への試み2010

    • Author(s)
      岩本亮輔、山口智広、上松尚、坂本務、藤嶌辰也、荒木努、名西〓之
    • Organizer
      2010年(平成22年)秋季第71回応用物理学会学術講演会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-14
    • Related Report
      2010 Annual Research Report
  • [Presentation] TEMを用いたDERI法ドープInNの極微構造評価2010

    • Author(s)
      坂本務、山口智広、岩本亮輔、荒木努、名西〓之
    • Organizer
      2010年(平成22年)秋季第71回応用物理学会学術講演会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-14
    • Related Report
      2010 Annual Research Report
  • [Presentation] InNデバイス作製プロセスへのウエットエッチングの適用2010

    • Author(s)
      三木彰、森本健太、前田就彦、山口智広、荒木努、名西〓之
    • Organizer
      2010年(平成22年)秋季第71回応用物理学会学術講演会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-14
    • Related Report
      2010 Annual Research Report
  • [Presentation] InGaN growth using droplet elimination by radical-beam irradiation method2010

    • Author(s)
      T.Yamaguchi, K.Wang, T.Araki, E.Yoon, N.Yasushi
    • Organizer
      16th International Conference on Molecular Beam Epitaxy (MBE2010)
    • Place of Presentation
      Berlin, Germany
    • Year and Date
      2010-08-19
    • Related Report
      2010 Annual Research Report
  • [Presentation] Various application of DERI (droplet elimination by radical-beam irradiation) method in growth of RF-MBE2010

    • Author(s)
      T.Yamaguchi, H.Umeda, T.Sakamoto, T.Araki, E.Yoon, Y.Nanishi
    • Organizer
      29th Electronic Materials Symposium (EMS-29)
    • Place of Presentation
      ラフォーレ琵琶湖(滋賀県)
    • Year and Date
      2010-07-14
    • Related Report
      2010 Annual Research Report
  • [Presentation] Wet etching by KOH for InN device fabrication2010

    • Author(s)
      A.Miki, K.Morimoto, N.Maeda, T.Yamaguchi, T.Araki, Y.Nanishi
    • Organizer
      29th Electronic Materials Symposium (EMS-29)
    • Place of Presentation
      ラフォーレ琵琶湖(滋賀県)
    • Year and Date
      2010-07-14
    • Related Report
      2010 Annual Research Report
  • [Presentation] Characterization of contact resistance of Ti/Al/Ti/Au ohmic metal on N-polar and In-polar InN films grown by RF-MBE2010

    • Author(s)
      K.Morimoto, S.Kikuchi, N.Maeda, T.Yamaguchi, Y.Nanishi
    • Organizer
      29th Electronic Materials Symposium (EMS-29)
    • Place of Presentation
      ラフォーレ琵琶湖(滋賀県)
    • Year and Date
      2010-07-14
    • Related Report
      2010 Annual Research Report
  • [Presentation] Investigation on InN mole fraction fluctuation in InGaN films grown by RF-MBE2010

    • Author(s)
      T.Kimura, E.Fukumoto, T.Yamaguchi, K.Wang, M.Kaneko, T.Araki, E.Yoon, Y.Nanishi
    • Organizer
      Third International Symposium on Growth of III-Nitrides (ISGN-3)
    • Place of Presentation
      Montpellier, France
    • Year and Date
      2010-07-05
    • Related Report
      2010 Annual Research Report
  • [Presentation] Evidence of Free Holes in Mg Doped InN2010

    • Author(s)
      K.Wang, R.Iwamoto, T.Yamaguchi, K.Kagawa, T.Araki, Y.Nanishi, N.Miller, M.Mayer, J.W.Ager, K.M.Yu, W.Walukiewicz
    • Organizer
      Third International Symposium on Growth of III-Nitrides (ISGN-3)
    • Place of Presentation
      Montpellier, France
    • Year and Date
      2010-07-05
    • Related Report
      2010 Annual Research Report
  • [Presentation] RF-MBE Growth of InN/InGaN MQW Structures by DERI and Their Characterization2010

    • Author(s)
      T.Araki, H.Umeda, T Yamaguchi, T.Sakamoto, E.Yoon, Y.Nanishi
    • Organizer
      22th Indium Phosphide and Related Materials Conference (IPRM2010)
    • Place of Presentation
      高松シンボルタワー(香川県)
    • Year and Date
      2010-06-01
    • Related Report
      2010 Annual Research Report
  • [Presentation] Growth, monitoring and InN/InGaN MQW structure fabrication by DERI method2010

    • Author(s)
      Y.Nanishi, T.Yamaguchi
    • Organizer
      IX International Conference of Polish Society for Crystal Growth
    • Place of Presentation
      Gdansk-Sobieszewo, Poland(招待講演)
    • Year and Date
      2010-05-24
    • Related Report
      2010 Annual Research Report
  • [Presentation] Undoped and Mg-doped InN grown using droplet elimination by radical-beam irradiation method2010

    • Author(s)
      T.Yamaguchi, K.Wang, R.Iwamoto, N.Miller, M.Mayer, J.W.Ager III, K.M.Yu, W.Walukiewicz, T.Araki, Y.Nanishi
    • Organizer
      The 8th International Symposium on Semiconductor Light Emitting Devices (ISSLED2010)
    • Place of Presentation
      Peking, China
    • Year and Date
      2010-05-18
    • Related Report
      2010 Annual Research Report
  • [Presentation] DERI法を用いたIn系窒化物半導体の結晶成長とデバイス構造作製への応用2010

    • Author(s)
      山口智広、荒木努、名西之
    • Organizer
      第2回窒化物半導体結晶成長講演会(プレISGN-3)
    • Place of Presentation
      三重大学、三重県
    • Year and Date
      2010-05-14
    • Related Report
      2011 Final Research Report
  • [Presentation] DERI法を用いたIn系窒化物半導体の結晶成長とデバイス構造作製への応用2010

    • Author(s)
      山口智広、荒木努、名西〓之
    • Organizer
      第2回窒化物半導体結晶成長講演会(プレISGN-3)
    • Place of Presentation
      三重大学(三重県)(招待講演)
    • Year and Date
      2010-05-14
    • Related Report
      2010 Annual Research Report
  • [Presentation] DERI法のRHEED強度その場観察手法を用いたラジカルセル診断2010

    • Author(s)
      勝木拓郎、福本英太、山口智広、荒木努、名西〓之
    • Organizer
      第2回窒化物半導体結晶成長講演会(プレISGN-3)
    • Place of Presentation
      三重大学(三重県)
    • Year and Date
      2010-05-14
    • Related Report
      2010 Annual Research Report
  • [Presentation] RF-MBE法における新規高品質InN結晶成長手法の提案とInGaN結晶成長への応用2009

    • Author(s)
      山口智広、名西〓之
    • Organizer
      2009年度 電子情報通信学会 レーザ・量子エレクトロニクス研究会
    • Place of Presentation
      徳島大学(徳島市)
    • Year and Date
      2009-11-19
    • Related Report
      2009 Annual Research Report
  • [Presentation] DERI法を用いたRF-MBE InN結晶成長と各種その場観察評価2009

    • Author(s)
      山口智広、荒木努、王科、岩本亮輔、名西〓之
    • Organizer
      第39回結晶成長国内会議(NCCG-39)
    • Place of Presentation
      名古屋大学(名古屋市)
    • Year and Date
      2009-11-14
    • Related Report
      2009 Annual Research Report
  • [Presentation] Droplet Elimination Process by Radical Beam Irradiation for the Growth of InN-based III-nitrides2009

    • Author(s)
      山口智広, 名西〓之
    • Organizer
      Satellite Workshop on Nitride Semiconductors
    • Place of Presentation
      ソウル(韓国)
    • Year and Date
      2009-10-26
    • Related Report
      2009 Annual Research Report
  • [Presentation] Proposal of Droplet Elimination Process by Radical Beam Irradiation for Reproducible Growth of High-quality InN and InGaN2009

    • Author(s)
      T.Yamaguchi, A.Uedono, T.Suski, Y.Nanishi
    • Organizer
      The 8th International Conference on Nitride Semiconductors(ICNS 2009)
    • Place of Presentation
      チェジュ(韓国)
    • Year and Date
      2009-10-22
    • Related Report
      2009 Annual Research Report
  • [Presentation] Growth of InN and Related Alloys Using Droplet Elimination by Radical Beam Irradiation2009

    • Author(s)
      山口智広, 名西〓之
    • Organizer
      2009 E-MRS Fall Meeting
    • Place of Presentation
      ワルシャワ(ポーランド)
    • Year and Date
      2009-09-15
    • Related Report
      2009 Annual Research Report
  • [Presentation] RF-MBE InN成長におけるDERI法の有用性2009

    • Author(s)
      山口智広、王科、荒木努、名西〓之
    • Organizer
      2009年(平成21年)秋季第70回応用物理学会学術講演会
    • Place of Presentation
      富山大学(富山市)
    • Year and Date
      2009-09-10
    • Related Report
      2009 Annual Research Report
  • [Presentation] Indium Incorporation Behavior in InGaN Growth by RF-MBE2009

    • Author(s)
      山口智広, 荒木努, 名西〓之
    • Organizer
      28th Electronic Materials Symposium(EMS28)
    • Place of Presentation
      ラフォーレ琵琶湖(守山市)
    • Year and Date
      2009-07-08
    • Related Report
      2009 Annual Research Report
  • [Presentation] Simple and Reproducible Growth of High-Quality InN by DERI2009

    • Author(s)
      T.Yamaguchi, R.Iwamoto, N.Maeda, T.Araki, Y.Nanishi
    • Organizer
      28th Electronic Materials Symposium(EMS28)
    • Place of Presentation
      ラフォーレ琵琶湖(守山市)
    • Year and Date
      2009-07-08
    • Related Report
      2009 Annual Research Report
  • [Presentation] New MBE growth method for high quality InN and related alloys using in situ monitoring technology2009

    • Author(s)
      T. Yamaguchi and Y. Nanishi
    • Organizer
      E-MRS 2009 Spring Meeting(European Materials Research Society Spring Meeting)
    • Place of Presentation
      Strasbourg, France
    • Year and Date
      2009-06-12
    • Related Report
      2011 Final Research Report
  • [Presentation] New MBE Growth Method for High Quality InN and Related Alloys Using in Situ Monitoring Technology2009

    • Author(s)
      山口智広, 名西〓之
    • Organizer
      E-MRS 2009 Spring Meeting(European Materials Research Society Spring Meeting)
    • Place of Presentation
      ストラスブルグ(フランス)
    • Year and Date
      2009-06-12
    • Related Report
      2009 Annual Research Report
  • [Remarks]

    • URL

      http://er-web.sc.kogakuin.ac.jp/Profiles/10/0000905/profile.html

    • Related Report
      2011 Final Research Report
  • [Remarks]

    • Related Report
      2011 Final Research Report
  • [Remarks]

    • URL

      http://er-web.sc.kogakuin.ac.jp/Profiles/10/0000905/profile.html

    • Related Report
      2011 Annual Research Report
  • [Remarks]

    • URL

      http://www.ns.kogakuin.ac.jp/~ct13354/lab-event2011.html

    • Related Report
      2011 Annual Research Report
  • [Remarks]

    • URL

      http://www.ritsumei.ac.jp/se/re/nanishilab/Nanishi-Lab.html

    • Related Report
      2010 Annual Research Report
  • [Remarks]

    • URL

      http://www.ritsumei.ac.jp/se/re/nanishilab/Nanishi-Lab.html

    • Related Report
      2009 Annual Research Report
  • [Patent(Industrial Property Rights)] 窒化物半導体薄膜の製造方法2009

    • Inventor(s)
      山口智広,名西.之
    • Industrial Property Rights Holder
      学校法人立命館
    • Filing Date
      2009-05-15
    • Related Report
      2011 Final Research Report
  • [Patent(Industrial Property Rights)] 窒化物半導体薄膜の製造方法2009

    • Inventor(s)
      山口智広, 名西〓之
    • Industrial Property Rights Holder
      学校法人立命館
    • Filing Date
      2009-05-15
    • Related Report
      2009 Annual Research Report

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Published: 2009-04-01   Modified: 2016-04-21  

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